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    • 4. 发明申请
    • ESTIMATION METHOD OF CURIE TEMPERATURE DISTRIBUTION WIDTH
    • CURIE温度分布宽度的估计方法
    • US20140043707A1
    • 2014-02-13
    • US13568572
    • 2012-08-07
    • Satoshi TOMIKAWATomohito MIZUNO
    • Satoshi TOMIKAWATomohito MIZUNO
    • G11B27/36
    • G01R33/12G01R33/098
    • An estimation method includes a heating step in which a recording bit, on which a reference signal is recorded, is heated under each of heating conditions having different heating temperatures, the recording bit being at least one recording bit in the magnetic recording medium, and a measurement step in which a signal intensity with respect to the reference signal recorded in the recording bit after heating is measured under each of the heating conditions of the heating step. Based on the signal intensities with respect to the reference signal respectively measured in the measurement step, the distribution width of the Curie temperatures of the plurality of magnetic grains that form the magnetic recording layer is estimated.
    • 估计方法包括:加热步骤,其中记录有参考信号的记录位在具有不同加热温度的每个加热条件下被加热,所述记录位是磁记录介质中的至少一个记录位,以及 测量步骤,其中在加热步骤的每个加热条件下测量相对于在加热之后记录在记录位中的参考信号的信号强度。 基于相对于在测量步骤中测量的参考信号的信号强度,估计形成磁记录层的多个磁性颗粒的居里温度的分布宽度。
    • 7. 发明授权
    • Near-field light generating element and method for forming the element
    • 近场光产生元件及其形成方法
    • US08223611B2
    • 2012-07-17
    • US12328232
    • 2008-12-04
    • Kosuke TanakaSeiichi TakayamaSatoshi Tomikawa
    • Kosuke TanakaSeiichi TakayamaSatoshi Tomikawa
    • G11B7/00G11B7/135
    • G11B5/3163G11B5/314G11B5/6088G11B2005/0005G11B2005/0021
    • Provided is a method for forming a near-field light generating element, which is capable of sufficiently suppressing the unevenness of a waveguide surface and the distortion within the waveguide. The forming method comprises the steps of: forming a first etching stopper layer on a lower waveguide layer; forming a second etching stopper layer; forming, on the second etching stopper layer, a plasmon antenna material layer; performing etching with the second etching stopper layer used as a stopper, to form a first side surface of plasmon antenna; forming a side-surface protecting mask so as to cover the first side surface; and performing etching with the first and second etching stopper layers used as stoppers, to form the second side surface. By providing the first and second etching stopper layer, over-etching can be prevented even when each etching process takes enough etch time, which allows easy management of etching endpoints.
    • 本发明提供一种形成近场光产生元件的方法,其能够充分地抑制波导表面的不均匀性和波导内的变形。 成形方法包括以下步骤:在下波导层上形成第一蚀刻阻挡层; 形成第二蚀刻停止层; 在第二蚀刻停止层上形成等离子体激元天线材料层; 用作为阻挡件的第二蚀刻阻挡层进行蚀刻,以形成等离子体激元的第一侧表面; 形成侧面保护罩以覆盖第一侧面; 并且利用用作塞子的第一和第二蚀刻阻挡层进行蚀刻,以形成第二侧表面。 通过设置第一和第二蚀刻停止层,即使每个蚀刻工艺都需要足够的蚀刻时间,也可以防止过蚀刻,这允许蚀刻端点的容易管理。