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    • 5. 发明授权
    • Solar servo control tracking device
    • 太阳能伺服控制跟踪装置
    • US08042534B2
    • 2011-10-25
    • US12222759
    • 2008-08-15
    • Kee Hyok ChoiIn Cheol LimHyun Woo KimHyeok Jae WooKyoo Jae Shin
    • Kee Hyok ChoiIn Cheol LimHyun Woo KimHyeok Jae WooKyoo Jae Shin
    • F24J2/38
    • G01S3/7861F24S30/425F24S50/20F24S2030/135H02S20/10H02S20/32H02S40/32H02S40/42Y02E10/47
    • A solar servo control tracking device is disclosed. The device includes: an integrated control device having a solar cell sensor unit detecting luminance at a solar azimuth, and an integrated control panel transmitting a control signal at a maximal solar azimuth, calculated by comparing a solar azimuth from the luminance at a solar azimuth; and solar tracking devices, respectively having a tracking device controller receiving the control signal via a wireless link, a high torque driving unit with an AC single phase inductor to generate driving torque by the control signal from the tracking device controller, solar module assemblies driven by the high torque driving unit to track the solar azimuth in accordance with the control signal, and an operating angle sensor unit installed to the high torque driving unit to detect operating angles of the solar module assemblies that track the sun by the control signal.
    • 公开了一种太阳能伺服控制跟踪装置。 该装置包括:集成控制装置,其具有检测太阳方位角的亮度的太阳能电池传感器单元;以及综合控制面板,其通过将太阳方位角与太阳方位角的亮度进行比较而计算出的最大太阳方位角的控制信号; 和分别具有通过无线链路接收控制信号的跟踪装置控制器的太阳跟踪装置,具有AC单相电感器的高扭矩驱动单元,以通过来自跟踪装置控制器的控制信号产生驱动转矩,太阳能模块组件由 高扭矩驱动单元,其根据控制信号跟踪太阳方位角;以及操作角度传感器单元,安装到高扭矩驱动单元,以通过控制信号检测太阳能模块组件跟踪太阳的操作角度。
    • 8. 发明授权
    • Patch for tooth whitening
    • 修补牙齿美白
    • US07323161B2
    • 2008-01-29
    • US10729648
    • 2003-12-05
    • Young Kweon ChoiHyun Suk YuJae Soon AhnHee Sook KimHyun Woo Kim
    • Young Kweon ChoiHyun Suk YuJae Soon AhnHee Sook KimHyun Woo Kim
    • A61K8/00A61Q11/00A61F13/00
    • A61K8/0208A61K8/22A61K8/731A61K8/8147A61K8/8176A61Q11/00
    • The patch for tooth whitening of the present invention includes a tooth-adhering layer (1) containing erodible polymer complexes formed by hydrogen bonding of a polymer with a carboxyl group (—COOH) and a polymer with a carbonyl group (—C═O) or ether group (—O—) and a tooth whitening agent; and an erosion rate-controlling layer (2) containing a mixture of a hydrophilic polymer and a film-forming polymer, wherein the patch is in a film form and is characterized by being eroded until extinguished after releasing the tooth whitening agent. When applied to the teeth, the patch releases a peroxide tooth-whitening agent while being hydrated by water in the mouth during a prescribed period, and thereafter, eroded until extinguished, thereby not requiring an additional detaching work from the teeth. Therefore, the patch is convenient in use and greatly reduces an obstruction sensation. Moreover, the patch has an excellent whitening effect.
    • 本发明的牙齿美白用贴剂包括:通过聚合物与羧基(-COOH)的氢键和具有羰基(-CO)或醚的聚合物(-CO)形成的含有可侵蚀聚合物络合物的牙齿粘附层(1) 基团(-O-)和牙齿增白剂; 以及包含亲水性聚合物和成膜聚合物的混合物的侵蚀速率控制层(2),其中所述贴剂是膜形式,其特征在于在释放牙齿增白剂后被侵蚀直到熄灭。 当施用于牙齿时,补片在规定的时间段内释放过氧化物牙齿增白剂,同时在口中水分水合,然后腐蚀直到熄灭,从而不需要从牙齿进一步的分离工作。 因此,贴片使用方便,大大降低了障碍感。 此外,贴剂具有优异的美白效果。
    • 9. 发明授权
    • Organometal-containing acrylate or methacrylate derivatives and
photoresists containing the polymers thereof
    • 含有机金属的丙烯酸酯或甲基丙烯酸酯衍生物和含有其聚合物的光致抗蚀剂
    • US6103448A
    • 2000-08-15
    • US149953
    • 1998-09-09
    • Jin Baek KimHyun Woo Kim
    • Jin Baek KimHyun Woo Kim
    • C07F7/12G03F7/07G03F7/075G03C1/492
    • G03F7/0758G03F7/0755
    • Organometal-containing acrylate or methacrylate derivatives and photoresists comprising the polymers thereof. Unlike conventional matrix polymers of photoresist, the polymers induce a difference in silicon content between exposed regions and unexposed regions of photoresists by releasing their silicon-containing side chains with the aid of acid in a chemical amplification manner. The difference in silicon content causes the exposed regions to be etched at a different rate from that of the unexposed regions under oxygen plasma. Thus, the photoresist material makes it possible to use a microlithographic process comprising a dry development step which can advantageously prevent the deformation or collapse of patterns which is aggravated as their aspect ratio increases, as well as the photoresist is economically more favorable than a top surface imaging system to which silylation on its top surface or a multi-level resist system to which wet development on its top layer must be applied, because the microlithographic process is very simple and no solvent is released.
    • 含有机金属的丙烯酸酯或甲基丙烯酸酯衍生物和含有其聚合物的光致抗蚀剂。 与光致抗蚀剂的常规基质聚合物不同,聚合物通过以化学放大方式释放其含硅侧链而在曝光区域和光致抗蚀剂的未曝光区域之间引起硅含量的差异。 硅含量的差异导致暴露区域以与氧等离子体下的未曝光区域不同的速率被蚀刻。 因此,光致抗蚀剂材料使得可以使用包括干显影步骤的微光刻工艺,其可以有利地防止随着其纵横比增加而加剧的图案的变形或塌陷,以及光致抗蚀剂在经济上比顶表面更有利 由于微光刻工艺非常简单并且没有溶剂释放,因此其顶表面上的甲硅烷基化或其顶层上的湿显影必须被施加到其上的多层抗蚀剂体系的成像系统。