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1. 发明申请

US20150301256A1 OPTICAL OBSERVATION DEVICE 有权
标题翻译：光学观察装置
公开(公告)号：US20150301256A1
公开(公告)日：2015-10-22
申请号：US14651364
申请日：2013-12-13
申请人： HAMAMATSU PHOTONICS K.K.
发明人： Yuu TAKIGUCHI
IPC分类号： G02B5/32 , G03H1/00 , G03H1/08
CPC分类号： G02B5/32 , G02B3/08 , G02B5/18 , G02B5/1814 , G02B21/00 , G02B21/0032 , G02B21/365 , G03H1/0005 , G03H1/0841 , G03H2001/005 , G03H2001/0094 , G03H2001/085
摘要： An optical observation system includes a spatial light modulator displaying a Fresnel type kinoform on a phase modulation plane, and modulating light L1 in phase to irradiate an observation object with modulated light L2, an imaging optical system imaging observation target light L3 from the observation object, an optical system moving mechanism moving the imaging optical system in an optical axis direction of the observation target light L3, and a control section controlling the optical system moving mechanism such that the focal position of the imaging optical system changes in response to a change in the light condensing position of the modulated light L2 by the Fresnel type kinoform.
摘要翻译：光学观察系统包括在相位调制平面上显示菲涅耳型奇诺夫的空间光调制器，并且相位调制光L1以用调制光L2照射观察对象，来自观察对象的成像光学系统成像观察目标光L3，在观察对象光L3的光轴方向移动成像光学系统的光学系统移动机构，以及控制部，控制光学系统移动机构，使得成像光学系统的焦点位置响应于通过菲涅耳型kinoform调制光L2的聚光位置。

2. 发明申请

US20150147684A1 SYSTEM AND METHOD FOR HOLOGRAPHY-BASED FABRICATION 审中-公开
标题翻译：基于全息制作的系统和方法
公开(公告)号：US20150147684A1
公开(公告)日：2015-05-28
申请号：US14550920
申请日：2014-11-22
申请人： Wasatch Photonics, Inc.
发明人： Gerald L. Heidt
IPC分类号： G03F7/20 , G02B5/32
CPC分类号： G03H1/20 , B82Y40/00 , G02B5/32 , G03F7/20 , G03F7/26 , G03F7/70283 , G03F7/70408 , G03H1/0005 , G03H1/041 , G03H1/182 , G03H1/2249 , G03H2001/0094 , G03H2001/185 , G03H2223/17 , Y10S977/901
摘要： A system and method may utilize holography to facilitate fabrication techniques such as 3D printing and lithography. The system may include a light source, a hologram of an original object or lithographic pattern recorded in a holographic medium, and a target such as a reservoir of photosensitive material or a photosensitive material attached to a substrate. Illuminating the hologram with the appropriate light source may cause a holographic image of the original object or lithographic pattern to form on the photosensitive material within the reservoir or on the substrate. Formation of the holographic image may result in the formation of a new object from the photosensitive material, or may facilitate removal or retention of photosensitive material as part of a lithographic process.
摘要翻译：系统和方法可以利用全息术来促进诸如3D打印和光刻的制造技术。系统可以包括光源，原始物体的全息图或记录在全息介质中的光刻图案，以及诸如感光材料的储存器或附着到基板的感光材料的目标。用合适的光源照射全息图可能会使原始物体或光刻图案的全息图像形成在储存器或基板上的感光材料上。全息图像的形成可以导致从感光材料形成新物体，或者可以有助于光刻材料的去除或保留作为光刻工艺的一部分。

3. 发明授权

US08227150B2 Holographic reticle and patterning method 有权
标题翻译：全息掩模版和图案化方法
公开(公告)号：US08227150B2
公开(公告)日：2012-07-24
申请号：US12768405
申请日：2010-04-27
申请人： Shih-Ming Chang , Chung-Hsing Chang , Wen-Chuan Wang , Chi-Lun Lu , Sheng-Chi Chin , Chin-Hsiang Lin , Chun-Kuang Chen
发明人： Shih-Ming Chang , Chung-Hsing Chang , Wen-Chuan Wang , Chi-Lun Lu , Sheng-Chi Chin , Chin-Hsiang Lin , Chun-Kuang Chen
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/14 , G03F1/50 , G03F7/70283 , G03F7/70416 , G03H1/0005 , G03H1/0244 , G03H1/08 , G03H1/2205 , G03H2001/0094 , G03H2001/0833 , G03H2210/30 , G03H2224/04 , G03H2240/12 , G03H2240/13 , G03H2240/23 , G03H2270/52
摘要： A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target. Three-dimensional patterns may be formed in a photoresist layer of the target in a single patterning step. These three-dimensional patterns may be filled to form three-dimensional structures or else used in a multi-surface imaging composition. The holographic representation of the image may also be transferred to a top photoresist layer of a top surface imaging (TSI) semiconductor device, either directly or using the hologram reticle. The top photoresist layer may then be used to pattern an underlying photoresist layer with the image. The lower photoresist layer is used to pattern a material layer of the device.
摘要翻译：全息图掩模版和图案化目标的方法。要传输到目标的图像的布局图案被转换成图像的全息图。制造包括全息图的全息标线。然后使用全息图标线来对目标进行图案化。可以在单个图案化步骤中在靶的光致抗蚀剂层中形成三维图案。这些三维图案可以被填充以形成三维结构，或者用于多表面成像组合物中。图像的全息图也可以直接地或使用全息图掩模图传递到顶表面成像（TSI）半导体器件的顶部光致抗蚀剂层。然后可以使用顶部光致抗蚀剂层来用图像对下面的光致抗蚀剂层进行图案化。下部光致抗蚀剂层用于对该器件的材料层进行图案化。

4. 发明申请

US20120120465A1 DEVICE AND METHOD OF MARKING A SET OF PRODUCTS 审中-公开
标题翻译：一套产品的设备和方法
公开(公告)号：US20120120465A1
公开(公告)日：2012-05-17
申请号：US13144126
申请日：2010-01-12
申请人： Christophe Martinez , Alain-Marcel Rey
发明人： Christophe Martinez , Alain-Marcel Rey
IPC分类号： G03H1/00 , B23K26/00 , B23K15/00
CPC分类号： G03H1/0011 , G03H1/08 , G03H2001/0022 , G03H2001/0094 , G03H2210/52 , G03H2210/54
摘要： The invention relates to a method of marking a batch of products, consisting in forming a synthetic hologram of an image (20) on each product, said hologram being furthermore encoded using a phase key, the image comprising a first portion (22) common to the various products of the batch and a second portion (24) that differs from one product to another.
摘要翻译：本发明涉及一种标记一批产品的方法，包括在每个产品上形成图像（20）的合成全息图，所述全息图还使用相位键进行编码，所述图像包括第一部分（22），共同的该批次的各种产品和一个产品与另一个产品不同的第二部分（24）。

5. 发明申请

US20100297538A1 Holographic Reticle and Patterning Method 有权
标题翻译：全息光罩和图案化方法
公开(公告)号：US20100297538A1
公开(公告)日：2010-11-25
申请号：US12768405
申请日：2010-04-27
申请人： Shih-Ming Chang , Chung-Hsing Chang , Wen-Chuan Wang , Chi-Lun Lu , Sheng-Chi Chin , Chin-Hsiang Lin , Chun-Kuang Chen
发明人： Shih-Ming Chang , Chung-Hsing Chang , Wen-Chuan Wang , Chi-Lun Lu , Sheng-Chi Chin , Chin-Hsiang Lin , Chun-Kuang Chen
IPC分类号： G03F7/20 , G03F1/00
CPC分类号： G03F1/14 , G03F1/50 , G03F7/70283 , G03F7/70416 , G03H1/0005 , G03H1/0244 , G03H1/08 , G03H1/2205 , G03H2001/0094 , G03H2001/0833 , G03H2210/30 , G03H2224/04 , G03H2240/12 , G03H2240/13 , G03H2240/23 , G03H2270/52
摘要： A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target. Three-dimensional patterns may be formed in a photoresist layer of the target in a single patterning step. These three-dimensional patterns may be filled to form three-dimensional structures or else used in a multi-surface imaging composition. The holographic representation of the image may also be transferred to a top photoresist layer of a top surface imaging (TSI) semiconductor device, either directly or using the hologram reticle. The top photoresist layer may then be used to pattern an underlying photoresist layer with the image. The lower photoresist layer is used to pattern a material layer of the device.
摘要翻译：全息图掩模版和图案化目标的方法。要传输到目标的图像的布局图案被转换成图像的全息图。制造包括全息图的全息标线。然后使用全息图标线来对目标进行图案化。可以在单个图案化步骤中在靶的光致抗蚀剂层中形成三维图案。这些三维图案可以被填充以形成三维结构，或者用于多表面成像组合物中。图像的全息图也可以直接地或使用全息图掩模图传递到顶表面成像（TSI）半导体器件的顶部光致抗蚀剂层。然后可以使用顶部光致抗蚀剂层来用图像对下面的光致抗蚀剂层进行图案化。下部光致抗蚀剂层用于对该器件的材料层进行图案化。

6. 发明授权

US07722997B2 Holographic reticle and patterning method 有权
标题翻译：全息掩模版和图案化方法
公开(公告)号：US07722997B2
公开(公告)日：2010-05-25
申请号：US11939790
申请日：2007-11-14
申请人： Shih-Ming Chang , Chung-Hsing Chang , Chih-Cheng Chin , Wen-Chuan Wang , Chi-Lun Lu , Sheng-Chi Chin , Chin-Hsiang Lin
发明人： Shih-Ming Chang , Chung-Hsing Chang , Chih-Cheng Chin , Wen-Chuan Wang , Chi-Lun Lu , Sheng-Chi Chin , Chin-Hsiang Lin
IPC分类号： G03F1/00 , G03H1/02
CPC分类号： G03F7/70291 , G03F1/50 , G03H1/0005 , G03H1/0244 , G03H1/0808 , G03H1/2205 , G03H2001/0094 , G03H2001/0833 , G03H2210/30 , G03H2210/452 , G03H2224/04 , G03H2240/12 , G03H2240/13 , G03H2240/23 , G03H2270/52
摘要： A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target. Three-dimensional patterns may be formed in a photoresist layer of the target in a single patterning step. These three-dimensional patterns may be filled to form three-dimensional structures. The holographic representation of the image may also be transferred to a top photoresist layer of a top surface imaging (TSI) semiconductor device, either directly or using the hologram reticle. The top photoresist layer may then be used to pattern an underlying photoresist layer with the image. The lower photoresist layer is used to pattern a material layer of the device.
摘要翻译：全息图掩模版和图案化目标的方法。要传输到目标的图像的布局图案被转换成图像的全息图。制造包括全息图的全息标线。然后使用全息图标线来对目标进行图案化。可以在单个图案化步骤中在靶的光致抗蚀剂层中形成三维图案。可以填充这些三维图案以形成三维结构。图像的全息图也可以直接地或使用全息图掩模图传递到顶表面成像（TSI）半导体器件的顶部光致抗蚀剂层。然后可以使用顶部光致抗蚀剂层来用图像对下面的光致抗蚀剂层进行图案化。下部光致抗蚀剂层用于对该器件的材料层进行图案化。

7. 发明授权

US07568445B2 System and method for the holographic deposition of material 有权
标题翻译：材料全息沉积的系统和方法
公开(公告)号：US07568445B2
公开(公告)日：2009-08-04
申请号：US10010506
申请日：2001-11-13
申请人： Brian T. Rosenberger , William M. Carra
发明人： Brian T. Rosenberger , William M. Carra
IPC分类号： C23C14/00 , C08J7/18 , G21H5/00 , C03C15/00 , C03C25/68
CPC分类号： B29C64/135 , B29K2105/0055 , B33Y30/00 , G03H2001/0094
摘要： An apparatus and method for hologram induced deposition of material for use in the formation of three-dimensional structures is described. An electromagnetic energy source may be directed in the form of a hologram to a process chamber with a medium. The medium may be an organometallic gaseous medium. The hologram may induce the medium to form a solid structure associated with the shape of the hologram. The pressure of the gaseous medium may range from subatmospheric to greater than 100 psi. Alternatively, the medium may be a liquid polymer, a solid particle, or others. The hologram may be formed with an LCD panel or other means. Further, a holographic movie may be projected into one or more mediums to form complex three-dimensional structures.
摘要翻译：描述了用于形成三维结构的材料的全息图感应沉积的装置和方法。电磁能源可以以全息图的形式被引导到具有介质的处理室。介质可以是有机金属气体介质。全息图可以诱导介质形成与全息图的形状相关联的固体结构。气体介质的压力可以从低于大气压到大于100psi。或者，介质可以是液体聚合物，固体颗粒或其它物质。全息图可以用LCD面板或其他方式形成。此外，全息影片可投射到一个或多个介质中以形成复杂的三维结构。

8. 发明授权

US07312021B2 Holographic reticle and patterning method 有权
标题翻译：全息掩模版和图案化方法
公开(公告)号：US07312021B2
公开(公告)日：2007-12-25
申请号：US10792084
申请日：2004-03-03
申请人： Shih-Ming Chang , Chung-Hsing Chang , Chih-Cheng Chin , Wen-Chuan Wang , Chi-Lun Lu , Sheng-Chi Chin , Chin-Hsiang Lin
发明人： Shih-Ming Chang , Chung-Hsing Chang , Chih-Cheng Chin , Wen-Chuan Wang , Chi-Lun Lu , Sheng-Chi Chin , Chin-Hsiang Lin
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F7/70291 , G03F1/50 , G03H1/0005 , G03H1/0244 , G03H1/0808 , G03H1/2205 , G03H2001/0094 , G03H2001/0833 , G03H2210/30 , G03H2210/452 , G03H2224/04 , G03H2240/12 , G03H2240/13 , G03H2240/23 , G03H2270/52
摘要： A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target. Three-dimensional patterns may be formed in a photoresist layer of the target in a single patterning step. These three-dimensional patterns may be filled to form three-dimensional structures. The holographic representation of the image may also be transferred to a top photoresist layer of a top surface imaging (TSI) semiconductor device, either directly or using the hologram reticle. The top photoresist layer may then be used to pattern an underlying photoresist layer with the image. The lower photoresist layer is used to pattern a material layer of the device.
摘要翻译：全息图掩模版和图案化目标的方法。要传输到目标的图像的布局图案被转换成图像的全息图。制造包括全息图的全息标线。然后使用全息图标线来对目标进行图案化。可以在单个图案化步骤中在靶的光致抗蚀剂层中形成三维图案。可以填充这些三维图案以形成三维结构。图像的全息图也可以直接地或使用全息图掩模图传递到顶表面成像（TSI）半导体器件的顶部光致抗蚀剂层。然后可以使用顶部光致抗蚀剂层来用图像对下面的光致抗蚀剂层进行图案化。下部光致抗蚀剂层用于对该器件的材料层进行图案化。

9. 发明授权

US07255968B2 Alignment method of exposure mask and manufacturing method of thin film element substrate 有权
标题翻译：曝光掩模的对准方法和薄膜元件基板的制造方法
公开(公告)号：US07255968B2
公开(公告)日：2007-08-14
申请号：US11223956
申请日：2005-09-13
申请人： Chiharu Iriguchi
发明人： Chiharu Iriguchi
IPC分类号： G03F9/00
CPC分类号： G03F9/7084 , G03H1/0408 , G03H2001/0094
摘要： A method for aligning an exposure mask comprises: using a plurality of hologram masks, on which an alignment mark is formed; aligning position of the hologram masks toward an object to be exposed and on which an alignment mark is also formed, with a plurality of times by using both alignment marks; and pattern-exposing the object, wherein, while aligning at least three consecutive times, an alignment mark for third time aligning on the object is set in between alignment marks respectively for second time aligning and first time aligning, or at a position on an opposite side to a side in which the alignment mark for second time aligning is located with respect to the alignment mark for first time aligning.
摘要翻译：用于对准曝光掩模的方法包括：使用多个全息掩模，在其上形成对准标记; 通过使用两个对准标记将全息掩模对准位置朝向待曝光的物体上并且还形成有对准标记，多次; 并且对所述物体进行图案曝光，其中，在对准至少三次的同时，在对准标记之间分别设置用于第三次对准物体的对准标记，用于第二次对准和第一次对准，或者在相对的位置上的位置一侧到第二次对齐的对准标记相对于对准标记位于第一次对准的一侧。

10. 发明授权

US07092134B1 Method and apparatus for recording a hologram from a mask pattern by the use of total internal reflection holography and hologram manufactured by the method 失效
标题翻译：通过使用通过该方法制造的全内反射全息术和全息图从掩模图案记录全息图的方法和装置
公开(公告)号：US07092134B1
公开(公告)日：2006-08-15
申请号：US10009944
申请日：2000-06-13
申请人： Woo-Sung Han , Olivier H. Carnal , Francis Stace Murray Clube
发明人： Woo-Sung Han , Olivier H. Carnal , Francis Stace Murray Clube
IPC分类号： G03H1/04
CPC分类号： G03F7/70408 , G03H1/00 , G03H1/0408 , G03H2001/0094 , G03H2001/0415 , G03H2001/2234 , G03H2222/31 , G03H2222/36 , G03H2223/18 , G03H2260/14
摘要： The present invention relates to a method and an apparatus for forming a hologram from a mask. According to the invention a photoresist is used as the holographic recording medium and the planes of polarisation of the object and reference beams incident on the holographic recording medium are arranged such that their polarisation vectors are substantially mutually orthogonal in the holographic recording medium and such that the polarisation vectors of the incident and totally internally reflected reference beams are also substantially orthogonal. Preferably, just the transmission hologram is formed in the holographic recording layer.
摘要翻译：本发明涉及一种从掩模形成全息图的方法和装置。根据本发明，使用光致抗蚀剂作为全息记录介质，并且入射到全息记录介质上的物体和参考光束的偏振平面被布置成使得它们的极化矢量在全息记录介质中基本相互正交，入射和全反射参考光束的偏振矢量也基本上是正交的。优选地，仅在全息记录层中形成透射全息图。

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