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1. 发明申请

US20170169987A1 PARALLELIZING ELECTROSTATIC ACCELERATION/DECELERATION OPTICAL ELEMENT 有权
公开(公告)号：US20170169987A1
公开(公告)日：2017-06-15
申请号：US14966227
申请日：2015-12-11
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： William Davis LEE , Frank Sinclair
IPC分类号： H01J37/08
CPC分类号： H01J37/12 , H01J37/05 , H01J37/08 , H01J37/1477 , H01J37/3007 , H01J37/3171 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/04924 , H01J2237/121
摘要： Provided herein are approaches for controlling a charged particle beam using a series of electrodes including a plurality of different shapes. In one approach, an electrostatic optical element includes a first set of electrodes having a first electrode shape for parallelizing and deflecting the charged particle beam using a first set of electrodes having a first electrode shape, such as a concave or convex profile. The electrostatic optical element further includes a second set of electrodes adjacent the first set of electrodes for accelerating or decelerating the charged particle beam along a beamline, wherein the second set of electrodes include a cylindrical shape. In one approach, a power supply is electrically connected to the first and second sets of electrodes, the power supply arranged to enable independent voltage/current control.

2. 发明授权

US09540725B2 Method and apparatus for beam deflection in a gas cluster ion beam system 有权
标题翻译：气体簇离子束系统中光束偏转的方法和装置
公开(公告)号：US09540725B2
公开(公告)日：2017-01-10
申请号：US14696063
申请日：2015-04-24
申请人： TEL Epion Inc.
发明人： Kenneth Regan , Yan Shao , Robert K. Becker , Christopher K. Olsen
IPC分类号： H01L21/425 , C23C14/22 , H01L21/265 , H01L21/263 , H01L21/02 , H01L21/285 , H01J37/08 , H01J37/147 , H01J37/317 , C23C14/10
CPC分类号： C23C14/221 , C23C14/10 , H01J37/08 , H01J37/1477 , H01J37/317 , H01J37/3171 , H01J2237/0812 , H01L21/02271 , H01L21/0262 , H01L21/2633 , H01L21/26566 , H01L21/28556
摘要： Provided is a method of controlling a gas cluster ion beam (GCIB) system for processing structures on a substrate. A GCIB system comprises deflection plates for directing a GCIB towards a substrate, the GCIB system coupled to a substrate scanning device configured to move a substrate in three dimensions. The substrate is exposed to the GCIB while the substrate is being moved by the substrate scanning device. A controller is used to control a set of deflection operating parameters comprising a deflection angle φ, voltage differential of the deflection plates, frequency of the deflection plate power, beam current, substrate distance, pressure in the nozzle, gas flow rate in the process chamber, separation of beam burns, duration of the bean burn, and/or duty cycle of the beam deflector output.
摘要翻译：提供了一种控制用于处理衬底上的结构的气体簇离子束（GCIB）系统的方法。 GCIB系统包括用于将GCIB引向衬底的偏转板，GCIB系统耦合到被配置成在三维中移动衬底的衬底扫描装置。当衬底被衬底扫描装置移动时，衬底暴露于GCIB。控制器用于控制一组偏转操作参数，包括偏转角φ，偏转板的电压差，偏转板功率的频率，光束电流，衬底距离，喷嘴中的压力，处理室中的气体流速，光束灼伤分离，豆烧的持续时间和/或光束偏转器输出的占空比。

3. 发明申请

US20130092826A1 Pattern Modification Schemes for Improved FIB Patterning 有权
标题翻译：用于改进FIB图案化的图案修改方案
公开(公告)号：US20130092826A1
公开(公告)日：2013-04-18
申请号：US13655129
申请日：2012-10-18
申请人： FEI Company
发明人： Tom Miller , Gene Mirro , Cornelis Sander Kooijman , Hendrik Jan de Vos
IPC分类号： H01J3/26
CPC分类号： H01J3/26 , H01J37/1472 , H01J37/1477 , H01J37/3026 , H01J2237/1504 , H01J2237/1518 , H01J2237/1526 , H01J2237/30416 , H01J2237/3045 , H01J2237/30461
摘要： An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.
摘要翻译：引导带电粒子束的改进方法，其补偿带电粒子通过改变一个或多个偏转器信号而穿过系统所需的时间。根据本发明的一个实施例，在数模（D / A）转换之前，将数字滤波器应用于扫描图案，以便减少或消除可能由TOF误差引起的过拍影响。在其他实施例中，也可以使用模拟滤波器或具有较低带宽的信号放大器的使用来补偿TOF误差。通过改变扫描图案，可以显着减少或消除超拍效果。

4. 发明申请

US20110068276A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20110068276A1
公开(公告)日：2011-03-24
申请号：US12885380
申请日：2010-09-17
申请人： Pieter Kruit , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Aernout Christiaan Zonnevylle
IPC分类号： G21K1/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/1477 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205
摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet centre line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet centre line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.
摘要翻译：本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜从其小透镜光轴。

5. 发明申请

US20110049382A1 PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING 有权
标题翻译：改进FIB图案的图案修改方案
公开(公告)号：US20110049382A1
公开(公告)日：2011-03-03
申请号：US12870816
申请日：2010-08-28
申请人： Tom Miller , Gene Mirro , Cornelis Sander Kooijman , Hendrik Jan De Vos
发明人： Tom Miller , Gene Mirro , Cornelis Sander Kooijman , Hendrik Jan De Vos
IPC分类号： H01J3/14
CPC分类号： H01J3/26 , H01J37/1472 , H01J37/1477 , H01J37/3026 , H01J2237/1504 , H01J2237/1518 , H01J2237/1526 , H01J2237/30416 , H01J2237/3045 , H01J2237/30461
摘要： An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.
摘要翻译：引导带电粒子束的改进方法，其补偿带电粒子通过改变一个或多个偏转器信号而穿过系统所需的时间。根据本发明的一个实施例，在数模（D / A）转换之前，将数字滤波器应用于扫描图案，以便减少或消除可能由TOF误差引起的过拍影响。在其他实施例中，也可以使用模拟滤波器或具有较低带宽的信号放大器的使用来补偿TOF误差。通过改变扫描图案，可以显着减少或消除超拍效果。

6. 发明授权

US07868305B2 Technique for ion beam angle spread control 有权
标题翻译：离子束角扩散控制技术
公开(公告)号：US07868305B2
公开(公告)日：2011-01-11
申请号：US11145949
申请日：2005-06-07
申请人： Atul Gupta , Joseph C. Olson
发明人： Atul Gupta , Joseph C. Olson
IPC分类号： H01J37/302
CPC分类号： H01J37/304 , H01J37/1477 , H01J37/3171 , H01J2237/1507 , H01J2237/3045 , H01J2237/30455 , H01J2237/30472 , H01J2237/31703 , H01L21/26586
摘要： A technique for ion beam angle spread control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread control. The method may comprise directing one or more ion beams at a substrate surface at two or more different incident angles, thereby exposing the substrate surface to a controlled spread of ion beam incident angles.
摘要翻译：公开了一种用于离子束角度扩展控制的技术。在一个特定的示例性实施例中，该技术可以被实现为用于离子束角度扩展控制的方法。该方法可以包括以两个或更多个不同的入射角度在衬底表面处引导一个或多个离子束，从而将衬底表面暴露于受控的离子束入射角扩散。

7. 发明申请

US20100248166A1 Deflector Array, Exposure Apparatus, and Device Manufacturing Method 有权
标题翻译：偏转器阵列，曝光装置和装置制造方法
公开(公告)号：US20100248166A1
公开(公告)日：2010-09-30
申请号：US12815507
申请日：2010-06-15
申请人： Kenichi Nagae , Masatoshi Kanamaru
发明人： Kenichi Nagae , Masatoshi Kanamaru
IPC分类号： H01J37/147 , H01J37/30 , G03F7/20
CPC分类号： H01J37/1477 , B82Y10/00 , B82Y40/00 , H01J37/30 , H01J37/3174 , H01J2237/0437 , H01J2237/1518
摘要： A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the substrate, and each of the plurality of deflectors includes a pair of electrodes that oppose each other through the opening and are configured to deflect a single charged particle beam. The plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors that are located nearest to each other. The plurality of deflectors is arrayed to form a checkerboard lattice, and two openings of the two of the plurality of deflectors overlap in the longitudinal direction.
摘要翻译：偏转器阵列包括多个偏转器，其偏转排列在基板上的带电粒子束。多个偏转器中的每一个包括形成在基板中的单个开口，并且多个偏转器中的每一个包括通过开口彼此相对的一对电极，并且被配置为偏转单个带电粒子束。多个偏转器被排列成使得一对电极在其纵向方向上的长度不小于彼此最靠近的多个偏转器中的两个偏转器的中心之间的距离。排列多个偏转器以形成棋盘格格，并且多个偏转器中的两个的两个开口在纵向方向上重叠。

8. 发明授权

US07569841B2 Deflection signal compensation for charged particle beam 有权
标题翻译：带电粒子束偏转信号补偿
公开(公告)号：US07569841B2
公开(公告)日：2009-08-04
申请号：US11433048
申请日：2006-05-12
申请人： Raymond Hill , Steve Ake Rosenberg , Daniel B. Downer
发明人： Raymond Hill , Steve Ake Rosenberg , Daniel B. Downer
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/1474 , H01J37/1477 , H01J37/28 , H01J37/302 , H01J37/304 , H01J37/3056 , H01J2237/1516 , H01J2237/30461 , H01J2237/30483
摘要： Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals to the multiple stages of a deflection system, the number of misdirected particles during a pixel change is reduced.
摘要翻译：当光束重新定位时通过偏转系统运送的带电粒子没有被接收到正确的偏转力并被误导。通过将信号独立地应用于偏转系统的多个阶段，减少了像素变化期间的误导粒子的数量。

9. 发明申请

US20090140161A1 Electrostatic deflector 有权
标题翻译：静电导流板
公开(公告)号：US20090140161A1
公开(公告)日：2009-06-04
申请号：US12216371
申请日：2008-07-02
申请人： Takashi Kametani , Masahiro Inoue
发明人： Takashi Kametani , Masahiro Inoue
IPC分类号： G21K1/08
CPC分类号： H01J37/147 , H01J37/1477 , H01J2209/00
摘要： An electrostatic deflector that can be manufactured easily and very accurately without using a member for positioning is provided. After multiple slits 81d to 88d have been formed in the same direction as that of the bus bar of an approximately conical electrode material 100 whose large-diameter section is formed with flange portions 81a to 88a for installation on an insulator 90, each of the flange portions is coupled with the insulator 90, then the electrode material 100 is cut along extension lines of the slits 81d to 88d, and thus, multiple electrode members electrically isolated from one another are formed.
摘要翻译：提供了一种可以容易且非常准确地制造而不使用用于定位的构件的静电偏转器。在多个狭缝81d至88d已经形成在与形成有大直径部分的大致圆锥形的电极材料100的母线相同的方向上，凸缘部分81a至88a用于安装在绝缘体90上，每个凸缘部分与绝缘体90连接，然后沿着狭缝81d至88d的延长线切割电极材料100，从而形成彼此电隔离的多个电极部件。

10. 发明申请

US20090121149A1 TECHNIQUES FOR SHAPING AN ION BEAM 审中-公开
标题翻译：形成离子束的技术
公开(公告)号：US20090121149A1
公开(公告)日：2009-05-14
申请号：US11937849
申请日：2007-11-09
申请人： Svetlana Radovanov , Frank Sinclair , Peter L. Kellerman , Victor M. Benveniste , Robert Lindberg
发明人： Svetlana Radovanov , Frank Sinclair , Peter L. Kellerman , Victor M. Benveniste , Robert Lindberg
IPC分类号： H01J3/18
CPC分类号： H01J37/1477 , H01J37/12 , H01J37/1475 , H01J37/3171 , H01J2237/083 , H01J2237/0835 , H01J2237/24542 , H01J2237/31701
摘要： Techniques for shaping an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for shaping an ion beam. The apparatus may comprise an entrance electrode biased at a first voltage potential, wherein an ion beam enters the entrance electrode, an exit electrode biased at a second voltage potential, wherein the ion beam exits the exit electrode, and a first suppression electrode and a second suppression electrode positioned between the entrance electrode and the exit electrode, wherein the first suppression electrode and the second suppression electrode are independently biased to variably focus the ion beam.
摘要翻译：公开了用于成形离子束的技术。在一个特定的示例性实施例中，可以将技术实现为用于成形离子束的装置。该装置可以包括偏置在第一电压电位的入口电极，其中离子束进入入口电极，偏置在第二电压电位的出射电极，其中离子束离开出射电极，并且第一抑制电极和第二抑制电极位于所述入射电极和所述出射电极之间的抑制电极，其中所述第一抑制电极和所述第二抑制电极被独立地偏置以可变地聚焦所述离子束。

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