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    • 6. 发明授权
    • Beam separator device, charged particle beam device and methods of operating thereof
    • 光束分离装置,带电粒子束装置及其操作方法
    • US09472373B1
    • 2016-10-18
    • US14828181
    • 2015-08-17
    • ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    • Stefan LanioJohn BreuerJürgen FrosienMatthias FirnkesJohannes Hopster
    • H01J37/147H01J37/12H01J37/28H01J37/153
    • H01J37/1472H01J37/12H01J37/147H01J37/153H01J37/28H01J2237/12H01J2237/152H01J2237/1532H01J2237/1534H01J2237/2538
    • A beam separator device (200) is described. The beam separator device (200) includes a first deflector (112) providing a first magnetic deflection field (B1) for deflecting a charged particle beam (101) propagating along a beam entrance axis (A1) by a first deflection angle (α1); a second deflector (114) arranged downstream from the first deflector (112) providing a second magnetic deflection field (B2) for deflecting the charged particle beam by a second deflection angle (α2) in the direction of an intermediate beam axis (A2), wherein the second deflector (114) is configured for deflecting the charged particle beam (102) re-entering the beam separator device (200) along the intermediate beam axis (A2) by a third deflection angle (α3); a third deflector (212) arranged downstream from the second deflector (114) providing a third magnetic deflection field (B2) for deflecting the charged particle beam (102) by a fourth deflection angle (α4) in the direction of a beam exit axis (A3); a first rotation-free lens to be arranged at a first crossover (X1) of the charged particle beam between the first deflector (112) and the second deflector (114) for at least partially compensating for a dispersion introduced by at least one of the first deflector and the second deflector; and a second rotation-free lens to be arranged at a second crossover (X2) of the charged particle beam between the second deflector (114) and the third deflector (212) for at least partially compensating for a dispersion introduced by at least one of the second deflector and the third deflector.
    • 光束分离装置(200)被描述。 分束器装置(200)包括第一偏转器(112),其提供第一磁偏转场(B1),用于使沿着光束入射轴线(A1)传播的带电粒子束(101)偏转第一偏转角(α1); 第二偏转器(114)布置在第一偏转器(112)的下游,提供用于使带电粒子束沿中间光束轴线(A2)的方向偏转第二偏转角(α2)的第二磁偏转场(B2) 其中所述第二偏转器(114)构造成用于使沿着所述中间光束轴线(A2)重新进入所述光束分离器装置(200)的带电粒子束(102)偏转第三偏转角(α3); 布置在第二偏转器(114)的下游的第三偏转器(212)提供第三磁偏转场(B2),用于使带电粒子束(102)沿光束出射轴线的方向偏转第四偏转角(α4) A3); 布置在第一偏转器(112)和第二偏转器(114)之间的带电粒子束的第一交叉(X1)处的第一无旋转透镜,用于至少部分补偿由至少一个 第一偏转器和第二偏转器; 以及第二无旋转透镜,被布置在所述带电粒子束在所述第二偏转器(114)和所述第三偏转器(212)之间的第二交叉(X2)处,用于至少部分地补偿由所述第二偏转器 第二偏转器和第三偏转器。
    • 7. 发明授权
    • Dome detection for charged particle beam device
    • US09330884B1
    • 2016-05-03
    • US14538338
    • 2014-11-11
    • ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    • Jürgen Frosien
    • H01J37/147H01J37/244H01J37/05
    • H01J37/244H01J37/05H01J2237/1508H01J2237/28
    • According to an embodiment, a method of operating a charged particle beam device is provided. The charged particle beam device includes a beam separation unit, a first optical component distanced from the beam separation unit and a second optical component distanced from the beam separation unit and distanced from the first optical component. The method includes generating a primary charged particle beam. The method further includes generating a first electric field and a first magnetic field in the beam separation unit. The method further includes guiding the primary charged particle beam through the beam separation unit in which the first electric field and the first magnetic field are generated, wherein a travel direction of the primary charged particle beam leaving the beam separation unit is aligned with a first target axis under the influence of the first electric field and the first magnetic field. The method further includes generating a secondary charged particle beam by impingement of the primary charged particle beam onto a sample. The method further includes separating the secondary charged particle beam from the primary charged particle beam in the beam separation unit, wherein the secondary charged particle beam is deflected under the influence of the first electric field and the first magnetic field to travel from the beam separation unit to the first optical component. The method further includes generating a second electric field and a second magnetic field in the beam separation unit. The method further includes guiding the primary charged particle beam through the beam separation unit in which the second electric field and the second magnetic field are generated, wherein the travel direction of the primary charged particle beam leaving the beam separation unit is aligned with the first target axis under the influence of the second electric field and the second magnetic field. The method further includes separating the secondary charged particle beam from the primary charged particle beam in the beam separation unit, wherein the secondary charged particle beam is deflected under the influence of the second electric field and the second magnetic field to travel from the beam separation unit to the second optical component.
    • 8. 发明授权
    • Method for operating a charged particle beam device with adjustable landing energies
    • US09202666B1
    • 2015-12-01
    • US14340335
    • 2014-07-24
    • ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    • Jürgen Frosien
    • H01J37/00H01J37/147H01J37/28
    • H01J37/147H01J37/28H01J2237/1508
    • A method of operating a charged particle beam device is provided. The charged particle beam device includes a beam separator that defines an optical axis, and includes a magnetic beam separation portion and an electrostatic beam separation portion. The method includes generating a primary charged particle beam, and applying a voltage to a sample, the voltage being set to a first value to determine a first landing energy of the primary charged particle beam. The method further includes creating an electric current in the magnetic beam separation portion, the current being set to a first value to generate a first magnetic field, and applying a voltage to the electrostatic beam separation portion, the voltage being set to a first value to generate a first electric field. The method includes guiding the primary charged particle beam to the beam separator, wherein the primary charged particle beam enters the beam separator at a first angle relative to the optical axis and, under the influence of the first magnetic field and the first electric field, leaves the beam separator at a second angle relative to the optical axis. The method includes generating a secondary charged particle beam by impingement of the primary charged particle beam on the sample to which the voltage with the first value is applied, and separating the secondary charged particle beam from the primary charged particle beam in the beam separator, wherein the secondary charged particle beam enters the beam separator at a third angle relative to the optical axis and, under the influence of the first magnetic field and the first electric field, leaves the beam separator at a fourth angle relative to the optical axis. The first angle and the fourth angle are different. The method further includes applying the voltage to the sample, the voltage being set to a second value to determine a second landing energy of the primary charged particle beam, creating the electric current in the magnetic beam separation portion, the electric current being set to a second value to generate a second magnetic field, applying the voltage to the electrostatic beam separation portion, the voltage being set to a second value to generate a second electric field, guiding the primary charged particle beam to the beam separator, wherein the primary charged particle beam enters the beam separator at the first angle relative to the optical axis and, under the influence of the second magnetic field and the second electric field, leaves the beam separator at the second angle relative to the optical axis, generating the secondary charged particle beam by impingement of the primary charged particle beam on the sample to which the voltage with the second value is applied, and separating the secondary charged particle beam from the primary charged particle beam in the beam separator, wherein the secondary charged particle beam enters the beam separator at the third angle relative to the optical axis and, under the influence of the second magnetic field and the second electric field, leaves the beam separator at the fourth angle relative to the optical axis.