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1. 发明授权

US08095346B2 Operation simulation system for plant construction 失效
标题翻译：工厂建设运行模拟系统
公开(公告)号：US08095346B2
公开(公告)日：2012-01-10
申请号：US12353373
申请日：2009-01-14
申请人： Yoshibumi Fukuda , Kenji Araki , Hisanori Nonaka , Norito Watanabe , Toshiyuki Miyake , Kensuke Morita , Kenji Akagi
发明人： Yoshibumi Fukuda , Kenji Araki , Hisanori Nonaka , Norito Watanabe , Toshiyuki Miyake , Kensuke Morita , Kenji Akagi
IPC分类号： G06G7/48
CPC分类号： G06Q10/06 , G06Q50/08
摘要： An operation simulation system for plant construction, having operating expense calculated based on crane type determined by a command input; the expense to construct foundation calculated based on the foundation placement on which the determined crane is put; the operating expense calculated based on a period during which an operation is carried out; the expense to temporarily place the installation object calculated based on the specifications of the installation object before the installation; the installation operation expense calculated based on an installation milestone reflecting a due date of the installation object; the total necessary expense calculated based on all the expenses calculated; the total necessary expense is analyzed and evaluated; and the command input is adjusted by reflecting the results of an evaluation analysis so that the value of the command input falls in range of the set values in the specifications held by the corresponding setting apparatus.
摘要翻译：一种用于工厂建造的操作模拟系统，具有基于由命令输入确定的起重机类型计算的操作费用; 根据确定的起重机的基础位置计算建造基础的费用; 基于进行操作的期间计算的营业费用; 在安装前根据安装对象的规格临时放置安装对象的费用; 安装操作费用根据反映安装对象到期日的安装里程计算; 根据所计算的所有费用计算所需总费用; 对总需求费用进行分析评估; 并且通过反映评估分析的结果来调整命令输入，使得命令输入的值落在由相应的设置装置保持的规格中的设定值的范围内。

2. 发明授权

US07964684B2 Antireflection film forming composition, antireflection film and optical device 有权
标题翻译：防反射膜形成组合物，抗反射膜和光学装置
公开(公告)号：US07964684B2
公开(公告)日：2011-06-21
申请号：US12040941
申请日：2008-03-03
申请人： Kensuke Morita , Makoto Muramatsu , Kouji Tonohara
发明人： Kensuke Morita , Makoto Muramatsu , Kouji Tonohara
IPC分类号： C08F30/08
CPC分类号： C09D143/04 , G02B1/111 , Y10T428/31663
摘要： An antireflection film forming composition, includes: a polymerized product of Compound (I) having m number of RSi(O0.5)3 units, in which m stands for an integer of from 8 to 16, and Rs each independently represents a non-hydrolyzable group, with the proviso that at least two of Rs each represents a vinyl- or ethynyl-containing group, wherein each of the RSi(O0.5)3 units is linked to another RSi(O0.5)3 unit while having an oxygen atom in common and constitutes a cage structure, and wherein, of solids contained in the composition, the polymerized product obtained by a polymerization reaction of Compound (I) amounts to 60 mass % or greater and Compound (I) amounts to 15 mass % or less.
摘要翻译：一种抗反射膜形成组合物，包括：具有m个RSi（O0.5）3单元的化合物（I）的聚合产物，其中m表示8至16的整数，并且R 5各自独立地表示非 - 可水解基团，条件是至少两个Rs各自表示含乙烯基或乙炔基的基团，其中每个RSi（O0.5）3单元连接到另一个RSi（O0.5）3单元，同时具有氧原子共同构成笼结构，其中，通过化合物（I）的聚合反应得到的聚合物的组成中含有的固体为60质量％以上，化合物（I）为15质量％或更少。

3. 发明授权

US07820777B2 Composition, film and producing method therefor 失效
标题翻译：组合物，薄膜及其制备方法
公开(公告)号：US07820777B2
公开(公告)日：2010-10-26
申请号：US11515014
申请日：2006-09-05
申请人： Kensuke Morita , Koji Wariishi , Kazutaka Takahashi , Makoto Muramatsu
发明人： Kensuke Morita , Koji Wariishi , Kazutaka Takahashi , Makoto Muramatsu
IPC分类号： C08G77/442 , B32B9/04 , H01L21/31 , H01L21/469
CPC分类号： C08G77/20 , C08G77/045 , C09D183/04 , Y10T428/31663
摘要： A composition comprising: a polymerized substance of a compound (I) that contains m numbers of RSi(O0.5)3 units, wherein m represents an integer of from 8 to 16; and R's each independently represents a non-hydrolysable group, provided that at least two among R's represent groups containing a vinyl group or an ethynyl group, and wherein each one of the RSi(O0.5)3 units is connected to another one of the RSi(O0.5)3 units by sharing an oxygen atom in each one of the RSi(O0.5)3 units, so as to form a cage structure, and wherein within a solid component contained in the composition, a polymerized substance formed by a reaction of the compound (I) represents 60 mass % or more.
摘要翻译：一种组合物，其包含：含有m个RSi（O0.5）3单元的化合物（I）的聚合物，其中m表示8〜16的整数; 并且R各自独立地表示不可水解基团，条件是R 1中的至少两个表示含有乙烯基或乙炔基的基团，并且其中每个RSi（O0.5）3单元连接到另一个 RSi（O0.5）3单元，通过在RSi（O0.5）3单元中的每一个中共享氧原子，以形成笼结构，并且其中在组合物中包含的固体组分中形成聚合物质化合物（I）的反应为60质量％以上。

4. 发明申请

US20100206830A1 HEAVY CONSTRUCTION INSTALLATION METHOD 失效
标题翻译：重型建筑安装方法
公开(公告)号：US20100206830A1
公开(公告)日：2010-08-19
申请号：US12706995
申请日：2010-02-17
申请人： Yuji Kaneko , Ryohel Miyahara , Sumko Maezawa , Kensuke Morita , Takashi Okano
发明人： Yuji Kaneko , Ryohel Miyahara , Sumko Maezawa , Kensuke Morita , Takashi Okano
IPC分类号： B66C23/00
CPC分类号： B66C23/00 , B66C23/52 , B66C23/82 , B66C25/00
摘要： There is provided a heavy construction installation method which does not need a secondarily transport in a construction field even if an installation position of a heavy construction is apart from a berthing position of a transport ship. A movable area where a ground plane is reinforced so that a heavy hoisting machine for installing a heavy construction in a building is movable is constructed so as to include a circle drawn around an installation position in the building with a maximum operating radius of the heavy hoisting machine relative to a weight of the heavy construction being as a radius, and a circle drawn around a loaded position of the heavy construction at a transport ship coming alongside a landing place with the maximum operating radius being as a radius.
摘要翻译：提供了一种重型施工安装方法，即使重型施工的安装位置与运输船的停泊位置分开，也不需要在施工现场二次运输。一个可移动区域，其中地平面被加强，使得用于在建筑物中安装重型建筑物的重型起重机是可移动的，以便包括围绕建筑物中的安装位置拉出的圆，其中重型起重机的最大工作半径机器相对于作为半径的重型结构的重量，以及围绕重型结构的装载位置在与最大工作半径作为半径的着陆处一起的着陆处的运输船周围的圆。

5. 发明授权

US07534904B2 Silicon-containing compound, composition containing said compound, and insulating material 失效
标题翻译：含硅化合物，含有所述化合物的组合物和绝缘材料
公开(公告)号：US07534904B2
公开(公告)日：2009-05-19
申请号：US11138352
申请日：2005-05-27
申请人： Kensuke Morita , Morio Yagihara , Koji Wariishi
发明人： Kensuke Morita , Morio Yagihara , Koji Wariishi
IPC分类号： C07F7/18
CPC分类号： C07F7/1804
摘要： A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1): AnSiX(4-n) (1) wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.
摘要翻译：一种用于形成绝缘膜的组合物，其包含由式（1）表示的化合物，由式（1）表示的化合物的水解产物和由式（1）表示的化合物的缩合物中的至少一种：＆lt; -formulae description =“In-line Formulas”end =“lead”？> AnSiX（4-n）（1）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中n 表示1〜3的整数， A表示含有由11个或更多个碳原子形成的笼状结构的任选取代的基团，当n表示2或3的整数时，A相互相同或不同; X表示可水解基团，当n表示1或2的整数时，X相同或不同。

6. 发明授权

US07501185B2 Film-forming composition, insulating material-forming composition, insulating film and electronic device 失效
标题翻译：成膜组合物，绝缘材料形成组合物，绝缘膜和电子器件
公开(公告)号：US07501185B2
公开(公告)日：2009-03-10
申请号：US11149385
申请日：2005-06-10
申请人： Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
发明人： Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
IPC分类号： B32B27/30 , C07C13/28
CPC分类号： C08J9/28 , C08G61/02 , C08J9/26 , C08J2201/046 , C08J2365/00 , C08L65/00 , H01B3/307 , H01B3/441 , Y10T428/249953 , Y10T428/31855
摘要： A film-forming composition comprising: a compound having a specific cage structure; a pore-forming agent; an adhesion promoter; and so on, an insulating film formed from the film-forming composition and an electronic device comprising the insulating film.
摘要翻译：一种成膜组合物，其包含：具有特定笼结构的化合物; 成孔剂; 粘合促进剂; 等等，由成膜组合物形成的绝缘膜和包括绝缘膜的电子器件。

7. 发明申请

US20080213492A1 INSULATING FILM FORMING COMPOSITION AND PRODUCTION METHOD OF INSULATING FILM 失效
标题翻译：绝缘膜形成组合物和绝缘膜生产方法
公开(公告)号：US20080213492A1
公开(公告)日：2008-09-04
申请号：US12040951
申请日：2008-03-03
申请人： Kensuke MORITA
发明人： Kensuke MORITA
IPC分类号： C08L77/00 , B05D3/00
CPC分类号： H01L21/3122 , C09D179/04 , C09D179/08 , C09D183/10 , H01L21/02137 , H01L21/02282 , H01L21/31695
摘要： An insulating film forming composition, includes: a polymer compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents; a heat-resistant organic polymer compound having a carbon-carbon unsaturated bond; and an organic solvent, and a method for producing an insulating film, includes: coating the insulating film forming composition on a substrate; and then curing the coating.
摘要翻译：绝缘膜形成组合物包括：通过使具有两个或更多个不饱和基团作为取代基的笼型倍半硅氧烷化合物聚合而获得的高分子化合物; 具有碳 - 碳不饱和键的耐热有机高分子化合物; 有机溶剂和绝缘膜的制造方法包括：在基板上涂布绝缘膜形成组合物; 然后固化涂层。

8. 发明授权

US07320828B2 Composition for forming insulating film and process for producing insulating film 失效
标题翻译：用于形成绝缘膜的组合物和用于制造绝缘膜的方法
公开(公告)号：US07320828B2
公开(公告)日：2008-01-22
申请号：US11060544
申请日：2005-02-18
申请人： Kensuke Morita , Yutaka Adegawa
发明人： Kensuke Morita , Yutaka Adegawa
IPC分类号： B32B9/04
CPC分类号： H01L21/3124 , C09D183/04 , H01L21/02126 , H01L21/02216 , H01L21/02282 , Y10T428/31663
摘要： A composition for forming an insulating film comprising at least one of a compound represented by formula (I), a hydrolysate of the compound represented by formula (I) and a condensate of the compound represented by formula (I): wherein R1 to R7 each independently represents an organic group, and R1 to R7 are the same or different. And an insulating film obtained by a process, the process comprising using the compound represented by formula (I) as a starting material.
摘要翻译：一种用于形成绝缘膜的组合物，其包含由式（I）表示的化合物，式（I）表示的化合物的水解产物和由式（I）表示的化合物的缩合物中的至少一种：其中R“ R 1至R 7各自独立地表示有机基团，R 1至R 7相同或不同。和通过该方法获得的绝缘膜，该方法包括使用由式（I）表示的化合物作为起始原料。

9. 发明申请

US20050240499A1 Drawing system and drawing method 审中-公开
标题翻译：绘图系统和绘图方法
公开(公告)号：US20050240499A1
公开(公告)日：2005-10-27
申请号：US10840221
申请日：2004-05-07
申请人： Kensuke Morita , Naoki Furusho
发明人： Kensuke Morita , Naoki Furusho
IPC分类号： G06Q30/06 , G06Q50/00 , G06F17/60
CPC分类号： G06Q30/06 , G06Q10/0875
摘要： A drawing of a system having plural components that are combined is formed based on components in a computer having a volatile memory and diagram data having drawings of the components. Information about the arrangement of the components on the drawing is received. Drawing information of the system is produced as a bitmap object by a processor of the computer, based on the received component arrangement information and the component diagram data. The volatile memory stores the bitmap object. The stored bitmap object is transmitted as an image.
摘要翻译：具有组合的多个组件的系统的图形是基于具有易失性存储器的计算机中的组件和具有组件的图形的图形数据形成的。收到有关图纸上组件布置的信息。基于接收的组件配置信息和组件图数据，由计算机的处理器产生系统的绘图信息作为位图对象。易失性存储器存储位图对象。存储的位图对象作为图像发送。

10. 发明申请

US20050182227A1 Composition for forming insulating film and process for producing insulating film 失效
标题翻译：用于形成绝缘膜的组合物和用于制造绝缘膜的方法
公开(公告)号：US20050182227A1
公开(公告)日：2005-08-18
申请号：US11060544
申请日：2005-02-18
申请人： Kensuke Morita , Yutaka Adegawa
发明人： Kensuke Morita , Yutaka Adegawa
IPC分类号： C09D183/04 , G03C1/76 , H01L21/312
CPC分类号： H01L21/3124 , C09D183/04 , H01L21/02126 , H01L21/02216 , H01L21/02282 , Y10T428/31663
摘要： A composition for forming an insulating film comprising at least one of a compound represented by formula (I), a hydrolysate of the compound represented by formula (I) and a condensate of the compound represented by formula (I): wherein R1 to R7each independently represents an organic group, and R1 to R7 are the same or different. And an insulating film obtained by a process, the process comprising using the compound represented by formula (I) as a starting material.
摘要翻译：一种用于形成绝缘膜的组合物，其包含由式（I）表示的化合物，式（I）表示的化合物的水解产物和由式（I）表示的化合物的缩合物中的至少一种：其中R“ R 1至R 7各自独立地表示有机基团，R 1至R 7相同或不同。和通过该方法获得的绝缘膜，该方法包括使用由式（I）表示的化合物作为起始原料。

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