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1. 发明申请

WO2012061163A3 APPARATUS, OPTICAL ASSEMBLY, METHOD FOR INSPECTION OR MEASUREMENT OF AN OBJECT AND METHOD FOR MANUFACTURING A STRUCTURE 审中-公开
公开(公告)号：WO2012061163A3
公开(公告)日：2012-05-10
申请号：PCT/US2011/057758
申请日：2011-10-25
申请人： NIKON CORPORATION , GOODWIN, Eric, Peter , WILLIAMSON, David, Michael , SMITH, Daniel, Gene , PHARAND, Michel , COOPER, Alexander , ROBERTSON, Alec , STAMPER, Brian, L.
发明人： GOODWIN, Eric, Peter , WILLIAMSON, David, Michael , SMITH, Daniel, Gene , PHARAND, Michel , COOPER, Alexander , ROBERTSON, Alec , STAMPER, Brian, L.
IPC分类号： G02F1/33
摘要： An optical assembly for a system for inspecting or measuring of an object is provided that is configured to move as a unit with a system, as the system is pointed at a target, and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the system. The optical assembly comprises catadioptric optics configured to fold the optical path of the pointing beam and measurement beam that are being directed through the outlet of the system, to compress the size of the optical assembly.

2. 发明申请

WO2012177663A3 AUTOFOCUS SYSTEM WITH REFERENCE CONFIGURATION 审中-公开
公开(公告)号：WO2012177663A3
公开(公告)日：2012-12-27
申请号：PCT/US2012/043186
申请日：2012-06-19
申请人： NIKON CORPORATION , SOGARD, Michael, R. , SMITH, Daniel, Gene , GOODWIN, Eric, Peter
发明人： SOGARD, Michael, R. , SMITH, Daniel, Gene , GOODWIN, Eric, Peter
IPC分类号： G03B3/00
摘要： A system (222) for measuring the position of a work piece (200) includes a redirector assembly (244), a light source assembly (240), a detector assembly (242), and a control system (224). The redirector assembly (244) is positioned near and spaced apart from the working surface (200A). The light source assembly (240) directs a measurement beam (246A) and a reference beam (246B) at the redirector assembly (244). The detector assembly (242) detects the measurement beam (246A) reflected off of the work piece (200) and generates a measurement signal, and detects the reference beam (246B) reflected off of the redirector assembly (244) and generates a reference signal. The control system (24) uses the measurement signal and the reference signal to determine the position of the work piece (200).

3. 发明申请

WO2018200536A2 ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018200536A2
公开(公告)日：2018-11-01
申请号：PCT/US2018/029160
申请日：2018-04-24
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the patternsource, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes |includes a projection optic sub-system configured to form an optical image of the patternsource on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

4. 发明申请

WO2009070492A1 AUTOFOCUS SYSTEM WITH ERROR COMPENSATION 审中-公开
标题翻译： AUTOFOCUS系统错误补偿
公开(公告)号：WO2009070492A1
公开(公告)日：2009-06-04
申请号：PCT/US2008/084238
申请日：2008-11-20
申请人： NIKON CORPORATION , SMITH, Daniel, Gene
发明人： SMITH, Daniel, Gene
IPC分类号： H01L21/30
CPC分类号： G03F9/7026
摘要： An aulofocus system for measuring the position of a work piece along an axis includes a slit light source assembly, a slit detector assembly, and a control system The slit light source assembly directs a first slit of light at a first slit area of the work piece The slit detector assembly detects light reflected off of the first slit area and generates a first slit signal relating to the amount of light reflected off of the first slit area at the slit detector assembly The control system uses the first slit signal from the slit detector assembly, and first reflectance information of the first slit area to determine the position of the work piece along the axis With this design, the autofocus system can compensate for the changes in reflectivity of the work piece As a result thereof, measurements taken with the autofocus system are more accurate and the work piece can be positioned with improved accuracy
摘要翻译：用于测量沿着轴的工件位置的自动对焦系统包括狭缝光源组件，狭缝检测器组件和控制系统。狭缝光源组件将工件的第一狭缝区域处的第一狭缝引导狭缝检测器组件检测从第一狭缝区域反射的光，并且产生与在狭缝检测器组件处的第一狭缝区域反射的光的量相关的第一狭缝信号。控制系统使用来自狭缝检测器组件的第一狭缝信号以及第一狭缝区域的第一反射率信息，以确定工件沿着轴的位置通过这种设计，自动对焦系统可以补偿工件的反射率的变化作为其结果，使用自动对焦系统更准确，工件可以提高准确度

5. 发明公开

EP3458912A1 EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING 审中-公开
公开(公告)号：EP3458912A1
公开(公告)日：2019-03-27
申请号：EP17798827.6
申请日：2017-05-19
申请人： Nikon Corporation , Flagello, Donis, G. , Williamson, David, M. , Renwick, Stephen, P. , Smith, Daniel, Gene , Binnard, Michael, B.
发明人： FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B5/18

6. 发明申请

WO2018208912A3 ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018208912A3
公开(公告)日：2018-11-15
申请号：PCT/US2018/031796
申请日：2018-05-09
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a ID EUV exposure tool that additionally includes (includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

7. 发明申请

WO2018194975A2 FIGOPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION 审中-公开
公开(公告)号：WO2018194975A2
公开(公告)日：2018-10-25
申请号：PCT/US2018/027785
申请日：2018-04-16
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

8. 发明申请

WO2021003444A2 METROLOGY FOR ADDITIVE MANUFACTURING 审中-公开
公开(公告)号：WO2021003444A2
公开(公告)日：2021-01-07
申请号：PCT/US2020/040772
申请日：2020-07-02
申请人： NIKON CORPORATION , GOODWIN, Eric, Peter
发明人： DURKO, Heather, Lynn , SMITH, Daniel, Gene , MARQUEZ, Johnathan, Agustin , BINNARD, Michael, Birk , CHANG, Patrick, Shih , BJORK, Matthew, Parker-mccormick , COON, Paul, Derek , HERR, Brett, William , ISHIKAWA, Motofusa
IPC分类号： G01B11/25 , G01B9/02 , B33Y50/02 , G01B15/04 , B22F10/28 , B22F10/36 , B22F12/90 , B33Y10/00 , B33Y30/00 , G01B11/2527 , G01B11/2536 , G01B9/02097
摘要： 3D metrology techniques are disclosed for determining a changing topography of a substrate processed in an additive manufacturing system. Techniques include fringe scanning, simultaneous fringe projections, interferometry, and x-ray imaging. The techniques can be applied to 3D printing systems to enable rapid topographical measurements of a 3D printer powder bed, or other rapidly moving, nearly continuous surface to be tested. The techniques act in parallel to the system being measured to provide information about system operation and the topography of the product being processed. A tool is provided for achieving higher precision, increasing throughput, and reducing the cost of operation through early detection and diagnosis of operating problems and printing defects. These techniques work well with any powder bed 3D printing system, providing real-time metrology of the powder bed, the most recently printed layer, or both without reducing throughput.

9. 发明申请

WO2018194975A3 FIGOPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION 审中-公开
公开(公告)号：WO2018194975A3
公开(公告)日：2018-10-25
申请号：PCT/US2018/027785
申请日：2018-04-16
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

10. 发明申请

WO2017199096A1 EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING 审中-公开
标题翻译：用于密集线图案的EUV光刻系统
公开(公告)号：WO2017199096A1
公开(公告)日：2017-11-23
申请号：PCT/IB2017/000696
申请日：2017-05-19
申请人： NIKON CORPORATION , FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
发明人： FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B5/18
摘要： Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece (156) includes source of EUV radiation (114) : a pattern-source (144) defining ID pattern : an illumination unit (IU) configured to irradiate the pattern-source (144) : and projection optics (PO) configured to optically image, with a reduction factor N>1, the ID pattern on image surface that is optically-conjugate to the ID pattern. Irradiation of the pattern-source (144) can be on-axis or off-axis. While ID pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source (144) can be flat or curved. The IU may include a relay reflector (126). A PO' s reflector may include multiple spatially-distinct reflecting elements (130, 134) aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the ID pattern of the pattern-source (144).
摘要翻译：专门配置成在目标工件（156）上印刷一维线的极紫外（EUV）刻蚀引擎包括EUV辐射源（114）：图案源（144） ID图案;配置为照射图案源（144）的照明单元（IU）;以及被配置为以缩减因子N> 1光学地成像光学共轭的图像表面上的ID图案的投影光学器件（PO）到ID模式。图案源（144）的照射可以是同轴的或离轴的。当ID图案具有第一空间频率时，其光学图像具有第二空间频率，其至少是第一空间频率的两倍。图案源（144）可以是平坦的或弯曲的。 IU可以包括中继反射器（126）。 PO的反射器可以包括聚集地形成这种反射器的多个空间不同的反射元件（130,134）。该引擎被配置为不允许形成空间分辨率基本上等于图案源（144）的ID图案的节距的任何2D图案的光学图像。

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