会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Anti-fuse, anti-fuse circuit including the same, and method of fabricating the anti-fuse
    • 防熔丝,反熔丝电路包括相同,以及制造防熔丝的方法
    • US08514648B2
    • 2013-08-20
    • US13051998
    • 2011-03-18
    • Jong-Pil SonSeong-Jin JangByung-Sik MoonDoo-Young KimHyoung-Joo KimJu-Seop Park
    • Jong-Pil SonSeong-Jin JangByung-Sik MoonDoo-Young KimHyoung-Joo KimJu-Seop Park
    • G11C17/18
    • H01L23/5252G11C17/16G11C29/785H01L27/101H01L2924/0002H01L2924/00
    • Provided are an anti-fuse, an anti-fuse circuit, and a method of fabricating the anti-fuse. The anti-fuse includes a semiconductor substrate, an isolation region, a channel diffusion region, a gate oxide layer, and a gate electrode. The semiconductor substrate includes a top surface and a bottom portion, the bottom portion of the semiconductor substrate having a first conductivity type. The isolation region is disposed inward from the top surface of the semiconductor substrate to a first depth. The channel diffusion region is disposed inward from the top surface of the semiconductor substrate to a second depth, the second depth located at a depth where the channel diffusion region meets an upper boundary of the bottom portion of the semiconductor substrate. The channel diffusion region is surrounded by the isolation region, the first depth is a greater distance from the top surface of the semiconductor substrate than the second depth, and the channel diffusion region has a second conductivity type opposite to the first conductivity type. The gate oxide layer is disposed on the channel diffusion region, and the gate electrode is disposed on the gate oxide layer to cover a top surface of the gate oxide layer.
    • 提供反熔丝,反熔丝电路和制造反熔丝的方法。 反熔丝包括半导体衬底,隔离区,沟道扩散区,栅极氧化层和栅电极。 半导体衬底包括顶表面和底部,半导体衬底的底部具有第一导电类型。 隔离区域从半导体衬底的顶表面向内设置到第一深度。 沟道扩散区域从半导体衬底的顶表面向内设置到第二深度,第二深度位于沟道扩散区域与半导体衬底的底部的上边界相交的深度处。 沟道扩散区域由隔离区域包围,第一深度比半导体衬底的顶表面的距离大于第二深度,并且沟道扩散区域具有与第一导电类型相反的第二导电类型。 栅极氧化层设置在沟道扩散区上,并且栅电极设置在栅极氧化层上以覆盖栅极氧化物层的顶表面。
    • 4. 发明申请
    • SEMICONDUCTOR DEVICE, A PARALLEL INTERFACE SYSTEM AND METHODS THEREOF
    • 半导体器件,并行接口系统及其方法
    • US20130135956A1
    • 2013-05-30
    • US13483719
    • 2012-05-30
    • Seung-Jun BaeSeong-Jin JangBeom-Sig Cho
    • Seung-Jun BaeSeong-Jin JangBeom-Sig Cho
    • G11C7/22
    • G11C7/22H03K19/0966H04L7/0008H04L7/033H04L7/10
    • A memory device includes a clock receiving block, a data transceiver block, a phase detection block, and a phase information transmitter. The clock receiving block is configured to receive a clock signal from a memory controller through a clock signal line and generate a data sampling clock signal and an edge sampling clock signal. The data transceiver block is configured to receive a data signal from the memory controller through a data signal line. The phase detection block is configured to generate phase information in response to the data sampling clock signal, the edge sampling clock signal and the data signal. The phase information transmitter is configured to transmit the phase information to the memory controller through a phase information signal line that is separate from the data signal line.
    • 存储器件包括时钟接收块,数据收发器块,相位检测块和相位信息发送器。 时钟接收块被配置为通过时钟信号线从存储器控制器接收时钟信号,并生成数据采样时钟信号和边沿采样时钟信号。 数据收发器模块被配置为通过数据信号线从存储器控制器接收数据信号。 相位检测块被配置为响应于数据采样时钟信号,边沿采样时钟信号和数据信号而产生相位信息。 相位信息发送器被配置为通过与数据信号线分离的相位信息信号线将相位信息发送到存储器控制器。
    • 7. 发明申请
    • ANTI-FUSE, ANTI-FUSE CIRCUIT INCLUDING THE SAME, AND METHOD OF FABRICATING THE ANTI-FUSE
    • 抗保险丝,包括其中的防熔丝电路以及制造防熔丝的方法
    • US20110267915A1
    • 2011-11-03
    • US13051998
    • 2011-03-18
    • Jong-Pil SONSeong-Jin JangByung-Sik MoonDoo-Young KimHyoung-Joo KimJu-Seop Park
    • Jong-Pil SONSeong-Jin JangByung-Sik MoonDoo-Young KimHyoung-Joo KimJu-Seop Park
    • G11C8/10H01L29/78H01L27/088
    • H01L23/5252G11C17/16G11C29/785H01L27/101H01L2924/0002H01L2924/00
    • Provided are an anti-fuse, an anti-fuse circuit, and a method of fabricating the anti-fuse. The anti-fuse includes a semiconductor substrate, an isolation region, a channel diffusion region, a gate oxide layer, and a gate electrode. The semiconductor substrate includes a top surface and a bottom portion, the bottom portion of the semiconductor substrate having a first conductivity type. The isolation region is disposed inward from the top surface of the semiconductor substrate to a first depth. The channel diffusion region is disposed inward from the top surface of the semiconductor substrate to a second depth, the second depth located at a depth where the channel diffusion region meets an upper boundary of the bottom portion of the semiconductor substrate. The channel diffusion region is surrounded by the isolation region, the first depth is a greater distance from the top surface of the semiconductor substrate than the second depth, and the channel diffusion region has a second conductivity type opposite to the first conductivity type. The gate oxide layer is disposed on the channel diffusion region, and the gate electrode is disposed on the gate oxide layer to cover a top surface of the gate oxide layer.
    • 提供反熔丝,反熔丝电路和制造反熔丝的方法。 反熔丝包括半导体衬底,隔离区,沟道扩散区,栅极氧化层和栅电极。 半导体衬底包括顶表面和底部,半导体衬底的底部具有第一导电类型。 隔离区域从半导体衬底的顶表面向内设置到第一深度。 沟道扩散区域从半导体衬底的顶表面向内设置到第二深度,第二深度位于沟道扩散区域与半导体衬底的底部的上边界相交的深度处。 沟道扩散区域由隔离区域包围,第一深度比半导体衬底的顶表面的距离大于第二深度,并且沟道扩散区域具有与第一导电类型相反的第二导电类型。 栅极氧化层设置在沟道扩散区上,并且栅电极设置在栅极氧化层上以覆盖栅极氧化物层的顶表面。