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    • 5. 发明授权
    • High speed silicon-based lateral junction photodetectors having recessed
electrodes and thick oxide to reduce fringing fields
    • 具有凹陷电极和厚氧化物的高速硅基侧面光电探测器,以减少边缘场
    • US5525828A
    • 1996-06-11
    • US294897
    • 1994-08-23
    • Ernest BassousJean-Marc HalboutSubramanian S. IyerRajiv V. JoshiVijay P. KesanMichael R. ScheuermannMassimo A. Ghioni
    • Ernest BassousJean-Marc HalboutSubramanian S. IyerRajiv V. JoshiVijay P. KesanMichael R. ScheuermannMassimo A. Ghioni
    • H01L31/02H01L31/105H01L31/108H01L31/07
    • H01L31/105H01L31/02024H01L31/1085
    • Silicon-VLSI-compatible photodetectors, in the form of a metal-semiconductor-metal photodetector (MSM-PD) or a lateral p-i-n photodetector (LPIN-PD), are disclosed embodying interdigitated metallic electrodes on a silicon surface. The electrodes of the MSM-PD have a moderate to high electron and hole barrier height to silicon, for forming the Schottky barriers, and are fabricated so as to be recessed in the surface semiconducting layer of silicon through the use of self-aligned metallization either by selective deposition or by selective reaction and etching, in a manner similar to the SALICIDE concept. Fabrication is begun by coating the exposed Si surface of a substrate with a transparent oxide film, such that the Si/oxide interface exhibits low surface recombination velocity. The interdigitated pattern is then etched through the oxide film by lithography to expose the Si surface and metallic electrode members are formed selectively in the exposed Si surface, using self-aligned metallization to produce thin interdigitated electrodes recessed below the silicon surface, which itself may be on a comparatively thin Si layer. The electrodes may be spaced to minimize the interdigital carrier transit time and maximize the sensitivity and the entire process and structure are compatible with conventional silicon integrated circuit (IC) technology. A further feature involves isolating the semiconductor surface layer from the substrate by a layer that may be either 1) transparent and insulating, 2) optically absorbing, or 3) optically reflecting, so that the photocarriers recombine before they can be collected by the field. In the latter case, the photodetector acts as a resonant cavity, resulting in an increase in the number of carriers that are generated, and hence a more sensitive device.
    • 在硅表面上公开了金属 - 半导体 - 金属光电探测器(MSM-PD)或横向p-i-n光电检测器(LPIN-PD)形式的硅 - VLSI兼容光电探测器。 MSM-PD的电极具有对于硅的中等到高电子和空穴阻挡高度,用于形成肖特基势垒,并且通过使用自对准金属化制造成凹入硅的表面半导体层 通过选择性沉积或通过选择性反应和蚀刻,以类似于SALICIDE概念的方式。 通过用透明氧化膜涂覆衬底的暴露的Si表面开始制造,使得Si /氧化物界面表现出低的表面复合速度。 然后通过光刻法将交错图案通过氧化膜蚀刻以暴露Si表面,并且使用自对准金属化选择性地在暴露的Si表面中形成金属电极构件,以产生凹陷在硅表面下方的薄的叉指电极,其本身可以是 在较薄的Si层上。 这些电极可以间隔开,以最小化叉指运送通过时间并使灵敏度最大化,并且整个过程和结构与传统的硅集成电路(IC)技术相兼容。 另一个特征包括通过可以是1)透明和绝缘,2)光学吸收或3)光学反射的层将衬底的半导体表面层隔离,使得光载流子在它们可以被场收集之前复合。 在后一种情况下,光电探测器用作谐振腔,导致所产生的载流子数量增加,因此增加了更敏感的装置。