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1. 发明授权

US07772690B2 Insulating film 有权
标题翻译：绝缘膜
公开(公告)号：US07772690B2
公开(公告)日：2010-08-10
申请号：US12040988
申请日：2008-03-03
申请人： Kensuke Morita , Koji Wariishi , Akira Asano , Makoto Muramatsu
发明人： Kensuke Morita , Koji Wariishi , Akira Asano , Makoto Muramatsu
IPC分类号： H01L23/053 , H01L23/141
CPC分类号： H01L21/3122 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/02351 , H01L21/316 , H01L21/31695
摘要： An insulating film for semiconductor devices is obtained by curing, on a substrate, a high molecular compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents and having a cyclic siloxane structure, wherein the structure of the cage-type silsesquioxane compound is not broken by curing, and the breakage of the cage structure can be detected by observing a peak at approximately 610 cm−1 in Raman spectrum of the film after curing.
摘要翻译：半导体器件用绝缘膜通过在基板上固化由具有两个以上不饱和基团作为取代基且具有环状硅氧烷结构的笼型倍半硅氧烷化合物而得到的高分子化合物，可以通过在固化后的膜的拉曼光谱中观察约610cm -1处的峰值来检测笼结构的断裂。

2. 发明授权

US07799843B2 Film 有权
标题翻译：电影
公开(公告)号：US07799843B2
公开(公告)日：2010-09-21
申请号：US12392794
申请日：2009-02-25
申请人： Makoto Muramatsu , Akira Asano , Kensuke Morita
发明人： Makoto Muramatsu , Akira Asano , Kensuke Morita
IPC分类号： C08J3/28 , C08F30/08 , C08F38/00 , B32B27/00
CPC分类号： C09D183/04 , C08G77/045 , Y10S427/104 , Y10T428/31663
摘要： A file is formed by coating a substrate with a film-forming composition including a compound having an alicyclic hydrocarbon structure and irradiating the coated composition with microwaves having a frequency of 5.8 GHz. An insulating film is formed by irradiating a film including a compound having a siloxane structure with microwave having a frequency of 5.8 GHz. These films possess excellent film properties such as dielectric constant and mechanical strength.
摘要翻译：通过用包含具有脂环族烃结构的化合物的成膜组合物涂布基材形成文件，并用频率为5.8GHz的微波照射涂布的组合物。通过用频率为5.8GHz的微波照射包含具有硅氧烷结构的化合物的膜来形成绝缘膜。这些膜具有优异的膜性质，例如介电常数和机械强度。

3. 发明授权

US07501185B2 Film-forming composition, insulating material-forming composition, insulating film and electronic device 失效
标题翻译：成膜组合物，绝缘材料形成组合物，绝缘膜和电子器件
公开(公告)号：US07501185B2
公开(公告)日：2009-03-10
申请号：US11149385
申请日：2005-06-10
申请人： Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
发明人： Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
IPC分类号： B32B27/30 , C07C13/28
CPC分类号： C08J9/28 , C08G61/02 , C08J9/26 , C08J2201/046 , C08J2365/00 , C08L65/00 , H01B3/307 , H01B3/441 , Y10T428/249953 , Y10T428/31855
摘要： A film-forming composition comprising: a compound having a specific cage structure; a pore-forming agent; an adhesion promoter; and so on, an insulating film formed from the film-forming composition and an electronic device comprising the insulating film.
摘要翻译：一种成膜组合物，其包含：具有特定笼结构的化合物; 成孔剂; 粘合促进剂; 等等，由成膜组合物形成的绝缘膜和包括绝缘膜的电子器件。

4. 发明申请

US20050276964A1 Film-forming composition, insulating material-forming composition, insulating film and electronic device 失效
标题翻译：成膜组合物，绝缘材料形成组合物，绝缘膜和电子器件
公开(公告)号：US20050276964A1
公开(公告)日：2005-12-15
申请号：US11149385
申请日：2005-06-10
申请人： Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
发明人： Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
IPC分类号： C08G61/02 , C08J9/00 , C08L65/00 , B32B3/26
CPC分类号： C08J9/28 , C08G61/02 , C08J9/26 , C08J2201/046 , C08J2365/00 , C08L65/00 , H01B3/307 , H01B3/441 , Y10T428/249953 , Y10T428/31855
摘要： A film-forming composition comprising: a compound having a specific cage structure; a pore-forming agent; an adhesion promoter; and so on, an insulating film formed from the film-forming composition and an electronic device comprising the insulating film.
摘要翻译：一种成膜组合物，其包含：具有特定笼结构的化合物; 成孔剂; 粘合促进剂; 等等，由成膜组合物形成的绝缘膜和包括绝缘膜的电子器件。

5. 发明授权

US07602955B2 Osteoporosis diagnosis aiding apparatus utilizing panoramic radiographs 失效
标题翻译：骨质疏松诊断辅助设备利用全景影像
公开(公告)号：US07602955B2
公开(公告)日：2009-10-13
申请号：US10541595
申请日：2003-12-25
申请人： Akira Taguchi , Takashi Nakamoto , Akira Asano
发明人： Akira Taguchi , Takashi Nakamoto , Akira Asano
IPC分类号： G06K9/00
CPC分类号： G06T7/0012 , G06T2207/10116 , G06T2207/20044 , G06T2207/30008 , G06T2207/30036
摘要： The present invention provides an osteoporosis diagnosis aiding apparatus that utilizes a panoramic radiograph. A digitalized image of the panoramic radiograph enters a personal computer (S210). The cortical bone at the lower edge of the mandibular molar in the panoramic radiograph is specified with a mouse to make that part a target of examination (S220). This extracted image is subjected to the following image processing. (1) Subject the image to median filtering so as to reduce noises throughout that image. (2) Find a skeleton constituted by micro-structural elements (S230). (3) Extract only components parallel to the tilt of the lower edge of the mandible (S240). (4) Binarize the image using Otsu's linear discrimination method, for example (S250). The binarized lines are then classified into three groups according to size, and can be determined as a risk of osteoporosis in a case where there is more than just a single line classified in the largest line group aside from the smallest line group.
摘要翻译：本发明提供一种利用全景X线片的骨质疏松症诊断辅助装置。全景X光片的数字化图像进入个人计算机（S210）。在全景X光片下的下颌磨牙下缘的皮质骨用鼠标指定使该部分成为检查目标（S220）。对该提取图像进行以下图像处理。（1）对图像进行中值滤波，以减少整个图像的噪声。（2）找到由微观结构元素构成的骨架（S230）。（3）仅提取与下颌骨下缘倾斜平行的部件（S240）。（4）使用Otsu的线性判别方法对图像进行二值化，例如（S250）。然后根据大小将二值化线分为三组，并且在除了最小线组之外的最多线组中不仅仅是分为单线的情况下，可以确定为骨质疏松症的风险。

6. 发明申请

US20070049481A1 Inorganic fiber and method for manufacturing the same 有权
标题翻译：无机纤维及其制造方法
公开(公告)号：US20070049481A1
公开(公告)日：2007-03-01
申请号：US11509680
申请日：2006-08-25
申请人： Akira Asano , Hideki Kitahara , Takahito Mochida
发明人： Akira Asano , Hideki Kitahara , Takahito Mochida
IPC分类号： C03C13/06 , C03B37/05
CPC分类号： C03B37/055 , C03C13/00 , C03C2213/02
摘要： Disclosed herein is a bio-soluble inorganic fiber with high tensile strength, manufactured in a method comprising: heating and melting a raw material which includes, on a weight basis, 60 to 80 percent of SiO2, 5 to 20 percent of MgO, 5 to 30 percent of CaO, 0.5 to 5 of Al2O3, and 0.1 to 5 of BaO, at a temperature of 1800 to 2100 degrees Celsius; and exposing the melting material to an air flow for fiber forming.
摘要翻译：本文公开了一种具有高拉伸强度的生物可溶性无机纤维，其制造方法包括：将原料加热和熔化，所述原料按重量计包含60〜80％的SiO 2，5 至20％的MgO，5至30％的CaO，0.5至5的Al 2 O 3 3和0.1至5的BaO，温度为1800至2100 摄氏度并将熔融材料暴露于用于纤维形成的空气流中。

7. 发明授权

US06473563B2 Vaporizer and apparatus for vaporizing and supplying 失效
标题翻译：蒸发器和蒸发和供应装置
公开(公告)号：US06473563B2
公开(公告)日：2002-10-29
申请号：US09986901
申请日：2001-11-13
申请人： Yukichi Takamatsu , Takeo Yoneyama , Koji Kiriyama , Akira Asano , Kazuaki Tonari , Mitsuhiro Iwata
发明人： Yukichi Takamatsu , Takeo Yoneyama , Koji Kiriyama , Akira Asano , Kazuaki Tonari , Mitsuhiro Iwata
IPC分类号： C23C1400
CPC分类号： C23C16/4411 , C23C16/4404 , C23C16/4481
摘要： There are disclosed a vaporizer wherein at least a portion of a CVD material feed portion in contact with a CVD material is constituted of a corrosion resistant synthetic resin; and an apparatus for vaporizing and supplying which comprises a cooler and the vaporizer wherein the inside of the CVD material feed portion of the vaporizer and the surface on the side of the vaporization chamber of the CVD material feed portion are constituted of a corrosion resistant synthetic resin; the feed portion in contact with the outside of the vaporizer is constituted of a metal; and the CVD material feed portion which is constituted of a metal and which undergoes heat transfer from the heating means upon heating the vaporization chamber can be cooled with a cooler. The vaporizer and apparatus, when used for supplying a gaseous CVD-material to CVD equipment for producing semiconductors, enables the CVD material to be efficiently vaporized and supplied at desirable concentration and flow rate without causing deposit or adhesion of the CVD material at a CVD material feed port even if a solid CVD-material is used.
摘要翻译：公开了一种蒸发器，其中与CVD材料接触的CVD材料供给部分的至少一部分由耐腐蚀合成树脂构成; 以及包括冷却器和蒸发器的蒸发和供给装置，其中蒸发器的CVD材料供给部分的内部和CVD材料进料部分的蒸发室侧的表面由耐蚀合成树脂 ; 与蒸发器的外部接触的进料部分由金属构成; 并且由冷却器冷却由金属构成并且在加热蒸发室时从加热装置传热的CVD材料进料部分。蒸发器和设备当用于向用于制造半导体的CVD设备供应气态CVD材料时，使得能够以期望的浓度和流速有效地蒸发和供应CVD材料，而不会在CVD材料上沉积或粘附CVD材料即使使用固体CVD材料。

8. 发明申请

US20100317188A1 FLUORINE DOPED CARBON FILMS PRODUCED BY MODIFICATION BY RADICALS 有权
标题翻译：通过辐射修饰生产的氟代碳化硅膜
公开(公告)号：US20100317188A1
公开(公告)日：2010-12-16
申请号：US12858162
申请日：2010-08-17
申请人： Kenichi Nishizawa , Yasuhiro Terai , Akira Asano
发明人： Kenichi Nishizawa , Yasuhiro Terai , Akira Asano
IPC分类号： H01L21/768
CPC分类号： H01L21/0212 , C23C16/26 , C23C16/56 , H01L21/02274 , H01L21/0234 , H01L21/3127
摘要： A film forming method includes the steps of forming a F-doped carbon film by using a source gas containing C and F, and modifying the F-doped carbon film by radicals, the source gas having a F/C ratio larger than 1 and smaller than 2, the F/C ratio being defined as a ratio of a number of F atoms to a number of C atoms in a source gas molecule.
摘要翻译：成膜方法包括以下步骤：通过使用含有C和F的源气体形成F-掺杂的碳膜，并且通过自由基改性F-掺杂的碳膜，所述源气体的F / C比大于1或更小超过2，F / C比定义为源气体分子中F原子数与C原子数的比率。

9. 外观设计

USD624907S1 Mobile phone 有权
公开(公告)号：USD624907S1
公开(公告)日：2010-10-05
申请号：US29342726
申请日：2009-08-31
申请人： Yukimasa Komiya , Akira Asano , Takayuki Miyazawa
设计人： Yukimasa Komiya , Akira Asano , Takayuki Miyazawa

10. 发明申请

US20060251828A1 Plasma film-forming method and plasma film-forming apparatus 审中-公开
标题翻译：等离子体成膜法和等离子体成膜装置
公开(公告)号：US20060251828A1
公开(公告)日：2006-11-09
申请号：US10549859
申请日：2004-03-24
申请人： Yasuo Kobayashi , Kohei Kawamura , Akira Asano , Yasuhiro Terai , Kenichi Nishizawa
发明人： Yasuo Kobayashi , Kohei Kawamura , Akira Asano , Yasuhiro Terai , Kenichi Nishizawa
IPC分类号： H05H1/24 , C23C16/00
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/3244 , H01L21/0212 , H01L21/02274 , H01L21/3127
摘要： A plasma-assisted deposition system for carrying out a plasma-assisted deposition method has a processing vessel defining a vacuum chamber and having an open upper end, a dielectric member covering the open upper end of the processing vessel, and a flat antenna member placed on the upper surface of the dielectric member. A coaxial waveguide has one end connected to the upper surface of the flat antenna member and the other end connected to a microwave generator. The flat antenna member is provided with many slots of a length corresponding to half the wavelength of a microwave arranged on concentric circles. For example, a circularly polarized microwave is radiated from the slots into a processing space to produce a source gas plasma. Electron temperature in the plasma in terms of mean square velocity is 3 eV or below and the electron density in the plasma is 5×1011 electrons per cubic centimeter or above. The plasma is used for depositing a fluorine-containing carbon film. Preferably, the process pressure is 19.95 Pa or below. Under such process conditions for depositing a fluorine-containing carbon film by using the plasma, the source gas, such as C5F8 gas, is decomposed properly to form a structure of long CF chains. A interlayer insulation film thus formed has a small relative dielectric constant and permits only a low leakage current.
摘要翻译：用于执行等离子体辅助沉积方法的等离子体辅助沉积系统具有限定真空室并具有敞开的上端的处理容器，覆盖处理容器的敞开的上端的电介质构件和放置在电介质构件的上表面。同轴波导的一端连接到平坦天线构件的上表面，另一端连接到微波发生器。扁平天线构件设置有多个长度对应于布置在同心圆上的微波的一半波长的槽。例如，圆形极化微波从狭缝辐射到处理空间中以产生源气体等离子体。等离子体中的平均电子速度的电子温度为3eV以下，等离子体中的电子密度为每立方厘米以上5×10 11电子。等离子体用于沉积含氟碳膜。优选地，工艺压力为19.95Pa或更低。在通过使用等离子体沉积含氟碳膜的这种工艺条件下，诸如C 5 F 8气体的源气体被适当地分解以形成结构的长CF链。这样形成的层间绝缘膜具有小的相对介电常数，并且仅允许低的漏电流。

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