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1. 发明授权

US06885437B2 Mask exchanging method and exposure apparatus 失效
标题翻译：面膜交换方法和曝光装置
公开(公告)号：US06885437B2
公开(公告)日：2005-04-26
申请号：US10781661
申请日：2004-02-20
申请人： Kenji Nishi , Katsunobu Ogura , Hidekazu Kikuchi
发明人： Kenji Nishi , Katsunobu Ogura , Hidekazu Kikuchi
IPC分类号： G03F7/20 , G03B27/62 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70733 , G03F7/70741
摘要： When a reticle stage capable of moving while holding a reticle is at a predetermined unloading position, an unloading arm performs unloading of a reticle. Also, the instant or immediately after the reticle is separated from the reticle stage by the unloading arm, the reticle stage is moved to a predetermined loading position where a reticle is loaded onto the reticle stage by a loading arm. This allows the reticle to be loaded onto the reticle stage before the unloading arm completely withdraws from the unloading position, which reduces the downtime between the retile unloading and the reticle loading. Accordingly, the throughput of the exposure apparatus can be improved, since the time required for reticle exchange is reduced.
摘要翻译：当保持掩模版时能够移动的标线片台处于预定的卸载位置时，卸载臂执行掩模版的卸载。此外，在通过卸载臂将掩模版与刻划台分隔开之后或之后，通过装载臂将标线片载物台移动到预定的装载位置，在该装载位置将掩模版装载到标线片台上。这样就可以在卸载臂从卸载位置完全退出之前，将掩模版加载到标线片台上，从而减少了沉淀物卸载与掩模版加载之间的停机时间。因此，由于减少了掩模版交换所需的时间，因此可以提高曝光装置的生产量。

2. 发明申请

US20070188407A1 Image display device and image display system 审中-公开
标题翻译：图像显示装置和图像显示系统
公开(公告)号：US20070188407A1
公开(公告)日：2007-08-16
申请号：US10587605
申请日：2004-10-19
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G09G5/00
CPC分类号： G02B27/027 , F16M11/10 , F16M11/2014 , F16M11/2057 , F16M11/2064 , F16M11/24 , F16M13/04 , F16M2200/047 , G02B7/001 , G02B25/001 , G02B27/0172 , G02B27/0176 , G02B2027/0132 , G02B2027/0136 , G02B2027/0178 , H04N5/7491
摘要： An image display device comprising a display portion that projects, via eyepiece optical systems which respectively correspond to each of the both eyes of a user, a light emitted from a two-dimensionally light emitting type photoelectric device which is perpendicular to the light beam emitting direction onto the eyeballs of said user, a supporting portion that supports the display portion at its portion that is not in contact with the user, and a face contact portion that is supported by the display portion and is capable of changing the distance between the eyepiece optical systems and the eyes of the user, whereby images with high image quality and high field angle are, in a space-saving manner, safely provided to the user, and, at the time, with the personal image display devices' disadvantages being saved, even multiple persons can enjoy the images.
摘要翻译：一种图像显示装置，包括：显示部，其通过目视光学系统分别对应于用户的两只眼睛中的每一个，从与发光方向垂直的二维发光型光电装置发射的光在所述用户的眼球上，支撑部分，其在与用户不接触的部分处支撑显示部分，以及由接触部分支撑的面接触部分，并且能够改变目镜光学部件系统和使用者的眼睛，从而以节省空间的方式将具有高图像质量和高视野角的图像安全地提供给用户，并且在此时，个人图像显示装置的缺点得到节省，甚至多人可以享受图像。

3. 发明申请

US20050024610A1 Exposure apparatus and stage device, and device manufacturing method 失效
标题翻译：曝光装置及舞台装置及装置的制造方法
公开(公告)号：US20050024610A1
公开(公告)日：2005-02-03
申请号：US10456485
申请日：2003-06-09
申请人： Kenji Nishi , Masahiko Okumura , Hiroki Okuno
发明人： Kenji Nishi , Masahiko Okumura , Hiroki Okuno
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70425 , G03F7/70725 , G03F7/70733
摘要： After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.
摘要翻译：在晶片上的分割区域的曝光完成之后，为了下一个分割区域的曝光，控制单元将阶段控制系统开始减速之前的某个时刻向控制系统发送关于将下一个分割区域暴露出来的控制参数的配置信息的标线片台和扫描方向的晶片台。因此，在阶段控制系统的加速之前，不需要暂停两个阶段，以接收关于暴露下一个分割区域所需的控制参数的配置信息，并且由于不需要暂停时间，因此可以提高生产率。在这种情况下，不会出现严重的问题，所以其他设备的性能不会受到干扰。

4. 发明授权

US06841323B2 Mask producing method 失效
标题翻译：面膜生产方法
公开(公告)号：US06841323B2
公开(公告)日：2005-01-11
申请号：US10648518
申请日：2003-08-27
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70733 , G03F7/70358 , G03F7/70475
摘要： A pattern region of a working reticle is divided into existing pattern portions and newly-forming pattern portions. With respect to the existing pattern portions, already-formed master reticle patterns are reduction-projected while stitching screens using an optical-type projection exposure apparatus. With respect to the newly-forming portions, enlarged patterns are formed by an electron beam drawing apparatus to form new master reticles, and reduced images of the newly formed master reticles are exposed while stitching screens using an optical-type projection exposure apparatus.
摘要翻译：作业掩模版的图案区域被划分为现有图案部分和新形成图案部分。对于现有的图案部分，已经形成的主掩模图案使用光学型投影曝光装置在缝合屏幕的同时进行缩小投影。对于新形成部分，通过电子束描绘装置形成放大的图案，以形成新的主标线，并且使用光学型投影曝光装置在缝合屏幕的同时露出新形成的主标线的缩小图像。

5. 发明授权

US06741332B2 Stage system, exposure apparatus, and device manufacturing method 失效
标题翻译：舞台系统，曝光装置和装置制造方法
公开(公告)号：US06741332B2
公开(公告)日：2004-05-25
申请号：US10407254
申请日：2003-04-07
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03B2758
CPC分类号： G03F7/70733 , G03F7/70716 , G03F7/70766
摘要： A stage is driven along guide surfaces of a supporting member with a stator that is provided independent from the support member vibration-wise and a mover connected to the stage. In addition, when a drive amount of the supporting member exceeds a predetermined amount in, for example, the vertical direction, a connection between the stage and the mover by a connection mechanism is released. That is, the connection between the stage and the mover is released before the mover connected to the stage on the supporting member comes into contact with the stator and both parts are put under a large stress, which can prevent the mover and stator from being damaged. Furthermore, since the stator is provided independent from the support member vibration-wise, position control of the stage can be preformed with high precision. Accordingly, the stage can be driven stably, for over a long period of time.
摘要翻译：台架沿着支撑构件的引导表面被驱动，其中定子具有独立于振动的支撑构件设置的定子和连接到平台的动子。此外，当支撑构件的驱动量例如在垂直方向上超过预定量时，通过连接机构的平台和动子之间的连接被释放。也就是说，在连接到支撑构件上的台架的动子与定子接触之前，平台和动子之间的连接被释放，并且两个部分都被施加在大的应力下，这可以防止动子和定子被损坏。此外，由于定子与振动状态下的支撑部件独立地设置，因此可以高精度地进行台架的位置控制。因此，能够长时间稳定地驱动平台。

6. 发明授权

US06704090B2 Exposure method and exposure apparatus 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US06704090B2
公开(公告)日：2004-03-09
申请号：US09852324
申请日：2001-05-10
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70066 , G03F7/70558
摘要： An exposure apparatus transfers an image of a pattern on a reticle onto a wafer W by synchronously scanning the reticle and the wafer with respect to a projection optical system in a state in which the reticle is illuminated with an exposure light beam from an exposure light source subjected to pulse light emission via a fly's eye lens, a movable blind, a main condenser lens system, and a fixed blind. First and second uneven illuminance-correcting plates, on which shielding line groups for correcting convex and concave uneven illuminance are depicted, are arranged at a position defocused from a conjugate plane with respect to a pattern plane of the reticle. A third correcting plate for roughly correcting uneven illuminance is arranged at a position further defocused therefrom. It is possible to enhance the uniformity of the totalized exposure amount on the wafer or the telecentricity when the exposure is performed in accordance with the scanning exposure system.
摘要翻译：曝光装置在通过从曝光光源照射的曝光光束的状态下相对于投影光学系统同步扫描掩模版和晶片，将掩模版上的图案的图像转印到晶片W上通过飞眼镜片，可动遮光罩，主聚光透镜系统和固定遮光板进行脉冲发光。第一和第二不平坦照度校正板被布置在相对于掩模版的图案平面从共轭平面散焦的位置上，其上示出了用于校正凸凹不均匀照度的屏蔽线组。用于大致校正不均匀照度的第三校正板布置在与其进一步散焦的位置处。当根据扫描曝光系统进行曝光时，可以提高晶片上的总曝光量的均匀性或远心度。

7. 再颁专利

USRE38320E1 Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system 失效
标题翻译：通过控制投影光学系统的透镜元件的温度来改变设备的聚焦的投射曝光设备
公开(公告)号：USRE38320E1
公开(公告)日：2003-11-18
申请号：US09809224
申请日：2001-03-16
申请人： Kenji Nishi , Kazuo Ushida , Seiro Murakami , Tohru Kiuchi , Yasuaki Tanaka
发明人： Kenji Nishi , Kazuo Ushida , Seiro Murakami , Tohru Kiuchi , Yasuaki Tanaka
IPC分类号： G03B2754
CPC分类号： G03F7/70891 , G03B27/26 , G03B27/54 , G03F7/70883
摘要： A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.

8. 发明授权

US06597430B1 Exposure method, illuminating device, and exposure system 失效
标题翻译：曝光方法，照明装置和曝光系统
公开(公告)号：US06597430B1
公开(公告)日：2003-07-22
申请号：US09979042
申请日：2001-12-31
申请人： Kenji Nishi , Osamu Tanitsu , Kyoji Nakamura
发明人： Kenji Nishi , Osamu Tanitsu , Kyoji Nakamura
IPC分类号： G03B2742
CPC分类号： G03F7/70583
摘要： An exposure method is provided, in which a speckle pattern (interference fringe) formed on a pattern of a transfer objective can be reduced without complicating an illumination optical system so much, without increasing the size of the illumination optical system so much, and without prolonging the exposure time, even when an exposure light beam having high coherence is used. A laser beam (LB) as an exposure light beam from an exposure light source (9) is introduced into a ring-shaped delay optical system (22), for example, via a modified illumination mechanism (19) and a light-collecting lens (21). A plurality of light fluxes, which have passed through the interior of the delay optical system (22) a variety of numbers of times depending on angular apertures in accordance with internal reflection, are superimposed and extracted as a laser beam (LB3). The laser beam (LB3) illuminates a reticle (R), for example, via a fly's eye lens (25) and a condenser lens (7).
摘要翻译：提供了一种曝光方法，其中可以在不使照明光学系统复杂化的情况下减少形成在转印物体的图案上的散斑图案（干涉条纹），而不会增加照明光学系统的尺寸，并且不延长曝光时间，即使使用具有高相干性的曝光光束。作为来自曝光光源（9）的曝光光束的激光束（LB）被引入到环形延迟光学系统（22）中，例如经由改进的照明机构（19）和聚光透镜（21）。通过根据内部反射而穿过延迟光学系统（22）的内部多个次数的多个光束被叠加并提取为激光束（LB3）。激光束（LB3）例如通过蝇眼透镜（25）和聚光透镜（7）照射掩模版（R）。

9. 发明授权

US06590637B2 Exposure apparatus and method 失效
公开(公告)号：US06590637B2
公开(公告)日：2003-07-08
申请号：US10123103
申请日：2002-04-15
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03B2742
CPC分类号： G03F7/70558 , G03F7/701 , G03F7/70108 , G03F7/70358 , G03F7/70608 , G03F9/7026
摘要： An projection exposure apparatus and method for illuminating a transfer pattern and forming an image upon a mask for exposure from the illumination light and transfer exposing the image of the pattern of the mask under the illumination light. Switching is performed between a normal illumination condition and a modified illumination condition based upon the numerical aperture of the illumination light; wherein the normal illumination condition occurs when the light quantity distribution at the illumination pupil plane is in a first region, including the optical-axis; and the modified illumination condition occurs when the light quantity distribution at the illumination pupil plane is in a second region, not including the optical-axis and wherein the pupil plane is an optical Fourier conversion surface of a pattern surface of the mask in an illumination system.

10. 发明授权

US06590634B1 Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US06590634B1
公开(公告)日：2003-07-08
申请号：US09716405
申请日：2000-11-21
申请人： Kenji Nishi , Kazuya Ota
发明人： Kenji Nishi , Kazuya Ota
IPC分类号： G03B2742
CPC分类号： G03F7/70216 , G03F7/70358 , G03F7/70425 , G03F7/70716 , G03F7/70733 , G03F9/70 , G03F9/7003 , G03F9/7015 , G03F9/7026 , G03F9/7088
摘要： Two stages (WS1, WS2) holding wafers can independently move between a positional information measuring section (PIS) under an alignment system (24a) and an exposing section (EPS) under a projection optical system (PI). The wafer exchange and alignment are performed on the stage (WS1), during which wafer (W2) is exposed on the stage (WS2). A position of each shot area of wafer (WS1) is obtained as a relative position with respect to a reference mark formed on the stage WS1 in the section (PIS). Relative positional information can be used for the alignment with respect to an exposure pattern when the wafer (WS1) is moved to the section (EPS) to be exposed. Therefore, it is not necessary that a stage position is observed continuously in moving the stage. Exposure operations are performed in parallel by the two wafer stages (WS1) and (WS2) so as to improve the throughput.
摘要翻译：保持晶片的两个阶段（WS1，WS2）可以独立地在对准系统（24a）下的位置信息测量部分（PIS）和投影光学系统（PI）下的曝光部分（EPS）之间移动。在阶段（WS1）上执行晶片交换和对准，在该阶段期间晶片（W2）暴露在平台（WS2）上。获得晶片（WS1）的每个照射区域的位置作为相对于部分（PIS）中的台WS1上形成的参考标记的相对位置。当将晶片（WS1）移动到要暴露的部分（EPS）时，相对位置信息可用于相对于曝光图案的对准。因此，在移动台阶段不需要连续观察台位置。曝光操作由两个晶片级（WS1）和（WS2）并行执行，以提高生产率。

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