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    • 4. 发明授权
    • Method for operating a data storage apparatus employing passive matrix addressing
    • 用于操作采用无源矩阵寻址的数据存储装置的方法
    • US07646629B2
    • 2010-01-12
    • US12010067
    • 2008-01-18
    • Per HambergChrister KarlssonPer-Erik NordalNicklas OjakangasJohan CarlssonHans G. Gudesen
    • Per HambergChrister KarlssonPer-Erik NordalNicklas OjakangasJohan CarlssonHans G. Gudesen
    • G11C11/22
    • G11C11/22G06F12/0238G06F2212/1036G06F2212/7211G11C8/12G11C2013/0083
    • In a method for obviating the effect of disturb voltages in a data storage apparatus employing passive matrix addressing, an application of electric potentials for an addressing operation is according to a voltage pulse protocol. The data storage cells of the apparatus are provided in two or more electrically separated segments each constituting non-overlapping physical address subspaces of the data storage apparatus physical address space. A number of data storage cells in each segment are preset to the same polarization by an active voltage pulse with a specific polarization. In a first addressing operation one or more data storage cells are read by applying an active pulse with the same polarization to each data storage cell and recording the output charge response. On basis thereof the output data in subsequent second addressing operation are copied onto preset data storage cells in another segment of the data storage apparatus, this segment being selected on the basis of its previous addressing history.
    • 在采用无源矩阵寻址的数据存储装置中避免干扰电压的影响的方法中,用于寻址操作的电位的应用是根据电压脉冲协议。 设备的数据存储单元被提供在两个或更多个电隔离的段中,每个段构成数据存储设备物理地址空间的非重叠物理地址子空间。 每个段中的多个数据存储单元通过具有特定极化的有源电压脉冲预设为相同的极化。 在第一寻址操作中,通过向每个数据存储单元施加具有相同极化的有源脉冲并记录输出电荷响应来读取一个或多个数据存储单元。 基于此,随后的第二寻址操作中的输出数据被复制到数据存储装置的另一段中的预定数据存储单元上,该段根据其先前的寻址历史进行选择。
    • 5. 发明申请
    • Method for making a ferroelectric memory cell in a ferroelectric memory device, and a ferroelectric memory device
    • 在铁电存储器件中制造铁电存储单元的方法和铁电存储器件
    • US20060073658A1
    • 2006-04-06
    • US11294392
    • 2005-12-06
    • Henrik LjungcrantzNiclas EdvardssonJohan CarlssonGoran Gustafsson
    • Henrik LjungcrantzNiclas EdvardssonJohan CarlssonGoran Gustafsson
    • H01L21/8242H01L21/20H01L21/00
    • H01L21/32051H01L27/11502
    • In a method for making ferroelectric memory cells in a ferroelectric memory device a first electrode comprising at least one metal layer and optionally at least one metal oxide layer is formed on a silicon substrate which has an optional insulating layer of silicon dioxide. A ferroelectric layer consisting of a thin film of ferroelectric polymer is formed on the top of the first electrode layer and at least a second electrode comprising at least one metal layer and at least one metal oxide layer is formed on the ferroelectric layer. The second electrode is deposited by thermal evaporation of a high-purity evaporation source from an effusion cell onto the ferroelectric layer in a vacuum chamber filled with a gas or a gas mixture. A ferroelectric memory device wherein the memory cell has been made with the above method, comprises at least a first and a second set of respectively parallel electrodes, wherein the electrodes in a set are provided orthogonally to the electrodes of a nearest following set and with memory cells formed in a ferroelectric layer provided between successive electrode sets, such that memory cells are defined in the crossings between the electrodes which contact the ferroelectric layer on each side thereof.
    • 在铁电存储器件中制造铁电存储单元的方法中,在具有任选的二氧化硅绝缘层的硅衬底上形成包括至少一个金属层和任选的至少一个金属氧化物层的第一电极。 在第一电极层的顶部形成由铁电聚合物薄膜构成的铁电层,并且在铁电层上形成至少包含至少一个金属层和至少一个金属氧化物层的第二电极。 通过在填充有气体或气体混合物的真空室中将高纯度蒸发源从渗出室热蒸发到铁电层上来沉积第二电极。 具有上述方法制造存储单元的铁电存储器件包括至少第一组和第二组分别平行的电极,其中一组中的电极与最接近的组的电极和记忆体正交地设置 形成在连续的电极组之间的铁电体层中形成的单元,使得存储单元被限定在与其每一侧接触铁电体层的电极之间的交叉中。