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1. 发明申请

US20070054135A1 Composition, film and producing method therefor 失效
标题翻译：组合物，薄膜及其制备方法
公开(公告)号：US20070054135A1
公开(公告)日：2007-03-08
申请号：US11515014
申请日：2006-09-05
申请人： Kensuke Morita , Koji Wariishi , Kazutaka Takahashi , Makoto Muramatsu
发明人： Kensuke Morita , Koji Wariishi , Kazutaka Takahashi , Makoto Muramatsu
IPC分类号： B32B9/04 , C08G77/20
CPC分类号： C08G77/20 , C08G77/045 , C09D183/04 , Y10T428/31663
摘要： A composition comprising: a polymerized substance of a compound (I) that contains m numbers of RSi(O0.5)3 units, wherein m represents an integer of from 8 to 16; and R's each independently represents a non-hydrolysable group, provided that at least two among R's represent groups containing a vinyl group or an ethynyl group, and wherein each one of the RSi(O0.5)3 units is connected to another one of the RSi(O0.5)3 units by sharing an oxygen atom in each one of the RSi(O0.5)3 units, so as to form a cage structure, and wherein within a solid component contained in the composition, a polymerized substance formed by a reaction of the compound (I) represents 60 mass % or more.
摘要翻译：一种组合物，其包含：含有m个RSi（O <0.5>）3个单元的化合物（I）的聚合物，其中m表示8至16的整数 ; 并且R各自独立地表示不可水解基团，条件是R中的至少两个表示含有乙烯基或乙炔基的基团，并且其中每个RSi（O）通过在RSi（O）3单体中的每一个中共享氧原子将3个单元连接到另一个RSi（O < 0.5），以形成笼结构，并且其中在组合物中含有的固体组分中，通过化合物（I）的反应形成的聚合物质表示60 质量％以上。

2. 发明授权

US07820777B2 Composition, film and producing method therefor 失效
标题翻译：组合物，薄膜及其制备方法
公开(公告)号：US07820777B2
公开(公告)日：2010-10-26
申请号：US11515014
申请日：2006-09-05
申请人： Kensuke Morita , Koji Wariishi , Kazutaka Takahashi , Makoto Muramatsu
发明人： Kensuke Morita , Koji Wariishi , Kazutaka Takahashi , Makoto Muramatsu
IPC分类号： C08G77/442 , B32B9/04 , H01L21/31 , H01L21/469
CPC分类号： C08G77/20 , C08G77/045 , C09D183/04 , Y10T428/31663
摘要： A composition comprising: a polymerized substance of a compound (I) that contains m numbers of RSi(O0.5)3 units, wherein m represents an integer of from 8 to 16; and R's each independently represents a non-hydrolysable group, provided that at least two among R's represent groups containing a vinyl group or an ethynyl group, and wherein each one of the RSi(O0.5)3 units is connected to another one of the RSi(O0.5)3 units by sharing an oxygen atom in each one of the RSi(O0.5)3 units, so as to form a cage structure, and wherein within a solid component contained in the composition, a polymerized substance formed by a reaction of the compound (I) represents 60 mass % or more.
摘要翻译：一种组合物，其包含：含有m个RSi（O0.5）3单元的化合物（I）的聚合物，其中m表示8〜16的整数; 并且R各自独立地表示不可水解基团，条件是R 1中的至少两个表示含有乙烯基或乙炔基的基团，并且其中每个RSi（O0.5）3单元连接到另一个 RSi（O0.5）3单元，通过在RSi（O0.5）3单元中的每一个中共享氧原子，以形成笼结构，并且其中在组合物中包含的固体组分中形成聚合物质化合物（I）的反应为60质量％以上。

3. 发明授权

US07772690B2 Insulating film 有权
标题翻译：绝缘膜
公开(公告)号：US07772690B2
公开(公告)日：2010-08-10
申请号：US12040988
申请日：2008-03-03
申请人： Kensuke Morita , Koji Wariishi , Akira Asano , Makoto Muramatsu
发明人： Kensuke Morita , Koji Wariishi , Akira Asano , Makoto Muramatsu
IPC分类号： H01L23/053 , H01L23/141
CPC分类号： H01L21/3122 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/02351 , H01L21/316 , H01L21/31695
摘要： An insulating film for semiconductor devices is obtained by curing, on a substrate, a high molecular compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents and having a cyclic siloxane structure, wherein the structure of the cage-type silsesquioxane compound is not broken by curing, and the breakage of the cage structure can be detected by observing a peak at approximately 610 cm−1 in Raman spectrum of the film after curing.
摘要翻译：半导体器件用绝缘膜通过在基板上固化由具有两个以上不饱和基团作为取代基且具有环状硅氧烷结构的笼型倍半硅氧烷化合物而得到的高分子化合物，可以通过在固化后的膜的拉曼光谱中观察约610cm -1处的峰值来检测笼结构的断裂。

4. 发明申请

US20070054136A1 Film forming composition, insulating film and production process of the insulating film 审中-公开
标题翻译：绝缘膜的成膜组合物，绝缘膜和制造工艺
公开(公告)号：US20070054136A1
公开(公告)日：2007-03-08
申请号：US11515818
申请日：2006-09-06
申请人： Kazutaka Takahashi , Koji Wariishi , Kensuke Morita
发明人： Kazutaka Takahashi , Koji Wariishi , Kensuke Morita
IPC分类号： B32B9/04 , C07F7/18
CPC分类号： C09D183/14 , Y10T428/31663
摘要： A film forming composition comprising: at least one of a compound represented by formula (I) as defined in the specification, a hydrolysate of the compound represented by formula (I) and a polycondensate of the compound represented by formula (I); and a silicon surfactant, a production process of an insulating film by using the composition and the insulating film.
摘要翻译：一种成膜组合物，其包含：如本说明书中定义的由式（I）表示的化合物中的至少一种，由式（I）表示的化合物的水解产物和由式（I）表示的化合物的缩聚物; 硅表面活性剂，使用该组合物和绝缘膜的绝缘膜的制造方法。

5. 发明申请

US20050267308A1 Silicon-containing compound, composition containing said compound, and insulating material 失效
标题翻译：含硅化合物，含有所述化合物的组合物和绝缘材料
公开(公告)号：US20050267308A1
公开(公告)日：2005-12-01
申请号：US11138352
申请日：2005-05-27
申请人： Kensuke Morita , Morio Yagihara , Koji Wariishi
发明人： Kensuke Morita , Morio Yagihara , Koji Wariishi
IPC分类号： C07F7/08 , C07F7/18 , C08L83/04 , C09D183/04
CPC分类号： C07F7/1804
摘要： A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1): AnSiX(4-n) (1) wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.
摘要翻译：一种用于形成绝缘膜的组合物，其包含由式（1）表示的化合物，由式（1）表示的化合物的水解产物和由式（1）表示的化合物的缩合物中的至少一种：＆lt; -formulae description =“In-line Formulas”end =“lead”？> A SiX（4-n）<1> <？in-line-formula description =“在线公式”end =“tail”？>其中n表示1至3的整数; A表示含有由11个或更多个碳原子形成的笼状结构的任选取代的基团，当n表示2或3的整数时，A相互相同或不同; X表示可水解基团，当n表示1或2的整数时，X相同或不同。

6. 发明授权

US07534904B2 Silicon-containing compound, composition containing said compound, and insulating material 失效
标题翻译：含硅化合物，含有所述化合物的组合物和绝缘材料
公开(公告)号：US07534904B2
公开(公告)日：2009-05-19
申请号：US11138352
申请日：2005-05-27
申请人： Kensuke Morita , Morio Yagihara , Koji Wariishi
发明人： Kensuke Morita , Morio Yagihara , Koji Wariishi
IPC分类号： C07F7/18
CPC分类号： C07F7/1804
摘要： A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1): AnSiX(4-n) (1) wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.
摘要翻译：一种用于形成绝缘膜的组合物，其包含由式（1）表示的化合物，由式（1）表示的化合物的水解产物和由式（1）表示的化合物的缩合物中的至少一种：＆lt; -formulae description =“In-line Formulas”end =“lead”？> AnSiX（4-n）（1）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中n 表示1〜3的整数， A表示含有由11个或更多个碳原子形成的笼状结构的任选取代的基团，当n表示2或3的整数时，A相互相同或不同; X表示可水解基团，当n表示1或2的整数时，X相同或不同。

7. 发明授权

US07497965B2 Insulating film-forming composition, insulating film and production method thereof 失效
标题翻译：绝缘膜形成组合物，绝缘膜及其制造方法
公开(公告)号：US07497965B2
公开(公告)日：2009-03-03
申请号：US11502389
申请日：2006-08-11
申请人： Koji Wariishi , Katsuyuki Watanabe , Kazutaka Takahashi
发明人： Koji Wariishi , Katsuyuki Watanabe , Kazutaka Takahashi
IPC分类号： E04B1/62 , E04B1/74 , C08G77/48 , C08L83/14 , C09D1/00 , C09D5/25 , C09D183/14
CPC分类号： H01L23/5329 , C09D4/00 , C09D183/14 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L21/31695 , H01L2924/0002 , Y10T428/31663 , C08G77/00 , H01L2924/00
摘要： An insulating film-forming composition comprising: at least one of a compound represented by formula (1) as defined in the specification, a hydrolysate and a condensate thereof; and at least one solvent, wherein the at least one solvent contains an organic solvent(s) having a boiling point of 85 to 250° C. in an amount of 25 mass % or more; a method for producing an insulating film by using the composition; and the insulating film.
摘要翻译：一种绝缘膜形成组合物，其包含：如说明书中定义的由式（1）表示的化合物，水解产物及其缩合物中的至少一种; 和至少一种溶剂，其中所述至少一种溶剂含有25质量％以上的沸点为85〜250℃的有机溶剂; 使用该组合物制造绝缘膜的方法; 和绝缘膜。

8. 发明申请

US20070034992A1 Insulating film-forming composition, insulating film and production method thereof 失效
标题翻译：绝缘膜形成组合物，绝缘膜及其制造方法
公开(公告)号：US20070034992A1
公开(公告)日：2007-02-15
申请号：US11502389
申请日：2006-08-11
申请人： Koji Wariishi , Katsuyuki Watanabe , Kazutaka Takahashi
发明人： Koji Wariishi , Katsuyuki Watanabe , Kazutaka Takahashi
IPC分类号： H01L23/58
CPC分类号： H01L23/5329 , C09D4/00 , C09D183/14 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L21/31695 , H01L2924/0002 , Y10T428/31663 , C08G77/00 , H01L2924/00
摘要： An insulating film-forming composition comprising: at least one of a compound represented by formula (1) as defined in the specification, a hydrolysate and a condensate thereof; and at least one solvent, wherein the at least one solvent contains an organic solvent(s) having a boiling point of 85 to 250° C. in an amount of 25 mass % or more; a method for producing an insulating film by using the composition; and the insulating film.
摘要翻译：一种绝缘膜形成组合物，其包含：如说明书中定义的由式（1）表示的化合物，水解产物及其缩合物中的至少一种; 和至少一种溶剂，其中所述至少一种溶剂含有25质量％以上的沸点为85〜250℃的有机溶剂; 使用该组合物制造绝缘膜的方法; 和绝缘膜。

9. 发明授权

US06203876B1 Information recording medium 失效
标题翻译：信息记录介质
公开(公告)号：US06203876B1
公开(公告)日：2001-03-20
申请号：US09231970
申请日：1999-01-15
申请人： Shinnichi Morishima , Koji Wariishi , Toshio Ishida , Michihiro Shibata
发明人： Shinnichi Morishima , Koji Wariishi , Toshio Ishida , Michihiro Shibata
IPC分类号： B32B302
CPC分类号： G11B7/244 , G11B7/247 , G11B7/2472 , G11B7/2534 , Y10S428/913 , Y10S430/146 , Y10T428/21
摘要： An information recording medium composed of 1) a transparent support, 2) a recording layer which is composed of an organic dye having an oxidation potential in terms of Po and an organic oxidizing agent having a reduction potential in terms of Pr in which the oxidation potential and the reduction potential satisfy the condition of 0.4V
摘要翻译：一种信息记录介质，包括1）透明支撑体，2）记录层，其由具有氧化电位的Po的有机染料和具有Pr的还原电位的有机氧化剂组成，其中氧化电位并且还原电位满足0.4V

10. 发明授权

US07723011B2 Image recording material and novel compound 失效
标题翻译：图像记录材料和新型化合物
公开(公告)号：US07723011B2
公开(公告)日：2010-05-25
申请号：US11950978
申请日：2007-12-05
申请人： Koji Wariishi
发明人： Koji Wariishi
IPC分类号： G03C1/00
CPC分类号： G03F7/092
摘要： This invention provides an image recording material, comprising: on a support, a protective layer that contains a crosslinked polymer formed of a polymer (a) having at least one kind of ionically crosslinkable functional group, and a low molecular weight compound (b) having at least one kind of ionically crosslinkable functional group, on an image recording layer, the image recording layer containing a compound (A), having at least one kind of ethylenically unsaturated bond, and a polymerization initiator (B).
摘要翻译：本发明提供一种图像记录材料，其特征在于，在载体上含有由具有至少一种离子交联性官能团的聚合物（a）形成的交联聚合物的保护层和具有至少一种离子交联性官能团的低分子量化合物（b）图像记录层上的至少一种离子交联性官能团，含有具有至少一种烯属不饱和键的化合物（A）的图像记录层和聚合引发剂（B）。

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