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    • 4. 发明申请
    • METHOD FOR PRODUCING HOLLOW STRUCTUAL BODY
    • 生产中空结构体的方法
    • US20100196645A1
    • 2010-08-05
    • US12668950
    • 2008-07-30
    • Terunori YamaguchiShinji HashiguchiMitsuo Ueno
    • Terunori YamaguchiShinji HashiguchiMitsuo Ueno
    • B32B1/08B29D23/00
    • D01F11/04B29C67/0014D01D5/24D06M11/09D06M11/11D06M11/17D06M11/22
    • It is intended to provide a method of producing a hollow construct, which may be in various shapes such as a fiber or a film as well as in various sizes and has chemical resistance, made of a fluorinated hydrocarbon polymer, a fluorinated carbon polymer or a polymer carrying a nitrogen-containing group, a silicon-containing group, an oxygen-containing group, a phosphorus-containing group or a sulfur-containing group having been introduced into the above-described polymer; and a hollow construct obtained by this method. The method of producing a hollow construct as described above is characterized by comprising the fluorination step wherein a construct made of a hydrocarbon polymer or a polymer carrying a nitrogen-containing group, a silicon-containing group, an oxygen-containing group, a phosphorus-containing group or a sulfur-containing group having been introduced into the above-described polymer is brought into contact with a treating gas containing fluorine under definite conditions and thus the treating gas is allowed to penetrate from the outer surface of the construct toward the inside thereof to thereby fluorinate the construct excluding the core part, and the removal step wherein the core part having been not fluorinated as described above is removed.
    • 本发明提供一种中空构造体的制造方法,该中空构造体可以是各种形状,例如纤维或膜,以及各种尺寸,并且具有耐化学性,由氟化烃聚合物,氟化碳聚合物或 携带含氮基团的聚合物,含有导入到上述聚合物中的含氮基团,含氧基团,含磷基团或含硫基团; 和通过该方法获得的中空构造。 如上所述的制造中空构造体的方法的特征在于包括氟化步骤,其中由烃聚合物或携带含氮基团的聚合物,含硅基团,含氧基团, 导入上述聚合物的含氟基团或含硫基团在一定条件下与含氟处理气体接触,从而允许处理气体从构造体的外表面向其内部渗透 除去核心部分以外的构造物氟化,除去上述未被氟化的芯部的除去工序。