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1. 发明申请

US20100221865A1 Crosstalk Improvement Through P On N Structure For Image Sensor 有权
标题翻译：通过P图像传感器的N结构进行串扰改善
公开(公告)号：US20100221865A1
公开(公告)日：2010-09-02
申请号：US12780625
申请日：2010-05-14
申请人： Chung-Wei Chang , Han-Chi Liu , Chun-Yao Ko , Shou-Gwo Wuu
发明人： Chung-Wei Chang , Han-Chi Liu , Chun-Yao Ko , Shou-Gwo Wuu
IPC分类号： H01L31/18
CPC分类号： H01L27/1463 , H01L21/761 , H01L27/14603 , H01L27/14609 , H01L27/14621 , H01L27/14627 , H01L27/14643 , H01L27/14689 , H01L31/035272
摘要： The present disclosure provides an image sensor semiconductor device. The semiconductor device includes a semiconductor substrate having a first type of dopant; a semiconductor layer having a second type of dopant different from the first type of dopant and disposed on the semiconductor substrate; and an image sensor formed in the semiconductor layer.
摘要翻译：本公开提供了一种图像传感器半导体器件。半导体器件包括具有第一类掺杂剂的半导体衬底; 半导体层，其具有不同于所述第一类型掺杂剂的第二类型的掺杂剂并且设置在所述半导体衬底上; 以及形成在半导体层中的图像传感器。

2. 发明授权

US07388187B1 Cross-talk reduction through deep pixel well implant for image sensors 有权
标题翻译：通过图像传感器的深像素阱植入进行串扰减少
公开(公告)号：US07388187B1
公开(公告)日：2008-06-17
申请号：US11682428
申请日：2007-03-06
申请人： Han-Chi Liu , Chung-Wei Chang , Shou-Gwo Wuu , Tong-Chern Ong , Chun-Yao Ko
发明人： Han-Chi Liu , Chung-Wei Chang , Shou-Gwo Wuu , Tong-Chern Ong , Chun-Yao Ko
IPC分类号： H01L31/00
CPC分类号： H01L27/14654 , H01L27/1463
摘要： An image sensor device includes a semiconductor substrate having a first type of conductivity, a semiconductor layer having the first type of conductivity formed on the semiconductor substrate, and pixels formed in the semiconductor layer. The semiconductor layer includes a first deep well having the first type of conductivity and substantially underlying the plurality of pixels, and a second deep well having a second type of conductivity different from the first type of conductivity and substantially underlying the first deep well.
摘要翻译：图像传感器装置包括具有第一导电类型的半导体衬底，在半导体衬底上形成具有第一类型导电性的半导体层和形成在半导体层中的像素。半导体层包括具有第一类型导电性并且基本上位于多个像素下面的第一深阱，以及具有不同于第一类型导电性的第二类型导电性并且基本上位于第一深阱的第二深阱。

3. 发明授权

US08368130B2 Method and device to reduce dark current in image sensors 有权
标题翻译：降低图像传感器暗电流的方法和装置
公开(公告)号：US08368130B2
公开(公告)日：2013-02-05
申请号：US12968047
申请日：2010-12-14
申请人： Chun-Yao Ko , Chung-Wei Chang , Han-Chi Liu , Shou-Gwo Wuu
发明人： Chun-Yao Ko , Chung-Wei Chang , Han-Chi Liu , Shou-Gwo Wuu
IPC分类号： H01L27/146 , H01L31/0232 , H01L31/0352
CPC分类号： H01L27/14689 , H01L27/14609
摘要： A method to fabricate an image sensor includes providing a semiconductor substrate having a pixel area and a logic area, forming a light sensing element in the pixel area, and forming a first transistor in the pixel area and a second transistor in the logic area. The step of forming the first transistor in the pixel area and the second transistor in the logic area includes performing a first implant process in the pixel area and the logic area, performing a second implant process in the pixel area and the logic area, and performing a third implant process only in the logic area.
摘要翻译：制造图像传感器的方法包括提供具有像素区域和逻辑区域的半导体衬底，在像素区域中形成光感测元件，以及在像素区域中形成第一晶体管和在逻辑区域中形成第二晶体管。在逻辑区域中的像素区域和第二晶体管中形成第一晶体管的步骤包括在像素区域和逻辑区域中执行第一注入处理，在像素区域和逻辑区域中执行第二注入处理，以及执行仅在逻辑区域中进行第三次植入过程。

4. 发明申请

US20110133260A1 METHOD AND DEVICE TO REDUCE DARK CURRENT IN IMAGE SENSORS 有权
标题翻译：减少图像传感器中的暗电流的方法和装置
公开(公告)号：US20110133260A1
公开(公告)日：2011-06-09
申请号：US12968047
申请日：2010-12-14
申请人： Chun-Yao Ko , Chung-Wei Chang , Han-Chi Liu , Shou-Gwo Wuu
发明人： Chun-Yao Ko , Chung-Wei Chang , Han-Chi Liu , Shou-Gwo Wuu
IPC分类号： H01L31/113
CPC分类号： H01L27/14689 , H01L27/14609
摘要： A method to fabricate an image sensor includes providing a semiconductor substrate having a pixel area and a logic area, forming a light sensing element in the pixel area, and forming a first transistor in the pixel area and a second transistor in the logic area. The step of forming the first transistor in the pixel area and the second transistor in the logic area includes performing a first implant process in the pixel area and the logic area, performing a second implant process in the pixel area and the logic area, and performing a third implant process only in the logic area.
摘要翻译：制造图像传感器的方法包括提供具有像素区域和逻辑区域的半导体衬底，在像素区域中形成光感测元件，以及在像素区域中形成第一晶体管和在逻辑区域中形成第二晶体管。在逻辑区域中的像素区域和第二晶体管中形成第一晶体管的步骤包括在像素区域和逻辑区域中执行第一注入处理，在像素区域和逻辑区域中执行第二注入处理，以及执行仅在逻辑区域中进行第三次植入过程。

5. 发明授权

US07879639B2 Method and device to reduce dark current in image sensors 有权
标题翻译：降低图像传感器暗电流的方法和装置
公开(公告)号：US07879639B2
公开(公告)日：2011-02-01
申请号：US11735226
申请日：2007-04-13
申请人： Chun-Yao Ko , Chung-Wei Chang , Han-Chi Liu , Shou-Gwo Wuu
发明人： Chun-Yao Ko , Chung-Wei Chang , Han-Chi Liu , Shou-Gwo Wuu
IPC分类号： H01L21/00
CPC分类号： H01L27/14689 , H01L27/14609
摘要： A method to fabricate an image sensor includes providing a semiconductor substrate having a pixel area and a logic area, forming a light sensing element in the pixel area, and forming a first transistor in the pixel area and a second transistor in the logic area. The step of forming the first transistor in the pixel area and the second transistor in the logic area includes performing a first implant process in the pixel area and the logic area, performing a second implant process in the pixel area and the logic area, and performing a third implant process only in the logic area.
摘要翻译：制造图像传感器的方法包括提供具有像素区域和逻辑区域的半导体衬底，在像素区域中形成光感测元件，以及在像素区域中形成第一晶体管和在逻辑区域中形成第二晶体管。在逻辑区域中的像素区域和第二晶体管中形成第一晶体管的步骤包括在像素区域和逻辑区域中执行第一注入处理，在像素区域和逻辑区域中执行第二注入处理，以及执行仅在逻辑区域中进行第三次植入过程。

6. 发明授权

US07732844B2 Crosstalk improvement through P on N structure for image sensor 有权
标题翻译：通过P on N结构对图像传感器进行串扰改善
公开(公告)号：US07732844B2
公开(公告)日：2010-06-08
申请号：US11682350
申请日：2007-03-06
申请人： Chung-Wei Chang , Han-Chi Liu , Chun-Yao Ko , Shou-Gwo Wuu
发明人： Chung-Wei Chang , Han-Chi Liu , Chun-Yao Ko , Shou-Gwo Wuu
IPC分类号： H01L31/062
CPC分类号： H01L27/1463 , H01L21/761 , H01L27/14603 , H01L27/14609 , H01L27/14621 , H01L27/14627 , H01L27/14643 , H01L27/14689 , H01L31/035272
摘要： The present disclosure provides an image sensor semiconductor device. The semiconductor device includes a semiconductor substrate having a first type of dopant; a semiconductor layer having a second type of dopant different from the first type of dopant and disposed on the semiconductor substrate; and an image sensor formed in the semiconductor layer.
摘要翻译：本公开提供了一种图像传感器半导体器件。半导体器件包括具有第一类掺杂剂的半导体衬底; 半导体层，其具有不同于所述第一类型掺杂剂的第二类型的掺杂剂并且设置在所述半导体衬底上; 以及形成在半导体层中的图像传感器。

7. 发明申请

US20080251821A1 METHOD AND DEVICE TO REDUCE DARK CURRENT IN IMAGE SENSORS 有权
标题翻译：减少图像传感器中的暗电流的方法和装置
公开(公告)号：US20080251821A1
公开(公告)日：2008-10-16
申请号：US11735226
申请日：2007-04-13
申请人： Chun-Yao Ko , Chung-Wei Chang , Han-Chi Liu , Shou-Gwo Wuu
发明人： Chun-Yao Ko , Chung-Wei Chang , Han-Chi Liu , Shou-Gwo Wuu
IPC分类号： H01L31/062 , H01L21/00
CPC分类号： H01L27/14689 , H01L27/14609
摘要： A method to fabricate an image sensor includes providing a semiconductor substrate having a pixel area and a logic area, forming a light sensing element in the pixel area, and forming a first transistor in the pixel area and a second transistor in the logic area. The step of forming the first transistor in the pixel area and the second transistor in the logic area includes performing a first implant process in the pixel area and the logic area, performing a second implant process in the pixel area and the logic area, and performing a third implant process only in the logic area.
摘要翻译：制造图像传感器的方法包括提供具有像素区域和逻辑区域的半导体衬底，在像素区域中形成光感测元件，以及在像素区域中形成第一晶体管和在逻辑区域中形成第二晶体管。在逻辑区域中的像素区域和第二晶体管中形成第一晶体管的步骤包括在像素区域和逻辑区域中执行第一注入处理，在像素区域和逻辑区域中执行第二注入处理，以及执行仅在逻辑区域中进行第三次植入过程。

8. 发明授权

US08669133B2 Crosstalk improvement through P on N structure for image sensor 有权
标题翻译：通过P on N结构对图像传感器进行串扰改善
公开(公告)号：US08669133B2
公开(公告)日：2014-03-11
申请号：US12780625
申请日：2010-05-14
申请人： Chung-Wei Chang , Han-Chi Liu , Chun-Yao Ko , Shou-Gwo Wuu
发明人： Chung-Wei Chang , Han-Chi Liu , Chun-Yao Ko , Shou-Gwo Wuu
IPC分类号： H01L21/00
CPC分类号： H01L27/1463 , H01L21/761 , H01L27/14603 , H01L27/14609 , H01L27/14621 , H01L27/14627 , H01L27/14643 , H01L27/14689 , H01L31/035272
摘要： The present disclosure provides an image sensor semiconductor device. The semiconductor device includes a semiconductor substrate having a first type of dopant; a semiconductor layer having a second type of dopant different from the first type of dopant and disposed on the semiconductor substrate; and an image sensor formed in the semiconductor layer.
摘要翻译：本公开提供了一种图像传感器半导体器件。半导体器件包括具有第一类掺杂剂的半导体衬底; 半导体层，其具有不同于所述第一类型掺杂剂的第二类型的掺杂剂并且设置在所述半导体衬底上; 以及形成在半导体层中的图像传感器。

9. 发明申请

US20080105944A1 Crosstalk Improvement Through P on N Structure For Image Sensor 有权
标题翻译：通过P对图像传感器的N结构进行串扰改进
公开(公告)号：US20080105944A1
公开(公告)日：2008-05-08
申请号：US11682350
申请日：2007-03-06
申请人： Chung-Wei Chang , Han-Chi Liu , Chun-Yao Ko , Shou-Gwo Wuu
发明人： Chung-Wei Chang , Han-Chi Liu , Chun-Yao Ko , Shou-Gwo Wuu
IPC分类号： H01L31/06 , H01L31/068
CPC分类号： H01L27/1463 , H01L21/761 , H01L27/14603 , H01L27/14609 , H01L27/14621 , H01L27/14627 , H01L27/14643 , H01L27/14689 , H01L31/035272
摘要： The present disclosure provides an image sensor semiconductor device. The semiconductor device includes a semiconductor substrate having a first type of dopant; a semiconductor layer having a second type of dopant different from the first type of dopant and disposed on the semiconductor substrate; and an image sensor formed in the semiconductor layer.
摘要翻译：本公开提供了一种图像传感器半导体器件。半导体器件包括具有第一类掺杂剂的半导体衬底; 半导体层，其具有不同于所述第一类型掺杂剂的第二类型的掺杂剂并且设置在所述半导体衬底上; 以及形成在半导体层中的图像传感器。

10. 发明申请

US20090243025A1 PIXEL STRUCTURE WITH A PHOTODETECTOR HAVING AN EXTENDED DEPLETION DEPTH 审中-公开
标题翻译：具有延伸深度深度的光电转换器的像素结构
公开(公告)号：US20090243025A1
公开(公告)日：2009-10-01
申请号：US12054505
申请日：2008-03-25
申请人： Eric G. Stevens , Hung Q. Doan , Shou-Gwo Wuu , Chung-Wei Chang
发明人： Eric G. Stevens , Hung Q. Doan , Shou-Gwo Wuu , Chung-Wei Chang
IPC分类号： H01L31/101
CPC分类号： H01L27/14609 , H01L27/14603 , H01L27/14689
摘要： An image sensor includes an imaging area that includes a plurality of pixels that are formed in a substrate layer of a first conductivity type. Each pixel includes a collection region that is formed in a portion of the substrate layer and doped with a dopant of a first conductivity type. A plurality of wells are disposed in portions of the substrate layer and doped with another dopant of the second conductivity type. Each well is positioned laterally adjacent to each collection region. A buried layer spans the imaging area and is disposed in a portion of the substrate layer that is beneath the photodetectors and the wells. The buried layer is doped with a dopant of a second conductivity type. Each collection region, each well, and the buried layer are formed such that a region of the substrate layer having substantially the same doping as the substrate layer resides between each collection region and the buried layer.
摘要翻译：图像传感器包括具有形成在第一导电类型的衬底层中的多个像素的成像区域。每个像素包括形成在衬底层的一部分中并掺杂有第一导电类型的掺杂剂的收集区域。多个阱设置在衬底层的部分中并且掺杂有另一种第二导电类型的掺杂剂。每个井横向定位在每个收集区域附近。掩埋层跨越成像区域并且被布置在基底层的位于光电检测器和孔下方的部分中。掩埋层掺杂有第二导电类型的掺杂剂。每个收集区域，每个阱和掩埋层被形成为使得具有与衬底层基本相同的掺杂的衬底层的区域驻留在每个收集区域和掩埋层之间。

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