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1. 发明授权

US06539959B1 Cleaning apparatus for plate-like part and method thereof 失效
标题翻译：板状零件清洗装置及其方法
公开(公告)号：US06539959B1
公开(公告)日：2003-04-01
申请号：US09498355
申请日：2000-02-04
申请人： Noriyuki Ohroku , Yuichirou Tanaka , Yoichi Takahara , Tomonori Saeki , Susumu Aiuchi , Hitoshi Oka , Fumio Morita , Masataka Fujiki , Akinobu Yamaoka
发明人： Noriyuki Ohroku , Yuichirou Tanaka , Yoichi Takahara , Tomonori Saeki , Susumu Aiuchi , Hitoshi Oka , Fumio Morita , Masataka Fujiki , Akinobu Yamaoka
IPC分类号： B08B310
CPC分类号： H01L21/67051 , B08B3/04 , B08B3/10 , G11B23/505 , Y10S134/902
摘要： At a time of cleaning a plate-like part such as a wafer or the like while rotating, for the purpose of reducing a contamination, a damage and an unevenness of process of the plate-like part which are caused by an amount of charged electricity of the plate-like part, chuck pins (chuck members) 201 which chuck the plate-like part 1 such as the wafer or the like and upper and lower cleaning plates 101 and 121 which oppose to the plate-like part 1 are constituted by a resin material containing carbon powders, and a desired potential difference is applied to a portion between the plate-like part and the cleaning plates by a voltage control unit 601 which is provided in an outer portion.
摘要翻译：在旋转时清洁诸如晶片等的板状部件的时候，为了减少由电荷量引起的污染，板状部件的过程的损坏和不均匀性板状部分夹住板状部分等板状部分1的卡盘销（卡盘部件）201和与板状部分1相对的上下清扫板101和121构成为：含有碳粉末的树脂材料，并且通过设置在外部的电压控制单元601将期望的电位差施加到板状部分和清洁板之间的部分。

2. 发明授权

US4420233A Projecting apparatus 失效
标题翻译：投影仪
公开(公告)号：US4420233A
公开(公告)日：1983-12-13
申请号：US381675
申请日：1982-05-24
申请人： Mineo Nomoto , Katsuhiro Iwashita , Toru Otsubo , Susumu Aiuchi
发明人： Mineo Nomoto , Katsuhiro Iwashita , Toru Otsubo , Susumu Aiuchi
IPC分类号： G03B13/36 , G02B7/28 , G03B3/10 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G03B27/34 , G03B21/28
CPC分类号： G03F7/70891 , G03B3/10 , G03F9/70
摘要： A projecting apparatus for forming an image of a mask on a wafer by a projector of a unit magnification reflection system having a concave spherical mirror and a convex spherical mirror. The distance from the projector to the mask or the upper side of a mask holder for holding the mask and the distance from the projector to the wafer are measured. An error of the image-forming position is computed from the distance measurements. At least one of the mask, the wafer and the projector is moved along the direction of projection in a manner to eliminate the error of the image-forming position computed, thus attaining automatic focus adjustment.
摘要翻译：一种用于通过具有凹球面镜和凸球面镜的单元放大反射系统的投影仪在晶片上形成掩模图像的投影设备。测量从投影仪到掩模的距离或用于保持面罩的掩模支架的上侧以及从投影仪到晶片的距离。从距离测量计算图像形成位置的误差。掩模，晶片和投影仪中的至少一个沿着投影方向移动，以消除所计算的图像形成位置的误差，从而获得自动聚焦调整。

3. 发明授权

US4675096A Continuous sputtering apparatus 失效
标题翻译：连续溅射装置
公开(公告)号：US4675096A
公开(公告)日：1987-06-23
申请号：US645671
申请日：1984-08-30
申请人： Hideki Tateishi , Tamotsu Shimizu , Susumu Aiuchi , Katsuhiro Iwashita , Hiroshi Nakamura
发明人： Hideki Tateishi , Tamotsu Shimizu , Susumu Aiuchi , Katsuhiro Iwashita , Hiroshi Nakamura
IPC分类号： B65G49/07 , C23C14/34 , C23C14/56 , H01L21/203 , C23C14/36
CPC分类号： C23C14/566 , C23C14/568
摘要： A continuous sputtering apparatus comprising a main vacuum chamber, one loading station and a plurality of process stations capable of having their pressures controlled separately. The process station includes a sub vacuum chamber capable of being in communication with the main vacuum chamber through an opening and an evacuation port. The loading station and the process stations are arranged to be spaced with equal angles. Substrate holders are provided to face the stations and are rotated by said equal angle in a time. The substrate holder opens and closes the opening of the sub vacuum chamber to serve as a gate valve.
摘要翻译：一种连续溅射装置，包括主真空室，一个装载站和能够分别控制其压力的多个处理站。处理站包括能够通过开口和排气口与主真空室连通的副真空室。装载站和处理站被布置为以相等角度间隔开。基板保持器被设置成面对车站，并且在一段时间内以相等的角度旋转。基板保持器打开和关闭副真空室的开口以用作闸阀。

4. 发明授权

US4405435A Apparatus for performing continuous treatment in vacuum 失效
标题翻译：用于在真空中进行连续处理的装置
公开(公告)号：US4405435A
公开(公告)日：1983-09-20
申请号：US296314
申请日：1981-08-26
申请人： Hideki Tateishi , Tsuneaki Kamei , Katsuo Abe , Shigeru Kobayashi , Susumu Aiuchi , Masashi Nakatsukasa , Nobuyuki Takahashi , Ryuji Sugimoto
发明人： Hideki Tateishi , Tsuneaki Kamei , Katsuo Abe , Shigeru Kobayashi , Susumu Aiuchi , Masashi Nakatsukasa , Nobuyuki Takahashi , Ryuji Sugimoto
IPC分类号： B01J3/00 , C23C14/56 , C23C15/00
CPC分类号： B01J3/006 , C23C14/566 , Y10S414/137 , Y10S414/139
摘要： An apparatus for performing continuous treatment in vacuum including an inlet chamber, a first intermediate chamber, at least one vacuum treating chamber, a second intermediate chamber and a withdrawing chamber arranged in the indicated order in a direction in which base plates are successively transferred. An opening device normally closed and opened when a base plate is transferred therethrough is mounted on a wall at the inlet of the inlet chamber, between the adjacent chambers and on a wall at the outlet side of the withdrawing chamber. A conveyor device for conveying each base plate in a horizontal direction through the opening device is mounted in each of the chambers, and an evacuating device is also mounted in each chamber. A base plate storing device for storing a plurality of base plates in a magazine is mounted in the first and second intermediate chambers. At least one vacuum treating device is mounted in the vacuum treating chamber.
摘要翻译：一种用于在真空中进行连续处理的装置，包括入口室，第一中间室，至少一个真空处理室，第二中间室和排出室，其按照依次传送基板的方向以指示的顺序排列。安装在入口室入口的壁上，在相邻的室之间和在抽出室的出口侧的壁上的壁上安装有一个通常关闭和打开底板的打开装置。用于通过打开装置沿水平方向输送每个基板的输送装置安装在每个室中，并且排气装置也安装在每个室中。在第一和第二中间室中安装有用于将多个基板存储在盒中的基板存储装置。至少一个真空处理装置安装在真空处理室中。

5. 发明授权

US4170418A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US4170418A
公开(公告)日：1979-10-09
申请号：US689818
申请日：1976-05-25
申请人： Susumu Aiuchi , Minoru Ikeda , Yoshio Matsumoto
发明人： Susumu Aiuchi , Minoru Ikeda , Yoshio Matsumoto
IPC分类号： G03B27/32 , G03F9/00 , G05D3/12 , H01L21/027 , H01L21/30 , G01B11/26
CPC分类号： G03F9/70
摘要： An alignment apparatus, in which a mask is overlaid on a wafer and a relative displacement between the wafer and a target pattern formed on the mask is detected to effect alignment thereof, comprises a slit frame adapted to reciprocate in a direction substantially parallel to the top surface of the mask and having a slit formed therein, an illumination optical system for illuminating the target pattern, an image formation optical system for forming the image of the target pattern onto the slit of the slit frame, a light sensing element mounted on the slit frame for detecting the target pattern image formed by the image formation optical system through the slit to convert the image into an electric signal, and a displacement detector for detecting the amount of movement of the reciprocation of the slit frame to convert the amount of movement into a position signal which the light sensing element scans, whereby the output signals from the displacement detector and the light sensing element are used to detect the relative position between the mask and the target pattern on the wafer and the mask is moved relative to the wafer such that the relative displacement amount becomes zero.
摘要翻译：其中掩模覆盖在晶片上并且在晶片和形成在掩模上的目标图案之间的相对位移被检测以对准其中的对准装置，包括适于沿基本上平行于顶部的方向往复运动的狭缝框架表面，其中形成有狭缝，用于照射目标图案的照明光学系统，用于将目标图案的图像形成在狭缝框的狭缝上的图像形成光学系统，安装在狭缝上的光感测元件框架，用于通过狭缝检测由图像形成光学系统形成的目标图案图像，以将图像转换为电信号;以及位移检测器，用于检测狭缝框架的往复运动量以将移动量转换为光感测元件扫描的位置信号，从而来自位移检测器和感光元件的输出信号 nt用于检测晶片上的掩模和目标图案之间的相对位置，并且掩模相对于晶片移动，使得相对位移量变为零。

6. 发明授权

US06693699B2 Image display device and its repairing method and apparatus 有权
标题翻译：图像显示装置及其修复方法和装置
公开(公告)号：US06693699B2
公开(公告)日：2004-02-17
申请号：US10234578
申请日：2002-09-06
申请人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
发明人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
IPC分类号： G02F113
CPC分类号： G02F1/1333 , G02F1/1309
摘要： A method for repairing a liquid crystal display provided with a light transmitting member having an image display section. The method includes filling a filler, which has a refractive index substantially equal to that of the light transmitting member, into a scratch or scratches formed on inside and outside surfaces of the light transmitting member so as to repair the scratch or scratches.
摘要翻译：一种修补液晶显示器的方法，该液晶显示器具有带有图像显示部分的透光部件。该方法包括将具有与透光构件的折射率基本相等的折射率的填充物填充到形成在透光构件的内表面和外表面上的划痕或划痕，以修复划痕或划痕。

7. 发明授权

US4933565A Method and apparatus for correcting defects of X-ray mask 失效
标题翻译：用于校正X射线掩模缺陷的方法和装置
公开(公告)号：US4933565A
公开(公告)日：1990-06-12
申请号：US216834
申请日：1988-07-08
申请人： Hiroshi Yamaguchi , Keiya Saito , Mitsuyoshi Koizumi , Akira Shimase , Satoshi Haraichi , Tateoki Miyauchi , Shinji Kuniyoshi , Susumu Aiuchi
发明人： Hiroshi Yamaguchi , Keiya Saito , Mitsuyoshi Koizumi , Akira Shimase , Satoshi Haraichi , Tateoki Miyauchi , Shinji Kuniyoshi , Susumu Aiuchi
IPC分类号： G01Q10/00 , G01Q70/14 , G03F1/00 , G03F1/22 , H01L21/027 , H01L21/30
CPC分类号： G03F1/74 , G03F1/22
摘要： The present invention relates to a method and apparatus for correcting defects of an X-ray mask which includes a focused ion beam used to irradiate at least a region having a defective portion of an X-ray mask having a protective film and eliminating the protective film; exposing a circuit pattern having a defective portion located under the region or setting this circuit pattern to the state near the exposure; detecting one of the secondary electrons, secondary ions, reflected electrons, or absorbing current generated from that region and detecting a true defective position. Then positioning the focused ion beam to the true defective position and irradiating the focused ion beam to the defective portion thereby correcting the defect.

8. 发明授权

US4628531A Pattern checking apparatus 失效
标题翻译：图案检查装置
公开(公告)号：US4628531A
公开(公告)日：1986-12-09
申请号：US583867
申请日：1984-02-27
申请人： Keiichi Okamoto , Kozo Nakahata , Yukio Matsuyama , Hideaki Doi , Susumu Aiuchi , Mineo Nomoto
发明人： Keiichi Okamoto , Kozo Nakahata , Yukio Matsuyama , Hideaki Doi , Susumu Aiuchi , Mineo Nomoto
IPC分类号： G01B11/24 , G01N21/88 , G01N21/956 , G06T7/00 , G06K9/00
CPC分类号： G06T7/001 , G01N21/956 , G06T2207/10056 , G06T2207/30148
摘要： A pattern checking apparatus carries out the detection of candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.
摘要翻译：模式检查装置通过具有足够高的灵敏度的主要选择来执行候选缺陷的检测，以检测任何现有缺陷，然后通过控制处理器对包括检测到的候选缺陷的外围的图案进行详细分析，通过从候选者中删除不是实际意义上的缺陷的候选缺陷的次要选择，从而仅检测到真实的缺陷。

9. 发明授权

US4536419A Method for forming tapered films 失效
标题翻译：形成锥形膜的方法
公开(公告)号：US4536419A
公开(公告)日：1985-08-20
申请号：US474032
申请日：1983-03-10
申请人： Hitoshi Kubota , Minoru Tanaka , Susumu Aiuchi
发明人： Hitoshi Kubota , Minoru Tanaka , Susumu Aiuchi
IPC分类号： C23C14/04 , C23C11/00 , C23C13/00
CPC分类号： C23C14/044
摘要： Method for forming thin films on a substrate by using a mask through dry process wherein the substrate and the mask are moved relative to each other at least once for the formation of a thin film before the thickness of the thin film being formed on the substrate reaches a predetermined value, so that the formed thin film has an outer edge partly or entirely contoured stepwise.
摘要翻译：通过使用通过干法的掩模在基板上形成薄膜的方法，其中在形成薄膜的薄膜的厚度在形成在基板上的厚度达到之前，基板和掩模相对于彼此移动至少一次以形成薄膜使得所形成的薄膜具有部分或全部轮廓的外边缘。

10. 发明授权

US4487678A Dry-etching apparatus 失效
标题翻译：干式蚀刻装置
公开(公告)号：US4487678A
公开(公告)日：1984-12-11
申请号：US597749
申请日：1984-04-06
申请人： Minori Noguchi , Toru Otsubo , Susumu Aiuchi , Takashi Kamimura , Teru Fujii
发明人： Minori Noguchi , Toru Otsubo , Susumu Aiuchi , Takashi Kamimura , Teru Fujii
IPC分类号： H01J37/18 , H01L21/00 , H01L21/302 , H01L21/3065 , H01L21/677 , C23C15/00
CPC分类号： H01L21/302 , H01J37/185 , H01L21/67069 , H01L21/67126 , H01L21/67745
摘要： The invention is directed to a dry-etching apparatus used for etching an aluminum wiring film formed on a wafer, and more particularly to a dry-etching apparatus which can remove chlorides deposited on the surface of the wafer during the dry etching thereof, as well as an etching resist film, without having to take the wafer out. This dry-etching apparatus is provided with an etching chamber, a vacuum antechamber attached to the etching chamber by a gate valve, and a post-treatment chamber attached to the vacuum antechamber. The apparatus is so formed that etched wafers removed to the vacuum antechamber can be sent therefrom to the post-treatment chamber, and then the post-treated wafers can be removed to the vacuum antechamber again, and then removed therefrom to the atmosphere.
摘要翻译：本发明涉及一种用于蚀刻形成在晶片上的铝布线膜的干蚀刻装置，更具体地说涉及一种能够在其干蚀刻期间去除沉积在晶片表面上的氯化物的干蚀刻装置，以及作为抗蚀剂膜，而不必将晶片取出。该干式蚀刻装置设置有蚀刻室，通过闸阀附着到蚀刻室的真空室以及与真空前厅连接的后处理室。该设备被形成为将去除到真空前厅的蚀刻的晶片从其中被送到后处理室，然后将经后处理的晶片再次移至真空前厅，然后从其中移除到大气中。

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