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1. 发明授权

US10044040B2 Binder for lithium cell, composition for producing electrode, and electrode 有权
公开(公告)号：US10044040B2
公开(公告)日：2018-08-07
申请号：US14438481
申请日：2013-10-25
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD. , Tokyo University of Science Foundation
发明人： Shinichi Komaba , Naoaki Yabuuchi , Zhen-Ji Han , Takeo Sasaki , Shota Hashimoto , Kuniaki Okamoto , Tsuneaki Maesawa
IPC分类号： C08F122/00 , C08G18/00 , H01M4/62 , C08G59/40 , C08L63/00 , H01M4/134 , H01M4/38 , C08G18/02 , C08F122/02 , H01M10/0525 , C08L33/02 , C08L79/00 , H01M10/052 , C08K5/00 , H01M4/02
摘要： It is an object of the present invention to provide an electrode capable of maintaining superior capacity retention without destruction of an electrode structure, even in the case of using an active material including silicon.The present invention relates to “a binder for a lithium cell, the binder comprising polyacrylic acid cross-liked by a cross-linking agent selected from the compounds described in the general formulae [1] to [13] and the polymer described in the general formula [14] (provided that the one which includes a functional group-containing vinylidene fluoride-based polymer is excluded)”; a “composition for producing an electrode of a lithium cell, the composition comprising 1) an active material containing silicon, 2) a conductive assistant and 3) a cross-linked-type polyacrylic acid (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)”; and an “electrode for a lithium cell, the electrode comprising 1) an active material containing silicon, 2) a conductive assistant, 3) a cross-linked-type polyacrylic acid, and 4) a current collector (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)”.

2. 发明申请

US20180138508A1 BINDER FOR LITHIUM CELL, COMPOSITION FOR PRODUCING ELECTRODE, AND ELECTRODE 审中-公开
公开(公告)号：US20180138508A1
公开(公告)日：2018-05-17
申请号：US15819452
申请日：2017-11-21
申请人： WAKO PURE CHEMICAL INDUSTRIES,LTD. , TOKYO UNIVERSITY OF SCIENCE FOUNDATION
发明人： Shinichi Komaba , Naoaki Yabuuchi , Zhen-ji Han , Takeo Sasaki , Shota Hashimoto , Kuniaki Okamoto , Tsuneaki Maesawa
IPC分类号： H01M4/62 , C08F220/06 , C08F222/10 , C08G18/02 , C08G59/40 , C08F122/02 , H01M4/38 , H01M4/134 , H01M10/0525 , C08L63/00 , C08K5/00 , C08L33/02 , C08L79/00 , H01M10/052 , H01M4/02
CPC分类号： H01M4/622 , C08F122/02 , C08G18/025 , C08G59/40 , C08K5/0025 , C08L33/02 , C08L63/00 , C08L79/00 , H01M4/134 , H01M4/386 , H01M4/625 , H01M10/052 , H01M10/0525 , H01M2004/027 , H01M2220/20 , C08F220/06 , C08F222/1006
摘要： It is an object of the present invention to provide an electrode capable of maintaining superior capacity retention without destruction of an electrode structure, even in the case of using an active material including silicon.The present invention relates to “a binder for a lithium cell, the binder comprising polyacrylic acid cross-linked by a cross-linking agent selected from the compounds described in the general formulae [1] to [13] and the polymer described in the general formula [14] (provided that the one which includes a functional group-containing vinylidene fluoride-based polymer is excluded)”; a “composition for producing an electrode of a lithium cell, the composition comprising 1) an active material containing silicon, 2) a conductive assistant and 3) a cross-linked-type polyacrylic acid (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)”; and an “electrode for a lithium cell, the electrode comprising 1) an active material containing silicon, 2) a conductive assistant, 3) a cross-linked-type polyacrylic acid, and 4) a current collector (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)”.

3. 发明申请

US20150287993A1 BINDER FOR LITHIUM CELL, COMPOSITION FOR PRODUCING ELECTRODE, AND ELECTRODE 审中-公开
标题翻译：用于锂电池的粘合剂，用于生产电极的组合物和电极
公开(公告)号：US20150287993A1
公开(公告)日：2015-10-08
申请号：US14438481
申请日：2013-10-25
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD. , TOKYO UNIVERSITY OF SCIENCE FOUNDATION
发明人： Shinichi Komaba , Naoaki Yabuuchi , Zhen-Ji Han , Takeo Sasaki , Shota Hashimoto , Kuniaki Okamoto , Tsuneaki Maesawa
IPC分类号： H01M4/62 , H01M4/38 , H01M10/0525 , C08F122/02
CPC分类号： H01M4/622 , C08F122/02 , C08G18/025 , C08G59/40 , C08K5/0025 , C08L33/02 , C08L63/00 , C08L79/00 , H01M4/134 , H01M4/386 , H01M4/625 , H01M10/052 , H01M10/0525 , H01M2004/027 , H01M2220/20 , C08F220/06 , C08F222/1006
摘要： It is an object of the present invention to provide an electrode capable of maintaining superior capacity retention without destruction of an electrode structure, even in the case of using an active material including silicon.The present invention relates to “a binder for a lithium cell, the binder comprising polyacrylic acid cross-liked by a cross-linking agent selected from the compounds described in the general formulae [1] to [13] and the polymer described in the general formula [14] (provided that the one which includes a functional group-containing vinylidene fluoride-based polymer is excluded)”; a “composition for producing an electrode of a lithium cell, the composition comprising 1) an active material containing silicon, 2) a conductive assistant and 3) a cross-linked-type polyacrylic acid (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)”; and an “electrode for a lithium cell, the electrode comprising 1) an active material containing silicon, 2) a conductive assistant, 3) a cross-linked-type polyacrylic acid, and 4) a current collector (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)”.
摘要翻译：本发明的目的是提供一种即使在使用包括硅的活性材料的情况下，也能够保持优异的电极保持性而不破坏电极结构的电极。本发明涉及“用于锂电池的粘合剂，所述粘合剂包含由选自通式[1]至[13]所述的化合物的交联剂交联的聚丙烯酸和通式式[14]（条件是不包括含有含官能团的偏二氟乙烯系聚合物的物质）“; “锂电池电极的制造用组合物”，该组合物含有1）含有硅的活性物质，2）导电助剂，3）交联型聚丙烯酸（含有含官能团的聚合物偏氟乙烯基聚合物除外）“; 和“锂电池用电极”，该电极包含1）含有硅的活性物质，2）导电助剂，3）交联型聚丙烯酸，4）集电体（设置为含有不含官能团的偏氟乙烯类聚合物）“。

4. 发明授权

US09803161B2 Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface 有权
公开(公告)号：US09803161B2
公开(公告)日：2017-10-31
申请号：US14397364
申请日：2013-04-26
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD.
发明人： Hiromi Kawada , Hironori Mizuta , Tsuneaki Maesawa
IPC分类号： C11D7/50 , C11D11/00 , C11D7/36 , H01L21/02 , C11D7/32 , H01L21/768 , H01L21/3105 , H01L21/321
CPC分类号： C11D11/0047 , C11D7/3218 , C11D7/36 , H01L21/0206 , H01L21/02068 , H01L21/02074 , H01L21/31055 , H01L21/3212 , H01L21/7684
摘要： A cleaning agent is provided for a semiconductor substrate superior in corrosion resistance of a tungsten wiring or a tungsten alloy wiring, and superior in removal property of polishing fines (particle) such as silica or alumina, remaining at surface of the semiconductor substrate, in particular, at surface of a silicon oxide film such as a TEOS film, after a chemical mechanical polishing process; and a method for processing a semiconductor substrate surface. A cleaning agent for a semiconductor substrate is to be used in a post process of a chemical mechanical polishing process of the semiconductor substrate having a tungsten wiring or a tungsten alloy wiring, and a silicon oxide film, comprising (A) a phosphonic acid-based chelating agent, (B) a primary or secondary monoamine having at least one alkyl group or hydroxyalkyl group in a molecule and (C) water, wherein a pH is over 6 and below 7.

5. 发明申请

US20160060584A1 CLEANING AGENT FOR METAL WIRING SUBSTRATE, AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE 审中-公开
标题翻译：用于金属接线衬底的清洁剂，以及用于清洁半导体衬底的方法
公开(公告)号：US20160060584A1
公开(公告)日：2016-03-03
申请号：US14783318
申请日：2014-04-09
申请人： Wako Pure Chemical Industries, Ltd.
发明人： Hironori Mizuta , Tsutomu Watahiki , Tsuneaki Maesawa
IPC分类号： C11D11/00 , H01L21/02 , C11D7/32
CPC分类号： C11D11/0047 , C11D7/3209 , C11D7/3218 , C11D7/3281 , H01L21/02074
摘要： It is a subject of the present invention to provide a cleaning agent for a substrate having a metal wiring, and a cleaning method for a semiconductor substrate comprising that the cleaning agent is used, by which following effects (1) to (5) are obtained, in a cleaning process after chemical mechanical polishing (CMP) in a manufacturing process of a semiconductor device. (1) Residues of fine particles (polishing agents) used in the CMP process, fine particles (metal particles) derived from a polished metal, an anticorrosive, and the like, can be removed sufficiently. (2) A coating film (protective film: oxidation resistant film) on a surface of the metal wiring, containing a complex between an anticorrosive, such as benzotriazole or quinaldic acid, and a surface metal of the metal wiring, formed in the CMP process, can be removed (stripped) sufficiently. (3) An oxide film containing a metal oxide can be formed after removal (stripping) of the coating film. (4) A semiconductor substrate can be obtained stably for a long period of time, without impairing flatness of the surface of the metal wiring (the surface of the oxide film containing the metal oxide), even leaving a substrate after the cleaning process after the CMP. (5) It is hard to deteriorate even after using the cleaning agent for a long period of time.The present invention relates to a cleaning agent for a substrate having a metal wiring, comprising an aqueous solution containing (A) carboxylic acid having a nitrogen-containing heterocyclic ring and (B) alkylhydroxylamine, and having a pH of 10 or higher, as well as a cleaning method for a semiconductor substrate, comprising that the cleaning agent is used.
摘要翻译：本发明的主题是提供一种具有金属布线的基板用清洗剂和包括使用清洗剂的半导体基板的清洗方法，通过该清洗剂得到以下效果（1）〜（5），在半导体器件的制造过程中的化学机械抛光（CMP）之后的清洁过程中。（1）CMP工艺中使用的微粒（抛光剂）残留物，由抛光金属衍生的细小颗粒（金属颗粒），防腐蚀剂等的残留物可被充分除去。（2）在CMP工序中形成的在金属配线的表面上含有防腐蚀剂如苯并三唑或喹哪啶酸之间的复合物和金属配线的表面金属的涂膜（保护膜：抗氧化膜），可以充分去除（剥离）。（3）除去（剥离）涂膜后，可以形成含有金属氧化物的氧化膜。（4）半导体衬底可以长时间稳定地获得，而不会损害金属布线表面（含有金属氧化物的氧化物膜的表面）的平整度，甚至在清洁工艺之后离开衬底 CMP。（5）即使长时间使用清洁剂，也难以劣化。本发明涉及一种具有金属配线的基板用清洗剂，其含有含有（A）含有氮杂环的羧酸的水溶液和（B）烷基羟胺，pH值在10以上。作为半导体衬底的清洁方法，包括使用清洁剂。

6. 发明申请

US20150140820A1 CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE 有权
标题翻译：用于半导体基板的清洁剂和用于处理半导体基板表面的方法
公开(公告)号：US20150140820A1
公开(公告)日：2015-05-21
申请号：US14397364
申请日：2013-04-26
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD.
发明人： Hiromi Kawada , Hironori Mizuta , Tsuneaki Maesawa
IPC分类号： C11D11/00 , H01L21/321 , H01L21/02 , H01L21/3105 , C11D7/36 , C11D7/32
CPC分类号： C11D11/0047 , C11D7/3218 , C11D7/36 , H01L21/0206 , H01L21/02068 , H01L21/02074 , H01L21/31055 , H01L21/3212 , H01L21/7684
摘要： A cleaning agent is provided for a semiconductor substrate superior in corrosion resistance of a tungsten wiring or a tungsten alloy wiring, and superior in removal property of polishing fines (particle) such as silica or alumina, remaining at surface of the semiconductor substrate, in particular, at surface of a silicon oxide film such as a TEOS film, after a chemical mechanical polishing process; and a method for processing a semiconductor substrate surface. A cleaning agent for a semiconductor substrate is to be used in a post process of a chemical mechanical polishing process of the semiconductor substrate having a tungsten wiring or a tungsten alloy wiring, and a silicon oxide film, comprising (A) a phosphonic acid-based chelating agent, (B) a primary or secondary monoamine having at least one alkyl group or hydroxyalkyl group in a molecule and (C) water, wherein a pH is over 6 and below 7.
摘要翻译：特别是对于钨线或钨合金布线的耐腐蚀性优异的半导体基板，特别是残留在半导体基板的表面的研磨细粒（粒子）如二氧化硅或氧化铝的去除性优异的清洗剂在化学机械抛光工艺之后，在诸如TEOS膜的氧化硅膜的表面上; 以及半导体衬底表面的处理方法。在具有钨线或钨合金布线的半导体衬底和氧化硅膜的化学机械抛光工艺的后处理中使用半导体衬底的清洁剂，其包含（A）基于膦酸的螯合剂，（B）在分子中具有至少一个烷基或羟烷基的伯或仲单胺和（C）水，其中pH高于6和低于7。

7. 发明授权

US10862127B2 Binder for lithium cell, composition for producing electrode, and electrode 有权
公开(公告)号：US10862127B2
公开(公告)日：2020-12-08
申请号：US15819452
申请日：2017-11-21
申请人： FUJIFILM WAKO PURE CHEMICAL CORPORATION , TOKYO UNIVERSITY OF SCIENCE FOUNDATION
发明人： Shinichi Komaba , Naoaki Yabuuchi , Zhen-ji Han , Takeo Sasaki , Shota Hashimoto , Kuniaki Okamoto , Tsuneaki Maesawa
IPC分类号： H01M4/62 , C08G59/40 , C08L63/00 , H01M4/134 , H01M4/38 , C08G18/02 , H01B1/12 , C08F122/02 , H01M10/0525 , C08L33/02 , C08L79/00 , H01M10/052 , C08K5/00 , H01M4/02
摘要： It is an object of the present invention to provide an electrode capable of maintaining superior capacity retention without destruction of an electrode structure, even in the case of using an active material including silicon.The present invention relates to “a binder for a lithium cell, the binder comprising polyacrylic acid cross-linked by a cross-linking agent selected from the compounds described in the general formulae [1] to [13] and the polymer described in the general formula [14] (provided that the one which includes a functional group-containing vinylidene fluoride-based polymer is excluded)”; a “composition for producing an electrode of a lithium cell, the composition comprising 1) an active material containing silicon, 2) a conductive assistant and 3) a cross-linked-type polyacrylic acid (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)”; and an “electrode for a lithium cell, the electrode comprising 1) an active material containing silicon, 2) a conductive assistant, 3) a cross-linked-type polyacrylic acid, and 4) a current collector (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)”.

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