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1. 发明授权

US07925367B2 Defect review and classification system 有权
标题翻译：缺陷审查和分类制度
公开(公告)号：US07925367B2
公开(公告)日：2011-04-12
申请号：US12573463
申请日：2009-10-05
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： The invention proposes a system that interrupts a processing associated with an ADC having low priority when an ADC processing cannot catch up with ADR by an ADC alone that is not under execution but uses an ADC for an ADR having high priority. To preferentially execute ADR/ADC having high priority, the invention employs an algorithm for serially selecting ADR/ADC in the order of higher processing capacity (in the order of greater numerical values in the expression by a DPH unit) from among ADR/ADCs that have the lowest priority, no matter whether the ADR/DC is now under execution or not.
摘要翻译：本发明提出了一种系统，当ADC处理不能通过一个ADC不能跟踪ADR而不能执行但对具有高优先级的ADR使用ADC时，中断与具有低优先级的ADC相关联的处理的系统。为了优先执行具有高优先级的ADR / ADC，本发明采用一种用于从ADR / ADC中的处理能力较高（按DPH单元的表达式中的较大数值的数量级）的顺序选择ADR / ADC的算法，优先级最低，无论ADR / DC是否在执行中。

2. 发明申请

US20070274609A1 Image Search Apparatus, Image Search System, Image Search Method, and Program for Executing Image Search Method 审中-公开
标题翻译：图像搜索装置，图像搜索系统，图像搜索方法和执行图像搜索方法的程序
公开(公告)号：US20070274609A1
公开(公告)日：2007-11-29
申请号：US11751891
申请日：2007-05-22
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06K9/54 , G06K9/00
CPC分类号： G06T7/001 , G01R31/307 , G06F16/58 , G06T2207/10056 , G06T2207/30148
摘要： An object of this invention is to realize, in a semiconductor defect review apparatus, a function of easily searching for an image similar to a reference image at high speed. To this end, an embodiment of this invention has a function of saving, as text information, pieces of information accompanying an image such as acquisition date and time, an acquisition condition, the result of analyzing a piece of information other than the image, and a user's comment, in association with the image. The embodiment is configured to narrow down similar image candidates by a keyword search using the pieces of accompanying information, calculate similarity of each image to a search reference image on the basis of the features of the image, and output search results in descending order of similarity.
摘要翻译：本发明的一个目的是在半导体缺陷检查装置中实现一种快速地搜索类似于参考图像的图像的功能。为此，本发明的实施例具有作为文本信息保存伴随诸如获取日期和时间的图像的信息，获取条件，分析图像之外的一条信息的结果的功能，以及用户的评论，与图像相关联。该实施例被配置为通过使用附带信息的关键字搜索来缩小相似图像候选，基于图像的特征来计算每个图像与搜索参考图像的相似度，并以相似度的降序输出搜索结果。

3. 发明申请

US20080004742A1 Automatic defect review and classification system 有权
标题翻译：自动缺陷审查和分类系统
公开(公告)号：US20080004742A1
公开(公告)日：2008-01-03
申请号：US11892583
申请日：2007-08-24
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： The invention proposes a system that interrupts a processing associated with an ADC having low priority when an ADC processing cannot catch up with ADR by an ADC alone that is not under execution but uses an ADC for an ADR having high priority. To preferentially execute ADR/ADC having high priority, the invention employs an algorithm for serially selecting ADR/ADC in the order of higher processing capacity (in the order of greater numerical values in the expression by a DPH unit) from among ADR/ADCs that have the lowest priority, no matter whether the ADR/DC is now under execution or not.
摘要翻译：本发明提出了一种系统，当ADC处理不能通过一个ADC不能跟踪ADR而不能执行但对具有高优先级的ADR使用ADC时，中断与具有低优先级的ADC相关联的处理的系统。为了优先执行具有高优先级的ADR / ADC，本发明采用一种用于从ADR / ADC中的处理能力较高（按DPH单元的表达式中的较大数值的数量级）的顺序选择ADR / ADC的算法，优先级最低，无论ADR / DC是否在执行中。

4. 发明申请

US20100021047A1 AUTOMATIC DEFECT REVIEW AND CLASSIFICATION SYSTEM 有权
标题翻译：自动缺陷审查和分类系统
公开(公告)号：US20100021047A1
公开(公告)日：2010-01-28
申请号：US12573463
申请日：2009-10-05
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06K9/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： The invention proposes a system that interrupts a processing associated with an ADC having low priority when an ADC processing cannot catch up with ADR by an ADC alone that is not under execution but uses an ADC for an ADR having high priority. To preferentially execute ADR/ADC having high priority, the invention employs an algorithm for serially selecting ADR/ADC in the order of higher processing capacity (in the order of greater numerical values in the expression by a DPH unit) from among ADR/ADCs that have the lowest priority, no matter whether the ADR/DC is now under execution or not.
摘要翻译：本发明提出了一种系统，当ADC处理不能通过一个ADC不能跟踪ADR而不能执行但对具有高优先级的ADR使用ADC时，中断与具有低优先级的ADC相关联的处理的系统。为了优先执行具有高优先级的ADR / ADC，本发明采用一种用于从ADR / ADC中的处理能力较高（按DPH单元的表达式中的较大数值的数量级）的顺序选择ADR / ADC的算法，优先级最低，无论ADR / DC是否在执行中。

5. 发明授权

US07584012B2 Automatic defect review and classification system 有权
标题翻译：自动缺陷审查和分类系统
公开(公告)号：US07584012B2
公开(公告)日：2009-09-01
申请号：US11892583
申请日：2007-08-24
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06F19/00 , G06K9/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： An automatic defect review and classification system including at least one automatic defect review apparatus for specifically observing defect portions of a sample and at least one automatic defect classification apparatus for automatically classifying the defects, the system further comprising a device which outputs a status for combination of the automatic review apparatus and the automatic defect classification apparatus.
摘要翻译：一种自动缺陷检查和分类系统，包括至少一个用于特异性地观察样本的缺陷部分的自动缺陷检查装置和用于自动分类缺陷的至少一个自动缺陷分类装置，所述系统还包括输出状态用于组合的装置自动检查装置和自动缺陷分类装置。

6. 发明申请

US20060282190A1 Automatic defect review and classification system 有权
标题翻译：自动缺陷审查和分类系统
公开(公告)号：US20060282190A1
公开(公告)日：2006-12-14
申请号：US11451330
申请日：2006-06-13
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： The invention proposes a system that interrupts a processing associated with an ADC having low priority when an ADC processing cannot catch up with ADR by an ADC alone that is not under execution but uses an ADC for an ADR having high priority. To preferentially execute ADR/ADC having high priority, the invention employs an algorithm for serially selecting ADR/ADC in the order of higher processing capacity (in the order of greater numerical values in the expression by a DPH unit) from among ADR/ADCs that have the lowest priority, no matter whether the ADR/DC is now under execution or not.
摘要翻译：本发明提出了一种系统，当ADC处理不能通过一个ADC不能跟踪ADR而不能执行但对具有高优先级的ADR使用ADC时，中断与具有低优先级的ADC相关联的处理的系统。为了优先执行具有高优先级的ADR / ADC，本发明采用一种用于从ADR / ADC中的处理能力较高（按DPH单元的表达式中的较大数值的数量级）的顺序选择ADR / ADC的算法，优先级最低，无论ADR / DC是否在执行中。

7. 发明授权

US07664562B2 Automatic defect review and classification system 有权
标题翻译：自动缺陷审查和分类系统
公开(公告)号：US07664562B2
公开(公告)日：2010-02-16
申请号：US11451330
申请日：2006-06-13
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： The invention proposes a system that interrupts a processing associated with an ADC having low priority when an ADC processing cannot catch up with ADR by an ADC alone that is not under execution but uses an ADC for an ADR having high priority. To preferentially execute ADR/ADC having high priority, the invention employs an algorithm for serially selecting ADR/ADC in the order of higher processing capacity (in the order of greater numerical values in the expression by a DPH unit) from among ADR/ADCs that have the lowest priority, no matter whether the ADR/DC is now under execution or not.
摘要翻译：本发明提出了一种系统，当ADC处理不能通过一个ADC不能跟踪ADR而不能执行但对具有高优先级的ADR使用ADC时，中断与具有低优先级的ADC相关联的处理的系统。为了优先执行具有高优先级的ADR / ADC，本发明采用一种用于从ADR / ADC中的处理能力较高（按DPH单元的表达式中的较大数值的数量级）的顺序选择ADR / ADC的算法，优先级最低，无论ADR / DC是否在执行中。

8. 发明申请

US20090222753A1 DEFECT INSPECTION TOOL AND METHOD OF PARAMETER TUNING FOR DEFECT INSPECTION TOOL 有权
标题翻译：缺陷检查工具和缺陷检查工具参数调试方法
公开(公告)号：US20090222753A1
公开(公告)日：2009-09-03
申请号：US12370784
申请日：2009-02-13
申请人： Kohei YAMAGUCHI , Kenji Obara , Takehiro Hirai
发明人： Kohei YAMAGUCHI , Kenji Obara , Takehiro Hirai
IPC分类号： G06F3/048 , G06K9/00 , G06F19/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148
摘要： Setting of a parameter of a defect inspection tool is based on trial and error in which effects are confirmed one by one and set, and the setting requires a high technique and is significantly inefficient. The present invention is to provide an inspection method and an inspection tool capable of solving such a problem and of setting the parameter (hereinafter, referred to as an inspection parameter) required for detecting the defect easily.In order to solve the problem, a defect inspection tool according to the present invention is provided with image obtaining unit for obtaining an image by applying an electron beam to a specimen; an image processing unit for performing a calculation process by using each predetermined inspection parameter group based on the image obtained by the image obtaining unit; and a parameter tuning unit for performing a process to determine an effective inspection parameter group from calculation results by the calculation process and narrowing down an inspection parameter group range by repeating the process for a plurality of images obtained by the image obtaining unit, and is provided with a configuration to detect the defect by using the inspection parameter group narrowed down.
摘要翻译：缺陷检查工具的参数设置是基于一个一个确认效果并进行设置的试错法，设定要求较高的技术，效果显着。本发明提供一种能够解决这样的问题的检查方法和检查工具，并且容易地设定检测缺陷所需的参数（以下称为检查参数）。为了解决这个问题，根据本发明的缺陷检查工具设置有图像获取单元，用于通过向样本施加电子束来获得图像; 图像处理单元，用于基于由图像获取单元获得的图像，使用每个预定检查参数组来执行计算处理; 以及参数调整单元，用于通过计算处理执行从计算结果确定有效检查参数组的处理，并通过重复由图像获取单元获得的多个图像的处理来缩小检查参数组范围，并且提供通过使用缩小的检查参数组来检测缺陷。

9. 发明申请

US20090045335A1 INSPECTION METHOD FOR SEMICONDUCTOR WAFER FOR REVIEWING DEFECTS 有权
标题翻译：用于检查缺陷的半导体波形检测方法
公开(公告)号：US20090045335A1
公开(公告)日：2009-02-19
申请号：US11607906
申请日：2006-12-04
申请人： Kenji Obara , Takehiro Hirai
发明人： Kenji Obara , Takehiro Hirai
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J37/222 , H01J37/244 , H01J37/26 , H01J37/28 , H01J2237/24475 , H01J2237/2448 , H01J2237/24592 , H01J2237/28 , H01J2237/2809 , H01J2237/2817
摘要： An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.
摘要翻译：本发明的目的是提供一种使用电子显微镜观察晶片边缘的合适方法。电子显微镜包括可以使图像倾斜的列，从而允许从倾斜方向观察晶片边缘。

10. 发明申请

US20120044262A1 SURFACE OBSERVATION APPARATUS AND SURFACE OBSERVATION METHOD 有权
标题翻译：表面观察装置和表面观测方法
公开(公告)号：US20120044262A1
公开(公告)日：2012-02-23
申请号：US13318718
申请日：2010-05-25
申请人： Takehiro Hirai , Kenji Obara , Naoma Ban
发明人： Takehiro Hirai , Kenji Obara , Naoma Ban
IPC分类号： G06K9/62 , G09G5/377 , G06T3/40
CPC分类号： H01L22/20 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A surface observation apparatus is achieved, which enables even a beginner to easily select an optimal evaluation indicator for each of various patterns to be evaluated without a trial and error approach. A plurality of images to be evaluated are input from an image processing unit (114) to an evaluation image input unit (113a) (in step 901). The input images to be evaluated are displayed on a display (115). A user rearranges the images in accordance with an evaluation criterion of the user while referencing the display (115), and defines an evaluation criterion (in step 902). Evaluation values are calculated for the input images (to be evaluated) using a plurality of evaluation indicators (in step 903). The evaluation values for each of the evaluation indicators are compared with the evaluation criterion defined by the user, and correlation coefficients are then calculated (in step 904). An evaluation indicator having the maximum absolute value of a correlation coefficient is automatically selected as an evaluation criterion that is closest to the evaluation criterion defined by the user (in step 905). The images are rearranged in order of correlation coefficient and a list of the images is displayed on the display (115) so that the images are arranged in order of evaluation value (in step 906).
摘要翻译：实现了表面观察装置，即使初学者也能够在不进行试错法的情况下容易地选择要评估的各种图案中的各种图案的最佳评价指标。将要评估的多个图像从图像处理单元（114）输入到评估图像输入单元（113a）（在步骤901中）。待评估的输入图像显示在显示器（115）上。用户根据用户的评价标准重新排列图像，同时参照显示器（115），并定义评估标准（步骤902）。使用多个评价指标对输入图像（待评价）计算评价值（步骤903）。将各评价指标的评价值与用户定义的评价标准进行比较，然后计算相关系数（步骤904）。自动选择具有相关系数的最大绝对值的评估指标作为最接近用户定义的评估标准的评估标准（在步骤905中）。按照相关系数的顺序重新排列图像，并且在显示器（115）上显示图像列表，使得以评估值的顺序排列图像（在步骤906中）。

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