专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US10062546B2 Sample holder and focused-ion-beam machining device provided therewith 有权
公开(公告)号：US10062546B2
公开(公告)日：2018-08-28
申请号：US14890258
申请日：2013-05-14
申请人： Hitachi, Ltd.
发明人： Noriyuki Lee , Hiroyuki Yamamoto , Akira Sugawara
IPC分类号： H01L37/00 , H01J37/305 , H01J37/317
CPC分类号： H01J37/3056 , H01J37/317 , H01J2237/0262 , H01J2237/045 , H01J2237/12 , H01J2237/151 , H01J2237/206 , H01J2237/31745 , H01J2237/31749
摘要： To realize a focused-ion-beam machining apparatus capable of machining a thin sample with a wide area and a uniform film thickness and a needle-like sample with a sharp tip, in a focused-ion-beam machining apparatus including: an ion source (1); an electronic lens (3) focusing an ion beam extracted from the ion source (1) and irradiating the ion beam to a sample (5); and a sample holder (13) holding the sample (5), the sample holder (13) is provided with a shield electrode (7) arranged in a manner such as to cover the sample (5), and the sample (5) and the shield electrode (7) are insulated from each other in a manner such that voltages can be applied to them separately from each other.

2. 发明授权

US09818573B2 Particle beam transport apparatus 有权
公开(公告)号：US09818573B2
公开(公告)日：2017-11-14
申请号：US14594852
申请日：2015-01-12
申请人： Ion Beam Applications S.A.
发明人： Michel Abs , Szymon Zaremba , Willem Kleeven
IPC分类号： H01J37/10 , A61L2/08 , A61N5/10 , G21K1/08 , G21K5/04 , G21K5/10 , H05G2/00 , H01J37/30 , H01J37/317 , H01J37/147 , H01J37/304
CPC分类号： H01J37/10 , A61L2/087 , A61L2202/122 , A61N5/1043 , A61N2005/1087 , G21K1/08 , G21K5/04 , G21K5/10 , H01J37/147 , H01J37/1474 , H01J37/3002 , H01J37/3005 , H01J37/304 , H01J37/3045 , H01J37/317 , H01J2237/103 , H01J2237/12 , H01J2237/14 , H01J2237/2602 , H01J2237/30 , H01J2237/31701 , H05G2/00
摘要： The present invention is related to an apparatus for transporting a charged particle beam. The apparatus may include means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning and means for adjusting the field strength of said at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.

3. 发明授权

US09455115B2 Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system 有权
标题翻译：调整粒子束装置和粒子束系统中的扫描器的方法
公开(公告)号：US09455115B2
公开(公告)日：2016-09-27
申请号：US14574190
申请日：2014-12-17
申请人： Carl Zeiss Microscopy GmbH
发明人： Simon Diemer
IPC分类号： H01J37/15 , H01J37/147 , H01J37/12 , H01J37/285
CPC分类号： H01J37/147 , H01J37/12 , H01J37/15 , H01J37/153 , H01J37/285 , H01J2237/12 , H01J2237/15 , H01J2237/153 , H01J2237/1532 , H01J2237/1534 , H01J2237/285
摘要： A method of adjusting a stigmator in a particle beam apparatus comprises directing a particle beam onto a sample wherein the particle beam traverses a quadrupole field 37 generated by energizing at least four field generators of the stigmator; acquiring first and second images of the sample at different field strengths of the quadrupole field while energizing the at least four field generators according to a first setting of a plurality of settings; acquiring third and fourth images of the sample at different field strengths of the quadrupole field 37 while energizing the at least four field generators according to a second setting of the plurality of settings; determining a plurality of image displacements based on the first, second, third and fourth images; determining an optimum setting of the at least four field generators based on the plurality of image displacements and the plurality of settings.
摘要翻译：调整粒子束装置中的标示器的方法包括将粒子束引导到样品上，其中，粒子束穿过通过对至少四个场效应晶体管的场发生器通电而产生的四极场37; 在所述四极场的不同场强下采集所述样本的第一和第二图像，同时根据多个设置的第一设置激励所述至少四个场发生器; 在所述四极场37的不同场强下采集所述样本的第三和第四图像，同时根据所述多个设置的第二设置激励所述至少四个场发生器; 基于所述第一，第二，第三和第四图像确定多个图像位移; 基于所述多个图像位移和所述多个设置来确定所述至少四个场发生器的最佳设置。

4. 发明申请

US20160181055A1 Method of Adjusting a Stigmator in a Particle Beam Apparatus and a Particle Beam System 有权
标题翻译：调整粒子束装置和粒子束系统中的反射镜的方法
公开(公告)号：US20160181055A1
公开(公告)日：2016-06-23
申请号：US14574190
申请日：2014-12-17
申请人： Carl Zeiss Microscopy GmbH
发明人： Simon Diemer
IPC分类号： H01J37/147 , H01J37/285 , H01J37/12
CPC分类号： H01J37/147 , H01J37/12 , H01J37/15 , H01J37/153 , H01J37/285 , H01J2237/12 , H01J2237/15 , H01J2237/153 , H01J2237/1532 , H01J2237/1534 , H01J2237/285
摘要： A method of adjusting a stigmator in a particle beam apparatus comprises directing a particle beam onto a sample wherein the particle beam traverses a quadrupole field 37 generated by energizing at least four field generators of the stigmator; acquiring first and second images of the sample at different field strengths of the quadrupole field while energizing the at least four field generators according to a first setting of a plurality of settings; acquiring third and fourth images of the sample at different field strengths of the quadrupole field 37 while energizing the at least four field generators according to a second setting of the plurality of settings; determining a plurality of image displacements based on the first, second, third and fourth images; determining an optimum setting of the at least four field generators based on the plurality of image displacements and the plurality of settings.
摘要翻译：调整粒子束装置中的标示器的方法包括将粒子束引导到样品上，其中，粒子束穿过通过对至少四个场效应晶体管的场发生器通电而产生的四极场37; 在所述四极场的不同场强下采集所述样本的第一和第二图像，同时根据多个设置的第一设置激励所述至少四个场发生器; 在所述四极场37的不同场强下采集所述样本的第三和第四图像，同时根据所述多个设置的第二设置激励所述至少四个场发生器; 基于所述第一，第二，第三和第四图像确定多个图像位移; 基于所述多个图像位移和所述多个设置来确定所述至少四个场发生器的最佳设置。

5. 发明授权

US09202670B2 Method of investigating the wavefront of a charged-particle beam 有权
标题翻译：调查带电粒子束波前的方法
公开(公告)号：US09202670B2
公开(公告)日：2015-12-01
申请号：US14574179
申请日：2014-12-17
申请人： FEI Company
发明人： Bart Jozef Janssen , Gijs van Duinen , Uwe Luecken , Ross Savage , Stephanus H.L. van den Boom , Ivan Lazic
IPC分类号： G21K5/04 , H01J37/28 , H01J37/26 , H01J37/20 , H01J37/244 , H01J37/295
CPC分类号： H01J37/28 , H01J37/20 , H01J37/244 , H01J37/265 , H01J37/295 , H01J2237/12 , H01J2237/14 , H01J2237/226 , H01J2237/24507 , H01J2237/2614 , H01J2237/2802 , H01J2237/2806
摘要： A method of investigating a wavefront of a charged-particle beam that is directed from a source through an illuminator so as to traverse a sample plane and land upon a detector, an output of the detector being used in combination with a mathematical reconstruction technique so as to calculate at least one of phase information and amplitude information for the wavefront at a pre-defined location along its path to the detector, in which method: Said beam is caused to traverse a particle-optical lens system disposed between said sample plane and said detector; At a selected location in the path from said source to said detector, a modulator is used to locally produce a given modulation of the wavefront; In a series of measurement sessions, different such modulations are employed, and the associated detector outputs are collectively used in said mathematical reconstruction.
摘要翻译：一种调查带电粒子束的波前的方法，该波前从源通过照明器引导以遍历采样平面并落在检测器上，检测器的输出与数学重建技术结合使用，以便沿着其到达检测器的路径的预定位置处计算波前的相位信息和幅度信息中的至少一个，其中：所述光束被穿过设置在所述样品平面和所述检测器之间的粒子 - 光学透镜系统探测器; 在从所述源到所述检测器的路径中的选定位置处，使用调制器来本地产生波前的给定调制; 在一系列测量会话中，使用不同的这种调制，并且相关联的检测器输出在所述数学重建中被统一使用。

6. 发明申请

US20150255249A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 有权
标题翻译：多重粒子光束写字装置
公开(公告)号：US20150255249A1
公开(公告)日：2015-09-10
申请号：US14638786
申请日：2015-03-04
申请人： NuFlare Technology, Inc.
发明人： Munehiro OGASAWARA
IPC分类号： H01J37/317 , H01J37/04 , H01J37/30
CPC分类号： H01J37/3177 , H01J37/045 , H01J37/3007 , H01J2237/043 , H01J2237/0492 , H01J2237/12
摘要： A multi charged particle beam writing apparatus includes an aperture member to form multiple beams, a blanking plate in which there are arranged a plurality of blankers to respectively perform blanking deflection for a corresponding beam in the multiple beams having passed through a plurality of openings of the aperture member, a blanking aperture member to block each beam having been deflected to be in OFF state by at least one of the plurality of blankers, a first grating lens, using the aperture member as gratings, to correct spherical aberration of the charged particle beam, and a correction lens configured to correct high order spherical aberration produced by the first grating lens.
摘要翻译：多带电粒子束写入装置包括形成多个光束的孔径构件，其中布置有多个遮挡件，以分别对通过多个光束的多个光束的多个光束中的相应光束执行消隐偏转孔径构件，用于阻挡已经被多个遮挡件中的至少一个偏转到处于关闭状态的每个光束的消隐孔径构件，使用孔径构件作为光栅的第一光栅透镜，以校正带电粒子束的球面像差以及配置为校正由第一光栅透镜产生的高阶球面像差的校正透镜。

7. 发明申请

US20150221468A1 Composite Charged Particle Beam Device 有权
标题翻译：复合带电粒子束装置
公开(公告)号：US20150221468A1
公开(公告)日：2015-08-06
申请号：US14422374
申请日：2013-07-01
申请人： Hitachi High-Technologies Corporation
发明人： Tsunenori Nomaguchi , Toshihide Agemura
IPC分类号： H01J37/10 , H01J37/26
CPC分类号： H01J37/10 , H01J37/1413 , H01J37/1471 , H01J37/16 , H01J37/222 , H01J37/261 , H01J37/265 , H01J37/28 , H01J37/3005 , H01J37/305 , H01J37/3056 , H01J37/3178 , H01J2237/0245 , H01J2237/032 , H01J2237/12 , H01J2237/31745
摘要： The present invention provides a composite charged particle beam device which is provided with two or more charged particle beam columns and enables high-resolution observation while a sample is placed at the position of a cross point. The present invention has the following configuration. A composite charged particle beam device is provided with a plurality of charged particle beam columns (101a, 102a), and is characterized in that a sample (103) is disposed at the position of an intersection point (171) where the optical axes of the plurality of columns intersect, a component (408a, 408b) that forms the tip of an objective lens of the charged particle beam column (102a) is detachable, and by replacing the component (408a, 408b), the distance between the intersection point (171) and the tip of the charge particle beam column can be changed.
摘要翻译：本发明提供了一种复合带电粒子束装置，其具有两个或更多个带电粒子束柱，并且当将样品放置在交叉点的位置时能够进行高分辨率观察。本发明具有以下结构。复合带电粒子束装置设置有多个带电粒子束柱（101a，102a），其特征在于，样品（103）设置在交叉点（171）的位置，多个列相交，形成带电粒子束列（102a）的物镜的尖端的部件（408a，408b）是可拆卸的，并且通过更换部件（408a，408b），交点 171），并且可以改变电荷粒子束柱的尖端。

8. 发明授权

US09000395B2 Energy filter for charged particle beam apparatus 有权
标题翻译：带电粒子束装置的能量过滤器
公开(公告)号：US09000395B2
公开(公告)日：2015-04-07
申请号：US14276000
申请日：2014-05-13
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/12 , H01J37/05 , H01J37/244 , H01J37/26
CPC分类号： H01J37/05 , H01J37/10 , H01J37/12 , H01J37/244 , H01J37/263 , H01J2237/057 , H01J2237/12 , H01J2237/14
摘要： This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.
摘要翻译：本发明提供了一种用于提高带电粒子束的反射型能量过滤器的性能的方法，该方法在能量过滤器的势垒的入口侧采用光束调节透镜，以使带电粒子束变成基本平行的光束被发现在潜在的障碍之上。该方法使得能量滤波器在大的发射角扩展上具有精细的能量鉴别能力，并且在大的FOV上具有高的能量鉴别能力的均匀性。在能量过滤器中使用这种方法的LVSEM可以显着提高图像对比度。本发明还提供了通过使用该方法的优点形成的多个能量鉴别检测装置。

9. 发明申请

US20140284476A1 Energy Filter for Charged Particle Beam Apparatus 有权
标题翻译：带电粒子束能量滤波器
公开(公告)号：US20140284476A1
公开(公告)日：2014-09-25
申请号：US14276000
申请日：2014-05-13
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/05 , H01J37/12 , H01J37/244 , H01J37/26
CPC分类号： H01J37/05 , H01J37/10 , H01J37/12 , H01J37/244 , H01J37/263 , H01J2237/057 , H01J2237/12 , H01J2237/14
摘要： This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.
摘要翻译：本发明提供了一种用于提高带电粒子束的反射型能量过滤器的性能的方法，该方法在能量过滤器的势垒的入口侧采用光束调节透镜，以使带电粒子束变成基本平行的光束被发现在潜在的障碍物上。该方法使得能量滤波器在大的发射角扩展上具有精细的能量鉴别能力，并且在大的FOV上具有高的能量鉴别能力的均匀性。在能量过滤器中使用这种方法的LVSEM可以显着提高图像对比度。本发明还提供了通过使用该方法的优点形成的多个能量鉴别检测装置。

10. 发明授权

US08816276B2 Electron beam writing apparatus and electron beam writing method 有权
标题翻译：电子束写入装置和电子束写入方法
公开(公告)号：US08816276B2
公开(公告)日：2014-08-26
申请号：US13768327
申请日：2013-02-15
申请人： NuFlare Technology, Inc.
发明人： Takanao Touya , Takahito Nakayama
IPC分类号： G21K5/04 , H01J37/30
CPC分类号： H01J37/3007 , H01J37/09 , H01J2237/12 , H01J2237/31776
摘要： An electron beam writing apparatus comprising a XY stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, wherein a shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a negative voltage constantly to the electrostatic lens.
摘要翻译：一种电子束写入装置，包括放置样品的XY平台，电子光学柱，发射设置在光学柱中的电子束的电子枪，设置有沿着电子束轴向排列的电极的静电透镜，在光学柱中，其中屏蔽板设置在XY台和电子光学柱之间以阻挡通过用电子束照射到样品产生的反射电子或二次电子。静电透镜设置在屏蔽板的正上方，以改变电子束的焦点位置。电压供给装置将恒定的负电压施加到静电透镜。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式