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1. 发明授权

US07211144B2 Pulsed nucleation deposition of tungsten layers 有权
标题翻译：钨层的脉冲成核沉积
公开(公告)号：US07211144B2
公开(公告)日：2007-05-01
申请号：US10194629
申请日：2002-07-12
申请人： Xinliang Lu , Ping Jian , Jong Hyun Yoo , Ken Kaung Lai , Alfred W. Mak , Robert L. Jackson , Ming Xi
发明人： Xinliang Lu , Ping Jian , Jong Hyun Yoo , Ken Kaung Lai , Alfred W. Mak , Robert L. Jackson , Ming Xi
IPC分类号： C30B25/16
CPC分类号： H01L21/28562 , C23C16/14 , C23C16/45523 , C23C16/45525 , C30B25/02 , C30B29/02
摘要： A method of forming a tungsten nucleation layer using a sequential deposition process. The tungsten nucleation layer is formed by reacting pulses of a tungsten-containing precursor and a reducing gas in a process chamber to deposit tungsten on the substrate. Thereafter, reaction by-products generated from the tungsten deposition are removed from the process chamber. After the reaction by-products are removed from the process chamber, a flow of the reducing gas is provided to the process chamber to react with residual tungsten-containing precursor remaining therein. Such a deposition process forms tungsten nucleation layers having good step coverage. The sequential deposition process of reacting pulses of the tungsten-containing precursor and the reducing gas, removing reaction by-products, and than providing a flow of the reducing gas to the process chamber may be repeated until a desired thickness for the tungsten nucleation layer is formed.
摘要翻译：使用顺序沉积工艺形成钨成核层的方法。钨成核层通过在处理室中使含钨前体和还原气体的脉冲反应而在基底上沉积钨而形成。此后，从处理室除去从钨沉积产生的反应副产物。在从处理室中除去反应副产物之后，将还原气体的流动提供给处理室以与其中剩余的含钨前体反应。这种沉积工艺形成具有良好阶梯覆盖的钨成核层。可以重复将含钨前体和还原气体的脉冲反应，除去反应副产物以及向处理室提供还原气体流的顺序沉积过程，直到钨成核层的期望厚度为形成。

2. 发明授权

US07695563B2 Pulsed deposition process for tungsten nucleation 失效
标题翻译：钨成核的脉冲沉积工艺
公开(公告)号：US07695563B2
公开(公告)日：2010-04-13
申请号：US11621040
申请日：2007-01-08
申请人： Xinliang Lu , Ping Jian , Jong Hyun Yoo , Ken Kaung Lai , Alfred W. Mak , Robert L. Jackson , Ming Xi
发明人： Xinliang Lu , Ping Jian , Jong Hyun Yoo , Ken Kaung Lai , Alfred W. Mak , Robert L. Jackson , Ming Xi
IPC分类号： C30B25/14
CPC分类号： H01L21/28562 , C23C16/14 , C23C16/45523 , C23C16/45525 , C30B25/02 , C30B29/02
摘要： In one embodiment, a method for depositing a tungsten material on a substrate within a process chamber is provided which includes exposing the substrate to a gaseous mixture containing a tungsten precursor and a reducing gas to deposit a tungsten nucleation layer on the substrate during a tungsten deposition process. The process further includes removing reaction by-products generated during the tungsten deposition process from the process chamber, exposing the substrate to the reducing gas to react with residual tungsten precursor within the process chamber during a soak process, removing reaction by-products generated during the soak process from the process chamber, and repeating the tungsten deposition process and the soak process during a cyclic deposition process. In the examples, the reducing gas may contain diborane or silane.
摘要翻译：在一个实施例中，提供了一种用于在处理室内的衬底上沉积钨材料的方法，其包括将衬底暴露于含有钨前体和还原气体的气态混合物，以在钨沉积期间在衬底上沉积钨成核层处理。该方法还包括从处理室除去在钨沉积过程中产生的反应副产物，在浸泡过程期间将基底暴露于还原气体以与处理室内的残余钨前体反应，除去在该过程中产生的反应副产物从处理室浸泡处理，并且在循环沉积工艺期间重复钨沉积工艺和浸泡工艺。在实施例中，还原气体可以含有乙硼烷或硅烷。

3. 发明申请

US20080317954A1 PULSED DEPOSITION PROCESS FOR TUNGSTEN NUCLEATION 失效
标题翻译：脉冲沉积的脉冲沉积过程
公开(公告)号：US20080317954A1
公开(公告)日：2008-12-25
申请号：US11621040
申请日：2007-01-08
申请人： XINLIANG LU , Ping Jian , Jong Hyun Yoo , Ken Kaung Lai , Alfred W. Mak , Robert L. Jackson , Ming Xi
发明人： XINLIANG LU , Ping Jian , Jong Hyun Yoo , Ken Kaung Lai , Alfred W. Mak , Robert L. Jackson , Ming Xi
IPC分类号： C23C16/08
CPC分类号： H01L21/28562 , C23C16/14 , C23C16/45523 , C23C16/45525 , C30B25/02 , C30B29/02
摘要： In one embodiment, a method for depositing a tungsten material on a substrate within a process chamber is provided which includes exposing the substrate to a gaseous mixture containing a tungsten precursor and a reducing gas to deposit a tungsten nucleation layer on the substrate during a tungsten deposition process. The process further includes removing reaction by-products generated during the tungsten deposition process from the process chamber, exposing the substrate to the reducing gas to react with residual tungsten precursor within the process chamber during a soak process, removing reaction by-products generated during the soak process from the process chamber, and repeating the tungsten deposition process and the soak process during a cyclic deposition process. In the examples, the reducing gas may contain diborane or silane.
摘要翻译：在一个实施例中，提供了一种用于在处理室内的衬底上沉积钨材料的方法，其包括将衬底暴露于含有钨前体和还原气体的气态混合物，以在钨沉积期间在衬底上沉积钨成核层处理。该方法还包括从处理室除去在钨沉积过程中产生的反应副产物，在浸泡过程期间将基底暴露于还原气体以与处理室内的残余钨前体反应，除去在该过程中产生的反应副产物从处理室浸泡处理，并且在循环沉积工艺期间重复钨沉积工艺和浸泡工艺。在实施例中，还原气体可以含有乙硼烷或硅烷。

4. 发明申请

US20090273782A1 LASER ABLATION APPARATUS AND METHOD 有权
标题翻译：激光雷射装置和方法
公开(公告)号：US20090273782A1
公开(公告)日：2009-11-05
申请号：US12435970
申请日：2009-05-05
申请人： Jong Hyun Yoo , Randolph S. Tribe , Chunyi Liu
发明人： Jong Hyun Yoo , Randolph S. Tribe , Chunyi Liu
IPC分类号： G01J3/30 , H01J49/00
CPC分类号： H01J49/0463 , B23K26/03 , B23K26/048 , B23K26/0861 , G01J3/443 , G01N21/718
摘要： Provided is a laser ablation spectroscopy apparatus and method. A pulse laser is focused on the sample site to generate a plasma plume during a laser ablation process. The plasma plume is detected with a spectrometer and an intensified charge coupled device. A sample of material is coupled to a stage movable in the x, y and z directions using an array of x-y-z motors. A change in the height of the sample is detected using a triangulation sensor. The apparatus includes a system computer for synchronizing the movement of the stage in the x, y and z direction during the laser ablation process. The method includes a protocol of generating one or more laser ablations per sample site. The spectral data of the total number of laser ablations for each sample site are averaged together. The protocol includes laser ablating additional sample sites and averaging the spectral data of the total number of sample sites.
摘要翻译：提供了一种激光烧蚀光谱仪和方法。脉冲激光器聚焦在样品位置以在激光烧蚀过程中产生等离子体羽流。用光谱仪和强化的电荷耦合器件检测等离子体羽流。材料样品使用x-y-z电机的阵列耦合到在x，y和z方向上可移动的台。使用三角测量传感器检测样品的高度变化。该装置包括一个系统计算机，用于在激光烧蚀过程中使x，y和z方向上舞台的移动同步。该方法包括每个样本位点产生一个或多个激光消融的协议。将每个样品位点的激光烧蚀总数的光谱数据一起平均。该协议包括激光烧蚀附加样品位点并平均样品总数的光谱数据。

5. 发明授权

US09061369B2 Method for real-time optical diagnostics in laser ablation and laser processing of layered and structured materials 有权
标题翻译：激光烧蚀和层状和结构材料激光加工中的实时光学诊断方法
公开(公告)号：US09061369B2
公开(公告)日：2015-06-23
申请号：US12939095
申请日：2010-11-03
申请人： Jong Hyun Yoo , Alexander A. Bol'shakov
发明人： Jong Hyun Yoo , Alexander A. Bol'shakov
IPC分类号： B23K26/03 , G01N27/00 , B23K26/06 , B23K26/38
CPC分类号： B23K26/032 , B23K26/0624 , B23K26/38 , G01N27/00
摘要： A method for real-time optical diagnostics in laser ablation and laser processing of layered or structured materials or material structures. Diagnostics is provided during laser ablation that is utilized regularly in laser processing and/or chemical analysis of structured materials, by means of measuring optical emission generated as a result of the pulsed laser-material interaction in real time. The method can involve a single-layer-film or a stack of multiple layers or a structure of different domains. The method is particularly beneficial in fabrication of thin-film structures, such as photovoltaic and electronic devices or circuits of devices.
摘要翻译：一种用于激光烧蚀和层状或结构材料或材料结构的激光加工中的实时光学诊断的方法。在激光烧蚀期间提供诊断，其通过测量由于实时脉冲激光 - 材料相互作用而产生的光学发射而定期用于结构化材料的激光加工和/或化学分析。该方法可以涉及单层膜或多层或不同结构域的堆叠。该方法特别有益于薄膜结构的制造，例如光伏和电子器件或器件的电路。

6. 发明申请

US20110100967A1 METHOD FOR REAL-TIME OPTICAL DIAGNOSTICS IN LASER ABLATION AND LASER PROCESSING OF LAYERED AND STRUCTURED MATERIALS 有权
标题翻译：激光吸收和层状和结构材料激光加工中的实时光学诊断方法
公开(公告)号：US20110100967A1
公开(公告)日：2011-05-05
申请号：US12939095
申请日：2010-11-03
申请人： Jong Hyun Yoo , Alexander A. Bol'shakov
发明人： Jong Hyun Yoo , Alexander A. Bol'shakov
IPC分类号： B23K26/02 , B23K26/06
CPC分类号： B23K26/032 , B23K26/0624 , B23K26/38 , G01N27/00
摘要： A method for real-time optical diagnostics in laser ablation and laser processing of layered or structured materials or material structures. Diagnostics is provided during laser ablation that is utilized regularly in laser processing and/or chemical analysis of structured materials, by means of measuring optical emission generated as a result of the pulsed laser-material interaction in real time. The method can involve a single-layer-film or a stack of multiple layers or a structure of different domains. The method is particularly beneficial in fabrication of thin-film structures, such as photovoltaic and electronic devices or circuits of devices.
摘要翻译：一种用于激光烧蚀和层状或结构材料或材料结构的激光加工中的实时光学诊断的方法。在激光烧蚀期间提供诊断，其通过测量由于实时脉冲激光 - 材料相互作用而产生的光学发射而定期用于结构化材料的激光加工和/或化学分析。该方法可以涉及单层膜或多层或不同结构域的堆叠。该方法特别有益于薄膜结构的制造，例如光伏和电子器件或器件的电路。

7. 发明申请

US20120206722A1 High-Resolution Laser Induced Breakdown Spectroscopy Devices and Methods 审中-公开
标题翻译：高分辨率激光诱导分解光谱仪器及方法
公开(公告)号：US20120206722A1
公开(公告)日：2012-08-16
申请号：US13155207
申请日：2011-06-07
申请人： Costas P. Grigoropoulos , David Jen Hwang , Jong Hyun Yoo , Richard E. Russo
发明人： Costas P. Grigoropoulos , David Jen Hwang , Jong Hyun Yoo , Richard E. Russo
IPC分类号： G01J3/30
CPC分类号： G01N21/718
摘要： Provided are laser induced breakdown spectroscopy (LIBS) devices. Embodiments of the devices are configured to obtain a spatial resolution of 10 μm or less. Also provided are methods of using the subject LIBS devices to determine whether one or more elements of interest are present in a target sample. The devices and methods find use in a variety of applications, e.g., submicron and nanoscale chemical analysis applications.
摘要翻译：提供激光诱导击穿光谱（LIBS）器件。这些装置的实施例被配置成获得10μm或更小的空间分辨率。还提供了使用对象LIBS设备来确定目标样本中是否存在感兴趣的一个或多个元素的方法。这些装置和方法可用于各种应用，例如亚微米和纳米级化学分析应用。

8. 发明授权

US08199321B2 Laser ablation apparatus and method 有权
标题翻译：激光消融装置及方法
公开(公告)号：US08199321B2
公开(公告)日：2012-06-12
申请号：US12435970
申请日：2009-05-05
申请人： Jong Hyun Yoo , Randolph S. Tribe , Chunyi Liu
发明人： Jong Hyun Yoo , Randolph S. Tribe , Chunyi Liu
IPC分类号： G01J3/443 , G01N21/63
CPC分类号： H01J49/0463 , B23K26/03 , B23K26/048 , B23K26/0861 , G01J3/443 , G01N21/718
摘要： Provided is a laser ablation spectroscopy apparatus and method. A pulse laser is focused on the sample site to generate a plasma plume during a laser ablation process. The plasma plume is detected with a spectrometer and an intensified charge coupled device. A sample of material is coupled to a stage movable in the x, y and z directions using an array of x-y-z motors. A change in the height of the sample is detected using a triangulation sensor. The apparatus includes a system computer for synchronizing the movement of the stage in the x, y and z direction during the laser ablation process. The method includes a protocol of generating one or more laser ablations per sample site. The spectral data of the total number of laser ablations for each sample site are averaged together. The protocol includes laser ablating additional sample sites and averaging the spectral data of the total number of sample sites.
摘要翻译：提供了一种激光烧蚀光谱仪和方法。脉冲激光器聚焦在样品位置以在激光烧蚀过程中产生等离子体羽流。用光谱仪和强化的电荷耦合器件检测等离子体羽流。材料样品使用x-y-z电机的阵列耦合到在x，y和z方向上可移动的台。使用三角测量传感器检测样品的高度变化。该装置包括一个系统计算机，用于在激光烧蚀过程中使x，y和z方向上舞台的移动同步。该方法包括每个样本位点产生一个或多个激光消融的协议。将每个样品位点的激光烧蚀总数的光谱数据一起平均。该协议包括激光烧蚀附加样品位点并平均样品总数的光谱数据。

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