专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US10643819B2 Method and system for charged particle microscopy with improved image beam stabilization and interrogation 有权
公开(公告)号：US10643819B2
公开(公告)日：2020-05-05
申请号：US15079046
申请日：2016-03-24
申请人： KLA-Tencor Corporation
发明人： Doug K. Masnaghetti , Gabor Toth , David Trease , Rohit Bothra , Grace Hsiu-Ling Chen , Rainer Knippelmeyer
IPC分类号： H01J31/28 , H01J37/244 , H01J37/10 , H01J37/28 , G01N23/203
CPC分类号： H01J37/28 , G01N23/203 , H01J37/10 , H01J37/244 , G01N2223/6116 , H01J2237/0044 , H01J2237/0048 , H01J2237/057 , H01J2237/2448 , H01J2237/2449 , H01J2237/24465 , H01J2237/24475 , H01J2237/24485 , H01J2237/2804 , H01J2237/2806
摘要： A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

2. 发明授权

US09984852B1 Time-of-flight charged particle spectroscopy 有权
公开(公告)号：US09984852B1
公开(公告)日：2018-05-29
申请号：US15364145
申请日：2016-11-29
申请人： FEI Company
发明人： Otger Jan Luiten , Petrus Henricus Antonius Mutsaers , Jasper Frans Mathijs van Rens , Wouter Verhoeven , Erik René Kieft
IPC分类号： G01N23/00 , H01J37/26 , H01J37/20
CPC分类号： H01J37/26 , H01J37/05 , H01J37/20 , H01J37/244 , H01J2237/0437 , H01J2237/2442 , H01J2237/24485 , H01J2237/2449 , H01J2237/2626 , H01J2237/2802
摘要： An apparatus for performing charged particle spectroscopy, comprising: A source, for producing a pulsed beam of charged particles that propagate along a beam path; A specimen holder, for holding a specimen at an irradiation position in said beam path; A detector arrangement, for performing energy-differentiated detection of charged particles that traverse said specimen, wherein, between said source and said detector arrangement, said beam path successively traverses: An energizing cavity, for applying a time-dependent accelerating field to said beam; A primary drift space; Said irradiation position; A temporal focusing cavity, for converting an energy differential in said beam into a time-of-flight differential; A secondary drift space.

3. 发明授权

US09859096B2 Inspection apparatus and inspection method 有权
公开(公告)号：US09859096B2
公开(公告)日：2018-01-02
申请号：US15358324
申请日：2016-11-22
申请人： NuFlare Technology, Inc.
发明人： Munehiro Ogasawara
IPC分类号： G01B9/02 , G01B11/02 , H01J37/244 , H01J37/26 , H01J37/22 , H01J37/20 , H01J37/147
CPC分类号： H01J37/265 , H01J37/147 , H01J37/20 , H01J37/222 , H01J37/244 , H01J61/28 , H01J2237/0435 , H01J2237/20285 , H01J2237/20292 , H01J2237/221 , H01J2237/24475 , H01J2237/2448 , H01J2237/2449 , H01J2237/24592 , H01J2237/2817
摘要： An inspection apparatus according to an embodiment includes an irradiation part configured to irradiate an inspection target substrate with multiple beams including energy beams, a detector, on which a plurality of charged particle beams of charged particles released from the inspection target substrate are imaged, configured to detect each of the charged particle beams as an electrical signal, and a comparing unit configured to compare reference image data and image data that is reproduced based on the detected electrical signals and that represents patterns formed on the inspection target substrate to inspect the patterns. The detector includes a plurality of detecting elements corresponding one-to-one to the charged particle beams. The detecting elements each have a size greater than a size that covers a beam blur of each charged particle beam imaged on the detector.

4. 发明申请

US20170153195A1 METHOD AND DEVICE FOR DETECTING CHARGED PARTICLES 审中-公开
公开(公告)号：US20170153195A1
公开(公告)日：2017-06-01
申请号：US15359623
申请日：2016-11-23
申请人： Academia Sinica
发明人： Yi-Sheng WANG
IPC分类号： G01N27/02
CPC分类号： G01N27/025 , G01N27/66 , G01N2001/028 , H01J37/244 , H01J2237/2449 , H01J2237/24507
摘要： Disclosed herein is a device for the detection of charged particles of a sample material. The device includes at least, a charge stripping means disposed in a first electric field, and a detection electrode disposed in a second electric field. The charge stripping means may neutralize or strip the charges of ions generated from the sample material and thereby give rise to detectable signals. The signals, which correspond to the stripping events occurred at the charge stripping means, are detected by the detection electrode placed in a second electric field. Disclosed herein is also a method of detecting charged particles of a sample material using the device disclosed herein.

5. 发明申请

US20160372304A1 Method and System for Charged Particle Microscopy with Improved Image Beam Stabilization and Interrogation 审中-公开
标题翻译：具有改进的图像束稳定和询问的带电粒子显微镜的方法和系统
公开(公告)号：US20160372304A1
公开(公告)日：2016-12-22
申请号：US15079046
申请日：2016-03-24
申请人： KLA-Tencor Corporation
发明人： Doug K. Masnaghetti , Gabor Toth , David Trease , Rohit Bothra , Grace Hsiu-Ling Chen , Rainer Knippelmeyer
IPC分类号： H01J37/28 , H01J37/244 , H01J37/10
CPC分类号： H01J37/28 , G01N23/203 , G01N2223/6116 , H01J37/10 , H01J37/244 , H01J2237/0044 , H01J2237/0048 , H01J2237/057 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/2804 , H01J2237/2806
摘要： A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.
摘要翻译：公开了一种具有改善的图像束稳定性的扫描电子显微镜系统。该系统包括被配置为产生电子束的电子束源和一组电子 - 光学元件以将至少一部分电子束引导到样品的一部分上。该系统包括发射体分析器组件。该系统包括分配器元件，其被配置为将由样品的表面发射的至少一部分二次电子和/或反向散射电子引导到发射体分析器组件。发射分析器组件被配置成对二次电子和/或后向散射电子中的至少一个进行成像。

6. 发明申请

US20160365221A1 ANALYZING ENERGY OF CHARGED PARTICLES 审中-公开
标题翻译：分析充电颗粒的能量
公开(公告)号：US20160365221A1
公开(公告)日：2016-12-15
申请号：US15183061
申请日：2016-06-15
申请人： Carl Zeiss Microscopy GmbH
发明人： Dirk Preikszas
IPC分类号： H01J37/28 , H01J37/21 , H01J37/147 , H01J37/10
CPC分类号： H01J37/28 , H01J37/10 , H01J37/1475 , H01J37/21 , H01J37/244 , H01J2237/05 , H01J2237/24475 , H01J2237/24485 , H01J2237/2449
摘要： An analysis device, possibly having an electrostatic and/or magnetic lens, analyzes the energy of charged particles and has an opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device. Another portion of the charged particles passes through the opposing field grid device and is detected by a detector. The opposing field grid device has a curvature. A center of curvature is an intersection point of an optical axis with the opposing field grid device. The curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis. The opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and/or is arranged to be displaceable along the optical axis.
摘要翻译：可能具有静电和/或磁性透镜的分析装置分析带电粒子的能量，并且具有相反的场栅装置，以这样的方式施加电压，使得一部分带电粒子被相对场反射网格设备。带电粒子的另一部分通过相对的场栅装置并由检测器检测。相对的栅格装置具有曲率。曲率中心是光轴与相对的场格栅装置的交点。曲率具有由曲率中心与光轴起始点之间的部分给出的曲率半径。相对的栅格装置在从曲率中心观察时在起始点的方向上弯曲和/或被布置成沿着光轴可移位。

7. 发明申请

US20160225582A1 Method and System for Imaging of a Photomask Through a Pellicle 有权
标题翻译：通过防护薄膜成像光掩模的方法和系统
公开(公告)号：US20160225582A1
公开(公告)日：2016-08-04
申请号：US15012599
申请日：2016-02-01
申请人： KLA-Tencor Corporation
发明人： William G. Schultz , Gildardo Delgado , Garry A. Rose
IPC分类号： H01J37/28 , H01J37/147 , H01J37/26
CPC分类号： H01J37/28 , G03F1/62 , G03F1/86 , H01J37/244 , H01J2237/2002 , H01J2237/2445 , H01J2237/24475 , H01J2237/2448 , H01J2237/2449 , H01J2237/2817
摘要： A system for imaging a sample through a protective pellicle is disclosed. The system includes an electron beam source configured to generate an electron beam and a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample. The system also includes an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample. In addition, the system includes a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.
摘要翻译：公开了一种通过保护性薄膜成像样品的系统。该系统包括被配置为产生电子束的电子束源和被配置为固定样品和防护薄膜组件的样品台，其中防护薄膜组件设置在样品上方。该系统还包括电子 - 光学柱，其包括一组电子 - 光学元件，以将至少一部分电子束通过防护薄膜组件引导到样品的一部分上。此外，该系统包括位于防护薄膜组件上方并被配置成检测从样品表面发出的电子的检测器组件。

8. 发明授权

US09153413B2 Multi-beam scanning electron beam device and methods of using the same 有权
标题翻译：多光束扫描电子束装置及其使用方法
公开(公告)号：US09153413B2
公开(公告)日：2015-10-06
申请号：US12528307
申请日：2008-02-22
申请人： Gilad Almogy , Avishai Bartov , Juergen Frosien , Pavel Adamec , Helmut Banzhof
发明人： Gilad Almogy , Avishai Bartov , Juergen Frosien , Pavel Adamec , Helmut Banzhof
IPC分类号： G21K7/00 , H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.
摘要翻译：描述了多光束扫描电子束装置（100）。具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130）用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

9. 发明申请

US20150144785A1 Asymmetric Electrostatic Quadrupole Deflector for Improved Field Uniformity 有权
标题翻译：用于改善场均匀性的不对称静电四极杆
公开(公告)号：US20150144785A1
公开(公告)日：2015-05-28
申请号：US14532805
申请日：2014-11-04
申请人： KLA-Tencor Corporation
发明人： Christopher Sears
IPC分类号： H01J37/147 , H01J37/10 , H01J37/153
CPC分类号： H01J37/1472 , H01J37/10 , H01J37/1471 , H01J37/153 , H01J2237/10 , H01J2237/1508 , H01J2237/1516 , H01J2237/2448 , H01J2237/2449 , H01J2237/2602 , H01J2237/28
摘要： An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.
摘要翻译：用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。在目标衬底处检测到的二次电子被聚焦成二次电子束。具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

10. 发明申请

US20150028203A1 INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE 有权
标题翻译：检查由PELLICLE保护的LITHOGRAPHIC MASK
公开(公告)号：US20150028203A1
公开(公告)日：2015-01-29
申请号：US13948975
申请日：2013-07-23
申请人： Applied Materials Israel, Ltd.
发明人： Alon Litman , Nir Ben-David Dodzin , Albert Karabekov , Alex Goldenshtein
IPC分类号： G03F1/86 , H01J37/26
CPC分类号： G03F1/86 , G03F1/62 , G21K1/062 , H01J37/28 , H01J2237/164 , H01J2237/2002 , H01J2237/244 , H01J2237/2449 , H01J2237/2809 , H01J2237/2817
摘要： A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask
摘要翻译：一种用于评估光刻掩模的系统和方法，该系统可以包括：（a）用于将一次电子引导到位于电子光学器件和光刻掩模之间的防护薄膜的电子光学器件; 其中所述一次电子表现出允许所述一次电子通过所述防护薄膜并撞击所述光刻掩模的能级; （b）至少一个检测器，用于检测检测到的发射电子并产生检测信号; 其中由于一次电子撞击在光刻掩模上而产生检测到的发射电子; 和（c）用于处理检测信号以提供关于光刻掩模的信息的处理器

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式