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    • 86. 发明申请
    • Apparatus for production of crystal of group III element nitride and process for producing crystal of group III element nitride
    • 用于生产III族元素氮化物晶体的装置和用于生产III族元素氮化物晶体的方法
    • US20080213158A1
    • 2008-09-04
    • US12082745
    • 2008-04-14
    • Hisashi MinemotoYasuo KitaokaIsao KidoguchiYusuke MoriFumio KawamuraTakatomo SasakiHidekazu UmedaYasuhito Takahashi
    • Hisashi MinemotoYasuo KitaokaIsao KidoguchiYusuke MoriFumio KawamuraTakatomo SasakiHidekazu UmedaYasuhito Takahashi
    • C30B23/00C01B21/06
    • C30B29/403C30B9/10C30B29/406C30B35/00Y10T117/1064Y10T117/1096
    • A manufacturing apparatus of Group III nitride crystals and a method for manufacturing Group III nitride crystals are provided, by which high quality crystals can be manufactured. For instance, crystals are grown using the apparatus of the present invention as follows. A crystal raw material (131) and gas containing nitrogen are introduced into a reactor vessel (120), to which heat is applied by a heater (110), and crystals are grown in an atmosphere of pressure applied thereto. The gas is introduced from a gas supplying device (180) to the reactor vessel (120) through a gas inlet of the reactor vessel, and then is exhausted to the inside of a pressure-resistant vessel (102) through a gas outlet of the reactor vessel. Since the gas is introduced directly to the reactor vessel (120) without passing through the pressure-resistant vessel (102), the mixture of impurities attached to the pressure-resistant vessel (102) and the like into the site of the crystal growth can be prevented. Further, since the gas flows through the reactor vessel (120), there is no aggregation of an evaporating alkali metal, etc., at the gas inlet or the like, and such an alkali metal does not flow into the gas supplying device (180). As a result, the quality of Group III nitride crystals obtained can be improved.
    • 提供III族氮化物晶体的制造装置和制造III族氮化物晶体的方法,由此可以制造高质量的晶体。 例如,使用本发明的装置如下生长晶体。 将晶体原料(131)和含氮气体引入反应器容器(120)中,通过加热器(110)向其施加热量,并在施加压力的气氛中生长晶体。 气体通过反应器容器的气体入口从气体供给装置(180)引入反应器容器(120),然后通过反应器的气体出口被排出到耐压容器(102)的内部 反应堆容器。 由于气体不通过耐压容器(102)直接引入反应器容器(120),附着在耐压容器(102)等上的杂质混合物进入晶体生长位置可以 被阻止 此外,由于气体流过反应器容器(120),所以在气体入口等处没有蒸发的碱金属等的聚集,并且这种碱金属不会流入气体供给装置(180 )。 结果,可以提高获得的III族氮化物晶体的质量。