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1. 发明申请

US20030124044A1 Modification process of synthetic silica powder and its quartz glass product 有权
标题翻译：合成二氧化硅粉及其石英玻璃制品的改性工艺
公开(公告)号：US20030124044A1
公开(公告)日：2003-07-03
申请号：US10303899
申请日：2002-11-26
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Masanori Fukui , Takahiro Satoh
IPC分类号： C01B033/12
CPC分类号： C30B35/002 , C03B19/1065 , C03B2201/04 , C03B2201/20 , C03C1/026 , C30B15/10 , Y10T117/10 , Y10T428/13 , Y10T428/131 , Y10T428/1317
摘要： A modified synthetic silica powder is produced by heating in vacuum an amorphous synthetic silica powder produced by a sol-gel process, and then cooling the heated silica powder in an atmosphere containing helium. When the modified synthetic silica powder is fused and vitrified in a process of crucible production, the resulting quartz glass crucible contains hardly any bubbles.
摘要翻译：通过在真空中加热通过溶胶 - 凝胶法制备的无定形合成二氧化硅粉末，然后在含有氦气的气氛中冷却加热的二氧化硅粉末来制备改性合成二氧化硅粉末。当改性合成二氧化硅粉末在坩埚生产过程中熔融和玻璃化时，所得石英玻璃坩埚几乎不含任何气泡。

2. 发明申请

US20040187771A1 Silica glass crucible 有权
标题翻译：二氧化硅玻璃坩埚
公开(公告)号：US20040187771A1
公开(公告)日：2004-09-30
申请号：US10801683
申请日：2004-03-17
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Yoshiyuki Tsuji , Toshio Tsujimoto
IPC分类号： B32B001/08
CPC分类号： C03C19/00 , B24C1/08 , C03C15/00 , C30B15/10 , Y10T117/1032 , Y10T117/108 , Y10T428/13 , Y10T428/131
摘要： To provide a silica glass crucible, wherein there are no problems of generating a sinking and buckling when said crucible is used for pulling up silicon single crystal at a high temperature. The silica glass crucible used for pulling up the silicon single crystal, wherein at least an outer surface of a wall part of the crucible is covered with fine grooves having a length of less than 200 nullm, a width of less than 30 nullm and a depth of from more than 3 nullm to less than 30 nullm. Preferably, said fine groves are formed by carrying out a sand-blast treatment and a hydrofluoric acid etching and exist on more than 10% of the outer surface of the crucible, and a sliding frictional coefficient of the outer surface of the crucible to a carbon at 1500 degree C. is more than 0.6.
摘要翻译：为了提供一种二氧化硅玻璃坩埚，其中当在高温下使用所述坩埚拉起硅单晶时，不存在产生下沉和翘曲的问题。用于提升硅单晶的二氧化硅玻璃坩埚，其中坩埚的壁部的至少外表面被细长的小于200μm的细槽，宽度小于30μm，深度从3岁以上到30岁以下的妈妈。优选地，通过进行喷砂处理和氢氟酸蚀刻而形成所述细小花纹，并且存在于坩埚的外表面的10％以上，坩埚的外表面的滑动摩擦系数为碳在1500摄氏度，大于0.6。

3. 发明申请

US20040112274A1 Reinforcing process of silica glass substance and reinforced silica glass crucible 审中-公开
标题翻译：石英玻璃物质和增强石英玻璃坩埚的加强过程
公开(公告)号：US20040112274A1
公开(公告)日：2004-06-17
申请号：US10673180
申请日：2003-09-30
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Toshio Tsujimoto , Hiroya Ishizuka , Naotaka Fumoto
IPC分类号： C30B001/00
CPC分类号： C30B35/002 , C03C17/004 , C03C17/005 , C03C17/02 , C03C17/04 , C03C2217/213 , C03C2218/11 , C03C2218/113 , C03C2218/17 , C30B15/10 , Y10T117/1032
摘要： A process reinforcing a silica glass substance, such as a silica glass crucible, is provided without intermixing an impurity. The process comprises forming a silica glass powder layer on a surface of the silica glass substance, and crystallizing said silica glass powder layer under high temperature. As for a silica glass crucible, the process for reinforcing the silica glass crucible and the reinforced silica glass crucible are provided, wherein the silica glass powder layer on the whole or a part of the surface of the crucible is formed and then, crystallized under a temperature at the melting of a silicon raw material being charged into said quartz glass crucible.
摘要翻译：提供加强二氧化硅玻璃物质如石英玻璃坩埚的方法，而不混合杂质。该方法包括在石英玻璃物质的表面上形成二氧化硅玻璃粉末层，并在高温下使所述二氧化硅玻璃粉末层结晶。对于石英玻璃坩埚，提供了用于增强石英玻璃坩埚和增强石英玻璃坩埚的方法，其中形成坩埚表面全部或一部分上的二氧化硅玻璃粉末层，然后在将硅原料熔化的温度加入到所述石英玻璃坩埚中。

4. 发明申请

US20040103841A1 Surface modification process of quartz glass crucible 审中-公开
标题翻译：石英玻璃坩埚表面改性工艺
公开(公告)号：US20040103841A1
公开(公告)日：2004-06-03
申请号：US10720122
申请日：2003-11-25
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Toshio Tsujimoto , Yoshiyuki Tsuji
IPC分类号： C30B001/00
CPC分类号： C30B15/10 , C30B35/002 , Y10T117/10
摘要： A process for modifying the surface of a quartz glass crucible and a modified quartz glass crucible produced by the process, where the crucible has a transparent coated layer containing a crystallization accelerator on the surface. The process includes coating a mixed solution containing a metal salt and a partial hydrolyzate of alkoxysilane oligomer on the surface of the crucible and heating to obtain a quartz glass crucible having a transparent coated layer. The crystallization accelerator contains a metal oxide or a metal carbonate dispersed in a silica matrix.
摘要翻译：用于改变石英玻璃坩埚的表面的方法和通过该方法制备的改性石英玻璃坩埚，其中坩埚在表面上具有含有结晶促进剂的透明涂层。该方法包括在坩埚的表面上涂覆含有金属盐和烷氧基硅烷低聚物的部分水解产物的混合溶液，并加热，得到具有透明涂层的石英玻璃坩埚。结晶促进剂含有分散在二氧化硅基质中的金属氧化物或金属碳酸盐。

5. 发明申请

US20040118208A1 Evaluation process of reactivity of silica glass with silicon melt and vibration at its surface, and silica glass crucible not causing the surface vibration 有权
标题翻译：石英玻璃与硅熔体的反应性评价过程及其表面振动，石英玻璃坩埚不会引起表面振动
公开(公告)号：US20040118208A1
公开(公告)日：2004-06-24
申请号：US10682112
申请日：2003-10-10
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Hiroshi Kishi , Minoru Kanda , Masanori Fukui
IPC分类号： G01N033/38 , G01H009/00 , C30B015/10 , C30B015/02 , C30B015/14
CPC分类号： C30B15/10 , C30B35/002 , G01N33/386 , Y10S117/90 , Y10T117/1004 , Y10T117/1032 , Y10T428/131 , Y10T428/1314
摘要： A evaluation process of a vibration level at the surface of silicon melt held in a silica glass crucible is provided by setting in the vacuum furnace, the test piece of the silica glass cut out from a silica glass crucible, melting a little amount of silicon put on said piece of the glass, and measuring a vibration cycle of the silicon melt. Moreover, a silica glass crucible not causing the vibration at the surface of the silicon melt held in the silica glass crucible is also provided, wherein the vibration cycle of a silica glass of a side wall of the crucible is controlled at more than null seconds.
摘要翻译：在石英玻璃坩埚中保存的硅熔体表面的振动水平的评价过程通过在真空炉中放置，将石英玻璃试样从石英玻璃坩埚切出，熔化少量硅在所述玻璃片上测量硅熔体的振动周期。此外，还提供了不引起保持在石英玻璃坩埚中的硅熔体表面的振动的石英玻璃坩埚，其中坩埚侧壁的石英玻璃的振动周期被控制在大于1/6 秒。

6. 发明申请

US20040050099A1 Reforming process of quartz glass crucible 有权
标题翻译：石英玻璃坩埚改造工艺
公开(公告)号：US20040050099A1
公开(公告)日：2004-03-18
申请号：US10628350
申请日：2003-07-29
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Masanori Fukui , Masaru Satoh
IPC分类号： C03B019/00
CPC分类号： C03B32/00 , C03B19/095 , C03B29/02 , C30B15/10
摘要： A reforming process of a quartz glass crucible in which the quartz glass crucible is reformed by an arc discharge generated by electrodes positioned around a rotational axis and configured to heat an inside surface of the crucible while the crucible is rotated. The process includes arranging electrodes in an electrode structure such that neighboring electrodes are positioned at regular intervals in a ring-like configuration; forming a stable ring-like arc between the neighboring electrodes, without generating a continuous arc between electrodes facing each other across a central portion of the ring-like configuration; heating the inside surface of the crucible; and removing a foreign substance located on the inside surface of the crucible or a bubble located under the inside surface of the crucible.
摘要翻译：一种石英玻璃坩埚的重整工艺，其中石英玻璃坩埚通过由位于旋转轴线周围的电极产生的电弧放电而重构，并且构造成在坩埚旋转的同时加热坩埚的内表面。该方法包括在电极结构中布置电极，使得相邻的电极以规定的间隔以环状构造定位; 在相邻电极之间形成稳定的环状电弧，而不会在环状构造的中心部分彼此面对的电极之间产生连续的电弧; 加热坩埚的内表面; 并且去除位于坩埚内表面上的异物或位于坩埚内表面下方的气泡。

7. 发明申请

US20030183161A1 Surface modified quartz glass crucible and its modification process 审中-公开
标题翻译：表面改性石英玻璃坩埚及其改性工艺
公开(公告)号：US20030183161A1
公开(公告)日：2003-10-02
申请号：US10162656
申请日：2002-06-06
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Toshio Tsujimoto , Yoshiyuki Tsuji
IPC分类号： C30B001/00
CPC分类号： C30B15/10 , C03C17/25 , C03C17/27 , Y10S117/90 , Y10T117/10 , Y10T117/1032 , Y10T117/1052
摘要： A surface modified quartz glass crucible and a process for modifying the crucible includes a layer of a metal oxide on the whole or a part of the inside and/or outside of the crucible, and baking it. At least an inside surface of the crucible is coated with a said metal oxide of magnesium, calcium, strontium or barium. The coated layer of the crucible does not abrade easily and provides a high dislocation free ratio of silicon single crystals pulled by using the crucible.
摘要翻译：表面改性石英玻璃坩埚和坩埚的改性方法包括在坩埚的内部和/或外部的整个或一部分上的金属氧化物层，并进行烘烤。至少坩埚的内表面涂有镁，钙，锶或钡的所述金属氧化物。坩埚的涂层不容易磨损，并且通过使用坩埚提供高的无位错硅单晶。

8. 发明申请

US20030094131A1 Surface modification process of quartz glass crucible 有权
标题翻译：石英玻璃坩埚表面改性工艺
公开(公告)号：US20030094131A1
公开(公告)日：2003-05-22
申请号：US10162637
申请日：2002-06-06
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Toshio Tsujimoto , Yoshiyuki Tsuji
IPC分类号： C30B023/00 , C30B025/00 , C30B028/12 , C30B028/14 , C30B001/00
CPC分类号： C30B15/10 , C30B35/002 , Y10T117/10
摘要： A process for modifying the surface of a quartz glass crucible and a modified quartz glass crucible produced by the process, where the crucible has a transparent coated layer containing a crystallization accelerator on the surface. The process includes coating a mixed solution containing a metal salt and a partial hydrolyzate of alkoxysilane oligomer on the surface of the crucible and heating to obtain a quartz glass crucible having a transparent coated layer. The crystallization accelerator contains a metal oxide or a metal carbonate dispersed in a silica matrix.
摘要翻译：用于改变石英玻璃坩埚的表面的方法和通过该方法制备的改性石英玻璃坩埚，其中坩埚在表面上具有含有结晶促进剂的透明涂层。该方法包括在坩埚的表面上涂覆含有金属盐和烷氧基硅烷低聚物的部分水解产物的混合溶液，并加热，得到具有透明涂层的石英玻璃坩埚。结晶促进剂含有分散在二氧化硅基质中的金属氧化物或金属碳酸盐。

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