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    • 2. 发明授权
    • Unsaturated beta-keto-ester acetals
    • 不饱和的BETA-KETO-ESTER ACETALS
    • US5059698A
    • 1991-10-22
    • US363801
    • 1989-06-09
    • Adrian SchulthessMax Hunziker
    • Adrian SchulthessMax Hunziker
    • C07D207/452C07D317/30C07D319/06C07D405/12C08F16/14C08F20/26C08F20/52C08F22/36C08F116/16C08F120/26C08F120/58C08F122/00C08F122/20C08F122/38C08F122/40G03F7/004H01L21/027
    • C07D317/30C07D319/06G03F7/0045
    • Polymeric .beta.-keto-ester acetals which, in combination with compounds which release acid under the action of actinic radiation, are suitable as positive photoresists, which are suitable for the production of printing plates, printed circuit boards, integrated circuits or silver-free films, can be prepared by free-radical polymerization from compounds of the formula I or II ##STR1## in which n is zero, 1 or 2 and, for example, R.sup.1 is an H atom, C.sub.1 -C.sub.10 -alkyl, phenyl or benzyl, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 independently of one another are each an H atom, halogen atom, C.sub.1 -C.sub.10 alkyl, phenyl, naphthyl or the radical --COOR.sup.9, ##STR2## or --SO.sub.2 R.sup.9, in which R.sup.9 is C.sub.1 -C.sub.6 alkyl or phenyl, X is O, S or NR.sup.10, in which R.sup.10 is an H atom, C.sub.1 -C.sub.6 alkyl or phenyl, Y is a radical of the following formulae ##STR3## in which R.sup.11 is an H atom, C.sub.1 -C.sub.6 alkyl or phenyl and Z is an aliphatic radical containing at least two methylene groups, and R.sup.12 and R.sup.13 independently of one another are each C.sub.1 -C.sub.10 alkyl, phenyl or naphthyl.
    • 与光化辐射作用下释放酸的化合物结合的聚合β-酮酯缩醛适用作正性光致抗蚀剂,适用于生产印版,印刷电路板,集成电路或无银膜 可以通过式I或II化合物的自由基聚合制备,其中n为0,1或2,例如,R1为H原子,C1 -C 10 - 烷基,苯基或苄基,R 2,R 3,R 4,R 5,R 6,R 7和R 8彼此独立地各自为H原子,卤素原子,C 1 -C 10烷基,苯基,萘基或基团-COOR 9, >或-SO 2 R 9,其中R 9为C 1 -C 6烷基或苯基,X为O,S或NR 10,其中R 10为H原子,C 1 -C 6烷基或苯基,Y为下式的基团。 其中R11为H原子,C1-C6烷基或苯基,Z为含有至少两个亚甲基的脂族基团,R12和R13独立地为 各自是C 1 -C 10烷基,苯基或萘基。
    • 4. 发明申请
    • PLANARIZING FILM-FORMING COMPOSITION FOR HARD DISK AND HARD DISK PRODUCTION METHOD USING SAME
    • 使用相同的硬盘和硬盘生产方法平面成膜组合物
    • US20130026132A1
    • 2013-01-31
    • US13640923
    • 2011-04-18
    • Taku KatoJunpei KobayashiKeisuke ShutoMasayoshi Suzuki
    • Taku KatoJunpei KobayashiKeisuke ShutoMasayoshi Suzuki
    • C08F120/10C07C69/604C08F120/26G11B5/84
    • G11B5/8404
    • A planarizing film-forming composition for a hard disk that is a non-magnetic filler is sufficiently filled into fine grooves on a magnetic material surface (surface), and is required not to cause contraction in the filled parts at the time of photo-curing (at the time of exposure) and post-exposure baking; and a method for producing a hard disk using the composition. The composition comprising at least one polyfunctional (meth)acrylate compound being in a liquid state at room temperature and atmospheric pressure and having a molecular weight of 300 to 10,000. The compound preferably has 2 to 20 (meth)acrylate groups in the molecule, or the compound preferably has a molecular weight of 300 to 2,300. A method for producing a hard disk comprising: forming a concave-convex shape on the surface; covering the surface having the concave-convex shape with the composition; and etching the covered surface for planarization until the surface is exposed.
    • 作为非磁性填料的硬盘用平坦化膜形成用组合物被充分地填充到磁性材料表面(表面)上的微细凹槽中,并且在光固化时不需要使填充部分收缩 (曝光时)和曝光后烘烤; 以及使用该组合物制造硬盘的方法。 所述组合物包含至少一种多官能(甲基)丙烯酸酯化合物,其在室温和大气压下处于液态,分子量为300至10,000。 该化合物在分子中优选具有2〜20(甲基)丙烯酸酯基,或者该化合物的分子量优选为300〜2300。 一种用于制造硬盘的方法,包括:在表面上形成凹凸形状; 用组合物覆盖具有凹凸形状的表面; 并蚀刻覆盖的表面用于平坦化直到表面暴露。