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    • 7. 发明授权
    • Light-emitting diode and light-emitting diode lamp
    • 发光二极管和发光二极管灯
    • US09318673B2
    • 2016-04-19
    • US13817226
    • 2011-08-16
    • Noriyoshi SeoAtsushi Matsumura
    • Noriyoshi SeoAtsushi Matsumura
    • H01L33/60H01L33/30H01L33/40H01L33/12H01L33/00H01L33/64H01L33/38
    • H01L33/60H01L33/0079H01L33/12H01L33/30H01L33/38H01L33/405H01L33/641H01L2224/45144H01L2224/48091H01L2224/73265H01L2924/00014H01L2924/00
    • The present invention relates to a light-emitting diode which has an emission wavelength of 655 nm or more, excellent monochromatic properties, high output, high luminance, high efficiency and fast response time, has such a characteristic that the intensity of light emitted from a light extraction surface and traveling in a direction perpendicular to the light extraction surface has high directivity, and can release heat to the outside with high efficiency; and a light-emitting diode lamp. The light-emitting diode includes a compound semiconductor layer (11) which includes at least a pn-junction-type light-emitting section (3) and a strain adjustment layer (13) laminated on the light-emitting section (3); wherein the light-emitting section (3) has a laminated structure composed of a strained light-emitting layer having a composition formula (AlXGa1-X)YIn1-YP (0≦X≦0.1, 0.37≦Y≦0.46) and a barrier layer, wherein the strain adjustment layer (13) can be penetrated by light from the light-emitting section (3) and has a smaller lattice constant than those of the strained light-emitting layer and the barrier layer; and wherein a functional substrate (5) is bonded to a surface (11b) of the compound semiconductor layer (11) which is located on the opposite side with respect to the light extraction surface (11a) through a reflective structure (4).
    • 本发明涉及发射波长为655nm以上的发光二极管,具有出色的单色特性,高输出,高亮度,高效率,快速响应时间等特点,具有以下特征: 光提取面在与光提取面垂直的方向上行进,具有高方向性,能够高效地向外部释放热量; 和发光二极管灯。 发光二极管包括至少包含pn结型发光部分(3)和层压在发光部分(3)上的应变调节层(13)的化合物半导体层(11)。 其特征在于,所述发光部(3)具有由具有组成式(AlXGa1-X)YIn1-YP(0& nlE; X< ll; 0.1,0.37& nlE; Y< ll; 0.46)的应变发光层和阻挡层 层,其中应变调节层(13)可以被来自发光部(3)的光穿透,并且具有比应变发光层和阻挡层的晶格常数更小的晶格常数; 并且其中通过反射结构(4)将功能性基板(5)结合到位于相对于所述光提取表面(11a)的相对侧的化合物半导体层(11)的表面(11b)。
    • 8. 发明授权
    • Epitaxial wafer for light emitting diode
    • 用于发光二极管的外延晶片
    • US08482027B2
    • 2013-07-09
    • US13255166
    • 2010-02-24
    • Noriyoshi SeoAtsushi MatsumuraRyouichi Takeuchi
    • Noriyoshi SeoAtsushi MatsumuraRyouichi Takeuchi
    • H01L33/00H01L21/00
    • H01L33/12H01L33/30
    • An epitaxial wafer for a light emitting diode, including a GaAs substrate, a light emitting unit provided on the GaAs substrate, and a strain adjustment layer provided on the light emitting unit, wherein the light emitting unit has a strained light emitting layer having a composition formula of (AlXGa1-X)YIn1-YP (wherein X and Y are numerical values that satisfy 0≦X≦0.1 and 0.39≦Y≦0.45 respectively), and the strain adjustment layer is transparent to the emission wavelength and has a lattice constant that is smaller than the lattice constant of the GaAs substrate. The invention provides an epitaxial wafer that enables mass production of a high-output and/or high-efficiency LED having an emission wavelength of not less than 655 nm.
    • 一种用于发光二极管的外延晶片,包括GaAs衬底,设置在GaAs衬底上的发光单元和设置在发光单元上的应变调节层,其中发光单元具有具有组成的应变发光层 (AlXGa1-X)YIn1-YP(其中X和Y分别为满足0 @ X @ 0.1和0.39 @ Y @ 0.45的数值),并且应变调节层对于发射波长透明并且具有晶格常数 小于GaAs衬底的晶格常数。 本发明提供一种外延晶片,其能够批量生产具有不小于655nm的发射波长的高输出和/或高效率LED。