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    • 51. 发明申请
    • High sensitivity scanning probe system
    • 高灵敏度扫描探针系统
    • US20050117163A1
    • 2005-06-02
    • US10726276
    • 2003-12-02
    • Tuck NgHui ChuaOsami Sasaki
    • Tuck NgHui ChuaOsami Sasaki
    • G01Q20/02G01Q30/02G01Q60/24G01B9/02
    • G01Q20/02
    • The present invention provides a hybrid optical and interferometric atomic force microscope system (40) for monitoring a cantilever probe (46). A light source (42) provides a light beam which is focussed on the back of the cantilever probe (46). The light reflected off the probe is split into two beams of different path lengths and are recombined to form an interference beam (58). This interference beam (58) is passed through a grating (102) having substantially the same period and orientation as the interference beam pattern. The light transmitted through the grating (102) illuminates a photodetector (122) to give a signal according to the intensity of the light falling on the photodetector. The photodetector output signal is sent to a positioning system (126), which in turn gives a signal to the piezoelectric system (54) so that the probe (46) follows the sample (50) surface. This signal is integrated as a function of position across the scanned area to represent a characteristic of the sample surface. An array of light beams, cantilever probes and photodetectors are also provided, and a plurality of characteristics may be obtained by performing a single scan on the sample surface. Actuators are also provided on the grating (102) and mirrors in the interferometer (60, 60a, 60b) to modulate the fringes of the interference beam (58) and cancel out noise in the microscope system (40).
    • 本发明提供一种用于监测悬臂探头(46)的混合光学和干涉原子力显微镜系统(40)。 光源(42)提供聚焦在悬臂探头(46)背面的光束。 从探头反射的光被分成不同路径长度的两个光束,并且被重组以形成干涉光束(58)。 该干涉光束(58)通过具有与干涉光束图案基本相同的周期和取向的光栅(102)。 透过光栅(102)的光照射光电检测器(122),以根据落在光电检测器上的光的强度给出信号。 光电检测器输出信号被发送到定位系统(126),该定位系统又向压电系统(54)提供信号,使得探头(46)跟随样品(50)表面。 该信号作为穿过扫描区域的位置的函数被积分,以表示样品表面的特征。 还提供了一组光束,悬臂探针和光电检测器,并且可以通过在样品表面上执行单次扫描来获得多个特性。 激光器还设置在光栅(102)和干涉仪(60,60a,60b)中的反射镜上,以调制干涉光束(58)的边缘并消除显微镜系统(40)中的噪声。
    • 52. 发明授权
    • Converting scanning electron microscopes
    • 转换扫描电子显微镜
    • US06891159B2
    • 2005-05-10
    • US10610345
    • 2003-06-30
    • Anjam KhursheedThiam Leong Thong
    • Anjam KhursheedThiam Leong Thong
    • G01N23/00G01Q30/02G21K7/00H01J37/28
    • H01J37/28H01J2237/2802
    • A device for converting a scanning electron microscope (SEM) to a scanning transmission electron microscope (STEM) is adapted to be mounted on a conventional SEM. The device has a casing mountable on the SEM and provides support for a specimen to be scanned by a beam of primary electrons exiting the objective lens of the SEM. The casing defines a pathway allowing transmission electrons that have passed through the specimen to be detected. The device may have a magnet mountable on the casing for generating a transverse magnetic field to deflect the transmission electrons within the casing. A magnetic lens may be mounted within the casing for focusing the beam of primary electrons onto the specimen. The secondary electron detector of the SEM may be used to detect secondary electrons emitted from a target excited by the transmitted electrons. Alternatively, an electron detector may be mounted within the casing for detecting the transmitted electrons.
    • 用于将扫描电子显微镜(SEM)转换成扫描透射电子显微镜(STEM)的装置适于安装在传统的SEM上。 该装置具有可安装在SEM上的壳体,并且通过离开SEM的物镜的一次电子束来扫描样品的支撑。 壳体限定允许透射通过要检测的样品的电子的途径。 该装置可以具有可安装在壳体上的磁体,用于产生横向磁场以使壳体内的透射电子偏转。 磁性透镜可以安装在壳体内,用于将一次电子束聚焦到样品上。 SEM的二次电子检测器可以用于检测从被透射电子激发的靶发射的二次电子。 或者,可以在壳体内安装电子检测器,以检测发射的电子。
    • 53. 发明授权
    • Method and apparatus to correct for stage motion in E-beam inspection
    • 在电子束检查中校正舞台运动的方法和装置
    • US06885000B1
    • 2005-04-26
    • US10702270
    • 2003-11-06
    • David L. Adler
    • David L. Adler
    • G01Q10/00G01Q30/02G01N23/22H01J37/26G01N21/00H01J37/244
    • H01J37/26G01N23/22H01J2237/226H01J2237/2446H01J2237/24495H01J2237/2817
    • One embodiment disclosed relates to an apparatus for inspecting a substrate. The apparatus includes at least an illumination system, a stage, a multiple-pixel detector, an imaging system, a deflector, and a deflector controller. The illumination system is configured to expose at least a portion of the substrate to an incident beam which causes said portion to emit radiation. The stage holds the substrate and moves the substrate relative to the beam during said exposure of the substrate. The imaging system images the emitted radiation onto the multi-pixel detector, which includes an array of detector elements configured to detect the emitted radiation. The deflector is configured to deflect the emitted radiation under control of the deflector controller. The deflection is controlled so as to compensate for the motion of the substrate relative to the beam.
    • 所公开的一个实施例涉及用于检查基板的装置。 该装置至少包括照明系统,舞台,多像素检测器,成像系统,偏转器和偏转器控制器。 照明系统被配置为将衬底的至少一部分暴露于引起所述部分发射辐射的入射光束。 在所述衬底的曝光期间,所述台架保持所述衬底并相对于所述光束移动所述衬底。 成像系统将发射的辐射成像到多像素检测器上,该多像素检测器包括被配置为检测发射的辐射的检测器元件的阵列。 偏转器被配置为在偏转器控制器的控制下偏转发射的辐射。 控制偏转以补偿基板相对于梁的运动。
    • 57. 发明授权
    • Instrument and method for combined surface topography and spectroscopic analysis
    • 组合表面形貌和光谱分析的仪器和方法
    • US06855926B2
    • 2005-02-15
    • US10182168
    • 2001-01-31
    • Richard Edward PalmerKrister SvenssonPeter Georg LaitenbergerFrederic FestyBrian John Eves
    • Richard Edward PalmerKrister SvenssonPeter Georg LaitenbergerFrederic FestyBrian John Eves
    • G01N23/20G01Q30/02G01Q60/10G01Q60/12H01J47/00G01N23/00G21K7/00
    • G01Q60/16G01Q30/02
    • A combined surface topography and spectroscopic analysis instrument comprises a scanning tunnelling microscope tip (12); and a sample carrier (58) which supports a sample (10) so that a surface thereto to be analyzed is presented towards the tip (12). The sample carrier (58) and the tip (12) are relative movable to enable the distance between the tip (12) and the surface to be varied in use and the sample surface to be scanned in two dimensions by the tip (12). An electronic analyzer is positioned to detect electrons from the tip (12) which have been back-scattered off the sample surface. A voltage controller (59) enables selective operation of the tip (12) in a first voltage range in scanning tunnelling mode, to enable spatial resolution imaging of the sample surface, and in a second, higher, voltage range in electron field emission mode whereby to permit the electron analyzer to analyze the back-scattered electrons. The electron analyzer is positioned so as to detect back-scattered electrons travelling at an angle of less than 20° with respect to the sample surface.
    • 组合表面形貌和光谱分析仪器包括扫描隧道显微镜尖端(12); 以及支撑样品(10)的样品载体(58),使得要分析的表面朝向尖端(12)呈现。 样品载体(58)和尖端(12)是可相对移动的,以使尖端(12)和表面之间的距离在使用中变化,并且样品表面将被二尖头(12)扫描。 定位电子分析仪以检测来自尖端(12)的电子,这些电子已从样品表面反向散射。 电压控制器(59)使得能够在扫描隧道模式中的第一电压范围内选择性地操作尖端(12),以便能够进行样品表面的空间分辨率成像,并且在电子场发射模式的第二,更高电压范围内,由此 以允许电子分析仪分析反向散射的电子。 电子分析仪被定位成能够检测相对于样品表面以小于20°的角度行进的反向散射电子。