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    • 3. 发明授权
    • Phase difference element and method for manufacturing the same
    • 相位差元件及其制造方法
    • US08842365B2
    • 2014-09-23
    • US13473100
    • 2012-05-16
    • Nobuyuki KoikeMasatoshi SasakiNaoki HanashimaAkio TakadaTakatoshi Yamada
    • Nobuyuki KoikeMasatoshi SasakiNaoki HanashimaAkio TakadaTakatoshi Yamada
    • G02B1/10G02B1/11
    • G02B1/115
    • A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate 11, an interface anti-reflection film group 12 and an obliquely vapor deposited film 13. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film group 12 is higher than the refractive index of the transparent substrate 11 and lesser than that of the obliquely vapor deposited film 13.
    • 公开了能够减少入射光反射的相位差元件和相位差元件的制造方法。 相位差元件包括透明基板11,界面防反射膜组12和倾斜气相沉积膜13.界面抗反射膜组由交替高和低折射率膜中的一个或多个组成,其中 各膜的膜厚度等于或小于使用的光的波长。 倾斜蒸镀膜由多层电介质材料形成。 这些层从彼此相差180°的两个方向交替倾斜蒸镀。 界面抗反射膜组12的折射率高于透明基板11的折射率,并且小于倾斜气相沉积膜13的折射率。
    • 4. 发明申请
    • PHASE DIFFERENCE ELEMENT AND METHOD FOR MANUFACTURING THE SAME
    • 相差元件及其制造方法
    • US20120293732A1
    • 2012-11-22
    • US13473100
    • 2012-05-16
    • Nobuyuki KoikeMasatoshi SasakiNaoki HanashimaAkio TakadaTakatoshi Yamada
    • Nobuyuki KoikeMasatoshi SasakiNaoki HanashimaAkio TakadaTakatoshi Yamada
    • G02F1/1335B05D5/06G02B1/11
    • G02B1/115
    • A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate 11, an interface anti-reflection film group 12 and an obliquely vapor deposited film 13. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film group 12 is higher than the refractive index of the transparent substrate 11 and lesser than that of the obliquely vapor deposited film 13 (FIG. 1).
    • 公开了能够减少入射光反射的相位差元件和相位差元件的制造方法。 相位差元件包括透明基板11,界面防反射膜组12和倾斜气相沉积膜13.界面抗反射膜组由交替高和低折射率膜中的一个或多个组成,其中 各膜的膜厚度等于或小于使用的光的波长。 倾斜蒸镀膜由多层电介质材料形成。 这些层从彼此相差180°的两个方向交替倾斜蒸镀。 界面抗反射膜组12的折射率高于透明基板11的折射率,并且小于倾斜气相沉积膜13(图1)的折射率。