专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06885437B2 Mask exchanging method and exposure apparatus 失效
标题翻译：面膜交换方法和曝光装置
公开(公告)号：US06885437B2
公开(公告)日：2005-04-26
申请号：US10781661
申请日：2004-02-20
申请人： Kenji Nishi , Katsunobu Ogura , Hidekazu Kikuchi
发明人： Kenji Nishi , Katsunobu Ogura , Hidekazu Kikuchi
IPC分类号： G03F7/20 , G03B27/62 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70733 , G03F7/70741
摘要： When a reticle stage capable of moving while holding a reticle is at a predetermined unloading position, an unloading arm performs unloading of a reticle. Also, the instant or immediately after the reticle is separated from the reticle stage by the unloading arm, the reticle stage is moved to a predetermined loading position where a reticle is loaded onto the reticle stage by a loading arm. This allows the reticle to be loaded onto the reticle stage before the unloading arm completely withdraws from the unloading position, which reduces the downtime between the retile unloading and the reticle loading. Accordingly, the throughput of the exposure apparatus can be improved, since the time required for reticle exchange is reduced.
摘要翻译：当保持掩模版时能够移动的标线片台处于预定的卸载位置时，卸载臂执行掩模版的卸载。此外，在通过卸载臂将掩模版与刻划台分隔开之后或之后，通过装载臂将标线片载物台移动到预定的装载位置，在该装载位置将掩模版装载到标线片台上。这样就可以在卸载臂从卸载位置完全退出之前，将掩模版加载到标线片台上，从而减少了沉淀物卸载与掩模版加载之间的停机时间。因此，由于减少了掩模版交换所需的时间，因此可以提高曝光装置的生产量。

IPRDB

热门服务

关于我们

友情链接

联系方式