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    • 3. 发明申请
    • E-BEAM DEFECT REVIEW SYSTEM
    • 电子束缺陷评估系统
    • US20100150429A1
    • 2010-06-17
    • US12335458
    • 2008-12-15
    • Jack JAUZhongwei CHENYi Xiang WANGChung-Shih PANJoe WANGXuedong LIUWeiming RENWei FANG
    • Jack JAUZhongwei CHENYi Xiang WANGChung-Shih PANJoe WANGXuedong LIUWeiming RENWei FANG
    • G06K9/00
    • G06T7/001G01N23/04G01N2223/102G01N2223/426G01N2223/611G06T2207/10061G06T2207/30148
    • The present invention relates to a defect review system, and/or particularly, to an apparatus and method of defect review sampling, review method and classification on a semiconductor wafer or a pattern lithography reticle during integrated circuit fabrication. These objects are achieved in comparing a reviewed image with a reference image pick-up through a smart sampling filter. A clustering computer system base on high speed network will provide data cache and save operation time and memory. A smart review sampling filter automatically relocate abnormal pattern or defects and classify the device location extracted from design database and/or from golden die image on the same substrate. The column of the present defect review system is comprised of the modified SORIL type objective lens. This column provides solution of improving throughput during sample review, material identification better image quality, and topography image of defect. One embodiment of the present invent adopts an optical auto focusing system to compromise micro height variation due wafer surface topography. And another embodiment adopts surface charge control system to regulate the charge accumulation due to electron irradiation during the review process.
    • 本发明涉及一种缺陷评估系统,和/或特别涉及在集成电路制造期间对半导体晶片或图案光刻掩模版进行缺陷评估抽样,评估方法和分类的装置和方法。 通过智能采样滤波器将经检查的图像与参考图像拾取进行比较,实现了这些目的。 基于高速网络的集群计算机系统将提供数据缓存,节省操作时间和内存。 智能检查采样过滤器自动重新定位异常模式或缺陷,并将从设计数据库中提取的设备位置和/或从相同基板上的金色模具图像分类。 本缺陷检查系统的列由改进的SORIL型物镜组成。 该栏提供了在样本审查期间提高吞吐量,材料识别更好的图像质量和缺陷的地形图像的解决方案。 本发明的一个实施例采用光学自动聚焦系统来破坏由晶片表面形貌引起的微高度变化。 另一个实施例采用表面电荷控制系统来调节在检查过程中由电子辐射引起的电荷累积。
    • 6. 发明授权
    • Apparatus of plural charged particle beams with multi-axis magnetic lens
    • 具有多轴磁性透镜的多个带电粒子束的装置
    • US08445862B2
    • 2013-05-21
    • US12968221
    • 2010-12-14
    • Zhongwei ChenWeiming RenKenichi KanaiXuedong Liu
    • Zhongwei ChenWeiming RenKenichi KanaiXuedong Liu
    • H01J37/143
    • H01J37/141H01J37/28H01J2237/1035H01J2237/1415H01J2237/1534
    • An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens. In the apparatus, some additional magnetic shielding measures such as magnetic shielding tubes, plates and house are used to eliminate the non-axisymmetric transverse field on the charged particle path from each charged particle source to the entrance of each sub-lens and from the exit of each sub-lens to the sample surface.
    • 设备基本上使用简单紧凑的多轴磁性透镜来同时将多个带电粒子束中的每一个聚焦在样品表面上。 在多轴磁性透镜的每个子透镜模块中,两个磁环分别插入具有非磁性径向间隙的上孔和下孔中。 每个间隙尺寸足够小以保持足够的磁耦合并且足够大以在靠近其光轴的空间中获得足够的磁标势电位分布的轴向对称性。 该方法同时消除了每个子透镜中的非轴对称横向场和所有子透镜之间的圆透镜场差; 都存在于传统的多轴磁性透镜中。 在该装置中,使用一些额外的磁屏蔽措施,例如磁屏蔽管,板和房子来消除带电粒子路径上从每个带电粒子源到每个子透镜的入口和从出口的入口处的非轴对称横向场 每个子透镜到样品表面。
    • 7. 发明授权
    • Wien filter
    • 维恩过滤器
    • US08436317B1
    • 2013-05-07
    • US13292455
    • 2011-11-09
    • Zhongwei ChenXuedong LiuWeiming Ren
    • Zhongwei ChenXuedong LiuWeiming Ren
    • H01J1/50
    • H01J37/05H01J49/288H01J2237/057
    • This invention provides a multi-pole type Wien filter, which acts more purely approaching its fundamentally expected performance. A 12-electrode electric device acts as an electric deflector, or acts as an electric deflector and an electric stigmator together. A cylindrical 4-coil magnetic device with a magnetic core acts as a magnetic deflector. Both can produce a dipole field while only incurring a negligibly-small 3rd order field harmonic. The magnetic core enhances the strength and more preciously regulates the distribution of the magnetic field originally generated by the coils. Then two ways to construct a Wien filter are proposed. One way is based on both of the foregoing electric and magnetic devices, and the other way is based on the foregoing electric device and a conventional magnetic deflector. The astigmatism in each of such Wien filters can be compensated by the electric stigmator of the electric device.
    • 本发明提供了一种多极型Wien滤波器,其更加纯粹地接近其根本预期的性能。 12电极电气装置用作电导向器,或者用作电导向器和电极连接器。 具有磁芯的圆柱形4线圈磁性装置用作磁导流板。 两者都可以产生偶极场,同时只产生一个可忽略的小三阶场谐波。 磁芯增强了强度,更加珍贵地调节了最初由线圈产生的磁场的分布。 然后提出构建维恩滤波器的两种方法。 一种方法是基于上述电气和磁性装置两者,另一种方法是基于前述的电气装置和常规的磁导向装置。 每个这样的维恩滤波器中的像散可以通过电气设备的电极来补偿。
    • 8. 发明授权
    • Wien filter with reduced field leakage
    • 维恩滤波器,减少了漏电
    • US08421029B1
    • 2013-04-16
    • US13298651
    • 2011-11-17
    • Weiming RenXuedong LiuZhongwei Chen
    • Weiming RenXuedong LiuZhongwei Chen
    • H01J1/50
    • H01J49/288H01J37/05H01J2237/057
    • This invention provides a design of Wien filter for satisfying Wien Condition so as to ensure the Wien filter's performance. At first, to minimize the magnetic flux leaking out of the Wien filter, the invention proposes three measures to form a magnetic circuit to cover the magnetic device of a Wien filter respectively. The measures especially benefit a Wien filter acting as beam separator or Monochromator in a high resolution SEM. Secondly, based on the Wien filter proposed in cross-reference, several ways are provided for reducing the dissatisfaction of Wien Condition within the Wien filter, which especially modify either or both of the distribution shapes of the on-axis electric and magnetic dipole fields at two ends of the Wien filter. These ways provide more flexibility to reduce the dissatisfaction of Wien Condition in a Wien filter to a given degree at a reasonable manufacturing cost.
    • 本发明提供了一种用于满足维恩条件的维恩滤波器的设计,以确保维恩滤波器的性能。 首先,为了使从Wien滤波器漏出的磁通量最小化,本发明提出了三种措施,以分别形成覆盖Wien滤波器的磁性装置的磁路。 该措施特别有益于在高分辨率扫描电镜中作为光束分离器或单色器的维恩滤光片。 其次,基于在交叉引用中提出的维恩滤波器,提供了几种方式来减少维恩滤波器中的维恩条件的不满,其特别地修改了在轴电磁场和磁偶极场的分布形状中的一个或两个 维恩过滤器的两端。 这些方式提供了更多的灵活性,可以以合理的制造成本将维恩过滤器中的维恩条件的不满度降低到给定的程度。