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    • 71. 发明授权
    • Coating and developing system control method of controlling coating and developing system
    • 涂料开发系统控制方法
    • US08377501B2
    • 2013-02-19
    • US12438031
    • 2007-09-11
    • Yasushi HayashidaYoshitaka HaraTomohiro Kaneko
    • Yasushi HayashidaYoshitaka HaraTomohiro Kaneko
    • C23C16/52C23C14/54
    • H01L21/67745H01L21/67178H01L21/67276
    • A coating and developing system and control method is provided. The system and control method curtails the amount of time for which a substrate is held with no purpose while improving the throughput of the coating and developing system. An inspection station through which a substrate processed in a processing station is transferred to a carrier station includes a plurality of different inspection modules respectively taking different inspection times, a buffer unit for temporarily holding a substrate and a substrate carrying means controlled by a controller. When the inspection module is engaged in inspecting a substrate, the substrate carrying means carries another substrate to be inspected by the same inspection module to the buffer unit and the substrate is held in the buffer unit. Thus, the holding of wafers in the inspection modules can be suppressed and the throughput can be improved.
    • 提供涂层和显影系统和控制方法。 该系统和控制方法在提高涂层和显影系统的生产量的同时,无需目的地限制基材保持的时间。 将在处理站中处理的基板通过其传送到承载站的检查站包括分别采取不同检查时间的多个不同检查模块,用于临时保持基板的缓冲单元和由控制器控制的基板承载装置。 当检查模块接合检查基板时,基板承载装置将待检查的另一基板由相同的检查模块携带到缓冲单元,并且基板保持在缓冲单元中。 因此,可以抑制检查模块中的晶片的保持,并且可以提高生产量。
    • 73. 发明授权
    • Coating and developing system, coating and developing method and storage medium
    • 涂层和显影系统,涂层和显影方法和存储介质
    • US08025023B2
    • 2011-09-27
    • US11826438
    • 2007-07-16
    • Yasushi HayashidaYoshitaka Hara
    • Yasushi HayashidaYoshitaka Hara
    • B05B7/00
    • H01L21/67276G02F1/1303G05B19/41865G05B2219/31428G05B2219/32097G05B2219/45031H01L21/67745Y02P90/20
    • Wafers A1 to A10 of a first lot A and wafers B1 to B10 of a second lot B are processed by a second heating unit at different temperatures, respectively. A wafer W is carried in a processing block included in coating and developing system along a route passing a temperature control unit CPL2, a coating unit BCT, a heating unit LHP2, a temperature control unit CPL3, a coating unit COT, a heating unit LHP3, and a cooling unit COL in that order. The process temperature of the heating unit LHP3 is changed after the last wafer A10 of the first lot A has been processed by the heating unit LHP3. The wafers of the second lot B are carried according to a carrying schedule such that carrying cycles succeeding a carrying cycle in which the first substrate B1 of the second lot B is carried to the second temperature conditioning unit CPL3 carry the substrates B of the second lot B succeeding the first substrate B1 and processed by a heating process by the heating unit LHP2 in due order to a buffer unit BF2, and the wafers B held in the buffer unit BF2 are carried in due order to the downstream modules after the process temperature of the heating unit LHP3 has been changed.
    • 第一批次A的晶片A1至A10和第二批次B的晶片B1至B10分别由不同温度的第二加热单元处理。 沿着通过温度控制单元CPL2,涂布单元BCT,加热单元LHP2,温度控制单元CPL3,涂布单元COT,加热单元LHP3的路线,在包括在涂布显影系统中的处理块中承载晶片W. ,以及冷却单元COL。 在第一批次A的最后一个晶片A10已被加热单元LHP3处理之后,加热单元LHP3的处理温度改变。 第二批次B的晶片根据携带时间表进行,使得在第二批次B的第一基板B1被承载到第二温度调节单元CPL3的承载循环之后的承载循环携带第二批次的基板B B在第一衬底B1之后,并且通过加热单元LHP2按照缓冲单元BF2进行加热处理,并且保持在缓冲单元BF2中的晶片B在处理温度为 加热单元LHP3已被改变。
    • 74. 发明申请
    • WET PROCESSING APPARATUS, WET PROCESSING METHOD AND STORAGE MEDIUM
    • 湿处理设备,湿处理方法和储存介质
    • US20110217473A1
    • 2011-09-08
    • US13037624
    • 2011-03-01
    • Naofumi KISHITAKouji FujimuraYoshitaka Hara
    • Naofumi KISHITAKouji FujimuraYoshitaka Hara
    • B05D1/30B05C11/00B05D1/00
    • B05D1/02B05C11/00B05D1/00B05D1/30
    • A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatus operates in a normal mode, a substrate carrying mechanism is controlled so as to deliver substrates alternately to processing units of a first group and those of a second group so that the substrates are processed sequentially in order. When the processing units of the first group (the second group) are unserviceable due to the inoperativeness of the substrate holders, a processing liquid supply system or a nozzle support mechanism, the nozzle unit for the processing units of the second group (the first group) is moved to process substrates by the serviceable ones of the first group (the second group).
    • 用于湿处理基板的湿式处理装置可以抑制当其一部分成为不可用时的吞吐量的降低。 湿式处理装置包括第一喷嘴单元和第二喷嘴单元。 当湿法处理装置以正常模式操作时,控制基板承载机构以将基板交替地传送到第一组和第二组的处理单元,使得依次顺序地处理基板。 当第一组(第二组)的处理单元由于基板保持器的不能操作而不能使用时,处理液体供应系统或喷嘴支撑机构,用于第二组(第一组)的处理单元的喷嘴单元 )被移动到由第一组(第二组)中可用的基板处理衬底。
    • 77. 发明授权
    • Substrate processing system and substrate processing method
    • 基板加工系统和基板加工方法
    • US07880859B2
    • 2011-02-01
    • US12621252
    • 2009-11-18
    • Yasushi HayashidaShinichi HayashiYoshitaka Hara
    • Yasushi HayashidaShinichi HayashiYoshitaka Hara
    • H01L21/20
    • H01L21/67276H01L21/67288Y10S414/135
    • A substrate processing system processes a plurality of substrates in a single-substrate processing mode by a plurality of processes and provided with a plurality of modules respectively for carrying out processes. When a defect is found in a substrate, a defective processing unit that caused the defect can be easily found out. The substrate processing system and a substrate processing method to be carried out by the substrate processing system can suppress the reduction of throughput when a large number of substrates are to be processed. The substrate processing system is provided with a plurality of modules for processing a plurality of substrates (W) in a single-substrate processing mode by a plurality of processes and includes a substrate carrying means (A4) for carrying a substrate (W) from a sending module to a receiving module, and a control means (6) for controlling the substrate carrying means (A4) on the basis of one of at least two carrying modes each assigning receiving modules to sending modules. The control means (6) changes the carrying mode in effect for the other carrying mode upon the reception of a carrying mode change command while substrates are being processed and makes the substrate carrying means (A4) carry substrates in the carrying mode newly brought into effect.
    • 基板处理系统通过多个处理以单基板处理模式处理多个基板,并且分别具有用于执行处理的多个模块。 当在基板中发现缺陷时,可以容易地发现引起缺陷的缺陷处理单元。 基板处理系统和由基板处理系统执行的基板处理方法可以抑制当要处理大量基板时的吞吐量的降低。 基板处理系统设置有多个模块,用于通过多个处理以单基板处理模式来处理多个基板(W),并且包括用于承载基板(W)的基板承载装置(A4) 发送模块到接收模块,以及控制装置(6),用于基于至少两种携带模式中的一种来控制基板承载装置(A4),每个模式分配接收模块到发送模块。 控制装置(6)在基板被处理时接收到承载模式改变命令时改变其他承载模式的承载模式,并使基板承载装置(A4)在新生效的承载模式中承载基板 。
    • 78. 发明申请
    • WIRELESS COMMUNICATION SYSTEM AND COMMUNICATION CONTROL METHOD
    • 无线通信系统和通信控制方法
    • US20090196203A1
    • 2009-08-06
    • US12303371
    • 2007-07-05
    • Akinori TairaYasunori KatouYoshitaka Hara
    • Akinori TairaYasunori KatouYoshitaka Hara
    • H04J3/00H04L27/28
    • H04W52/42H04B7/0617H04L1/0003H04L1/0009H04L1/1607H04L1/1829H04W16/02H04W16/28H04W72/1273
    • The present invention relates to a wireless communication system that performs data communication using a spatial multiplex transmission scheme. A mobile station includes a transmission weight calculating unit that calculates a transmission weight and a beam information notifying signal generating unit that transmits a known signal for generating partial space information at a base station side. A base station includes a scheduling unit (DL spatial scheduling unit (17), UL spatial scheduling unit (18), and beam information notifying signal response vector estimating unit (20)) that generates the partial space information based on a received first known signal, and performs downstream scheduling and upstream scheduling based on the partial space information, and a scheduling result transmitting unit (UL control information generating unit (14) and transmission weight calculating unit (19)) that transmits a packet including an upstream scheduling result.
    • 无线通信系统技术领域本发明涉及使用空间复用传输方式进行数据通信的无线通信系统。 移动站包括计算发送权重的发送权重计算单元和在基站侧发送用于生成部分空间信息的已知信号的波束信息通知信号生成单元。 基站包括基于接收的第一已知信号生成部分空间信息的调度单元(DL空间调度单元(17),UL空间调度单元(18)以及波束信息通知信号响应向量估计单元(20)) ,并且基于部分空间信息执行下行调度和上行调度,以及发送包括上行调度结果的分组的调度结果发送单元(UL控制信息生成单元(14)和发送权重计算单元(19))。
    • 80. 发明申请
    • COMMUNICATION APPARATUS
    • 通讯设备
    • US20090022231A1
    • 2009-01-22
    • US11815315
    • 2006-02-16
    • Mari OchiaiAkinori TairaYoshitaka Hara
    • Mari OchiaiAkinori TairaYoshitaka Hara
    • H04L27/28
    • H04L27/0002H04B1/005H04B1/006H04B7/12H04L27/2662
    • A communication apparatus associated with a system that uses two or more discontinuous frequency bands. The communication apparatus includes a BPF (band pass filter) including a plurality of BPFs associated with signals having respective frequency bands; a controller that controls each unit to transmit/receive the signals having the respective frequency bands; a down-converter that down-converts a filtered signal into a baseband signal while switching frequencies under control of the controller; a receiver that performs predetermined reception processing under control of the controller; and a transmitter that performs predetermined transmission processing under control of the controller, and common hardware is used in communication in all frequency bands with respect to processing of the baseband signal.
    • 与使用两个或多个不连续频带的系统相关联的通信装置。 通信装置包括:BPF(带通滤波器),包括与具有各自频带的信号相关联的多个BPF; 控制器,其控制每个单元发送/接收具有各个频带的信号; 一个下变换器,其在控制器的控制下切换频率时将滤波后的信号下变频为基带信号; 接收机,其在所述控制器的控制下执行预定的接收处理; 以及在控制器的控制下执行预定的传输处理的发射机,并且在关于基带信号的处理的所有频带中使用公共硬件进行通信。