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    • 26. 发明授权
    • Atomic force microscope drying system and atomic force microscope
    • 原子力显微镜干燥系统和原子力显微镜
    • US09442132B2
    • 2016-09-13
    • US14626612
    • 2015-02-19
    • National Tsing Hua University
    • Fan-Gang TsengJoe-Ming Chang
    • G01Q60/24G01Q30/12B82Y35/00
    • G01Q30/12B82Y35/00
    • A drying system, which can be implemented in an atomic force microscopy (AFM) machine according to the invention, includes an elastomer having elasticity and disposed between an AFM scan head device and a platen to form a chamber. A sample supporting substrate is disposed in the chamber and for placement of a specimen. A gas inlet pipeline extends from an outside of the chamber to an inside of the chamber to introduce a drying gas into the chamber. A gas outlet pipeline extends from the inside of the chamber to the outside of the chamber to exhaust the drying gas out of the chamber. Using the mechanism of introducing and exhausting the drying gas can exhaust the moisture out of the chamber, so that the relative humidity (RH) is decreased below 5% and a constant internal pressure is held in the space to become stable.
    • 可以在根据本发明的原子力显微镜(AFM)机器中实施的干燥系统包括弹性体,其具有弹性并且设置在AFM扫描头装置和压板之间以形成室。 样品支撑衬底设置在腔室中并用于放置样品。 气体入口管道从腔室的外部延伸到腔室的内部,以将干燥气体引入腔室。 气体出口管道从腔室的内部延伸到腔室的外部,以将干燥气体排出腔室。 使用引入和排出干燥气体的机构可以将水分从室中排出,使得相对湿度(RH)降低到5%以下,并且在该空间内保持恒定的内部压力以变得稳定。