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    • 3. 发明授权
    • Piezoelectric micro-blower
    • 压电式微型鼓风机
    • US08596998B2
    • 2013-12-03
    • US12958573
    • 2010-12-02
    • Masaaki FujisakiKiyoshi KuriharaDaisuke Kondo
    • Masaaki FujisakiKiyoshi KuriharaDaisuke Kondo
    • F04B35/04
    • F04B43/046F04B45/047F04F7/00
    • A piezoelectric micro-blower includes an inner case to which a peripheral portion of a vibrating plate including a piezoelectric element is fixed such that a blower chamber is defined between the inner case and the vibrating plate and an outer case arranged to cover an outer periphery of the inner case with a gap therebetween. The inner case is elastically retained in the outer case by a plurality of connecting portions. A first opening is provided in a top plate portion of the inner case that faces a central portion of the vibrating plate, and a second opening is provided in a top plate portion of the outer case that faces the first opening. A central space is provided between the top plate portions, and fluid introduced from the outside is guided to the central space through the gap between the inner and outer cases. The vibrating plate is driven in a bending mode so that air is sucked into the central space and is discharged through the second opening. The connecting portions prevent leakage of vibration of the vibrating plate from the inner case to the outer case, thereby reducing energy loss.
    • 一种压电微型鼓风机,包括内壳体,其中包括压电元件的振动板的周边部分固定在内壳体和振动板之间限定鼓风机室,外壳体设置成覆盖外壳 内壳体之间具有间隙。 内壳通过多个连接部分弹性地保持在外壳中。 第一开口设置在内壳体的面对振动板的中心部分的顶板部分中,并且第二开口设置在外壳体的面向第一开口的顶板部分中。 在顶板部之间设置中央空间,从外侧引入的流体通过内外壳之间的间隙被引导到中央空间。 振动板以弯曲模式被驱动,使得空气被吸入中心空间并通过第二开口排出。 连接部防止振动板从内侧壳体向外侧壳体的振动的泄漏,从而减少能量损失。
    • 4. 发明申请
    • SURFACE PROCESSING APPARATUS
    • 表面加工设备
    • US20090173444A1
    • 2009-07-09
    • US12397150
    • 2009-03-03
    • Yasumi SagoMasayoshi IkedaKazuaki KanekoDaisuke KondoOsamu Morita
    • Yasumi SagoMasayoshi IkedaKazuaki KanekoDaisuke KondoOsamu Morita
    • C23F1/08C23C16/54
    • C23C16/4557C23C16/45565C23C16/45572C23C16/5096H01J37/3244
    • The invention is to realize a gas ejection mechanism, which makes it possible to form a uniform gas flow and to control the temperature and its distribution over a gas plate, and thereby to provide a surface processing apparatus which can continuously carry out uniform processing. A surface processing apparatus of this invention comprises: a process chamber in which a substrate holding mechanism and a gas ejection mechanism are arranged to face each other; an exhaust means; and a gas supply means; wherein a gas distribution mechanism, a cooling or the heating mechanism provided with a coolant channel or a heater to cool or heat a gas plate and a number of gas passages, and the gas plate having a number of gas outlets communicated with the gas passages are arranged in that order from the upper stream to construct the gas ejection mechanism, and wherein the gas plate is fixed to the cooling or heating mechanism with a clamping member or with an electrostatic chucking mechanism. A second gas distribution mechanism may be installed between the gas plate and the cooling or heating mechanism so as to form gas outlets under the coolant channel.
    • 本发明是为了实现气体喷射机构,其能够形成均匀的气流并且控制温度及其在气板上的分布,从而提供能够连续进行均匀处理的表面处理装置。 本发明的表面处理装置包括:处理室,其中基板保持机构和气体喷射机构彼此相对配置; 排气装置; 和气体供给装置; 其特征在于,具有冷却通道的冷却或加热机构,或用于冷却或加热气板和多个气体通道的加热机构以及具有与气体通路连通的多个气体出口的气体板的气体分配机构, 从上游按顺序排列构成气体排出机构,其中,气板用夹紧构件或静电吸附机构固定在冷却或加热机构上。 第二气体分配机构可以安装在气体板和冷却或加热机构之间,以在冷却剂通道下形成气体出口。
    • 8. 发明申请
    • APPARATUS OF MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL
    • 制造碳化硅单晶的设备
    • US20120103262A1
    • 2012-05-03
    • US13262516
    • 2010-03-31
    • Wataru SeikiDaisuke Kondo
    • Wataru SeikiDaisuke Kondo
    • C30B23/06
    • C30B29/36C30B23/06
    • A apparatus (1) for manufacturing a silicon carbide single crystal comprises a graphite crucible (10) and configured so that the upper opening (11b) of a cylindrical crucible main body (11) has been blocked with a cover member (12), and a heating member comprising a single heating coil continuously wound around the outer periphery of the graphite crucible (10) and in which a sublimation material (50) is held on the bottom (11a) and a seed crystal (60) is attached to the inner surface (12a) of the crucible. The lower coil (31), which has wound around the bottom (11a) of the crucible main body (11), and the upper coil (32), which has wound around the cover member (12), have coil pitches (P1 and P3) which are smaller than the coil pitch (P2) of the central coil (33), which has wound around a center in the height-direction of the crucible main body (11).
    • 一种用于制造碳化硅单晶的设备(1)包括石墨坩埚(10)并且被构造成使得圆柱形坩埚主体(11)的上部开口(11b)已经被盖构件(12)阻挡,并且 加热构件,包括连续缠绕在所述石墨坩埚(10)的外周的单个加热线圈,并且其中升华材料(50)保持在所述底部(11a)上,并且晶种(60)附接到所述内部 坩埚的表面(12a)。 缠绕在坩埚主体(11)的底部(11a)上的下部线圈(31)和缠绕在盖部件(12)上的上部线圈(32)具有线圈间距(P1和 P3),其小于在坩埚主体(11)的高度方向上的中心缠绕的中心线圈(33)的线圈间距(P2)。