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1. 发明申请

WO2012061163A3 APPARATUS, OPTICAL ASSEMBLY, METHOD FOR INSPECTION OR MEASUREMENT OF AN OBJECT AND METHOD FOR MANUFACTURING A STRUCTURE 审中-公开
公开(公告)号：WO2012061163A3
公开(公告)日：2012-05-10
申请号：PCT/US2011/057758
申请日：2011-10-25
申请人： NIKON CORPORATION , GOODWIN, Eric, Peter , WILLIAMSON, David, Michael , SMITH, Daniel, Gene , PHARAND, Michel , COOPER, Alexander , ROBERTSON, Alec , STAMPER, Brian, L.
发明人： GOODWIN, Eric, Peter , WILLIAMSON, David, Michael , SMITH, Daniel, Gene , PHARAND, Michel , COOPER, Alexander , ROBERTSON, Alec , STAMPER, Brian, L.
IPC分类号： G02F1/33
摘要： An optical assembly for a system for inspecting or measuring of an object is provided that is configured to move as a unit with a system, as the system is pointed at a target, and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the system. The optical assembly comprises catadioptric optics configured to fold the optical path of the pointing beam and measurement beam that are being directed through the outlet of the system, to compress the size of the optical assembly.

2. 发明申请

WO2013070568A2 SYSTEM AND METHOD FOR CONTROLLING A TEMPERATURE OF A REACTION ASSEMBLY 审中-公开
标题翻译：用于控制反应组件温度的系统和方法
公开(公告)号：WO2013070568A2
公开(公告)日：2013-05-16
申请号：PCT/US2012/063646
申请日：2012-11-06
申请人： NIKON CORPORATION , PHARAND, Michel , MAHADESWARASWAMY, Chetan , BINNARD, Michael, B.
发明人： PHARAND, Michel , MAHADESWARASWAMY, Chetan , BINNARD, Michael, B.
IPC分类号： B01J8/00
CPC分类号： G03F7/70716 , B01J19/0093 , B01J2219/00783 , B01J2219/00873 , G03F7/70758 , G03F7/70858 , G03F7/70875 , H01L21/682
摘要： A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled to the stage (14) and a conductor array (36) that is coupled to the reaction assembly (18); (iv) a temperature adjuster (20); and (v) a control system (22) that selectively controls the temperature adjuster (20). The conductor array (36) includes a set of first zone conductor units (250), and a set of second zone conductor units (252). The temperature adjuster (20) independently adjusts the temperature of the set of first zone conductor units (250), and the set of second zone conductor units (252).
摘要翻译：一种舞台组件（10），包括（i）保持装置（26）的舞台（14）; （ii）与所述载物台（14）间隔开的反应组件（18）; （iii）移动所述载物台（14）的载物台移动器（16），所述载物台移动器（16）包括联接到所述载物台（14）的磁体阵列（38）和导体阵列（36），所述导体阵列反应组件（18）; （iv）温度调节器（20）; 和（v）选择性地控制温度调节器（20）的控制系统（22）。导体阵列（36）包括一组第一区导体单元（250）和一组第二区导体单元（252）。温度调节器（20）独立地调节该组第一区导体单元（250）和该组第二区导体单元（252）的温度。

3. 发明申请

WO2013090123A1 THERMAL PLATE FOR ENVIRONMENT AND TEMPERATURE CONTROL OF MOTORS USED TO MOVE STAGES IN LITHOGRAPHY TOOLS 审中-公开
标题翻译：电动工具用于移动电机的环境温度控制和温度控制
公开(公告)号：WO2013090123A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/068294
申请日：2012-12-06
申请人： NIKON CORPORATION , BINNARD, Michael B. , PHARAND, Michel , MORIMOTO, Shigeru , POON, Alex Ka Tim , COON, Derek , KHO, Leonard Wai Fung , KESWANI, Gaurav
发明人： BINNARD, Michael B. , PHARAND, Michel , MORIMOTO, Shigeru , POON, Alex Ka Tim , COON, Derek , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： H02K9/22
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70858 , H02K41/031
摘要： A lithography tool having a stage for supporting and positioning a substrate, an array configured to move the stage, and a cover plate positioned between the stage and the array. In various embodiments, the array may be either a magnet or coil array. The cover plate acts as a thermal insulator that helps even out temperature variations across the array. Consequently, thermal disturbances to the array or other parts of the lithography tool are reduced, resulting in a minimization of positioning errors. In addition, the cover plate also protects the array and provides a smooth surface in the event of a "crash" of the substrate stage.
摘要翻译：一种光刻工具，具有用于支撑和定位基板的台架，配置成移动台架的阵列以及位于台架和阵列之间的盖板。在各种实施例中，阵列可以是磁体或线圈阵列。盖板用作有助于均匀排列阵列温度变化的绝热材料。因此，光刻工具的阵列或其他部分的热干扰减少，导致定位误差的最小化。此外，盖板还保护阵列，并且在衬底台的“碰撞”的情况下提供光滑的表面。

4. 发明申请

WO2004095477A2 HIGH-PERFORMANCE ELECTROSTATIC CLAMP COMPRISING A RESISTIVE LAYER, MICRO-GROOVES, AND DIELECTRIC LAYER 审中-公开
标题翻译：包含电阻层，微孔和电介质层的高性能静电夹
公开(公告)号：WO2004095477A2
公开(公告)日：2004-11-04
申请号：PCT/US2004/012549
申请日：2004-04-21
申请人： AXCELIS TECHNOLOGIES INC. , KELLERMAN, Peter , BENVENISTE, Victor , PHARAND, Michel , STONE, Dale
发明人： KELLERMAN, Peter , BENVENISTE, Victor , PHARAND, Michel , STONE, Dale
IPC分类号： H01G
CPC分类号： H01L21/6833 , H02N13/00
摘要： An electrostatic clamp for securing a semiconductor wafer during processing. The electrostatic clamp comprises a base member, a resistive layer, a dielectric layer including a gas pressure distribution micro-groove network, a gas gap positioned between a backside of a semiconductor wafer and the dielectric layer, and a pair of high voltage electrodes positioned between the resistive layer and the dielectric layer. The electrostatic clamp can further comprise at least one ground electrode positioned between the resistive layer and the dielectric layer that provides shielding for the gas pressure distribution micro-groove network. The electrostatic clamp is characterized by a heat transfer coefficient of greater than or about 200 mW/Kcm 2 , a response time of less than or about 1 second, and gas leakage of less than or about 0.5 sccm. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. .
摘要翻译：一种用于在加工过程中固定半导体晶片的静电夹。静电夹具包括基底构件，电阻层，包括气体压力分布微槽网络的电介质层，位于半导体晶片的背面与电介质层之间的气隙，以及一对位于电阻层和电介质层。静电夹具还可以包括位于电阻层和电介质层之间的至少一个接地电极，其为气体压力分布微槽网络提供屏蔽。静电夹具的特征在于传热系数大于或约200mW / Kcm 2，响应时间小于或约1秒，气体泄漏小于或约0.5sccm。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。。

5. 发明申请

WO2008051369A2 LOW-COST ELECTROSTATIC CLAMP WITH FAST DECLAMP TIME 审中-公开
标题翻译：低成本的静电夹钳具有快速减速时间
公开(公告)号：WO2008051369A2
公开(公告)日：2008-05-02
申请号：PCT/US2007/021614
申请日：2007-10-10
申请人： AXCELIS TECHNOLOGIES, INC. , LAFONTAINE, Marvin , PHARAND, Michel , RUBIN, Leonard , BECKER, Klaus
发明人： LAFONTAINE, Marvin , PHARAND, Michel , RUBIN, Leonard , BECKER, Klaus
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , H02N13/00
摘要： A method for manufacturing a semiconductor wafer electrostatic clamp, comprising providing a mounting plate, forming an insulative layer on an insulating portion of the mounting plate, forming a first electrode on a first portion of the mounting plate, forming a second electrode on a second portion of the mounting plate, forming a first segment having a first conductivity over the first electrode, forming a first region having a second conductivity over the first segment that creates an n-p type composite, forming a second segment having a third conductivity formed over the over the second electrode, forming a second region having a fourth conductivity formed over the second region that creates an p-n type composite.
摘要翻译：一种制造半导体晶片静电夹的方法，包括提供安装板，在安装板的绝缘部分上形成绝缘层，在安装板的第一部分上形成第一电极，在第二部分上形成第二电极在所述第一电极上形成具有第一导电性的第一区段，在所述第一区段上形成具有第二导电性的第一区域，所述第一区域在所述第一区段上形成np型复合材料，形成具有第三导电性的第二区段，在第二区域上形成具有第四导电性的第二区域，形成pn型复合材料的第二电极。

6. 发明申请

WO2006020645A1 MAGNETIC SUPPORT STRUCTURE FOR AN ELEVATOR TUBE OF A VERTICLE RAPID THERMAL PROCESSING UNIT 审中-公开
标题翻译：用于快速热处理装置的电梯管的磁支撑结构
公开(公告)号：WO2006020645A1
公开(公告)日：2006-02-23
申请号：PCT/US2005/028280
申请日：2005-08-08
申请人： AXCELIS TECHNOLOGIES, INC. , PHARAND, Michel , NORMANDIN, Dennis , EIRIKSSON, Ari
发明人： PHARAND, Michel , NORMANDIN, Dennis , EIRIKSSON, Ari
IPC分类号： H01L21/00
CPC分类号： H01L21/68792
摘要： A vertical rapid thermal processing system includes a processing chamber and an elevator structure providing for vertical movement of a workpiece within the processing chamber. The elevator structure includes a workpiece support for supporting the workpiece and an elevator shaft coupled to the workpiece support and extending externally from the processing chamber. An end portion of the elevator shaft, external to the processing chamber, has a selected magnetic polarity. The elevator structure also includes moveable carriage coupled to the shaft to provide vertical movement of the workpiece within the processing chamber. The carriage includes a shaft support having the selected polarity. The shaft support is positioned adjacent the polarized end portion of the elevator shaft such that repulsive magnetic forces maintain a gap between the end portion of the elevator shaft and the shaft support as the shaft support and elevator shaft move vertically along a path of travel.
摘要翻译：垂直快速热处理系统包括处理室和提供工件在处理室内的垂直移动的升降机结构。电梯结构包括用于支撑工件的工件支撑件和联接到工件支撑件并从处理室外部延伸的升降机轴。电梯井的在处理室外部的端部具有选定的磁极性。电梯结构还包括联接到轴的可移动的托架，以提供工件在处理室内的垂直移动。托架包括具有所选极性的轴支撑件。轴支撑件邻近电梯井的极化端部定位，使得当轴支撑件和电梯井沿行进路径垂直移动时，排斥磁力在电梯井的端部与轴支撑件之间保持间隙。

7. 发明申请

WO2008070876A2 ENVIRONMENTAL ISOLATION SYSTEM FOR FLAT PANEL DISPLAYS 审中-公开
标题翻译：平板显示屏的环境隔离系统
公开(公告)号：WO2008070876A2
公开(公告)日：2008-06-12
申请号：PCT/US2007/087034
申请日：2007-12-10
申请人： ASYST TECHNOLOGIES, INC. , BONORA, Anthony, C. , PHARAND, Michel , GOULD, Robert
发明人： BONORA, Anthony, C. , PHARAND, Michel , GOULD, Robert
IPC分类号： B65D85/48 , G02F1/13
CPC分类号： B65D81/2076 , B65D85/30 , B65D2585/6837 , H01L21/67017 , H01L21/6734 , H01L21/67363 , H01L21/67379 , H01L21/67383 , H01L21/67393 , H01L21/67772 , H01L21/67775
摘要： The present invention generally comprises a system for FPD material storage and transport. The FPD system may contain environmental protection, material tracking and/or workstation loading capabilities. One of the components of the system includes a transportable, sealable container. Another component of the system includes a sealable load port against which a container is docked so that the substrates may be processed.
摘要翻译：本发明通常包括用于FPD材料储存和运输的系统。 FPD系统可能包含环境保护，材料跟踪和/或工作站加载功能。该系统的一个部件包括一个可运输，可密封的容器。该系统的另一个部件包括可密封的负载端口，容器对准该负载端口，使得可以处理衬底。

8. 发明申请

WO2008021340A2 WORKPIECE HANDLING SCAN ARM FOR ION IMPLANTATION SYSTEM 审中-公开
标题翻译：用于离子植入系统的工作处理扫描臂
公开(公告)号：WO2008021340A2
公开(公告)日：2008-02-21
申请号：PCT/US2007/017942
申请日：2007-08-13
申请人： AXCELIS TECHNOLOGIES, INC. , BECKEL, Donovan , EIRIKSSON, Ari , MITCHELL, Robert , PHARAND, Michel , LAFONTAINE, Marvin , PUROHIT, Ashwin , WEED, Steve , ARSENAULT, Wayne , PATHAK, Shantanu
发明人： EIRIKSSON, Ari , MITCHELL, Robert , PHARAND, Michel , LAFONTAINE, Marvin , PUROHIT, Ashwin , WEED, Steve , ARSENAULT, Wayne , PATHAK, Shantanu
CPC分类号： H01L21/6831 , H01L21/68764
摘要： An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic fluid seals associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.
摘要翻译：提供离子注入装置，系统和方法用于将工件保持器与扫描臂连接和断开。提供了一种扭转头，其中可操作地安装静电卡盘，其中与一个或多个扭转头和静电卡盘相关联的一个或多个旋转和非旋转构件具有与其相关联的一个或多个动态流体密封件。静电卡盘还可操作以从扭转头移除而不断开一个或多个动态流体密封件。

9. 发明公开

EP2633364A2 APPARATUS, OPTICAL ASSEMBLY, METHOD FOR INSPECTION OR MEASUREMENT OF AN OBJECT AND METHOD FOR MANUFACTURING A STRUCTURE 审中-公开
标题翻译：设备，光学布置，其方法为讯问或测量物体及其制造方法的结构
公开(公告)号：EP2633364A2
公开(公告)日：2013-09-04
申请号：EP11838550.9
申请日：2011-10-25
申请人： Nikon Corporation
发明人： GOODWIN, Eric, Peter , WILLIAMSON, David, Michael , SMITH, Daniel, Gene , PHARAND, Michel , COOPER, Alexander , ROBERTSON, Alec , STAMPER, Brian, L.
IPC分类号： G02F1/33
CPC分类号： G01N21/01 , G01B11/026 , G01N2021/1793 , G01S7/4814 , G01S7/4817 , G01S7/4818
摘要： An optical assembly for a system for inspecting or measuring of an object is provided that is configured to move as a unit with a system, as the system is pointed at a target, and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the system. The optical assembly comprises catadioptric optics configured to fold the optical path of the pointing beam and measurement beam that are being directed through the outlet of the system, to compress the size of the optical assembly.

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