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1. 发明申请

US20140044429A1 Color Film Developing Apparatus 有权
标题翻译：彩色显影装置
公开(公告)号：US20140044429A1
公开(公告)日：2014-02-13
申请号：US13642543
申请日：2012-09-05
申请人： Liwei Hu
发明人： Liwei Hu
IPC分类号： G03D5/00
CPC分类号： G03D5/00 , G03F7/3064
摘要： The present invention provides a color film developing apparatus, which is used to uniformly develop photoresist on the surface of a substrate as manufacturing a liquid crystal panel, comprising a developing chamber. The developing chamber comprises a first developing chamber and a second developing chamber respectively set inclined to a horizontal plane; the inclined directions of the first developing chamber and the second developing chamber inclined to the horizontal plane are contrary to each other. The color film developing apparatus according to the present invention can avoid the secondary development of the photoresist on the inclined substrate caused by the developer flowing from top to bottom when the substrate passes the developing chamber and proceeds to develop; enhance the uniformity of the development of the substrate; improve the uniformity of the in-plane process; narrow the differences; improve the quality of the product.
摘要翻译：本发明提供了一种彩色显影装置，其用于在制造液晶面板时在基板的表面上均匀地显影光致抗蚀剂，其包括显影室。显影室包括分别设置成倾斜于水平面的第一显影室和第二显影室; 第一显影室和第二显影室相对于水平面倾斜的倾斜方向彼此相反。根据本发明的彩色显影装置可以避免当显影室通过显影室时由显影剂从顶部向底部流动而引起的倾斜基板上的光致抗蚀剂的二次显影并进行显影; 增强基材的均匀性; 提高平面过程的均匀性; 缩小差异; 提高产品质量。

2. 发明申请

US20110045414A1 RINSING METHOD, DEVELOPING METHOD, DEVELOPING SYSTEM AND COMPUTER-READ STORAGE MEDIUM 有权
标题翻译：研究方法，开发方法，开发系统和计算机读取存储介质
公开(公告)号：US20110045414A1
公开(公告)日：2011-02-24
申请号：US12913420
申请日：2010-10-27
申请人： Hirofumi TAKEGUCHI , Junji NAKAMURA , Kousuke YOSHIHARA
发明人： Hirofumi TAKEGUCHI , Junji NAKAMURA , Kousuke YOSHIHARA
IPC分类号： G03C5/00
CPC分类号： G03D5/00 , B08B3/04 , H01L21/67051
摘要： The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rinsing method of rinsing a substrate processed by a developing process for developing an exposed pattern comprises the steps of discharging a rinsing liquid onto a central part of the substrate processed by the developing process and coated with a developer puddle while the substrate is stopped or rotated (step 5), stopping discharging the rinsing liquid in a state where the developer puddle remains at least in a peripheral part of the substrate (step 6), and rotating the substrate at a high rotating speed to shake the developer remaining on the substrate off the substrate together with the rinsing liquid (step 7).
摘要翻译：本发明提供了能够令人满意地冲洗抗蚀剂膜的表面的冲洗方法，而与抗蚀剂膜的表面的状态无关，从而可以减少由显影产生的残留物引起的显影缺陷。漂洗通过用于显影曝光图案的显影工艺处理的基材的冲洗方法包括以下步骤：将冲洗液体排出到通过显影过程处理的基材的中心部分上，并在基材停止或旋转时涂覆显影剂水坑（步骤5），在显影剂熔池至少保持在基板的周边部分的状态下停止排出冲洗液体（步骤6），并且以高转速旋转基板以摇动残留在基板上的显影剂基底与冲洗液一起（步骤7）。

3. 发明授权

US07828488B2 Developing apparatus, developing method, coating and developing system and storage medium 有权
标题翻译：开发设备，开发方法，涂层开发系统和存储介质
公开(公告)号：US07828488B2
公开(公告)日：2010-11-09
申请号：US12105701
申请日：2008-04-18
申请人： Nobuaki Matsuoka
发明人： Nobuaki Matsuoka
IPC分类号： G03D5/00
CPC分类号： G03D5/00
摘要： A developing apparatus includes two rotating members respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism extended between the rotating members to form a carrying passage, and capable of moving along an orbital path to carry a wafer supported thereon along the carrying passage, a sending-in transfer unit disposed at the upstream end of the carrying passage, a sending-out transfer unit disposed at the downstream end of the carrying passage, a developer pouring nozzle for pouring a developer onto the wafer, a cleaning nozzle for pouring a cleaning liquid onto the wafer, and a gas nozzle for blowing a gas against the wafer. The developer pouring nozzle, the cleaning nozzle and the gas nozzle are arranged in that order in a direction in which the wafer is carried along the carrying passage.
摘要翻译：显影装置包括分别具有平行的水平旋转轴线和彼此纵向相对设置的两个旋转构件，在旋转构件之间延伸以形成承载通道并且能够沿着轨道路径移动以承载晶片的承载通道形成机构沿着输送通道支撑在其上的输送转印单元，设置在输送通道的上游端的送出转印单元，设置在输送通道的下游端的送出转印单元，用于将显影剂倾倒到晶片上的显影剂倾倒喷嘴用于将清洗液注入到晶片上的清洗喷嘴和用于将气体吹向晶片的气体喷嘴。显影剂倾倒喷嘴，清洁喷嘴和气体喷嘴沿着沿承载通道承载晶片的方向依次排列。

4. 发明申请

US20090245881A1 DEVICE AND METHOD FOR DOSING TONER MATERIAL IN AN ELECTROPHOTOGRAPHIC PRINTER OR COPIER 失效
标题翻译：电子印刷机或复印机中调色剂材料的设备和方法
公开(公告)号：US20090245881A1
公开(公告)日：2009-10-01
申请号：US12480255
申请日：2009-06-08
申请人： Bernhard Schlageter , Klaus Strol , Reinhold Schmidl , Josef Ranner , Bernd Schoch , Joseph Knott
发明人： Bernhard Schlageter , Klaus Strol , Reinhold Schmidl , Josef Ranner , Bernd Schoch , Joseph Knott
IPC分类号： G03G15/08
CPC分类号： G03D5/00 , G03G15/0855 , G03G15/0865 , G03G15/0879 , G03G2215/0685 , G03G2215/0827
摘要： In a method or device for dosing toner material in an electrophotographic printer or copier, toner material is introduced into at least one bucket chamber rotatably arranged in an opening at a bottom of a toner reservoir. The bucket chamber has a paddle wheel which seals the opening of the toner reservoir. As the paddlewheel rotates, toner material in the bucket chamber is conveyed into a region. The toner material conveyed from the paddlewheel is further conveyed with a screw conveyor. Also a toner reservoir is provided having a toner removal opening shaped to accommodate at least a portion of a paddlewheel.
摘要翻译：在用于在电子照相打印机或复印机中配量调色剂材料的方法或装置中，调色剂材料被引入可旋转地布置在调色剂储存器底部的开口中的至少一个桶室中。铲斗室具有密封墨粉盒的开口的桨轮。当水轮旋转时，桶室中的调色剂材料被输送到一个区域中。从桨轮输送的调色剂材料进一步用螺旋输送机输送。还提供一种调色剂储存器，其具有成形为容纳至少一部分水轮的调色剂去除开口。

5. 发明申请

US20080284989A1 Developing method and developing unit 有权
公开(公告)号：US20080284989A1
公开(公告)日：2008-11-20
申请号：US12216751
申请日：2008-07-10
申请人： Yuko Ono , Junichi Kitano
发明人： Yuko Ono , Junichi Kitano
IPC分类号： G03B27/52
CPC分类号： G03D5/00 , G03F7/3028 , G03F7/322 , Y10S134/902
摘要： In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.

6. 发明申请

US20080267619A1 DEVELOPING APPARATUS, DEVELOPING METHOD, COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法，涂装和开发系统和存储介质
公开(公告)号：US20080267619A1
公开(公告)日：2008-10-30
申请号：US12105701
申请日：2008-04-18
申请人： Nobuaki MATSUOKA
发明人： Nobuaki MATSUOKA
IPC分类号： G03D5/00
CPC分类号： G03D5/00
摘要： A developing apparatus includes two rotating members 41 and 42 respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism 4 extended between the rotating members 41 and 42 to form a carrying passage, and capable of moving along an orbital path to carry a wafer W supported thereon along the carrying passage, a sending-in transfer unit 31 disposed at the upstream end of the carrying passage, a sending-out transfer unit 32 disposed at the downstream end of the carrying passage, a developer pouring nozzle 71 for pouring a developer onto the wafer W, a cleaning nozzle 72 for pouring a cleaning liquid onto the wafer W, and a gas nozzle 74 for blowing a gas against the wafer W. The developer pouring nozzle 71, the cleaning nozzle 72 and the gas nozzle 74 are arranged in that order in a direction in which the wafer W is carried along the carrying passage between the upstream and the downstream end of the carrying passage.
摘要翻译：显影装置包括分别具有平行的水平旋转轴线和彼此纵向相对布置的两个旋转构件41和42，在旋转构件41和42之间延伸的承载通道形成机构4，以形成承载通道，并且能够沿着携带沿着输送通道支撑在其上的晶片W的轨道，设置在运送通道的上游端的送入传送单元31，设置在运送通道的下游端的送出传送单元32，用于将显影剂倾倒到晶片W上的显影剂倾倒嘴71，用于将清洗液注入到晶片W上的清洁喷嘴72和用于将气体吹向晶片W的气体喷嘴74.显影剂倾倒嘴71，清洁喷嘴 72和气体喷嘴74沿着沿着车辆的上游和下游端之间的输送通道承载晶片W的方向依次布置通行证

7. 发明授权

US07441968B2 Spray development of photosensitive plates 失效
公开(公告)号：US07441968B2
公开(公告)日：2008-10-28
申请号：US11588714
申请日：2006-10-27
申请人： Howard A. Fromson , William J. Rozell , William J. Ryan
发明人： Howard A. Fromson , William J. Rozell , William J. Ryan
IPC分类号： G03D5/00 , B41N3/00
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/24 , B41C2210/262 , G03D5/00 , G03F7/3042
摘要： Excellent development of photosensitive coatings on planographic printing plates is achieved by directing a dynamic flow of fresh alkaline developer solution that impinges on a target area of the coating extending the width of the plate and floods the target area with a turbulent flow. At sufficient volumetric flow rate, the developer solution at the target area is constantly displaced during the development time, whereby no boundary layer forms on and travels with the plate during the development time and thus the target area is always in contact with fresh developer solution.

8. 发明申请

US20070297794A1 PHOTOLITHOGRAPHY SYSTEM AND METHOD 审中-公开
标题翻译：光刻系统和方法
公开(公告)号：US20070297794A1
公开(公告)日：2007-12-27
申请号：US11767324
申请日：2007-06-22
申请人： Byong-Cheol PARK , Dong-Hwa SHIN , Yun-Sik YANG
发明人： Byong-Cheol PARK , Dong-Hwa SHIN , Yun-Sik YANG
IPC分类号： G03D5/00
CPC分类号： G03D5/00 , G03F7/70533 , G03F7/70991 , H01L21/67225 , H01L21/67271
摘要： A photolithography system includes an application and development module, an exposure module, and an interface module interposed between the first two modules. Bake units for performing a post-exposure bake process are provided to both the application and development module and the interface module. The interface module also includes a buffer unit. An error detected within the application and development module would ordinarily stop operation of the post-exposure bake process in the application and development module. Upon detection of the error, communication between the auxiliary controller controlling the bake unit of the interface module and the exposure controller is made, and a wafer processed at the exposure module undergoes a post-exposure bake process at the bake unit of the interface module, and then is stored in the buffer unit of the interface module.
摘要翻译：光刻系统包括应用和开发模块，曝光模块和插入在前两个模块之间的接口模块。用于进行曝光后烘烤处理的烘烤单元被提供给应用和开发模块和接口模块。接口模块还包括缓冲单元。在应用程序和开发模块中检测到的错误通常会在应用程序和开发模块中停止曝光后烘烤过程的操作。在检测到错误时，进行控制接口模块的烘烤单元的辅助控制器与曝光控制器之间的通信，并且在曝光模块处理的晶片在接口模块的烘烤单元处进行曝光后烘烤处理，然后存储在接口模块的缓冲单元中。

9. 发明申请

US20070253709A1 DEVELOPING APPARATUS, DEVELOPING PROCESSING METHOD, DEVELOPING PROCESSING PROGRAM, AND COMPUTER READABLE RECORDING MEDIUM RECORDING THE PROGRAM 有权
标题翻译：开发设备，开发处理方法，开发处理程序以及记录程序的计算机可读记录介质
公开(公告)号：US20070253709A1
公开(公告)日：2007-11-01
申请号：US11739848
申请日：2007-04-25
申请人： Kousuke YOSHIHARA
发明人： Kousuke YOSHIHARA
IPC分类号： G03D5/00
CPC分类号： G03D5/00
摘要： A developing apparatus, a developing processing method, a developing processing program, and a computer readable recording medium recording the program, which can reduce the consumption amount of the developing solution and the developing processing time irrespective of the type of resist materials or the shape of resist patterns, are provided. A step of horizontally holding a substrate and rotating the substrate around a vertical axis at a prescribed rotation rate, and a step of intermittently supplying a developing solution to a center of the substrate from a discharge port of a developing solution nozzle arranged opposing to the surface of the substrate are executed. In the step of intermittently supplying the developing solution to the center of the substrate, an intermittence time and a substrate rotation rate in the intermittence time are set to prevent the developing solution supplied to the substrate from drying.
摘要翻译：记录程序的显影装置，显影处理方法，显影处理程序和计算机可读记录介质，无论抗蚀剂材料的类型如何，都可以减少显影液的消耗量和显影处理时间，抗蚀剂图案。水平地保持基板并以规定的旋转速度使垂直轴线旋转的步骤，以及从显影液喷嘴的排出口向基板的中心间歇地供给显影液的步骤的基板。在将显影液间歇地供给到基板的中心的步骤中，设置间歇时间的间歇时间和基板旋转速度，以防止供给到基板的显影液干燥。

10. 发明申请

US20060198633A1 Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium 失效
标题翻译：在光刻工艺中设置处理条件的方法，用于设置光刻工艺中的处理条件的装置，程序和计算机可读记录介质
公开(公告)号：US20060198633A1
公开(公告)日：2006-09-07
申请号：US11362087
申请日：2006-02-27
申请人： Michio Tanaka , Masahide Tadokoro
发明人： Michio Tanaka , Masahide Tadokoro
IPC分类号： G03D5/00
CPC分类号： G03D5/00 , G03F7/70558 , G03F7/70608 , G03F7/70625 , H01L21/67109 , H01L21/67178 , H01L21/67225 , H01L21/67248 , H01L21/67253
摘要： In the present invention, in the photolithography process in which a certain processing condition has been already set, a resist film on a substrate is exposed to light using a mask, which reduces only zero-order light of a light source at a predetermined light reduction rate and transmits the light, and then heated and developed so that the film on the substrate is reduced. Thereafter, the reduction in film thickness of the resist film is measured. The measured reduction in film thickness is then converted into a line width of a resist pattern on the already-set processing condition by a correlation function between the reduction in film thickness and the line width. Based on the converted line width, the temperature setting of the heating temperature at the time of heating after the exposure is performed. Consequently, the condition setting in the photolithography process is appropriately performed, resulting in improved uniformity of the line width of the resist pattern within the substrate.
摘要翻译：在本发明中，在已经设定了一定的处理条件的光刻工序中，使用掩模对基板上的抗蚀剂膜进行曝光，仅在预定的光衰减下仅减少光源的零级光速率并传输光，然后加热和显影，使得底物上的膜减少。此后，测量抗蚀剂膜的膜厚度的降低。然后，通过薄膜厚度的减小和线宽之间的相关函数，将已测定的膜厚度的减小值转换为已设定的处理条件下的抗蚀剂图案的线宽。基于转换的线宽，进行曝光后的加热时的加热温度的设定。因此，适当地执行光刻工艺中的条件设置，从而改善了衬底内抗蚀剂图案的线宽的均匀性。

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