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1. 发明授权

US07842344B2 Peptide and protein arrays and direct-write lithographic printing of peptides and proteins 有权
标题翻译：肽和蛋白质阵列和肽和蛋白质的直写平版印刷
公开(公告)号：US07842344B2
公开(公告)日：2010-11-30
申请号：US10788414
申请日：2004-03-01
申请人： Chad A. Mirkin , Jung-Hyurk Lim , David S. Ginger , Jwa-Min Nam , Ki-Bum Lee , Linette Demers , Albena Ivanisevic
发明人： Chad A. Mirkin , Jung-Hyurk Lim , David S. Ginger , Jwa-Min Nam , Ki-Bum Lee , Linette Demers , Albena Ivanisevic
IPC分类号： B05D1/36
CPC分类号： G03B27/42 , Y10S977/857 , Y10S977/884 , Y10S977/885 , Y10S977/886
摘要： The present invention relates to the use of direct-write lithographic printing of proteins and peptides onto surfaces. In particular, the present invention relates to methods for creating protein and peptide arrays and compositions derived therefrom. Nanoscopic tips can be used to deposit the peptide or protein onto the surface to produce a pattern. The pattern can be dots or lines having dot diameter and line width of less than 1,000 nm. The tips and the substrate surfaces can be adapted for the peptide and protein lithography.
摘要翻译：本发明涉及将蛋白质和肽直接写入平版印刷在表面上的用途。特别地，本发明涉及用于产生蛋白质和肽阵列的方法和由其衍生的组合物。可以使用纳米尖端将肽或蛋白质沉积到表面上以产生图案。图案可以是点直径和线宽小于1,000nm的点或线。尖端和底物表面可适用于肽和蛋白质光刻。

2. 发明申请

US20050009206A1 Peptide and protein arrays and direct-write lithographic printing of peptides and proteins 有权
标题翻译：肽和蛋白质阵列和肽和蛋白质的直写平版印刷
公开(公告)号：US20050009206A1
公开(公告)日：2005-01-13
申请号：US10788414
申请日：2004-03-01
申请人： Chad Mirkin , Jung-Hyurk Lim , David Ginger , Jwa-Min Nam , Ki-Bum Lee , Linette Demers , Albena Ivanisevic
发明人： Chad Mirkin , Jung-Hyurk Lim , David Ginger , Jwa-Min Nam , Ki-Bum Lee , Linette Demers , Albena Ivanisevic
IPC分类号： G01Q70/12 , G01Q60/00 , G01Q70/18 , G01Q80/00 , G03B27/42 , G01N33/543
CPC分类号： G03B27/42 , Y10S977/857 , Y10S977/884 , Y10S977/885 , Y10S977/886
摘要： The present invention relates to the use of direct-write lithographic printing of proteins and peptides onto surfaces. In particular, the present invention relates to methods for creating protein and peptide arrays and compositions derived therefrom. Nanoscopic tips can be used to deposit the peptide or protein onto the surface to produce a pattern. The pattern can be dots or lines having dot diameter and line width of less than 1,000 nm. The tips and the substrate surfaces can be adapted for the peptide and protein lithography.
摘要翻译：本发明涉及将蛋白质和肽直接写入平版印刷在表面上的用途。特别地，本发明涉及用于产生蛋白质和肽阵列的方法和由其衍生的组合物。可以使用纳米尖端将肽或蛋白质沉积到表面上以产生图案。图案可以是点直径和线宽小于1,000nm的点或线。尖端和底物表面可适用于肽和蛋白质光刻。

3. 发明授权

US07951334B2 Direct write nanolithographic deposition of nucleic acids from nanoscopic tips 有权
标题翻译：从纳米尖端直接写入纳米光刻的核酸
公开(公告)号：US07951334B2
公开(公告)日：2011-05-31
申请号：US12044738
申请日：2008-03-07
申请人： Chad A. Mirkin , Linette Demers , David S. Ginger
发明人： Chad A. Mirkin , Linette Demers , David S. Ginger
IPC分类号： B01L3/02
CPC分类号： G03F7/0002 , G01Q80/00 , Y10T436/2575
摘要： The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.
摘要翻译：描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案，包括导电和绝缘基底。含有反应性基团如硫醇基团的核酸（包括寡核苷酸）的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。反应性基团提供化学吸附或共价结合到基底表面。所得到的表现出良好稳定性的核酸特征可与互补核酸杂交，并使用例如用核酸官能化的纳米颗粒进行相应的探测。可以通过选择尖端处理，相对湿度和核酸结构来控制图案化。

4. 发明授权

US07361310B1 Direct write nanolithographic deposition of nucleic acids from nanoscopic tips 失效
标题翻译：从纳米尖端直接写入纳米光刻的核酸
公开(公告)号：US07361310B1
公开(公告)日：2008-04-22
申请号：US10307515
申请日：2002-12-02
申请人： Chad A. Mirkin , Linette Demers , David S. Ginger
发明人： Chad A. Mirkin , Linette Demers , David S. Ginger
IPC分类号： B01L3/02
CPC分类号： G03F7/0002 , G01Q80/00 , Y10T436/2575
摘要： The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.
摘要翻译：描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案，包括导电和绝缘基底。含有反应性基团如硫醇基团的核酸（包括寡核苷酸）的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。反应性基团提供化学吸附或共价结合到基底表面。所得到的表现出良好稳定性的核酸特征可与互补核酸杂交，并使用例如用核酸官能化的纳米颗粒进行相应的探测。可以通过选择尖端处理，相对湿度和核酸结构来控制图案化。

5. 发明申请

US20080269073A1 DIRECT WRITE NANOLITHOGRAPHIC DEPOSITION OF NUCLEIC ACIDS FROM NANOSCOPIC TIPS 有权
标题翻译：来自纳米结构的核酸的直接写入纳米晶体沉积
公开(公告)号：US20080269073A1
公开(公告)日：2008-10-30
申请号：US12044738
申请日：2008-03-07
申请人： Chad A. Mirkin , Linette Demers , David S. Ginger
发明人： Chad A. Mirkin , Linette Demers , David S. Ginger
IPC分类号： C40B40/06 , C40B50/18
CPC分类号： G03F7/0002 , G01Q80/00 , Y10T436/2575
摘要： The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.
摘要翻译：描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案，包括导电和绝缘基底。含有反应性基团如硫醇基团的核酸（包括寡核苷酸）的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。反应性基团提供化学吸附或共价结合到基底表面。所得到的表现出良好稳定性的核酸特征可与互补核酸杂交，并使用例如用核酸官能化的纳米颗粒进行相应的探测。可以通过选择尖端处理，相对湿度和核酸结构来控制图案化。

6. 发明授权

US08071168B2 Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair 失效
标题翻译：用于图案化导电材料的微米直写方法和应用于平板显示器维修
公开(公告)号：US08071168B2
公开(公告)日：2011-12-06
申请号：US11065694
申请日：2005-02-25
申请人： Sylvain Cruchon-Dupeyrat , Hua Zhang , Robert Elghanian , Linette Demers , Nabil Amro , Sandeep Disawal , John Bussan
发明人： Sylvain Cruchon-Dupeyrat , Hua Zhang , Robert Elghanian , Linette Demers , Nabil Amro , Sandeep Disawal , John Bussan
IPC分类号： B05D5/00
CPC分类号： C09D11/101 , C23C18/06 , C23C18/08 , C23C18/161 , C23C18/1667 , C23C18/1689 , C23C18/1692 , G03F7/0002 , H01L21/288 , H05K3/105 , H05K3/1241 , H05K2203/0195
摘要： A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material.
摘要翻译：一种用于直接写入具有微米和亚微米尺寸特征的导电金属迹线的新的低温方法。在该方法中，使用平面光束，例如具有或不具有尖端的AFM悬臂，以将金属前体油墨的痕迹绘制到基底上。金属轨迹的尺寸可以通过悬臂的几何形状直接控制，从而可以通过微加工的悬臂将可追溯的微量线从1微米到100微米宽的沉积物进行控制。具有尖锐尖端的悬臂可用于进一步将最小特征尺寸缩小至亚微米级。通过构建相似或不同材料的层可以增加特征的高度。

7. 发明授权

US07491422B2 Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrate 失效
标题翻译：使用弹性体聚合物涂覆的纳米级尖端输送墨水的直写式纳米光刻方法形成在基底上具有内部空洞的结构
公开(公告)号：US07491422B2
公开(公告)日：2009-02-17
申请号：US11056391
申请日：2005-02-14
申请人： Hua Zhang , Robert Elghanian , Linette Demers , Nabil Amro , Sandeep Disawal , Sylvain Cruchon-Dupeyrat
发明人： Hua Zhang , Robert Elghanian , Linette Demers , Nabil Amro , Sandeep Disawal , Sylvain Cruchon-Dupeyrat
IPC分类号： B05D5/00 , B05D1/28 , B82B1/00 , G01N33/00 , G03F1/00
CPC分类号： B81C1/0046 , G03F7/0002 , G03F7/2049 , Y10S977/857 , Y10S977/863 , Y10S977/879
摘要： A novel method of transporting ink to a substrate with dip-pen nanolithographic (DPN) stamp tips coated with polymer (e.g., polydimethylsiloxane (PDMS), etc.). This kind of tip adsorbs chemicals (“inks”) easily and is used to generate DPN nanopatterns that are imaged with the same tip after a DPN process. This method builds a bridge between micro-contact printing (μCP) and DPN, making it possible for one to easily generate smaller structures of any molecules that have been patterned by the μCP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional Si3N4 probe tip. Importantly, the unique stamp tip was able to transfer solvent (e.g., liquid “ink”) onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step. Inks comprising metals and sol-gel materials are noted, as well as applications in photomask repair, enhancement, and fabrication.
摘要翻译：使用涂覆有聚合物（例如聚二甲基硅氧烷（PDMS）等）的浸笔纳米光刻（DPN）印模尖端将墨输送到基底的新方法。这种尖端容易吸附化学物质（“油墨”），并用于产生在DPN工艺之后用相同尖端成像的DPN纳米图案。该方法构建了微接触印刷（muCP）和DPN之间的桥梁，使得可以轻松地生成通过muCP技术图案化的任何分子的较小结构。简单的涂层和书写过程丰富了最先进的DPN技术。通过使用这种新型尖端获得的亚100nm DPN分辨率与常规Si 3 N 4探针尖端的分辨率相当。重要的是，独特的压头能够将溶剂（例如液体“墨”）转移到基底上，从而制造具有仅一个DPN保持/书写步骤的中空纳米结构。注意到包含金属和溶胶 - 凝胶材料的油墨，以及光掩模修复，增强和制造中的应用。

8. 发明申请

US20100297190A1 IDENTIFICATION FEATURES 审中-公开
标题翻译：识别功能
公开(公告)号：US20100297190A1
公开(公告)日：2010-11-25
申请号：US12536465
申请日：2009-08-05
申请人： Cedric Loiret-Bernal , Linette Demers , Bjoern Rosner , Michael Nelson , Ray Eby , Joseph S. Fragala , Raymond Roger Shile , Hua Zhang , John Edward Bussan , Sylvain Cruchon-Dupeyrat
发明人： Cedric Loiret-Bernal , Linette Demers , Bjoern Rosner , Michael Nelson , Ray Eby , Joseph S. Fragala , Raymond Roger Shile , Hua Zhang , John Edward Bussan , Sylvain Cruchon-Dupeyrat
IPC分类号： A61K9/00 , A61P43/00
CPC分类号： B30B15/065 , B30B15/34 , G06K19/06028
摘要： Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described.
摘要翻译：用于提供药物组合物和物体具有难以检测的识别区域和识别特征的方法。使用微光刻，纳米光刻和冲压方法。识别特征可以是相对于表面的正突起或负凹痕。识别区域可以包括条形码和全息图。可以使用DPN印刷或诸如电子束光刻，光刻或纳米压印光刻的其它平版印刷术来制备标记，然后将其用于制备识别特征。可以形成冗余图案。本发明可用于防伪。还描述了用于冲压识别特征的装置。

9. 发明申请

US20100294844A1 Identification features 有权
标题翻译：识别功能
公开(公告)号：US20100294844A1
公开(公告)日：2010-11-25
申请号：US11109877
申请日：2005-04-20
申请人： Cedric Loiret-Bernal , Linette Demers , Bjoern Rosner , Michael Nelson , Ray Eby , Joseph S. Fragala , Raymond Roger Shile , Hua Zhang , John Edward Bussan , Sylvain Cruchon-Dupeyrat
发明人： Cedric Loiret-Bernal , Linette Demers , Bjoern Rosner , Michael Nelson , Ray Eby , Joseph S. Fragala , Raymond Roger Shile , Hua Zhang , John Edward Bussan , Sylvain Cruchon-Dupeyrat
IPC分类号： G06K19/06 , B30B15/34
CPC分类号： B30B15/065 , B30B15/34 , G06K19/06028
摘要： Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described.
摘要翻译：用于提供药物组合物和物体具有难以检测的识别区域和识别特征的方法。使用微光刻，纳米光刻和冲压方法。识别特征可以是相对于表面的正突起或负凹痕。识别区域可以包括条形码和全息图。可以使用DPN印刷或诸如电子束光刻，光刻或纳米压印光刻的其它平版印刷术来制备标记，然后将其用于制备识别特征。可以形成冗余图案。本发明可用于防伪。还描述了用于冲压识别特征的装置。

10. 发明授权

US07005378B2 Processes for fabricating conductive patterns using nanolithography as a patterning tool 失效
标题翻译：使用纳米光刻作为图案形成工具制造导电图案的工艺
公开(公告)号：US07005378B2
公开(公告)日：2006-02-28
申请号：US10647430
申请日：2003-08-26
申请人： Percy Vandorn Crocker, Jr. , Linette Demers , Nabil A. Amro
发明人： Percy Vandorn Crocker, Jr. , Linette Demers , Nabil A. Amro
IPC分类号： H01L21/44
CPC分类号： C23C18/06 , B82Y10/00 , B82Y40/00 , C23C18/08 , C23C18/161 , C23C18/1612 , C23C18/1658 , C23C18/1666 , C23C18/1667 , C23C18/1678 , G03F7/0002 , H01L21/288 , H01L21/76838 , H05K3/105 , H05K3/1241 , Y10S438/929
摘要： Nanolithographic deposition of metallic nanostructures using coated tips for use in microelectronics, catalysis, and diagnostics. AFM tips can be coated with metallic precursors and the precursors patterned on substrates. The patterned precursors can be converted to the metallic state with application of heat. High resolution and excellent alignment can be achieved.
摘要翻译：使用涂覆尖端的金属纳米结构的纳米光刻沉积用于微电子学，催化和诊断。 AFM尖端可以用金属前体涂覆，并且前体在基底上图案化。图案化的前体可以通过加热转化成金属状态。可以实现高分辨率和优异的对准。

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