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1. 发明授权

US09746767B2 Photoresist composition and method of manufacturing black matrix using the same 有权
公开(公告)号：US09746767B2
公开(公告)日：2017-08-29
申请号：US14881815
申请日：2015-10-13
申请人： Samsung Display Co., Ltd.
发明人： Ki Beom Lee , Hyun-Seok Kim , Hi Kuk Lee , Jae Hyuk Chang
IPC分类号： G03F7/031 , G03F7/00 , G03F7/20 , G03F7/32
CPC分类号： G03F7/0007 , G03F7/031 , G03F7/20 , G03F7/325
摘要： A photoresist composition including 5 wt % to 10 wt % of a binder resin, 5 wt % to 10 wt % of a photopolymerization monomer, 1 wt % to 5 wt % of a photopolymerization initiator comprising an oxime ester-based compound and activated by light in a wavelength range of 400 nm to 410 nm, 5 wt % to 10 wt % of a black coloring agent, and a residual amount of a solvent.

2. 发明授权

US09046779B2 Method of fabricating display device using maskless exposure apparatus and display device 有权
标题翻译：使用无掩模曝光装置和显示装置制造显示装置的方法
公开(公告)号：US09046779B2
公开(公告)日：2015-06-02
申请号：US13861039
申请日：2013-04-11
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Sang Hyun Yun , Cha-Dong Kim , Jung-In Park , Jae Hyuk Chang , Hi Kuk Lee
IPC分类号： B32B3/00 , G03F7/20 , G03F7/00 , G02F1/1335 , G02F1/1339
CPC分类号： G03F7/2022 , G02F1/133512 , G02F1/13394 , G03F7/0007 , G03F7/203 , G03F7/70475 , Y10T428/24851
摘要： The present invention relates to a method of fabricating a display device using a maskless exposure apparatus, and the display device, and more particularly, to a method of fabricating a display device by using a maskless exposure apparatus, which is capable of preventing a stain from being viewed, and the display device. An exemplary embodiment of the present invention provides a method of fabricating a display device, including: forming a first exposure region on a substrate by performing exposure while scanning the substrate with a first exposure head irradiating an exposure beam according to pattern information of a first pattern in a scanning direction; and forming a second exposure region adjacent to the first exposure region on the substrate by performing exposure while scanning the substrate with a second exposure head irradiating an exposure beam according to the pattern information of the first pattern in the scanning direction; in which an exposure boundary region between the first exposure region and the second exposure region is extended in the scanning direction, and the exposure boundary region overlaps a light blocking region.
摘要翻译：本发明涉及使用无掩模曝光装置和显示装置制造显示装置的方法，更具体地说，涉及一种使用无掩模曝光装置制造显示装置的方法，该无掩模曝光装置能够防止被观看，以及显示装置。本发明的一个示例性实施例提供了一种制造显示装置的方法，包括：通过在用基于第一图案的图案信息的照射曝光光束的第一曝光头扫描基板的同时进行曝光来在基板上形成第一曝光区域在扫描方向; 以及根据所述第一图案在所述扫描方向上的图案信息，利用照射曝光光束的第二曝光头对所述基板进行曝光，同时在所述基板上形成与所述第一曝光区域相邻的第二曝光区域; 其中第一曝光区域和第二曝光区域之间的曝光边界区域在扫描方向上延伸，并且曝光边界区域与遮光区域重叠。

3. 发明授权

US09645450B2 Alignment apparatus, exposing apparatus including the same, and manufacturing method of liquid crystal display device 有权
公开(公告)号：US09645450B2
公开(公告)日：2017-05-09
申请号：US13871732
申请日：2013-04-26
申请人： Samsung Display Co., Ltd.
发明人： Jae Hyuk Chang , Hi Kuk Lee , Cha-Dong Kim , Sang Hyun Yun , Jung-In Park , Chang Hoon Kim , Ki Beom Lee
IPC分类号： G01B11/00 , G02F1/1341 , G02F1/13 , G01B11/27 , G02F1/1333 , G02F1/1335
CPC分类号： G02F1/1341 , G01B11/272 , G02F1/1303 , G02F2001/133354 , G02F2001/133548
摘要： Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate.

4. 发明授权

US09835951B2 Roll to roll light exposure system 有权
公开(公告)号：US09835951B2
公开(公告)日：2017-12-05
申请号：US14933896
申请日：2015-11-05
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jae Hyuk Chang , Sang Hyun Yun , Ki Beom Lee , Hi Kuk Lee
IPC分类号： G03B27/58 , G03F7/20 , G03F7/22
CPC分类号： G03F7/70141 , G03F7/201 , G03F7/213 , G03F7/22 , G03F7/70791 , G03F9/00 , G03F9/7088
摘要： Embodiments of the present invention provide a roll-to-roll exposure system having a reference mark array and alignment scope units for precisely measuring the position and orientation of an object on a flexible multilayered circuit film. A roll-to-roll exposure system according to an exemplary embodiment of the present invention includes: a plurality of rolls configured to move a flexible multilayered circuit film having an object positioned thereon; alignment scope units positioned so as to be spaced apart from each other and proximate to the rolls; and at least one exposure unit positioned so as to be spaced proximate to the rolls and spaced apart from sides of the alignment scope units, in which one of the rolls has a reference mark array on its surface.

5. 发明授权

US09366975B2 Stage transferring device and position measuring method thereof 有权
标题翻译：舞台转移装置及其位置测量方法
公开(公告)号：US09366975B2
公开(公告)日：2016-06-14
申请号：US13959864
申请日：2013-08-06
申请人： Samsung Display Co., Ltd.
发明人： Hi Kuk Lee , Sang Don Jang , Jae Hyuk Chang , Hyang-Shik Kong , Cha-Dong Kim , Chang Hoon Kim , Jung-In Park , Sang Hyun Yun
IPC分类号： G01B11/02 , G03F7/20
CPC分类号： G03F7/70775
摘要： A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.
摘要翻译：舞台转移装置发明包括：传送台，物体安装在该传送台上，并在x-y平面内传送物体; 和台架位置测量装置。舞台位置测量装置在转印台上包括一维刻度; 被配置为与一维刻度重叠的一维刻度读取头，将测量光束照射到重叠的一维刻度并测量转印台的1Dy轴坐标; 转印台上的二维编码器; 以及被构造成与二维编码器重叠的二维编码器读取头，将测量光束照射到重叠的二维编码器，并测量转印台的2D x轴坐标和2D y轴坐标。

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