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    • 12. 发明申请
    • PROJECTION-TYPE PHOTOLITHOGRAPHY SYSTEM USING COMPOSITE PHOTON SIEVE
    • 使用复合光子栅的投影型光刻机系统
    • US20130044299A1
    • 2013-02-21
    • US13375102
    • 2011-08-16
    • Changqing XieNan GaoYilei HuaXiaoli ZhuHailiang LiLina ShiDongmei LiMing Liu
    • Changqing XieNan GaoYilei HuaXiaoli ZhuHailiang LiLina ShiDongmei LiMing Liu
    • G03B27/32
    • G02B5/1876G03F7/70316G03F7/70325
    • The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve. According to the present disclosure, because the composite photon sieve is used instead of a projection objective lens in a conventional projection-type photolithography system, the advantage of high efficiency in the conventional projection-type photolithography system can be reserved, and also photolithography can be performed in batches rapidly, so that photolithography efficiency can be improved. Meanwhile, costs can be effectively cut down and the system can be reduced in size.
    • 本公开涉及微纳米制造领域,并且提供了使用复合光子筛的投影型光刻系统。 该系统包括:依次布置的照明系统,面板,复合光子筛和基板。 照明系统适于产生入射光并用入射光照射掩模板。 掩模板适于通过复合光子筛提供要成像的物体,并且入射光通过掩模板后到达复合光子筛。 复合光子筛适于进行成像,掩模板上的图案在基底上成像。 衬底适于接收由复合光子筛成像的掩模板上的图案的图像。 根据本公开,由于在常规投影型光刻系统中使用复合光子筛代替投影物镜,因此可以预留在常规投影型光刻系统中高效率的优点,并且光刻可以 批量快速进行,从而可以提高光刻效率。 同时,可以有效降低成本,缩小系统。
    • 13. 发明申请
    • Process for preparing isopimaric acid
    • 异海松酸的制备方法
    • US20110060160A1
    • 2011-03-10
    • US12927097
    • 2010-11-04
    • Zhendong ZhaoXingdi LiLiangwu BiYuxiang ChenYan GuDongmei LiJing Wang
    • Zhendong ZhaoXingdi LiLiangwu BiYuxiang ChenYan GuDongmei LiJing Wang
    • C07C51/43
    • C07C61/29C07C51/43C07C2603/22C07C61/35
    • Disclosed is a process for preparing isopimaric acid, comprising the following steps: First step: dissolving thermally isomerized rosin in acetone, adding in drops a solution of isobutanolamine in acetone to form a precipitate, standing, filtering, washing with ethanol, and drying to obtain crude ammonium salt of isopimaric acid; recrystallizing the crude ammonium salt of isopimaric acid according to multi-recrystallization, and drying to obtain purified crystal of ammonium salt of isopimaric acid; Second step: dissolving the purified crystal of ammonium salt of isopimaric acid obtained in the first step in ether, adding hydrochloric acid in portions until the crystal of ammonium salt of isopimaric acid disappears, removing a water layer and washing the ether layer with water to neutral, evaporating the ether, dissolving the residue in acetone, adding water slowly into the solution dropwise until crystals cease to grow, then filtering and drying to obtain purified isopimaric acid.
    • 公开了一种制备异海松酸的方法,包括以下步骤:第一步:将热异构松香溶解在丙酮中,滴加异丁醇胺的丙酮溶液形成沉淀,静置,过滤,用乙醇洗涤,并干燥得到 异海松酸的粗铵盐; 根据多重结晶重结晶异海松酸的粗铵盐,干燥,得到异海松酸铵盐的纯化结晶; 第二步:将纯化的第一步获得的异海松酸铵盐的结晶溶解在乙醚中,分几次加入盐酸,直到异海松酸的铵盐结晶消失,去除水层,用水洗涤乙醚层至中性 蒸发乙醚,将残余物溶解在丙酮中,慢慢加入水中直到晶体停止生长,然后过滤并干燥,得到纯化的异海松酸。