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1. 发明授权

US11311903B2 Coating method and coating device with compensation for asymmetries of the spray jet 有权
公开(公告)号：US11311903B2
公开(公告)日：2022-04-26
申请号：US14345706
申请日：2012-09-05
申请人： Andreas Fischer , Ralph Glaser , Carmen Goltz
发明人： Andreas Fischer , Ralph Glaser , Carmen Goltz
IPC分类号： B05D1/04 , B05D1/02 , B05B12/08 , B05B13/04 , B05B12/16 , B05B5/04
摘要： The invention relates to a coating method for coating a component surface (4) with a coating agent, in particular for painting a motor vehicle body component with a paint, having the following steps: ⋅ emitting a spray jet (1) of the coating agent onto the component surface (4) of the component to be coated by means of an atomizer (2), said spray jet (1) having a main axis (5) and having an asymmetry with respect to the main axis (5) such that the spray jet (1) generates a spray pattern with a corresponding asymmetry on the component surface (4), and ⋅ at least partially compensating for the asymmetry of the spray jet (1) such that the asymmetry of the resulting spray pattern on the component surface (4) is reduced. The invention further relates to a corresponding coating device.

2. 发明申请

US20140220231A1 COATING METHOD AND COATING DEVICE WITH COMPENSATION FOR ASYMMETRIES OF THE SPRAY JET 审中-公开
标题翻译：涂料方法和涂料装置与喷涂喷嘴的不对称补偿
公开(公告)号：US20140220231A1
公开(公告)日：2014-08-07
申请号：US14345706
申请日：2012-09-05
申请人： Andreas Fischer , Ralph Glaser , Carmen Goltz
发明人： Andreas Fischer , Ralph Glaser , Carmen Goltz
IPC分类号： B05B15/04 , B05D1/04 , B05D1/02
CPC分类号： B05D1/04 , B05B5/04 , B05B12/082 , B05B12/16 , B05B13/0452 , B05D1/02 , G05B2219/45065
摘要： The invention relates to a coating method for coating a component surface (4) with a coating agent, in particular for painting a motor vehicle body component with a paint, having the following steps: • emitting a spray jet (1) of the coating agent onto the component surface (4) of the component to be coated by means of an atomizer (2), said spray jet (1) having a main axis (5) and having an asymmetry with respect to the main axis (5) such that the spray jet (1) generates a spray pattern with a corresponding asymmetry on the component surface (4), and • at least partially compensating for the asymmetry of the spray jet (1) such that the asymmetry of the resulting spray pattern on the component surface (4) is reduced. The invention further relates to a corresponding coating device.
摘要翻译：本发明涉及一种用涂料涂覆组分表面（4）的涂覆方法，特别是用涂料涂漆机动车辆部件，具有以下步骤：•发射喷涂剂（1）通过雾化器（2）到要涂覆的部件的部件表面（4）上，所述喷射喷嘴（1）具有主轴线（5），并且相对于主轴线（5）具有不对称性，使得喷射喷嘴（1）产生在组件表面（4）上具有对应不对称性的喷雾图案，以及•至少部分地补偿喷射喷嘴（1）的不对称性，使得所得到的喷涂图案在部件上的不对称性表面（4）减少。本发明还涉及相应的涂覆装置。

3. 发明授权

US09928995B2 Methods for preventing plasma un-confinement events in a plasma processing chamber 有权
公开(公告)号：US09928995B2
公开(公告)日：2018-03-27
申请号：US12820020
申请日：2010-06-21
申请人： Andreas Fischer , Rajinder Dhindsa
发明人： Andreas Fischer , Rajinder Dhindsa
IPC分类号： B23P6/00 , H01J37/32
CPC分类号： H01J37/32495 , H01J37/32082 , H01J37/32623 , Y10T29/49718
摘要： A method for configuring a plasma processing chamber for preventing a plasma un-confinement event during processing of a substrate from occurring outside of a confined plasma sustaining region is provided. The confined plasma sustaining region is defined by a set of confinement rings surrounding a bottom portion of an electrode is provided. The method includes determining a worst-case Debye length for a plasma generated in the plasma processing chamber during the processing. The method also includes performing at least one of adjusting gaps between any pair of adjacent confinement rings and adding at least one additional confinement ring to ensure that a gap between the any pair of adjacent confinement rings is less than the worst-case Debye length.

4. 发明授权

US09174296B2 Plasma ignition and sustaining methods and apparatuses 有权
标题翻译：等离子体点火和维持方法和装置
公开(公告)号：US09174296B2
公开(公告)日：2015-11-03
申请号：US12908459
申请日：2010-10-20
申请人： Neil Martin Paul Benjamin , Andreas Fischer
发明人： Neil Martin Paul Benjamin , Andreas Fischer
IPC分类号： B23K9/00 , B23K10/00 , B23K9/013
CPC分类号： H01J37/32541 , B23K9/013 , B23K10/00 , B23K2101/40 , H01J37/3211
摘要： An apparatus for generating plasma including a plasma generating vessel and a coil having a coil length and a first set of partially enclosing, longitudinally oriented conductive (PELOC) fingers and a second set of PELOC fingers. The PELOC finger sets are oriented along a longitudinal axis of the vessel with each partially enclosing a periphery of the vessel. The two sets of PELOC fingers are oriented fingertips facing fingertips and separated by an inter-set distance that is less than the coil length.
摘要翻译：一种用于产生等离子体的装置，包括等离子体发生容器和具有线圈长度的线圈和第一组部分封闭的纵向导电（PELOC）指状物和第二组PELOC指状物。 PELOC手指组沿着容器的纵向轴线定向，每个部分包围容器的周边。两组PELOC手指是面向指尖的定向指尖，并且以小于线圈长度的间隔距离分开。

5. 发明授权

US08911590B2 Integrated capacitive and inductive power sources for a plasma etching chamber 有权
标题翻译：用于等离子体蚀刻室的集成电容和感应电源
公开(公告)号：US08911590B2
公开(公告)日：2014-12-16
申请号：US11363703
申请日：2006-02-27
申请人： Rajinder Dhindsa , Mukund Srinivasan , Kenji Takeshita , Alexei Marakhtanov , Andreas Fischer
发明人： Rajinder Dhindsa , Mukund Srinivasan , Kenji Takeshita , Alexei Marakhtanov , Andreas Fischer
IPC分类号： H01L21/306 , C23C16/00 , H01J37/32
CPC分类号： H01J37/32862 , H01J37/32091 , H01J37/321 , H01J37/32642
摘要： Broadly speaking, the embodiments of the present invention provide an improved chamber cleaning mechanism. The present invention can also be used to provide additional knobs to tune the etch processes. In one embodiment, a plasma processing chamber configured to generate a plasma includes a bottom electrode assembly with an bottom electrode, wherein the bottom electrode is configured to receive a substrate. The plasma processing chamber includes a top electrode assembly with a top electrode and an inductive coil surrounding the top electrode. The inductive coil is configured to convert a gas into a plasma within a region defined within the chamber, wherein the region is outside an area defined above a top surface of the bottom electrode.
摘要翻译：广义而言，本发明的实施例提供了一种改进的室清洁机构。本发明还可以用于提供附加的旋钮来调整蚀刻工艺。在一个实施例中，构造成产生等离子体的等离子体处理室包括具有底部电极的底部电极组件，其中底部电极被配置为容纳衬底。等离子体处理室包括具有顶部电极的顶部电极组件和围绕顶部电极的感应线圈。感应线圈被配置为将气体转变成在腔室内限定的区域内的等离子体，其中该区域位于限定在底部电极的顶表面之上的区域之外。

6. 发明授权

US08747646B2 Process for the anodic cross-dehydrodimerization of arenes 有权
标题翻译：芳烃阳极交叉脱氢二聚化方法
公开(公告)号：US08747646B2
公开(公告)日：2014-06-10
申请号：US13375495
申请日：2010-06-01
申请人： Andreas Fischer , Itamar Michael Malkowsky , Florian Stecker , Siegfried R. Waldvogel , Axel Kirste
发明人： Andreas Fischer , Itamar Michael Malkowsky , Florian Stecker , Siegfried R. Waldvogel , Axel Kirste
IPC分类号： C25B3/10 , C25B3/00 , C25B3/02
CPC分类号： C25B3/10
摘要： The invention relates to a process for preparing biaryls by anodic cross-dehydrodimerization of substituted phenols with arenes in the presence of partially fluorinated and/or perfluorinated mediators and a supporting electrolyte.
摘要翻译：本发明涉及通过在部分氟化和/或全氟化的介质和支持电解质的存在下用芳烃进行阳离子交叉脱氢二聚化来制备联芳基的方法。

7. 发明授权

US08642810B2 Method for the direct amination of hydrocarbons into amino hydrocarbons, including electrochemical separation of hydrogen and electrochemical reaction of the hydrogen into water 有权
标题翻译：将烃直接胺化成氨基烃的方法，包括氢的电化学分离和氢的电化学反应进入水中
公开(公告)号：US08642810B2
公开(公告)日：2014-02-04
申请号：US13383014
申请日：2010-07-07
申请人： Petr Kubanek , Alexander Panchenko , Andreas Fischer , Thomas Heidemann
发明人： Petr Kubanek , Alexander Panchenko , Andreas Fischer , Thomas Heidemann
IPC分类号： C07C209/02
CPC分类号： C07C209/02 , B01D2255/00 , B01D2256/16 , B01D2257/108 , C25B3/00 , Y02P20/582 , C07C211/46
摘要： Process for the direct amination of hydrocarbons to aminohydrocarbons by reaction of a feed stream E comprising at least one hydrocarbon and at least one aminating reagent to form a reaction mixture R comprising aminohydrocarbon and hydrogen in a reaction zone RZ and electrochemical separation of at least part of the hydrogen formed in the reaction from the reaction mixture R by means of a gastight membrane-electrode assembly having at least one selectively proton-conducting membrane and at least one electrode catalyst on each side of the membrane, where at least part of the hydrogen is oxidized to protons at the anode catalyst on the retentate side of the membrane and the protons pass through the membrane and on the permeate side are reacted with oxygen to form water, where the oxygen originates from an oxygen-comprising stream O which is brought into contact with the permeate side of the membrane, over the cathode catalyst.
摘要翻译：通过包含至少一种烃和至少一种氨化试剂的进料流E的反应将碳氢化合物直接胺化成氨基烃的方法，以在反应区RZ中形成包含氨基烃和氢的反应混合物R，并且将至少部分通过具有至少一个选择性质子传导膜和至少一个电极催化剂的气密膜电极组件在反应混合物R的反应中形成的氢，其中至少部分氢是在阳极催化剂上在膜的滞留侧氧化成质子，并且质子通过膜并且在渗透侧与氧气反应以形成水，其中氧源自与氧接触的含氧物流O 与膜的渗透侧在阴极催化剂上。

8. 发明申请

US20140007413A1 PLASMA CONFINEMENT STRUCTURES IN PLASMA PROCESSING SYSTEMS AND METHODS THEREOF 有权
标题翻译：等离子体处理系统中的等离子体配合结构及其方法
公开(公告)号：US20140007413A1
公开(公告)日：2014-01-09
申请号：US14022111
申请日：2013-09-09
申请人： Eric Hudson , Andreas Fischer
发明人： Eric Hudson , Andreas Fischer
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： C23C16/00 , C23F1/00 , H01J37/32082 , H01J37/32623
摘要： A method for manufacturing a plasma processing system is provided. The method includes providing a movable plasma-facing structure configured to surround a plasma that is generated during processing of a substrate. The method also includes disposing a movable electrically conductive structure outside of the movable plasma-facing structure, wherein both structures configured to be deployed and retracted as a single unit to facilitate handling of the substrate. The movable electrically conductive structure is radio frequency (RF) grounded during the plasma processing. During processing, the RF current from the plasmas flows to the movable electrically conductive structure through the movable plasma-facing structure during the plasma processing. The method further includes coupling a set of conductive straps to the movable electrically conductive structure. The set of conductive straps accommodates the movable electrically conductive structure when it is deployed and retracted while providing the RF current a low impedance path to ground.
摘要翻译：提供了一种制造等离子体处理系统的方法。该方法包括提供构造成围绕在衬底的处理期间产生的等离子体的可移动等离子体面向结构。该方法还包括将可移动导电结构设置在可移动等离子体面向结构的外部，其中两个结构构造成作为单个单元展开和缩回以便于处理基板。可移动导电结构是在等离子体处理期间接地的射频（RF）。在处理期间，来自等离子体的RF电流在等离子体处理期间通过可移动等离子体面向结构流动到可移动导电结构。该方法还包括将一组导电带耦合到可移动导电结构。一组导电带在展开和缩回时容纳可移动的导电结构，同时为RF电流提供一个低阻抗地线路径。

9. 发明申请

US20130292856A1 METHOD FOR THE WAFER-LEVEL INTEGRATION OF SHAPE MEMORY ALLOY WIRES 有权
标题翻译：用于形状记忆合金线的水平集成的方法
公开(公告)号：US20130292856A1
公开(公告)日：2013-11-07
申请号：US13885257
申请日：2011-11-22
申请人： Stefan Braun , Frank Niklaus , Andreas Fischer , Henrik Gradin
发明人： Stefan Braun , Frank Niklaus , Andreas Fischer , Henrik Gradin
IPC分类号： H01L23/00
CPC分类号： H01L24/85 , B23K20/007 , C22C19/03 , H01L24/05 , H01L24/45 , H01L24/48 , H01L24/78 , H01L24/94 , H01L2224/04042 , H01L2224/05571 , H01L2224/05599 , H01L2224/45 , H01L2224/45015 , H01L2224/45139 , H01L2224/45155 , H01L2224/4813 , H01L2224/48453 , H01L2224/48463 , H01L2224/78301 , H01L2224/85045 , H01L2224/85099 , H01L2224/85205 , H01L2224/85345 , H01L2224/85375 , H01L2224/85385 , H01L2224/85399 , H01L2224/858 , H01L2224/85855 , H01L2224/85899 , H01L2924/00011 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01015 , H01L2924/01023 , H01L2924/01033 , H01L2924/10253 , H01L2924/14 , H01L2924/1461 , H01L2224/45099 , H01L2924/00 , H01L2224/05552 , H01L2924/01049 , H01L2924/00015 , H01L2924/20753 , H01L2924/01022
摘要： The present invention relates to a method to attach a shape memory alloy wire to a substrate, where the wire is mechanically attached into a 3D structure on the substrate. The present invention also relates to a device comprising a shape memory alloy wire attached to a substrate, where the wire is mechanically attached into a 3D structure on the substrate.
摘要翻译：本发明涉及一种将形状记忆合金线附着到基底上的方法，其中线被机械连接到基底上的3D结构中。本发明还涉及一种装置，其包括附接到基底的形状记忆合金丝，其中线被机械地附接到基底上的3D结构中。

10. 发明授权

US08500953B2 Edge ring assembly with dielectric spacer ring 有权
标题翻译：边缘环组件与介质隔离环
公开(公告)号：US08500953B2
公开(公告)日：2013-08-06
申请号：US12415114
申请日：2009-03-31
申请人： Jeremy Chang , Andreas Fischer , Babak Kadkhodayan
发明人： Jeremy Chang , Andreas Fischer , Babak Kadkhodayan
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01L21/467 , H01J37/32623 , Y10T29/4973
摘要： An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.
摘要翻译：边缘环组件围绕等离子体蚀刻室中的衬底支撑表面。边缘环组件包括边缘环和介电隔离环。围绕基板支撑表面并且沿着径向方向被边缘环包围的介电间隔环构造成使边缘环与基板绝缘。边缘环组件围绕衬底支撑表面的结合可以降低聚合物在衬底的下侧和沿着衬底边缘的聚集，并增加衬底的等离子体蚀刻均匀性。

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