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    • 2. 发明授权
    • Chanelled substrate double heterostructure lasers
    • 香奈儿衬底双异质结构激光器
    • US4323859A
    • 1982-04-06
    • US118653
    • 1980-02-04
    • Julian P. NoadAnthony J. SpringthorpeChristopher M. Look
    • Julian P. NoadAnthony J. SpringthorpeChristopher M. Look
    • H01L33/00H01S5/223H01S3/19
    • H01L33/0062H01S5/2232
    • In fabricating a III-V compound, for example, GaAs, having a layered structure a first layer is grown on a planar substrate by a vapor deposition process adapted to produce differential growth while a subsequent layer is grown by a deposition process which restores planarity. In this way, a uniformly thick combination layer is produced with a non-planar junction between its composite layers. Particularly in the fabrication of channelled substrate double heterostructure lasers, a channelled blocking layer is grown by organo-metallic pyrolysis (OMP) and a subsequent confining layer is grown using liquid phase epitaxy (LPE). The OMP process produces a channel with flanking shoulder portions which permit LPE growth of a very thin confining layer immediately above the shoulder portions thereby improving linearity of the device.
    • 在制造III-V族化合物时,例如,具有层状结构的第一层的GaAs通过适于产生差异生长的气相沉积工艺在平面基板上生长,而后续层通过恢复平面性的沉积工艺生长。 以这种方式,在其复合层之间产生具有非平面结的均匀厚的组合层。 特别是在通道衬底双异质结构激光器的制造中,通过有机金属热解(OMP)生长通道阻挡层,并且随后使用液相外延(LPE)生长限制层。 OMP过程产生具有侧翼部分的通道,其允许紧邻肩部部分上方的非常薄的限制层的LPE生长,从而提高装置的线性。
    • 5. 发明授权
    • Diffusion equipment
    • 扩散设备
    • US4493287A
    • 1985-01-15
    • US446441
    • 1982-12-03
    • Anthony J. Springthorpe
    • Anthony J. Springthorpe
    • C30B31/10C23C13/08
    • C30B31/103Y10S118/90
    • To secure accurate control over rapid diffusion such as the diffusion of zinc into gallium arsenide, the source and slices to be processed are isolated from one another during an initial warm-up period. This is done using one vessel for the crystal slice and a second vessel for the source. The source vessel initially blocks an opening in the slice vessel while the source and slice are brought to the desired diffusion temperature. The source vessel is then slid through the opening to a diffusing position in which a trailing part of the source vessel again plugs the opening in the slice vessel and in which an open part of the source vessel is now in the interior of the slice vessel. Use of this arrangement avoids the uncontrolled diffusion which occurs in current diffusion capsules during initial heating of the capsule.
    • 为了确保对快速扩散的准确控制,例如锌向砷化镓的扩散,待加工的源和切片在初始预热期间彼此隔离。 这是使用一个用于晶体切片的容器和用于源的第二容器来完成的。 源容器首先阻挡切片容器中的开口,同时使源和切片达到期望的扩散温度。 然后将源容器滑动通过开口到扩散位置,在该扩散位置,源容器的尾部再次插入切片容器中的开口,并且源容器的开放部分现在处于切片容器的内部。 使用这种布置避免了在胶囊的初始加热期间在当前扩散胶囊中发生的不受控制的扩散。