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1. 发明申请

US20180188652A1 PHOTOLITHOGRAPHY METHOD AND SYSTEM BASED ON HIGH STEP SLOPE 审中-公开
公开(公告)号：US20180188652A1
公开(公告)日：2018-07-05
申请号：US15905969
申请日：2018-02-27
申请人： CSMC TECHNOLOGIES FAB1 CO., LTD.
发明人： Jiale SU
IPC分类号： G03F7/20 , G03F1/38
CPC分类号： G03F7/2035 , G03F1/38 , G03F7/203
摘要： A photolithography system based on a high step slope may include a depositing unit configured to manufacture a sacrificial layer having high step slope on a substrate. The system may also include a coating unit configured to coat a photoresist layer on the sacrificial layer by performing a spin-on PR coating process to form a photolithographic layer. The system may further include a photolithography unit configured to perform one or more photolithography processes to the photolithographic layer. The photolithography unit may comprise a plurality of masks of compensation patterns. The compensation pattern may comprise a slope-top compensation pattern and a slope compensation pattern.

2. 发明授权

US09563116B2 Mask, exposure apparatus and device manufacturing method 有权
标题翻译：面膜，曝光装置及装置制造方法
公开(公告)号：US09563116B2
公开(公告)日：2017-02-07
申请号：US13967688
申请日：2013-08-15
申请人： NIKON CORPORATION
发明人： Yuichi Shibazaki
IPC分类号： G03F9/00 , G03F1/38 , G03F7/20
CPC分类号： G03F1/38 , G03F7/201 , G03F7/2035 , G03F7/703 , G03F7/70358 , G03F9/00 , G03F9/70 , G03F9/7023
摘要： A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.
摘要翻译：使用圆筒状的荫罩通过投影光学系统在基板上形成图案的图像。掩模具有图案形成表面，其上形成图案并且围绕预定轴线放置，并且掩模能够以预定轴线为旋转轴线旋转，与基板的移动同步至少预定的一维方向。当将图案形成表面上的掩模的直径设为D，将一维方向上的基板的最大长度设为L，投影光学系统的投影比为β时，圆周比例为π，则满足D≥（β×L）/π的条件。

3. 发明授权

US09174400B2 Method for producing structures in optoelectronic components and device for this purpose 有权
标题翻译：用于生产光电元件结构的方法和用于此目的的器件
公开(公告)号：US09174400B2
公开(公告)日：2015-11-03
申请号：US11707589
申请日：2007-02-15
申请人： Karl Engl , Berthold Hahn , Volker Härle
发明人： Karl Engl , Berthold Hahn , Volker Härle
IPC分类号： H01L33/22 , B29D11/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/20 , H01L31/0232
CPC分类号： B29D11/00278 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0005 , G03F7/2035 , H01L31/0232 , H01L33/22
摘要： A method for producing structures (5) on a multiplicity of optoelectronic components (1), wherein the multiplicity of optoelectronic components (1) are arranged on an auxiliary carrier (10) and the structures (5) are produced by carrying out a movement of a first roller (15) relative to the auxiliary carrier (10) and producing the structures (5) in the process by means of exerting a pressure between the first roller (15) and the auxiliary carrier (10).
摘要翻译：一种用于在多个光电子部件（1）上制造结构（5）的方法，其中所述多个光电子部件（1）布置在辅助载体（10）上，并且所述结构（5）通过执行相对于辅助载体（10）的第一辊（15），并且通过在第一辊（15）和辅助载体（10）之间施加压力来在该过程中产生结构（5）。

4. 发明申请

US20140234780A1 LITHOGRAPHY WITH REDUCED FEATURE PITCH USING ROTATING MASK TECHNIQUES 审中-公开
标题翻译：使用旋转掩码技术的降低特征点的算术
公开(公告)号：US20140234780A1
公开(公告)日：2014-08-21
申请号：US14261345
申请日：2014-04-24
申请人： Rolith, Inc.
发明人： Boris Kobrin , Mark Brongersma , Edward Barnard
IPC分类号： G03F7/40 , G03F7/22
CPC分类号： G03F7/40 , G03F7/201 , G03F7/2014 , G03F7/2035 , G03F7/22 , G03F7/703 , G03F7/70325
摘要： Embodiments of the present invention are directed to techniques for obtaining patterns of features. One set of techniques uses multiple-pass rolling mask lithography to obtain the desired feature pattern. Another technique uses a combination of rolling mask lithography and a self-aligned plasmonic mask lithography to obtain a desired feature pitch.
摘要翻译：本发明的实施例涉及用于获得特征图案的技术。一组技术使用多遍轧制掩模光刻来获得所需的特征图案。另一种技术使用滚动掩模光刻和自对准等离子体掩模光刻的组合来获得期望的特征间距。

5. 发明申请

US20140152966A1 FACILITY AND METHOD FOR TREATING SUBSTRATE 有权
标题翻译：处理基材的设施和方法
公开(公告)号：US20140152966A1
公开(公告)日：2014-06-05
申请号：US14091764
申请日：2013-11-27
申请人： Semes Co., Ltd.
发明人： Soo Min HWANG , Dong Ho KIM , Won Jin KIM , Ho Shin KANG
IPC分类号： G03F7/20
CPC分类号： G03F7/162 , G03F7/2035 , G03F7/3021
摘要： Provided is a method of a substrate treatment. The method includes providing an operation module with substrates contained in a lot and performing an operation treatment thereon and performing a test treatment on the substrates completed with the operation treatment in a test module. The performing of the test treatment includes determining a substrate to be tested, which is provided to the test module, to allow the test treatment to be completed within an operation treatment time for the substrates in a unit lot.
摘要翻译：提供了一种基板处理方法。该方法包括向操作模块提供包含在批量中的基板，并在其上执行操作处理，并且在测试模块中对通过操作处理完成的基板执行测试处理。执行测试处理包括确定提供给测试模块的待测试基板，以允许在单位批次中的基板的操作处理时间内完成测试处理。

6. 发明授权

US08609301B2 Mask, exposure apparatus and device manufacturing method 有权
标题翻译：面膜，曝光装置及装置制造方法
公开(公告)号：US08609301B2
公开(公告)日：2013-12-17
申请号：US12399483
申请日：2009-03-06
申请人： Yuichi Shibazaki
发明人： Yuichi Shibazaki
IPC分类号： G03F1/00 , G03F9/00 , G03B27/46 , H01L21/00
CPC分类号： G03F1/38 , G03F7/201 , G03F7/2035 , G03F7/703 , G03F7/70358 , G03F9/00 , G03F9/70 , G03F9/7023
摘要： A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.
摘要翻译：使用圆筒状的荫罩通过投影光学系统在基板上形成图案的图像。掩模具有图案形成表面，其上形成图案并且围绕预定轴线放置，并且掩模能够以预定轴线为旋转轴线旋转，与基板的移动同步至少预定的一维方向。当图案形成表面上的掩模的直径取为D时，将一维方向上的基板的最大长度设为L，投影光学系统的投影比为β，圆周比例为pi，则满足D> =（β×L）/ pi的条件。

7. 发明申请

US20120274004A1 NANOPATTERNING METHOD AND APPARATUS 有权
标题翻译： NANOPATTERNING方法和装置
公开(公告)号：US20120274004A1
公开(公告)日：2012-11-01
申请号：US13546436
申请日：2012-07-11
申请人： Boris Kobrin
发明人： Boris Kobrin
IPC分类号： B29C59/16 , B82Y40/00
CPC分类号： G03F7/2035 , B82Y40/00 , G03F1/0007 , G03F1/0084 , G03F1/34 , G03F1/50 , G03F1/60 , G03F7/0012 , G03F7/2014 , G03F7/2032
摘要： Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.
摘要翻译：本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可移动的纳米结构膜来对辐射敏感材料成像。纳米图案技术利用近场光刻技术，其中纳米结构膜用于调制到达辐射敏感层的光强度。近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中可移动膜包括金属纳米孔或纳米颗粒。

8. 发明申请

US20120135235A1 Lock-Release Polymerization 有权
标题翻译：锁定聚合
公开(公告)号：US20120135235A1
公开(公告)日：2012-05-31
申请号：US13125306
申请日：2009-10-21
申请人： Ki Wan Bong , Patrick Seamus Doyle , Daniel Colin Pregibon
发明人： Ki Wan Bong , Patrick Seamus Doyle , Daniel Colin Pregibon
IPC分类号： C08L83/04 , B01J19/00 , B29B9/12 , G03F7/20
CPC分类号： C08J3/075 , G03F7/0037 , G03F7/2012 , G03F7/2035 , Y10T428/2982
摘要： Techniques are provided to independently control 3D shape and chemistry of rapidly produced colloids. A pre-polymer mixture including a monomer is made to flow into a channel with insular relief in a wall at a known location of the channel. A stimulus that polymerizes the pre-polymer mixture is directed onto the known location to form a structure locked in place at the known location by the insular relief. A pressure is applied to the channel that is sufficient to deflect the wall having the insular relief sufficiently to release a hydrogel particle comprising the structure.
摘要翻译：提供了独立控制快速生成的胶体的3D形状和化学性质的技术。使包含单体的预聚合物混合物在通道的已知位置的壁中流入具有岛状浮雕的通道。将预聚合物混合物聚合的刺激物被引导到已知位置，以形成通过岛状浮雕锁定在已知位置的结构。对通道施加足以使具有岛状浮雕的壁充分偏转以释放包含该结构的水凝胶颗粒的压力。

9. 发明申请

US20090170014A1 MASK, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：掩模，曝光装置和装置制造方法
公开(公告)号：US20090170014A1
公开(公告)日：2009-07-02
申请号：US12399483
申请日：2009-03-06
申请人： YUICHI SHIBAZAKI
发明人： YUICHI SHIBAZAKI
IPC分类号： G03F1/00 , G03F7/20 , G03B27/62 , G03B27/54
CPC分类号： G03F1/38 , G03F7/201 , G03F7/2035 , G03F7/703 , G03F7/70358 , G03F9/00 , G03F9/70 , G03F9/7023
摘要： A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.
摘要翻译：使用圆筒状的荫罩通过投影光学系统在基板上形成图案的图像。掩模具有图案形成表面，其上形成图案并且围绕预定轴线放置，并且掩模能够以预定轴线为旋转轴线旋转，与基板的移动同步至少预定的一维方向。当图案形成表面上的掩模的直径取为D时，将一维方向上的基板的最大长度设为L，投影光学系统的投影比为β，圆周以pi为比例，则满足D> =（betaxL）/ pi的条件。

10. 发明申请

US20050196707A1 Patterned conductive coatings 审中-公开
标题翻译：图案导电涂层
公开(公告)号：US20050196707A1
公开(公告)日：2005-09-08
申请号：US10791116
申请日：2004-03-02
申请人： Ronald Cok
发明人： Ronald Cok
IPC分类号： G03F7/00 , G03F7/11 , G03F7/20 , H05K1/09 , H05K3/00 , H05K3/06 , H05K3/28
CPC分类号： G03F7/0007 , G03F7/0035 , G03F7/11 , G03F7/2035 , H05K1/097 , H05K3/0023 , H05K3/06 , H05K3/064 , H05K3/28 , H05K2203/0571 , H05K2203/1545
摘要： A method of continuously manufacturing a patterned conductive layer includes the steps of providing a linearly moving substrate; coating a dispersion containing conductive nano-materials onto a surface of the linearly moving substrate; drying the coated dispersion wherein the nano-materials self-align into a conductive layer; coating a protective layer of radiation-curable material over the nano-materials coated on the linearly moving substrate; exposing the protective layer coating to patterned radiation and curing the exposed pattern in the protective layer; and removing uncured sections of the protective layer and the underlying sections of the conductive layer to form a patterned conductive layer.
摘要翻译：连续制造图案化导电层的方法包括以下步骤：提供线性移动的衬底; 将含有导电纳米材料的分散体涂覆到所述线性移动基板的表面上; 干燥涂覆的分散体，其中纳米材料自对准成导电层; 在涂覆在线性移动的衬底上的纳米材料上涂覆可辐射固化材料的保护层; 将保护层涂层暴露于图案化辐射并固化保护层中的暴露图案; 以及去除所述保护层和所述导电层的下面部分的未固化部分以形成图案化的导电层。

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