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    • 5. 发明授权
    • Optical modulator
    • 光调制器
    • US09551887B2
    • 2017-01-24
    • US14780525
    • 2014-02-27
    • Sumitomo Osaka Cement Co., Ltd.
    • Junichiro IchikawaToshio KataokaKatsutoshi Kondou
    • G02F1/025G02F1/03G02F1/035G02F1/225G02F1/015
    • G02F1/025G02F1/0316G02F1/0356G02F1/225G02F2001/0154G02F2201/063G02F2201/122G02F2201/128
    • An optical modulator has a ridge optical waveguide and a modulation electrode. The modulation electrode is composed of a signal electrode to which a modulation signal is supplied, a first ground electrode, and a second ground electrode, the signal electrode has a wide portion having a width wider than the width of the uppermost portion of the ridge optical waveguide, the first ground electrode has a central portion ground electrode component provided on a first surface so as to extend along a first direction, and the second ground electrode has a central portion ground electrode component provided on a second surface so as to extend along the first direction. The central portion ground electrode components respectively have a first and a second through-holes, and these through-holes overlap the wide portion of the signal electrode as seen in a planar view.
    • 光调制器具有脊形光波导和调制电极。 调制电极由提供调制信号的信号电极,第一接地电极和第二接地电极构成,信号电极具有比脊状光学器件的最上部宽度宽的宽度 第一接地电极具有沿第一方向设置在第一表面上的中心部分接地电极部件,并且第二接地电极具有设置在第二表面上的中心部分接地电极部件,以沿着第一方向延伸 第一个方向 中心部分接地电极部件分别具有第一和第二通孔,并且如平面图所示,这些通孔与信号电极的宽部分重叠。
    • 9. 发明授权
    • Semiconductor light intensity modulator
    • 半导体光强调制器
    • US5528413A
    • 1996-06-18
    • US179712
    • 1994-01-11
    • Eitaro Ishimura
    • Eitaro Ishimura
    • G02F1/015G02F1/025G02F1/03
    • G02F1/025G02F2001/0154G02F2001/0157G02F2203/255
    • A semiconductor light intensity modulator utilizing the electric field absorbing effect, includes a light absorption layer which absorbs light due to the electric field absorption effect and a phase correcting semiconductor layer to which an electric field is applied independently from the light absorption layer, having a larger energy band gap than that of the light absorption layer disposed in the light waveguide path or in the vicinity thereof, of the semiconductor light intensity modulator.In this construction, by adjusting the refractive index of the phase correcting semiconductor layer and the length of the light waveguide path, the change in the refractive index in the light absorption layer can be cancelled, whereby a semiconductor light intensity modulator free of phase modulation is obtained.
    • 利用电场吸收效应的半导体光强调制器包括由于电场吸收效应吸收光的光吸收层和独立于光吸收层施加电场的相位修正半导体层,具有较大的 能量带隙比设置在光波导路径中或其附近的光吸收层的能带隙高。 在这种结构中,通过调整相位校正半导体层的折射率和光波导路径的长度,可以消除光吸收层的折射率变化,由此无相位调制的半导体光强度调制器 获得。
    • 10. 发明授权
    • Semiconductor optical guided-wave device
    • 半导体光导波器件
    • US5455433A
    • 1995-10-03
    • US237856
    • 1994-05-04
    • Keiro Komatsu
    • Keiro Komatsu
    • H01L31/14G02B6/13G02F1/015G02F1/025G02F1/225G02F1/313H01S5/00H01L33/00
    • G02F1/025G02B6/131G02F1/2257G02F1/3133G02F2001/0154G02F2201/063
    • A semiconductor optical guided-wave device which makes quantization and integration possible and which is fine in structure and low in loss is provided, which comprises a semiconductor substrate, at least one ridge type semiconductor optical waveguide formed thereon and at least one pair of electrodes for applying an electric field to the waveguide. The ridge of the optical waveguide is formed by a selective crystal growth process.. The ridge can be realized preferably in such a method that a mask having an opening at a position where a ridge is formed is patterned to a layer on which the ridge is formed, and the crystal growth of a material for forming the ridge is made by a crystal growth technology such as the MOVPE method. The mask to be used for the crystal growth purpose is preferably a thin dielectric film such as, for example, SiO.sub.2 film. The semiconductor optical waveguide preferably comprises grown layers including a first semiconductor cladding layer, a semiconductor guiding and a second semiconductor cladding layer grown in this order and a ridge having a third semiconductor cladding layer and a semiconductor capping layer laminated in this order on the second semiconductor cladding layer.
    • 提供一种使得量化和集成成为可能并且结构细小且损耗低的半导体光导波装置,其包括半导体衬底,形成在其上的至少一个脊型半导体光波导和至少一对电极, 向波导施加电场。 光波导的脊通过选择性晶体生长工艺形成。该脊可以优选以这样一种方法实现,即在形成脊的位置处具有开口的掩模被图案化成其上的脊是 形成,并且通过诸如MOVPE方法的晶体生长技术来形成用于形成脊的材料的晶体生长。 用于晶体生长目的的掩模优选为例如SiO 2膜的薄电介质膜。 半导体光波导优选地包括生长层,其包括依次生长的第一半导体包覆层,半导体引导和第二半导体覆层以及在第二半导体上依次层叠有第三半导体包覆层和半导体覆盖层的脊 包层