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51. 发明授权

US09564302B2 Contamination filter for mass spectrometer 有权
标题翻译：质谱仪污染过滤器
公开(公告)号：US09564302B2
公开(公告)日：2017-02-07
申请号：US14894494
申请日：2014-06-20
申请人： DH TECHNOLOGIES DEVELOPMENT PTE. LTD.
发明人： Thomas R. Covey , Bradley B. Schneider
IPC分类号： H01J37/00 , B01D15/34 , G01N27/62 , H01J49/00 , H01J49/14 , H01J49/16
CPC分类号： G01N27/624 , H01J49/0031 , H01J49/004 , H01J49/0422 , H01J49/145 , H01J49/165
摘要： Methods and systems for performing mass spectrometry are provided herein. In accordance with various aspects of the applicants' teachings, the methods and systems can utilize an ion mobility spectrometer operating at atmospheric or low-vacuum pressure to remove the major contributors to the contamination and degradation of critical downstream components of a mass spectrometer located within a high-vacuum system (e.g., ion optics, mass filters, detectors), with limited signal loss.
摘要翻译：本文提供了用于进行质谱分析的方法和系统。根据申请人的教导的各个方面，所述方法和系统可以利用在大气压或低真空压力下操作的离子迁移谱仪来除去主要贡献者对位于一个或多个内部的质谱仪的关键下游组分的污染和降解高真空系统（例如离子光学，质量过滤器，检测器），信号损失有限。

52. 发明授权

US09564286B2 Method of forming thin film of semiconductor device 有权
标题翻译：形成半导体器件薄膜的方法
公开(公告)号：US09564286B2
公开(公告)日：2017-02-07
申请号：US14459644
申请日：2014-08-14
申请人： Samsung Electronics Co., Ltd.
发明人： Sam Hyung Sam Kim , Andrei Teodor Iancu , Friedrich B. Prinz , Michael C. Langston , Peter Schindler , Ki-Hyun Kim , Stephen P. Walch , Takane Usui
IPC分类号： B05D3/06 , H01J37/00 , H01J37/32 , C23C16/455 , H01L21/768
CPC分类号： H01J37/00 , C23C16/45536 , H01J37/321 , H01J37/32183 , H01J37/32339 , H01J37/32357 , H01L21/02274 , H01L21/02277 , H01L21/0228 , H01L21/76224 , H01L21/76831 , H01L21/76898
摘要： Provided is a method of forming a thin film of a semiconductor device. The method includes forming a precursor layer on a surface of a substrate by supplying a precursor gas into a chamber, discharging the precursor gas remaining in the chamber to an outside of the chamber by supplying a purge gas into the chamber, supplying a reactant gas into the chamber, generating plasma based on the reactant gas, forming a thin film by a chemical reaction between plasma and the precursor layer and radiating extreme ultraviolet (EUV) light into the chamber, and discharging the reactant gas and the plasma remaining in the chamber by supplying a purge gas into the chamber.
摘要翻译：提供了形成半导体器件的薄膜的方法。该方法包括通过将前体气体供应到室中在基板的表面上形成前体层，通过向室内供给吹扫气体将残留在室中的前体气体排出到室中，将反应气体供应到该腔室基于反应气体产生等离子体，通过等离子体和前体层之间的化学反应形成薄膜，并将极紫外（EUV）光放射到室中，并通过以下步骤排出反应气体和留在腔室中的等离子体将净化气体供应到室中。

53. 发明授权

US09557253B2 Electron microscopic observation method for observing biological sample in shape as it is, and composition for evaporation suppression under vacuum, scanning electron microscope, and transmission electron microscope used in the method 有权
标题翻译：用于观察生物样品形状的电子显微镜观察方法，以及该方法中使用的真空蒸发抑制组合物，扫描电子显微镜和透射电子显微镜
公开(公告)号：US09557253B2
公开(公告)日：2017-01-31
申请号：US14343537
申请日：2012-09-07
申请人： Takahiko Hariyama , Yasuharu Takaku , Hiroshi Suzuki , Yoshinori Muranaka , Isao Ohta , Masatsugu Shimomura , Daisuke Ishii
发明人： Takahiko Hariyama , Yasuharu Takaku , Hiroshi Suzuki , Yoshinori Muranaka , Isao Ohta , Masatsugu Shimomura , Daisuke Ishii
IPC分类号： H01J37/00 , G01N1/44 , G01N23/225 , G01N23/04 , H01J37/20 , G01N1/28
CPC分类号： G01N1/44 , G01N1/2853 , G01N23/04 , G01N23/225 , G01N23/2252 , G01N2223/612 , H01J37/20 , H01J2237/2002 , H01J2237/2004
摘要： Provided is an observation method by an electron microscope, in which a biological sample can be observed as it is alive and a situation that the biological sample is moving can be observed using an electron microscope, and a composition for evaporation suppression under vacuum, a scanning electron microscope, and a transmission electron microscope used in the method.The sample observation method by an electron microscope according to the invention includes applying a composition for evaporation suppression containing at least one kind selected from an amphiphilic compound, oils and fats, and an ionic liquid to the surface of a sample to form a thin film, and covering the sample with the thin film, and displaying an electron microscopic image of the sample, which is covered with the thin film and accommodated in a sample chamber under vacuum, on a display device.
摘要翻译：通过根据本发明的电子显微镜的样品观察方法包括将包含选自两亲性化合物，油和脂肪中的至少一种的蒸发抑制组合物和离子液体施加到样品的表面以形成薄膜，并用薄膜覆盖样品，并在显示装置上显示被薄膜覆盖并在真空下容纳在样品室中的样品的电子显微镜图像。

54. 发明授权

US09536699B2 Charged particle beam system and method of operating a charged particle beam system 有权
标题翻译：带电粒子束系统和操作带电粒子束系统的方法
公开(公告)号：US09536699B2
公开(公告)日：2017-01-03
申请号：US14314317
申请日：2014-06-25
申请人： Carl Zeiss Microscopy, LLC
发明人： John A. Notte, IV , Weijie Huang , Raymond Hill , FHM-Faridur Rahman , Alexander Groholski , Shawn McVey
IPC分类号： H01J37/00 , H01J37/08 , G21K5/04 , H01J27/26 , H01J37/18
CPC分类号： H01J37/18 , G21K5/04 , H01J27/26 , H01J37/08 , H01J2237/002 , H01J2237/0216 , H01J2237/032 , H01J2237/0653 , H01J2237/0807 , H01J2237/1501 , H01J2237/1502 , H01J2237/1825 , H01J2237/188 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/20235
摘要： The present disclosure relates to a gas field ion source having a gun housing, an electrically conductive gun can base attached to the gun housing, an inner tube mounted to the gun can base, the inner tube being made of an electrically isolating ceramic, an electrically conductive tip attached to the inner tube, an outer tube mounted to the gun can base, the outer tube being made of an electrically isolating ceramic, and an extractor electrode attached to the outer tube. The extractor electrode can have an opening for the passage of ions generated in proximity to the electrically conductive tip.
摘要翻译：本发明涉及一种具有枪壳体的气体离子源，连接到枪壳体的导电枪壳底座，安装在枪壳底座上的内管，内管由电隔离陶瓷制成，连接到内管的导电尖端，安装到枪罐底座的外管，外管由电绝缘陶瓷制成，以及附接到外管的提取器电极。提取器电极可以具有用于通过在导电末端附近产生的离子的开口。

55. 发明授权

US09524853B2 Ion implantation machine presenting increased productivity 有权
标题翻译：离子注入机提高了生产效率
公开(公告)号：US09524853B2
公开(公告)日：2016-12-20
申请号：US14783296
申请日：2014-04-09
申请人： ION BEAM SERVICES
发明人： Frank Torregrosa , Laurent Roux
IPC分类号： H01J37/00 , H01J37/317 , C23C14/48 , C23C14/50 , H01J37/32 , H01J37/08 , H01J37/20
CPC分类号： H01J37/3171 , C23C14/48 , C23C14/50 , H01J37/08 , H01J37/20 , H01J37/32412 , H01J37/32541 , H01J37/32568 , H01J37/32715
摘要： The present invention relates to an ion implantation machine 100 that comprises: an enclosure 101 that is connected to a pump device 102; a plasma source 115-121-122; a bias power supply 113; a gas inlet 117 leading into the enclosure; and a substrate-carrier 104 connected to the negative pole of the bias power supply and arranged inside the enclosure. The machine is remarkable in that: the substrate-carrier 104 consists in at least two parallel plates 105-106; a reference electrode consists in at least one strip 110, this reference electrode being connected to the positive pole of the bias power supply; and the strip is interposed between the two plates.

56. 发明授权

US09508528B2 Method for correcting drift of accelerating voltage, method for correcting drift of charged particle beam, and charged particle beam writing apparatus 有权
标题翻译：用于校正加速电压漂移的方法，用于校正带电粒子束漂移的方法和带电粒子束写入装置
公开(公告)号：US09508528B2
公开(公告)日：2016-11-29
申请号：US14838848
申请日：2015-08-28
申请人： NuFlare Technology, Inc.
发明人： Hironori Mizoguchi
IPC分类号： H01J37/00 , H01J37/317 , H01J37/21 , H01J37/24 , H01J37/28 , H01J37/304
CPC分类号： H01J37/3174 , H01J37/21 , H01J37/241 , H01J37/28 , H01J37/304 , H01J2237/3045 , H01J2237/30461 , H01J2237/31776
摘要： A method for correcting a drift of an accelerating voltage includes measuring, after a position of a focus of a charged particle beam has been adjusted based on a first adjustment value and a predetermined time period has passed, a second adjustment value when the position of the focus of the charged particle beam is newly adjusted, calculating a deviation amount between the first adjustment value and the second adjustment value, calculating, using a correlation stored in a storage device, a correction value of an accelerating voltage to be applied to a beam source which emits the charged particle beam, where the correction value corresponds to the deviation amount, and correcting the accelerating voltage to be applied to the beam source, by using the correlation value.
摘要翻译：一种用于校正加速电压的漂移的方法包括：在基于第一调整值和预定时间段已经调整带电粒子束的焦点的位置之后，测量第二调整值，当位置重新调整带电粒子束的焦点，计算第一调整值和第二调整值之间的偏差量，使用存储在存储装置中的相关性来计算要施加到光束源的加速电压的校正值其发射带电粒子束，其中校正值对应于偏差量，并且通过使用相关值来校正要施加到束源的加速电压。

57. 发明授权

US09496116B2 Method for measuring a distance of a component from an object and for setting a position of a component in a particle beam device 有权
标题翻译：用于测量部件与物体的距离和用于设定粒子束装置中的部件的位置的方法
公开(公告)号：US09496116B2
公开(公告)日：2016-11-15
申请号：US14874969
申请日：2015-10-05
申请人： Carl Zeiss Microscopy GmbH
发明人： Holger Doemer , Andreas Schmaunz
IPC分类号： H01J37/00 , H01J37/02 , H01J37/28
CPC分类号： H01J37/023 , H01J37/28 , H01J2237/006 , H01J2237/10 , H01J2237/2007 , H01J2237/2801
摘要： The system described herein determines a distance of a component of a particle beam device from an object to the particle beam device and sets a position of the component in the particle beam device. The component is moved from a first starting position of the component relatively in the direction of an object, which is located in a second starting position, until the component makes contact with the object. When the component makes contact with the object, an adjusting path covered by the component and/or the object during the movement is determined. The adjusting path runs along a straight line that joins a first point on the component in the first starting position to a second point on the object in the second starting position that is arranged closest to the first point on the component along this line. The adjusting path corresponds to the distance.
摘要翻译：本文描述的系统确定粒子束装置的部件从物体到粒子束装置的距离，并且设置粒子束装置中部件的位置。组件相对于位于第二起始位置的物体的方向相对地从组件的第一起始位置移动，直到部件与物体接触。当组件与对象接触时，确定在移动期间被组件和/或对象覆盖的调整路径。调整路径沿着将第一起始位置中的部件上的第一点连接到物体上的第二起始位置的直线延伸，该第二起始位置最靠近沿该线路的部件上的第一点布置。调整路径对应于距离。

58. 发明授权

US09484182B2 Charged-particle-beam device and method for correcting aberration 有权
标题翻译：带电粒子束装置和校正像差的方法
公开(公告)号：US09484182B2
公开(公告)日：2016-11-01
申请号：US14422423
申请日：2013-08-07
申请人： Hitachi High-Technologies Corporation
发明人： Hisanao Akima , Takaho Yoshida
IPC分类号： H01J37/00 , H01J37/153 , H01J37/26 , H01J37/10
CPC分类号： H01J37/153 , H01J37/10 , H01J37/26 , H01J37/28 , H01J2237/1532 , H01J2237/1534 , H01J2237/216 , H01J2237/2614
摘要： The present invention provides a method and apparatus for correcting an aberration in a charged-particle-beam device. The apparatus includes a charged-particle-beam source, a charged-particle optical system that irradiates a specimen with charged particles emitted from the charged-particle-beam source, an aberration corrector that corrects an aberration of the charged-particle optical system, a control unit that controls the charged-particle optical system and the aberration corrector, a through-focus imaging unit that obtains plural Ronchigrams in which a focal position of the charged-particle optical system is changed, and an aberration calculation unit that divides the obtained Ronchigram into plural local areas, and calculates the amount of the aberration based on line focuses detected in the local areas.
摘要翻译：本发明提供了一种用于校正带电粒子束装置中的像差的方法和装置。该装置包括带电粒子束源，从带电粒子束源发射的带电粒子照射样本的带电粒子光学系统，校正带电粒子光学系统的像差的像差校正器，控制所述带电粒子光学系统的控制单元和所述像差校正器，获得所述带电粒子光学系统的焦点位置被改变的多个Ronchigram的通过焦点摄像单元，以及将获得的Ronchigram 进入多个局部区域，并且基于在局部区域中检测到的线焦点来计算像差量。

59. 发明授权

US09460889B2 Charged particle microscope device and image capturing method 有权
标题翻译：带电粒子显微镜装置及摄像方法
公开(公告)号：US09460889B2
公开(公告)日：2016-10-04
申请号：US14110758
申请日：2012-04-11
申请人： Kenji Nakahira , Atsushi Miyamoto
发明人： Kenji Nakahira , Atsushi Miyamoto
IPC分类号： H01J37/00 , H01J37/26 , H01J37/244 , H01J37/28
CPC分类号： H01J37/26 , H01J37/244 , H01J37/28 , H01J2237/221 , H01J2237/24495 , H01J2237/2809
摘要： A specimen image capture method using a charged particle microscope device includes: a first image acquisition step in which the gain of a detector in a charged particle microscope is set to a first gain value, charged particle beam scanning is carried out on a specimen, and a first image is obtained; a second image acquisition step in which the gain of the detector is set to a second gain value, which is different to the first gain value, charged particle beam scanning is carried out on the specimen, and a second image is obtained; and an image combination step in which the first gain value and the second gain value are used and the first image and the second image are combined.
摘要翻译：使用带电粒子显微镜装置的标本图像捕获方法包括：第一图像获取步骤，其中将带电粒子显微镜中的检测器的增益设置为第一增益值，对样本进行带电粒子束扫描，获得第一个图像; 第二图像获取步骤，其中检测器的增益被设置为与第一增益值不同的第二增益值，对样本进行带电粒子束扫描，并获得第二图像; 以及其中使用第一增益值和第二增益值并且组合第一图像和第二图像的图像组合步骤。

60. 发明授权

US09406481B2 Transmission electron microscope micro-grid 有权
标题翻译：透射电子显微镜微格
公开(公告)号：US09406481B2
公开(公告)日：2016-08-02
申请号：US14738952
申请日：2015-06-15
申请人： Tsinghua University , HON HAI PRECISION INDUSTRY CO., LTD.
发明人： Yang Wei , Xiao-Yang Lin , Shou-Shan Fan
IPC分类号： H01J37/00 , H01J37/20 , H01J37/26 , B82Y30/00
CPC分类号： H01J37/20 , B82Y30/00 , H01J37/26 , H01J2237/0216 , Y10S977/742
摘要： A transmission electron microscope micro-grid includes a carbon nanotube layer sandwiched between a first metal layer and a second metal layer. The carbon nanotube layer includes a first surface and a second surface opposite to each other, and the carbon nanotube layer comprises a number of carbon nanotubes. The first metal layer is attached on the first surface. The second metal layer is attached on the second surface. The first metal layer and the second metal layer are bonded with the carbon nanotube layer via a number of dangling bonds on the number of carbon nanotubes, the first metal layer defines a number of first through holes, the second metal layer defines a number of second through holes, and the carbon nanotube layer is exposed through the number of first through holes and the number of second through holes.
摘要翻译：透射电子显微镜微格栅包括夹在第一金属层和第二金属层之间的碳纳米管层。碳纳米管层包括彼此相对的第一表面和第二表面，并且碳纳米管层包含多个碳纳米管。第一金属层附着在第一表面上。第二金属层附着在第二表面上。第一金属层和第二金属层通过多个碳纳米管的悬挂键与碳纳米管层接合，第一金属层限定多个第一通孔，第二金属层限定多个第二金属层通孔，并且碳纳米管层通过多个第一通孔和第二通孔的数量而暴露。

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