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    • 10. 发明授权
    • Semiconductor device
    • 半导体器件
    • US09136388B2
    • 2015-09-15
    • US13549867
    • 2012-07-16
    • Shunpei YamazakiMasahiro TakahashiTatsuya HondaTakehisa Hatano
    • Shunpei YamazakiMasahiro TakahashiTatsuya HondaTakehisa Hatano
    • H01L29/26H01L29/786
    • H01L29/7869H01L29/24H01L29/78618
    • Provided is a structure of a transistor, which enables a so-called normally-off switching element, and a manufacturing method thereof. Provided is a structure of a semiconductor device which achieves high-speed response and high-speed operation by improving on characteristics of a transistor, and a manufacturing method thereof. Provided is a highly reliable semiconductor device. In the transistor in which a semiconductor layer, source and drain electrode layers, a gate insulating layer, and a gate electrode layer are stacked in that order. As the semiconductor layer, an oxide semiconductor layer which contains at least four kinds of elements of indium, gallium, zinc, and oxygen, and has a composition ratio (atomic percentage) of indium as twice or more as a composition ratio of gallium and a composition ratio of zinc, is used.
    • 提供了能够实现所谓的常关断开关元件的晶体管的结构及其制造方法。 提供了通过提高晶体管的特性实现高速响应和高速操作的半导体器件的结构及其制造方法。 提供了一种高度可靠的半导体器件。 在其中半导体层,源极和漏极电极层,栅极绝缘层和栅极电极层以该顺序堆叠的晶体管中。 作为半导体层,含有铟,镓,锌和氧中的至少四种元素的氧化物半导体层,铟的组成比(原子百分比)为镓和a的组成比的两倍以上 使用锌的组成比。