专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120307047A1 IMAGING SYSTEM AND CONTROL METHOD THEREOF 有权
标题翻译：成像系统及其控制方法
公开(公告)号：US20120307047A1
公开(公告)日：2012-12-06
申请号：US13473172
申请日：2012-05-16
申请人： Miyoko Kawashima , Tomochika Murakami
发明人： Miyoko Kawashima , Tomochika Murakami
IPC分类号： H04N7/18
CPC分类号： G06T7/0042 , G02B21/367 , G06T3/4038 , G06T7/73 , G06T2207/10056
摘要： An imaging system includes: an imaging unit that divides an imaging area of a subject into a plurality of blocks and captures images of the blocks; an image processing unit that merges the images of the respective blocks captured by the imaging unit to generate an entire image; a measuring unit that measures a plurality of points on the subject to acquire measured data before an image of the subject is captured by the imaging unit; and a dividing position adjusting unit that adjusts dividing positions of the subject based on the measured data of the measuring points acquired by the measuring unit so that boundaries of the blocks are arranged at positions having smaller spatial variations in values of the measured data. The imaging unit captures an image of each block according to the dividing positions adjusted by the dividing position adjusting unit.
摘要翻译：一种成像系统包括：成像单元，其将被摄体的成像区域划分成多个块并捕获块的图像; 图像处理单元，其合并由所述摄像单元拍摄的各个块的图像，以生成整个图像; 测量单元，其在由所述成像单元捕获所述被摄体的图像之前，测量所述被摄体上的多个点以获取测量数据; 以及分割位置调整单元，其基于由所述测量单元获取的测量点的测量数据来调整所述被摄体的分割位置，使得所述块的边界被布置在所述测量数据的值的空间变化较小的位置处。成像单元根据由分割位置调整单元调整的分割位置拍摄各块的图像。

2. 发明申请

US20120236137A1 IMAGING APPARATUS 有权
标题翻译：成像设备
公开(公告)号：US20120236137A1
公开(公告)日：2012-09-20
申请号：US13416456
申请日：2012-03-09
申请人： Miyoko Kawashima
发明人： Miyoko Kawashima
IPC分类号： H04N5/225 , H04N7/18
CPC分类号： H04N5/2258 , G02B5/005 , G02B21/36 , G02B27/58 , H04N5/2254 , H04N5/2256 , H04N5/238
摘要： An imaging apparatus includes an imaging optical system configured to form an optical image of an object, a first imaging sensor device, a second imaging sensor device having an integration degree smaller than that of the first imaging sensor, and a controller configured to execute a first imaging mode in which the first imaging sensor device is used for image pickup of the object while the first imaging sensor device is located at an image plane of the imaging optical system, and a second imaging mode in which the second imaging sensor device is used for image pickup of the object while the second imaging sensor device is located at the image plane of the imaging optical system.
摘要翻译：一种成像装置，包括被配置为形成物体的光学图像的成像光学系统，第一成像传感器装置，具有小于第一成像传感器的积分度的第二成像传感器装置，以及控制器，被配置为执行第一成像模式，其中第一成像传感器装置用于在第一成像传感器装置位于成像光学系统的像平面处的物体的图像拾取;以及第二成像模式，其中第二成像传感器装置用于第二成像传感器装置位于成像光学系统的像平面处的物体的图像拾取。

3. 发明授权

US07592130B2 Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US07592130B2
公开(公告)日：2009-09-22
申请号：US11549279
申请日：2006-10-13
申请人： Miyoko Kawashima
发明人： Miyoko Kawashima
IPC分类号： G03F7/20
CPC分类号： G03F7/70283 , G03F7/701 , G03F7/70425 , G03F7/70566
摘要： An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern onto a substrate to be exposed, wherein three lights among diffracted lights from the contact hole pattern interfere with each other, wherein said mask is an attenuated phase shift mask, and wherein said illumination light forms a radial polarization illumination.
摘要翻译：曝光方法包括以下步骤：使用照明光照射具有接触孔图案的掩模，并且经由投影光学系统将接触孔图案投射到待曝光的基板上，其中来自接触的衍射光中的三个光孔图案彼此干涉，其中所述掩模是衰减相移掩模，并且其中所述照明光形成径向偏振照明。

4. 发明授权

US07547502B2 Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US07547502B2
公开(公告)日：2009-06-16
申请号：US11552295
申请日：2006-10-24
申请人： Miyoko Kawashima
发明人： Miyoko Kawashima
IPC分类号： G03F7/20
CPC分类号： G03F7/70425 , G03F7/701
摘要： An exposure method includes the step of illuminating a mask having a contact hole pattern that includes a hybrid pattern using an illumination light that forms an effective source that has plural poles, and projecting an image of the mask onto a plate through a projection optics. The hybrid pattern includes a matrix pattern in which plural contact holes are arranged in a matrix shape, and a checker pattern in which plural contact holes are arranged in a checker shape. Three or four diffracted lights from the contact hole pattern interfere with each other.
摘要翻译：曝光方法包括使用形成具有多个极的有效光源的照明光照射具有包括混合图案的接触孔图案的掩模并通过投影光学器件将掩模的图像投影到板上的步骤。混合图案包括其中多个接触孔以矩阵形状布置的矩阵图案，并且其中多个接触孔以棋盘形状布置的棋盘图案。来自接触孔图案的三个或四个衍射光彼此干涉。

5. 发明授权

US07402378B2 Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US07402378B2
公开(公告)日：2008-07-22
申请号：US11255559
申请日：2005-10-21
申请人： Kenji Saitoh , Miyoko Kawashima
发明人： Kenji Saitoh , Miyoko Kawashima
IPC分类号： G03C5/00
CPC分类号： G03F1/30 , G03F7/70091 , G03F7/701 , G03F7/70283 , G03F7/70433
摘要： There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thicker than the dummy pattern's line width, illuminating the phase shift mask by using illumination light having a peak near or on an optical axis in an intensity distribution to transfer the desired pattern onto the exposure plane by projecting light having passed through the phase shift mask onto the exposure plane.
摘要翻译：提供了一种曝光方法，其包括以下步骤：形成具有期望图案的相移掩模和覆盖在期望图案上的循环虚拟图案，通过虚拟图案的效果而被分解的期望图案的一部分比通过在强度分布中使用具有在光轴附近或在光轴上的峰值的照明光来照射相移掩模，以通过将穿过相移掩模的光投射到曝光平面上将期望的图案转印到曝光平面上。

6. 发明授权

US07126667B2 Exposure apparatus and method 有权
标题翻译：曝光装置和方法
公开(公告)号：US07126667B2
公开(公告)日：2006-10-24
申请号：US11377184
申请日：2006-03-17
申请人： Miyoko Kawashima , Akiyoshi Suzuki
发明人： Miyoko Kawashima , Akiyoshi Suzuki
IPC分类号： G03B27/42 , G03B27/52 , G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70125 , G03F7/7025 , G03F7/70341 , G03F7/70958
摘要： An exposure method immerses, in liquid, a surface of an object to be exposed, and a surface of a projection optical system closest to the object, and projects a repetitive pattern formed on a mask via the projection optical system onto the object. The exposure method may direct exposure light having a wavelength λ through a projection optical system that is at least partially immersed in liquid and has a numerical aperture of no·sin θNA greater than 0.9 in order to transfer a pattern formed on a mask onto an object to be exposed, wherein no is a refractive index of the liquid, Δn is the fluctuation of the refractive index of the liquid, θNA is the largest angle common to the liquid and a resist material applied to the object to be exposed, and d is a thickness of the liquid in an optical-axis direction of the projection optical system which satisfies d≦(0.03λ) cos θNA/Δn.
摘要翻译：曝光方法将待暴露物体的表面和最接近物体的投影光学系统的表面浸没在液体中，并且通过投影光学系统将形成在掩模上的重复图案投射到物体上。曝光方法可以通过投影光学系统直接曝光具有波长λ的光，所述投影光学系统至少部分地浸没在液体中并具有数值孔径为n < 大于0.9，为了将掩模上形成的图案转印到待曝光的物体上，其中n O是液体的折射率，Deltan是液体的折射率的波动， θNA是液体和施加到待曝光物体的抗蚀剂材料共同的最大角度，d是投影光学系统的光轴方向上的液体的厚度，其满足 d <=（0.03lambda）cosθNA / Deltan。

7. 发明申请

US20060197933A1 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US20060197933A1
公开(公告)日：2006-09-07
申请号：US11366558
申请日：2006-03-03
申请人： Miyoko Kawashima
发明人： Miyoko Kawashima
IPC分类号： G03B27/54
CPC分类号： G03F7/70283
摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a plate to be exposed, and a pupil filter that includes a first area and a second area formed outside of the first area, the first area being formed as a circular area upon which a low order diffracted light that has passed the pattern of the mask is incident, the second area being formed as an annular area upon which a high order diffracted light that does not contain the low order diffracted light is incident and which inverts a phase of half of the high order diffracted light incident and cancels out the high order diffracted light.
摘要翻译：曝光装置包括投影光学系统，用于将掩模的图案投影到待曝光的板上，以及瞳孔滤光器，其包括形成在第一区域外部的第一区域和第二区域，第一区域形成为圆形已经通过掩模图案的低级衍射光入射到其上的区域，第二区域形成为不含低级衍射光的高级衍射光入射的环形区域，并且其中一个高阶衍射光的一半的相位入射并抵消高阶衍射光。

8. 发明授权

US06992750B2 Exposure apparatus and method 失效
公开(公告)号：US06992750B2
公开(公告)日：2006-01-31
申请号：US10732768
申请日：2003-12-09
申请人： Miyoko Kawashima , Akiyoshi Suzuki
发明人： Miyoko Kawashima , Akiyoshi Suzuki
IPC分类号： G03B27/52 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70125 , G03F7/7025 , G03F7/70341 , G03F7/70958
摘要： An exposure method immerses, in liquid, a surface of an object to be exposed, and a surface of a projection optical system closest to the object, and projects a repetitive pattern formed on a mask via the projection optical system onto the object. The exposure method forms on a pupil of the projection optical system an effective light source that emits, from an axis orthogonal to an optical axis of the projection optical system, light that is parallel to a repetitive direction of the repetitive pattern and has an incident angle θ upon the object, wherein the light includes only s-polarized light in an area of an incident angle θ that satisfies 90°−θNA≦θ≦θNA, where θNA is the largest value of the incident angle θ.

9. 发明授权

US08502962B2 Computer readable storage medium including effective light source calculation program, and exposure method 失效
标题翻译：包括有效光源计算程序和曝光方法的计算机可读存储介质
公开(公告)号：US08502962B2
公开(公告)日：2013-08-06
申请号：US12945775
申请日：2010-11-12
申请人： Miyoko Kawashima , Kenji Yamazoe , Hironobu Fujishima
发明人： Miyoko Kawashima , Kenji Yamazoe , Hironobu Fujishima
IPC分类号： G03B27/32 , G03B27/54 , G03B27/72 , G03F7/20
CPC分类号： G03F7/70091 , G03F7/70083 , G03F7/705 , G03F7/70508
摘要： A storage medium includes a program which causes a computer to execute a method of calculating a light intensity distribution on a pupil plane of an illumination optical system. The method includes: determining an impulse response function of a projection optical system by performing Fourier transform on a pupil function of the projection optical system; setting a length to a second zero point of the impulse response function as a response length, extracting, from elements forming a target pattern, only elements inside am area within radius which is response length, and determining a function indicating the extracted pattern as an image function; and obtaining the light intensity distribution based on the pupil function, the determined impulse response function, and the determined image function.
摘要翻译：存储介质包括使计算机执行计算照明光学系统的光瞳平面上的光强度分布的方法的程序。该方法包括：通过对投影光学系统的光瞳功能执行傅立叶变换来确定投影光学系统的脉冲响应函数; 将脉冲响应函数的长度设置为第二零点作为响应长度，从形成目标图案的元素中仅提取作为响应长度的半径内的am区域内的元素，以及将指示提取的图案的功能确定为图像功能; 并且基于瞳孔函数，所确定的脉冲响应函数和所确定的图像功能获得光强度分布。

10. 发明申请

US20120327208A1 IMAGING APPARATUS 有权
标题翻译：成像设备
公开(公告)号：US20120327208A1
公开(公告)日：2012-12-27
申请号：US13488601
申请日：2012-06-05
申请人： Yoshinari Higaki , Miyoko Kawashima , Toshihiko Tsuji
发明人： Yoshinari Higaki , Miyoko Kawashima , Toshihiko Tsuji
IPC分类号： H04N5/217 , H04N7/18
CPC分类号： G02B21/365 , G02B13/18 , G02B27/0068 , H04N5/3572
摘要： An imaging apparatus comprises: an imaging unit having an imaging optical system and an imaging device; a measuring unit that measures, for each of a plurality of regions on a specimen, an optical aberration or a physical quantity causing the aberration before the imaging of the specimen is performed; a plurality of optical elements that are inserted in an optical path of the imaging optical system for correcting the aberration and that differ in correction amount; and a control unit that selects an optical element from among the optical elements on the basis of a measurement result of the measuring unit, and inserts the selected optical element into the optical path of the imaging optical system before the imaging of the specimen. The imaging optical system is configured to be capable of forming simultaneously images of the plurality of regions on the imaging device.
摘要翻译：一种成像装置包括：具有成像光学系统和成像装置的成像单元; 测量单元，其针对样本的多个区域中的每一个测量导致在所述样本的成像之前产生像差的光学像差或物理量; 多个光学元件，其插入到成像光学系统的光路中，用于校正像差，并且校正量不同; 以及控制单元，其基于所述测量单元的测量结果从所述光学元件中选择光学元件，并且在所述样本的成像之前将所选择的光学元件插入所述成像光学系统的光路中。成像光学系统被配置为能够同时形成成像装置上的多个区域的图像。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式