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1. 发明授权

US07989748B2 Image reading apparatus, image forming apparatus, image inspecting apparatus and image forming system 有权
标题翻译：图像读取装置，图像形成装置，图像检查装置以及图像形成系统
公开(公告)号：US07989748B2
公开(公告)日：2011-08-02
申请号：US11484641
申请日：2006-07-12
申请人： Yoshihisa Soeda , Norio Yamada , Yoshinobu Kagami , Osamu Inage , Kenichi Satoh , Atsushi Ikeda
发明人： Yoshihisa Soeda , Norio Yamada , Yoshinobu Kagami , Osamu Inage , Kenichi Satoh , Atsushi Ikeda
IPC分类号： H01L27/00 , G01N21/88 , H04N5/217 , H04N9/64
CPC分类号： H04N1/401 , H04N1/407 , H04N1/486
摘要： A level detecting part detects image data levels for the respective output directions of the first half and the second half to be used for the linearity correction, which image data levels correspond to image data around a connection point between the first half and the second half and are obtained from respective combinations for the respective output directions of the first half and the second half. A calculating part calculates linearity correction values or correction value calculating parameters from the detected image data levels for any one of the first half and the second half; and a defect detection part detecting a defect in the image data levels thus detected around the connection point are provided.
摘要翻译：电平检测部分检测要用于线性校正的前半部分和第二半部分的各个输出方向的图像数据电平，哪个图像数据电平对应于在前半部分和下半部分之间的连接点周围的图像数据，从上半部和第二半部的各输出方向的各组合获得。计算部分根据检测到的上半部和第二半部中任一个的图像数据电平计算线性校正值或校正值计算参数; 并且提供了检测在连接点周围检测到的图像数据水平的缺陷的缺陷检测部分。

2. 发明申请

US20070013954A1 Image reading apparatus, image forming apparatus, image inspecting apparatus and image forming system 有权
标题翻译：图像读取装置，图像形成装置，图像检查装置以及图像形成系统
公开(公告)号：US20070013954A1
公开(公告)日：2007-01-18
申请号：US11484641
申请日：2006-07-12
申请人： Yoshihisa Soeda , Norio Yamada , Yoshinobu Kagami , Osamu Inage , Kenichi Satoh , Atsushi Ikeda
发明人： Yoshihisa Soeda , Norio Yamada , Yoshinobu Kagami , Osamu Inage , Kenichi Satoh , Atsushi Ikeda
IPC分类号： H04N1/409
CPC分类号： H04N1/401 , H04N1/407 , H04N1/486
摘要： A level detecting part detects image data levels for the respective output directions of the first half and the second half to be used for the linearity correction, which image data levels correspond to image data around a connection point between the first half and the second half and are obtained from respective combinations for the respective output directions of the first half and the second half. A calculating part calculates linearity correction values or correction value calculating parameters from the detected image data levels for any one of the first half and the second half; and a defect detection part detecting a defect in the image data levels thus detected around the connection point are provided.
摘要翻译：电平检测部分检测要用于线性校正的前半部分和第二半部分的各个输出方向的图像数据电平，哪个图像数据电平对应于在前半部分和下半部分之间的连接点周围的图像数据，从上半部和第二半部的各输出方向的各组合获得。计算部分根据检测到的上半部和第二半部中任一个的图像数据电平计算线性校正值或校正值计算参数; 并且提供了检测在连接点周围检测到的图像数据水平的缺陷的缺陷检测部分。

3. 发明授权

US08881262B2 Image processing apparatus and user authentication method for image processing apparatus 有权
标题翻译：图像处理装置和图像处理装置的用户认证方法
公开(公告)号：US08881262B2
公开(公告)日：2014-11-04
申请号：US13082692
申请日：2011-04-08
申请人： Atsushi Ikeda
发明人： Atsushi Ikeda
IPC分类号： G06F21/00 , G06F21/60 , G06F21/31 , G06F3/12
CPC分类号： G06F21/608 , G06F3/1222 , G06F21/31
摘要： An image processing apparatus includes a first authentication unit configured to authenticate a user, a second authentication unit configured to authenticate the user, an operation unit configured to receive an operation from the user, a logout unit configured to set the user in a logout state in which the user is unauthenticated, if a predetermined time has passed without the operation unit receiving any operation from the user while the user is authenticated by the first authentication unit or the second authentication unit, and a change unit configured to change the predetermined time to a second time shorter than a first time, if the user is unauthenticated by the second authentication unit while the user is authenticated by the first authentication unit and the second authentication unit.
摘要翻译：图像处理装置包括被配置为认证用户的第一认证单元，被配置为认证用户的第二认证单元，被配置为从用户接收操作的操作单元，被配置为将用户设置为退出状态的注销单元如果在用户被第一认证单元或第二认证单元认证的情况下经过预定时间而没有操作单元接收到来自用户的任何操作的预定时间，以及改变单元，被配置为将预定时间改变为如果用户被第一认证单元和第二认证单元认证，则用户在第二认证单元未被认证的情况下比第一次短。

4. 发明申请

US20130074182A1 INFORMATION PROCESSING APPARATUS AND CONTROL METHOD OF THE SAME 有权
标题翻译：信息处理装置及其控制方法
公开(公告)号：US20130074182A1
公开(公告)日：2013-03-21
申请号：US13605634
申请日：2012-09-06
申请人： Atsushi Ikeda
发明人： Atsushi Ikeda
IPC分类号： G06F21/00
CPC分类号： G06F21/00 , G06F21/51 , G06F2221/033
摘要： A device function to be used by an application is specified, a risk level of the specified device function is acquired, and a risk level of the application is calculated based on the acquired risk level of the device function.
摘要翻译：指定应用程序使用的设备功能，获取指定设备功能的风险级别，并根据获取的设备功能的风险级别计算应用的风险级别。

5. 发明授权

US08241418B2 Producing method of powder particles by using grinding medium 失效
标题翻译：使用研磨介质生产粉末颗粒的方法
公开(公告)号：US08241418B2
公开(公告)日：2012-08-14
申请号：US12224426
申请日：2007-02-26
申请人： Kazuki Shigeta , Atsushi Ikeda
发明人： Kazuki Shigeta , Atsushi Ikeda
IPC分类号： C04B14/04
CPC分类号： C09C1/0015 , B02C17/20 , B02C18/148 , C01P2004/64 , C01P2004/80 , C03C12/00
摘要： The present invention provides a producing method of powder particles having an average particle diameter on the order of submicrons. Specifically, the producing method is a producing method of powder particles obtained by grinding a product to be ground by using plural grinding media, wherein the grinding media including at least one kind (grinding medium A) having an average particle diameter of 0.01 to 5 times and at least one kind (grinding medium B) having an average particle diameter of 10 to 450 times, with respect to the average particle diameter of the product to be ground before being ground, are used.
摘要翻译：本发明提供平均粒径为亚微米级的粉末颗粒的制造方法。具体地说，该制造方法是通过使用多个研磨介质研磨待研磨产物而获得的粉末颗粒的制造方法，其中，所述研磨介质包含平均粒径为0.01〜5倍的至少一种（研磨介质A）并且使用平均粒径为10〜450倍的至少一种（研磨介质B），相对于研磨前的待研磨产品的平均粒径。

6. 发明授权

US08217089B2 Elastomer porous material and method of producing the same 有权
标题翻译：弹性体多孔材料及其制造方法
公开(公告)号：US08217089B2
公开(公告)日：2012-07-10
申请号：US12745589
申请日：2008-12-01
申请人： Wataru Nemoto , Kazuya Takato , Asuka Koyanagi , Jun Ogawa , Atsushi Ikeda
发明人： Wataru Nemoto , Kazuya Takato , Asuka Koyanagi , Jun Ogawa , Atsushi Ikeda
IPC分类号： C08J5/02 , C08J9/00
CPC分类号： C08J9/283 , C08J2383/04 , G03G15/0808 , G03G15/0818 , G03G15/2057 , G03G21/0058 , G03G2215/1614 , Y10T428/26
摘要： In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF1, which indicates the roundness of a circle and is represented by the following formula: SF ⁢ ⁢ 1 = π ⁢ ⁢ a 2 4 ⁢ A × 100 (wherein a represents the length of major axis of each cell, and A represents the area thereof), of 150 or less account for 80% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having a shape factor SF1, which indicates the roundness of a circle and is represented by the same formula (wherein a represents the length of major axis of each cell, and A represents the area thereof), of 150 or less account for 80% or more of all cells in the second observation region.
摘要翻译：在本发明的弹性体多孔体中，当以一定的倍率观察第一截面的第一观察区域的细胞时，具有表示圆的圆度的形状因子SF1的细胞由下式表示： SF⁢1 =＆pgr; ⁢a 2 4 A×100（其中，a表示各单元的长轴的长度，A表示其面积）为150以下，占第一观察区域的全部单元的80％以上，当以一定的倍率观察与第一截面正交的第二截面的第二观察区域中的单元时，具有表示圆的圆度并由相同的式表示的形状系数SF1的单元（其中a 表示每个细胞的长轴的长度，A表示其面积）为150以下，占第二观察区域的全部细胞的80％以上。

7. 发明授权

US07973367B2 Semiconductor device and manufacturing method thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US07973367B2
公开(公告)日：2011-07-05
申请号：US12650009
申请日：2009-12-30
申请人： Kenshi Kanegae , Akihiko Tsuzumitani , Atsushi Ikeda
发明人： Kenshi Kanegae , Akihiko Tsuzumitani , Atsushi Ikeda
IPC分类号： H01L27/092 , H01L27/095
CPC分类号： H01L21/32139 , H01L21/28052 , H01L21/28114 , H01L21/321 , H01L21/32132 , H01L21/32134 , H01L21/32137 , H01L29/665
摘要： In order that a top surface of a gate electrode does not have sharp portions, ends of the top surface of the gate electrode are rounded before refractory metal is deposited for silicidation. This reduces intensive application of film stresses which are generated in heat treatment, enabling formation of a silicide layer with a uniform, sufficient thickness.
摘要翻译：为了使栅电极的上表面不具有尖锐部分，在沉积难熔金属以进行硅化处理之前，栅极顶表面的端部是圆形的。这减少了在热处理中产生的膜应力的集约应用，使得能够形成具有均匀的足够厚度的硅化物层。

8. 发明申请

US20100311851A1 ELASTOMER POROUS MATERIAL AND METHOD OF PRODUCING THE SAME 有权
标题翻译：弹性体多孔材料及其制造方法
公开(公告)号：US20100311851A1
公开(公告)日：2010-12-09
申请号：US12745576
申请日：2008-12-01
申请人： Wataru Nemoto , Kazuya Takato , Asuka Koyanagi , Jun Ogawa , Atsushi Ikeda
发明人： Wataru Nemoto , Kazuya Takato , Asuka Koyanagi , Jun Ogawa , Atsushi Ikeda
IPC分类号： C08J9/00
CPC分类号： C08L83/04 , C08J9/283 , C08J2383/04 , G03G15/0808 , G03G15/0818 , G03G15/2057 , G03G21/0058 , G03G2215/1614
摘要： In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the second observation region.
摘要翻译：在本发明的弹性体多孔体中，当以一定的倍率观察第一截面的第一观察区域中的细胞时，具有纵横比a / b的细胞，其中a表示每个细胞的最大直径，b表示在与其正交的方向上测量的该单元的短轴的长度为1.3以下，占第一观察区域中的全部细胞的70％以上，并且当第二截面的第二观察区域中的细胞正交以一定的倍率观察到第一横截面，具有纵横比a / b的单元，其中a表示每个单元的最大直径，b表示在与其正交的方向上测量的该单元的短轴的长度，为1.3以下，占第二观察区域的全部细胞的70％以上。

9. 发明申请

US20100305225A1 ELASTOMER POROUS MATERIAL AND METHOD OF PRODUCING THE SAME 有权
标题翻译：弹性体多孔材料及其制造方法
公开(公告)号：US20100305225A1
公开(公告)日：2010-12-02
申请号：US12745669
申请日：2008-12-01
申请人： Wataru Nemoto , Kazuya Takato , Asuka Koyanaki , Jun Ogawa , Atsushi Ikeda
发明人： Wataru Nemoto , Kazuya Takato , Asuka Koyanaki , Jun Ogawa , Atsushi Ikeda
IPC分类号： C08J9/00
CPC分类号： C08J9/28 , B29C44/3403 , B29C67/202 , C08J2201/0504 , C08J2383/04 , Y10T428/26
摘要： In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF2, which indicates the remoteness from complete roundness and is represented by the following formula: SF   2 = P 2 4  π   A × 100 (wherein A represents the area of each cell, and P represents the perimeter length thereof), of 130 or less account for 80% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having a shape factor SF2, which indicates the remoteness from complete roundness and is represented by the same formula (wherein A represents the area of each cell, and P represents the perimeter length thereof), of 130 or less account for 80% or more of all cells in the second observation region.
摘要翻译：在本发明的弹性体多孔材料中，当以一定的倍率观察第一截面的第一观察区域的细胞时，具有形状因子SF2的细胞，其表示从完全圆度偏离并由下式表示： SF÷2 = P 2 4＆pgr A×100（其中A表示每个细胞的面积，P表示其周长）为130以下，占第一观察区域的全部细胞的80％以上，并且当第二观察区域中的细胞在一定的放大倍数下观察与第一截面正交的第二截面的观察区域，具有形状因子SF2的单元，其表示从完全圆度偏离并由相同的式（其中A表示每个单元的面积，P表示其周长）为130以下，占第二观察区域的全部细胞的80％以上。

10. 发明申请

US20100102396A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20100102396A1
公开(公告)日：2010-04-29
申请号：US12650009
申请日：2009-12-30
申请人： Kenshi Kanegae , Akihiko Tsuzumitani , Atsushi Ikeda
发明人： Kenshi Kanegae , Akihiko Tsuzumitani , Atsushi Ikeda
IPC分类号： H01L27/088 , H01L29/78
CPC分类号： H01L21/32139 , H01L21/28052 , H01L21/28114 , H01L21/321 , H01L21/32132 , H01L21/32134 , H01L21/32137 , H01L29/665
摘要： In order that a top surface of a gate electrode does not have sharp portions, ends of the top surface of the gate electrode are rounded before refractory metal is deposited for silicidation. This reduces intensive application of film stresses which are generated in heat treatment, enabling formation of a silicide layer with a uniform, sufficient thickness.
摘要翻译：为了使栅电极的上表面不具有尖锐部分，在沉积难熔金属以进行硅化处理之前，栅极顶表面的端部是圆形的。这减少了在热处理中产生的膜应力的集约应用，使得能够形成具有均匀的足够厚度的硅化物层。

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