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    • 2. 发明授权
    • Resistance change memory
    • 电阻变化记忆
    • US08498142B2
    • 2013-07-30
    • US13072029
    • 2011-03-25
    • Kenichi Murooka
    • Kenichi Murooka
    • G11C11/00
    • G11C13/0069G11C13/0002G11C13/0004G11C13/0007G11C13/0023G11C13/0033G11C2013/0092G11C2213/71G11C2213/72
    • A memory includes memory cells each includes a resistance change element and a diode, and each memory cell between one of row lines and one of column lines, a first decoder which selects one of the row lines as a selected row line, a second decoder which selects one of the column lines as a selected column line, a voltage pulse generating circuit which generates a voltage pulse, a voltage pulse shaping circuit which makes a rise time and a fall time of the voltage pulse longer, and a control circuit which applies the voltage pulse outputting from the voltage pulse shaping circuit to unselected column lines except the selected column line, and which applies a fixed potential to unselected row lines except the selected row line, in a data writing to a memory cell which is provided between the selected row line and the selected column line.
    • 存储器包括各自包括电阻变化元件和二极管的存储单元,以及行线和列线之一之间的每个存储单元,选择行行之一作为所选行行的第一解码器,第二解码器, 选择列线之一作为选择的列线,产生电压脉冲的电压脉冲发生电路,使电压脉冲的上升时间和下降时间更长的电压脉冲整形电路以及施加电压脉冲的控制电路 电压脉冲从电压脉冲整形电路输出到除了所选列线之外的未选择的列线,并且在设置在所选择的行之间的存储单元的数据写入中将固定电位施加到除所选行行之外的未选行行 行和所选列行。
    • 5. 发明授权
    • Nonvolatile semiconductor memory device
    • 非易失性半导体存储器件
    • US08320157B2
    • 2012-11-27
    • US12876637
    • 2010-09-07
    • Reika IchiharaTakayuki TsukamotoHiroshi KannoKenichi Murooka
    • Reika IchiharaTakayuki TsukamotoHiroshi KannoKenichi Murooka
    • G11C11/00
    • G11C13/0069G11C13/0007G11C13/0097G11C2213/13G11C2213/34G11C2213/72
    • According to one embodiment, a nonvolatile semiconductor memory device includes a memory cell array and a control circuit. The memory cell array includes a plurality of first wirings, a plurality of second wirings intersecting the plurality of first wirings, and a plurality of memory cells provided at the intersections of the plurality of first and second wirings and each including a non-ohmic element and a variable resistance element connected in series. The control circuit selects one of the plurality of memory cells, generates an erasing pulse for erasing data from the selected memory cell, and supplies the erasing pulse to the selected memory cell. The control circuit executes data erase by applying a voltage of the erasing pulse to the non-ohmic element in the reverse bias direction.
    • 根据一个实施例,非易失性半导体存储器件包括存储单元阵列和控制电路。 存储单元阵列包括多个第一布线,与多条第一布线相交的多条第二布线,以及多个存储单元,设置在多个第一布线和第二布线的交点处,每个包括非欧姆元件和 串联连接的可变电阻元件。 控制电路选择多个存储单元中的一个,产生用于从所选存储单元擦除数据的擦除脉冲,并将擦除脉冲提供给所选存储单元。 控制电路通过在反向偏置方向上向非欧姆元件施加擦除脉冲的电压来执行数据擦除。
    • 10. 发明授权
    • Storage device
    • 储存设备
    • US08766225B2
    • 2014-07-01
    • US13040764
    • 2011-03-04
    • Kenichi MurookaHiroshi Kanno
    • Kenichi MurookaHiroshi Kanno
    • H01L29/02
    • H01L27/1021H01L27/101
    • According to the embodiment, a storage device includes row lines arranged parallel to one another, column lines arranged parallel to one another to intersect with the row lines, and a memory cell disposed at each of intersections of the row lines and the column lines and including a resistance-change element and a diode connected in series to the resistance-change element. The diode includes a stack of a first semiconductor region containing an impurity of a first conductivity type, a second semiconductor region containing an impurity of the first conductivity type lower in concentration than in the first semiconductor region, and a third semiconductor region containing an impurity of a second conductivity type. An impurity concentration in the second semiconductor region of the diode in a first adjacent portion adjacent to the first semiconductor region is higher than that in a second adjacent portion adjacent to the third semiconductor region.
    • 根据实施例,存储装置包括彼此平行布置的行线,彼此平行布置以与行线相交的列线,以及设置在行线和列线的每个交叉处的存储单元,并且包括 与电阻变化元件串联连接的电阻变化元件和二极管。 二极管包括一个包含第一导电类型的杂质的第一半导体区的堆叠,含有比第一半导体区低的浓度的第一导电类型的杂质的第二半导体区和含有杂质的第三半导体区 第二导电类型。 与第一半导体区域相邻的第一相邻部分中的二极管的第二半导体区域中的杂质浓度高于与第三半导体区域相邻的第二相邻部分中的杂质浓度。