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1. 发明申请

US20170089813A1 METHOD AND SYSTEM FOR ION BEAM DELAYERING OF A SAMPLE AND CONTROL THEREOF 审中-公开
公开(公告)号：US20170089813A1
公开(公告)日：2017-03-30
申请号：US15379049
申请日：2016-12-14
申请人： TECHINSIGHTS INC.
发明人： Robert K. Foster , Christopher Pawlowicz , Jason Abt , Ian Jones , Heinz Josef Nentwich
IPC分类号： G01N1/32 , H01J37/32 , H01L23/00
摘要： There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

2. 发明授权

US09915628B2 Circuit tracing using a focused ion beam 有权
公开(公告)号：US09915628B2
公开(公告)日：2018-03-13
申请号：US15174260
申请日：2016-06-06
申请人： TECHINSIGHTS INC.
发明人： Christopher Pawlowicz , Alexander Sorkin , Michael W. Phaneuf , Alexander Krechmer , Ken G. Lagarec
IPC分类号： G21G5/00 , G01N23/225 , H01J37/22 , H01L21/66 , G01R31/303
CPC分类号： G01N23/2255 , G01R31/303 , H01J37/222 , H01J2237/24564 , H01J2237/24585 , H01J2237/2803 , H01J2237/2809 , H01J2237/31749 , H01L22/12
摘要： Methods and systems for tracing circuitry on integrated circuits using focused ion beam based imaging techniques. A first component or node on an integrated circuit is coupled to a second component or node on the same integrated circuit. After an external bias is applied to the first component or node, a focused ion beam is applied to the integrated circuit and an image is taken using an electron detector. The features or components on the integrated circuit which are coupled to the second component or node will show up in high contrast on the resulting image. The method may also involve applying a bias to a node or component and then using focused ion beam imaging techniques (through an electron detector) to arrive at an image of the integrated circuit. Components coupled to the node will appear in high contrast in the resulting image.

3. 发明授权

US11214874B2 Method and system for ion beam delayering of a sample and control thereof 有权
公开(公告)号：US11214874B2
公开(公告)日：2022-01-04
申请号：US16906436
申请日：2020-06-19
申请人： TECHINSIGHTS INC.
发明人： Robert K. Foster , Christopher Pawlowicz , Jason Abt , Ian Jones , Heinz Josef Nentwich
IPC分类号： G01N1/32 , C23F4/00 , H01L23/00 , H01J37/32 , H01L21/263 , H01L21/66
摘要： There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

4. 发明授权

US09529040B2 Circuit tracing using a focused ion beam 有权
标题翻译：使用聚焦离子束的电路跟踪
公开(公告)号：US09529040B2
公开(公告)日：2016-12-27
申请号：US14811549
申请日：2015-07-28
申请人： TECHINSIGHTS INC.
发明人： Christopher Pawlowicz , Alexander Sorkin , Alexander Krechmer
IPC分类号： G21G5/00 , G01R31/303 , G01R31/28 , G01N23/225 , H01L21/66
CPC分类号： G01R31/303 , G01N23/2255 , G01R31/2896 , H01J2237/24564 , H01J2237/24585 , H01J2237/2803 , H01J2237/2809 , H01J2237/31749 , H01L22/12
摘要： Described are various embodiments of methods and systems for tracing circuitry on integrated circuits using focused ion beam based imaging techniques. In one such embodiment, a method is provide for identifying functional componentry associated with a switchable power interface on an integrated circuit, wherein the switchable power interface comprises a source and a drain with a control switch therebetween, said control switch being controllable by a control signal during operation of the integrated circuit. The method comprises connecting, with deposited conductive material, the source and the drain; applying an external voltage bias to a power input of the switchable power interface via one of the source and the drain; exposing the integrated circuit to a focused ion beam; and gathering an image of the integrated circuit during exposure to determine areas of high contrast indicating functional componentry in operative connection with the switchable power interface.
摘要翻译：描述了使用基于聚焦离子束的成像技术在集成电路上跟踪电路的方法和系统的各种实施例。在一个这样的实施例中，提供了一种用于识别与集成电路上的可切换电力接口相关联的功能组件的方法，其中所述可切换电力接口包括其间具有控制开关的源极和漏极，所述控制开关由控制信号在集成电路运行期间。该方法包括用沉积的导电材料连接源极和漏极; 通过源极和漏极中的一个将外部电压施加到可切换电力接口的功率输入; 将集成电路暴露于聚焦离子束; 以及在曝光期间收集集成电路的图像，以确定与可切换电源接口可操作连接的功能组件的高对比度区域。

5. 发明授权

US10689763B2 Method and system for ion beam delayering of a sample and control thereof 有权
公开(公告)号：US10689763B2
公开(公告)日：2020-06-23
申请号：US15379049
申请日：2016-12-14
申请人： TECHINSIGHTS INC.
发明人： Robert K. Foster , Christopher Pawlowicz , Jason Abt , Ian Jones , Heinz Josef Nentwich
IPC分类号： C23F4/00 , G01N1/32 , H01L23/00 , H01J37/32 , H01L21/263 , H01L21/66
摘要： There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

6. 发明授权

US10469777B2 Methods, systems and devices relating to distortion correction in imaging devices 有权
公开(公告)号：US10469777B2
公开(公告)日：2019-11-05
申请号：US15560935
申请日：2016-03-22
申请人： TechInsights Inc.
发明人： Christopher Pawlowicz , Alexander Sorkin , Vladimir Martincevic
IPC分类号： H01J37/304 , H01J37/26 , H01J37/22 , H04N5/357 , G01N23/2251 , H01J37/28
摘要： Devices, systems and methods relating to a distortion-correcting imaging for collecting image-related data of a substrate are disclosed, comprising: a beam emitter for directing an emission at an intended location on the substrate, and a signal detector for determining a signal intensity value associated with the emission; wherein the signal intensity value is associated with a corrected substrate location, said corrected substrate location determined from the intended substrate location and a correction factor, said correction factor being a function of said intended substrate location.

7. 发明申请

US20170096741A1 METHOD AND SYSTEM FOR ION BEAM DELAYERING OF A SAMPLE AND CONTROL THEREOF 审中-公开
公开(公告)号：US20170096741A1
公开(公告)日：2017-04-06
申请号：US15378551
申请日：2016-12-14
申请人： TECHINSIGHTS INC.
发明人： Robert K. Foster , Christopher Pawlowicz , Jason Abt , Ian Jones , Heinz Josef Nentwich
IPC分类号： C23F4/00 , H01J37/32 , G01N1/32 , H01L21/263 , H01L21/66
摘要： There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

8. 发明申请

US20200318242A1 METHOD AND SYSTEM FOR ION BEAM DELAYERING OF A SAMPLE AND CONTROL THEREOF 审中-公开
公开(公告)号：US20200318242A1
公开(公告)日：2020-10-08
申请号：US16906436
申请日：2020-06-19
申请人： TECHINSIGHTS INC.
发明人： Robert K. Foster , Christopher Pawlowicz , Jason Abt , Ian Jones , Heinz Josef Nentwich
IPC分类号： C23F4/00 , G01N1/32 , H01L23/00 , H01J37/32 , H01L21/263 , H01L21/66
摘要： There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

9. 发明授权

US10550480B2 Method and system for ion beam delayering of a sample and control thereof 有权
公开(公告)号：US10550480B2
公开(公告)日：2020-02-04
申请号：US15378551
申请日：2016-12-14
申请人： TECHINSIGHTS INC.
发明人： Robert K. Foster , Christopher Pawlowicz , Jason Abt , Ian Jones , Heinz Josef Nentwich
IPC分类号： C23F4/00 , G01N1/32 , H01L23/00 , H01J37/32 , H01L21/263 , H01L21/66
摘要： There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

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