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    • 32. 发明授权
    • Neuron device
    • 神经元装置
    • US07893483B2
    • 2011-02-22
    • US12043193
    • 2008-03-06
    • Atsuhiro KinoshitaYoshifumi Nishi
    • Atsuhiro KinoshitaYoshifumi Nishi
    • H01L29/788
    • H01L29/7881H01L21/28273H01L27/11521H01L29/42324H01L29/66825H01L29/785
    • A neuron device includes: a semiconductor layer; source and drain regions formed in the semiconductor layer at a distance from each other; a protection film formed on an upper face of the semiconductor layer; a channel region formed in the semiconductor layer between the source region and the drain region; a pair of gate insulating films formed on two side faces of the channel region; a floating gate electrode including: a first portion covered on the gate insulating films and the protection film; a second portion connected to the first portion; and a third portion provided on the substrate so as to connect to the end portion of the second portion on the opposite side from the first portion; an interelectrode insulating film provided on the first to third portions; and a plurality of control gate electrodes provided on the third portion.
    • 神经元装置包括:半导体层; 源极和漏极区域形成在半导体层中彼此间隔一定距离; 形成在所述半导体层的上表面上的保护膜; 在所述源极区域和所述漏极区域之间的所述半导体层中形成的沟道区域; 形成在沟道区域的两个侧面上的一对栅极绝缘膜; 一种浮栅电极,包括:覆盖在栅极绝缘膜和保护膜上的第一部分; 连接到第一部分的第二部分; 以及第三部分,设置在所述基板上,以便在与所述第一部分相反的一侧连接到所述第二部分的端部; 设置在所述第一至第三部分上的电极间绝缘膜; 以及设置在第三部分上的多个控制栅电极。
    • 33. 发明申请
    • NEURON DEVICE
    • 神经元设备
    • US20090250742A1
    • 2009-10-08
    • US12043193
    • 2008-03-06
    • Atsuhiro KINOSHITAYoshifumi Nishi
    • Atsuhiro KINOSHITAYoshifumi Nishi
    • H01L29/788
    • H01L29/7881H01L21/28273H01L27/11521H01L29/42324H01L29/66825H01L29/785
    • A neuron device includes: a semiconductor layer; source and drain regions formed in the semiconductor layer at a distance from each other; a protection film formed on an upper face of the semiconductor layer; a channel region formed in the semiconductor layer between the source region and the drain region; a pair of gate insulating films formed on two side faces of the channel region; a floating gate electrode including: a first portion covered on the gate insulating films and the protection film; a second portion connected to the first portion; and a third portion provided on the substrate so as to connect to the end portion of the second portion on the opposite side from the first portion; an interelectrode insulating film provided on the first to third portions; and a plurality of control gate electrodes provided on the third portion.
    • 神经元装置包括:半导体层; 源极和漏极区域形成在半导体层中彼此间隔一定距离; 形成在所述半导体层的上表面上的保护膜; 在所述源极区域和所述漏极区域之间的所述半导体层中形成的沟道区域; 形成在沟道区域的两个侧面上的一对栅极绝缘膜; 一种浮栅电极,包括:覆盖在栅极绝缘膜和保护膜上的第一部分; 连接到第一部分的第二部分; 以及第三部分,设置在所述基板上,以便在与所述第一部分相反的一侧连接到所述第二部分的端部; 设置在所述第一至第三部分上的电极间绝缘膜; 以及设置在第三部分上的多个控制栅电极。
    • 38. 发明授权
    • Resistance-variable memory device
    • 电阻变量存储器件
    • US09112132B2
    • 2015-08-18
    • US13605746
    • 2012-09-06
    • Takayuki IshikawaYoshifumi NishiDalsuke MatsushitaMasato Koyama
    • Takayuki IshikawaYoshifumi NishiDalsuke MatsushitaMasato Koyama
    • G11C11/00H01L45/00
    • H01L45/04H01L45/1233H01L45/145
    • A memory device includes a first electrode, a second electrode, a third electrode, a first variable resistance layer between the first electrode and the third electrode, and a second variable resistance layer between the second electrode and the third electrode. The first, second, and third electrodes, and the first and second variable resistance layers are formed of materials that cause the first variable resistance layer to transition from a high resistance state to a low resistance state when a voltage is applied across the first and second electrodes and maintain the high resistance state when the voltage is cut off, and cause the second variable resistance layer to transition from a high resistance state to a low resistance state when the voltage is applied across the first and second electrodes and transition from the high resistance state to the low resistance state when the voltage is cut off.
    • 存储器件包括第一电极,第二电极,第三电极,第一电极和第三电极之间的第一可变电阻层,以及在第二电极和第三电极之间的第二可变电阻层。 第一,第二和第三电极以及第一和第二可变电阻层由当第一和第二电极层施加电压时使第一可变电阻层从高电阻状态转变为低电阻状态的材料形成 电极,当电压被切断时保持高电阻状态,并且当电压施加在第一和第二电极两端并从高电阻转变时,使第二可变电阻层从高电阻状态转变到低电阻状态 当电压被切断时,状态为低电阻状态。