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1. 发明授权

US08786827B2 Method and apparatus for measurement of exit pupil transmittance 失效
标题翻译：出射瞳孔透射率的测量方法和装置
公开(公告)号：US08786827B2
公开(公告)日：2014-07-22
申请号：US12703100
申请日：2010-02-09
申请人： Adlai H. Smith , Robert O. Hunter, Jr.
发明人： Adlai H. Smith , Robert O. Hunter, Jr.
IPC分类号： G03B27/72 , G03B27/68 , G03B27/52 , G03B27/62 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70941 , G02B27/0927 , G02B27/0944 , G03F7/70091 , G03F7/70158 , G03F7/70566 , G03F7/70591
摘要： A method and apparatus for determining the state of the lens transmittance of an optical projection system are described. A lens or imaging objective transmission is determined as a function of exit pupil transverse direction cosine (nx,ny) at multiple field points thereby providing a more complete analysis and correction of a photolithographic exposure system. The entrance pupil of a projection imaging system is uniformly illuminated and the angular dependence of transmission through the imaging system as a function of exit pupil direction cosines is determined. The illumination source includes a light conditioner with an in-situ illumination structure (ISIS), which is an optical structure that can provide uniform illumination of the system's entrance pupil.
摘要翻译：描述了用于确定光学投影系统的透镜透射率的状态的方法和装置。作为多个场点处的出射光瞳横向余弦（nx，ny）的函数，确定透镜或成像物镜透射，从而提供对光刻曝光系统的更完整的分析和校正。投影成像系统的入射光瞳被均匀地照射，并且确定作为出射光瞳方向余弦的函数的通过成像系统的透射的角度依赖性。照明源包括具有原位照明结构（ISIS）的光调节器，其是可以提供系统的入射光瞳的均匀照明的光学结构。

2. 发明授权

US07381503B2 Reference wafer calibration reticle 失效
标题翻译：参考晶圆校准标线
公开(公告)号：US07381503B2
公开(公告)日：2008-06-03
申请号：US11742468
申请日：2007-04-30
申请人： Adlai H. Smith , Robert O. Hunter, Jr.
发明人： Adlai H. Smith , Robert O. Hunter, Jr.
IPC分类号： G03F9/00
CPC分类号： G03F7/70458 , G03F1/44 , G03F7/70516 , G03F7/70616 , G03F7/70633 , G03F9/7076 , Y10S430/143 , Y10S430/168
摘要： An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility where an archive media includes etched alignment attributes. Exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming completed alignment attributes. Then, measuring offsets in the completed alignment attributes and constructing a calibration file for the archive media based upon the offset measurements and other characteristic data of the exposure tool.
摘要翻译：一种用于在半导体制造设备中制造和使用校准的配准参考晶片的装置和方法，其中存档介质包括蚀刻对准属性。将互补对准属性的图案公开在归档介质上，使得互补对准属性的图案覆盖并与蚀刻的对准属性互锁，从而形成完整的对准属性。然后，基于曝光工具的偏移测量值和其他特征数据，测量完成的对齐属性中的偏移并为归档介质构建校准文件。

3. 发明授权

US6130009A Apparatus and process for nozzle production utilizing computer generated holograms 失效
标题翻译：使用计算机产生的全息图的喷嘴生产的装置和方法
公开(公告)号：US6130009A
公开(公告)日：2000-10-10
申请号：US177108
申请日：1994-01-03
申请人： Adlai H. Smith , Bruce B. McArthur , Robert O. Hunter, Jr.
发明人： Adlai H. Smith , Bruce B. McArthur , Robert O. Hunter, Jr.
IPC分类号： B23K26/06 , B23K26/38 , B41J2/16 , G03H1/08 , G03H1/00
CPC分类号： B41J2/162 , B23K26/066 , B23K26/389 , B41J2/1634 , G03H1/0005 , G03H1/08 , G03H2001/0094 , G03H2222/36 , Y10S430/146
摘要： An apparatus and process for generating precision ink jet nozzle arrays in substrates is disclosed. The apparatus includes laser output through an alignment path, power monitor, expansion telescope and scanner. Preferably, beam division optics are used in conjunction with the scanner to divide out a plurality of beams and scan simultaneously a corresponding plurality of computer generated holograms (CGHs). These computer generated holograms are configured and scanned so that the generated image--preferably in the first order of diffraction--produces at least a row of ink jet holes having precision dimension and alignment preferably without optical interference from other diffraction orders. Utilizing the disclosed process and apparatus, a one step system is disclosed for going from a substrate to a finished nozzle array suitable for use with ink jet printers.
摘要翻译：公开了一种用于在衬底中产生精密喷墨喷嘴阵列的装置和方法。该装置包括通过对准路径的激光输出，功率监视器，扩展望远镜和扫描仪。优选地，分束光学器件与扫描器结合使用以分割多个光束并同时扫描相应的多个计算机产生的全息图（CGH）。这些计算机生成的全息图被配置和扫描，使得所产生的图像（优选地以衍射的一级）产生至少一排具有精确尺寸和对准的喷墨孔，优选地不具有来自其它衍射级的光学干涉。利用所公开的方法和装置，公开了一种用于从基底转移到适用于喷墨打印机的成品喷嘴阵列的一步系统。

4. 发明授权

US5702662A Process for ablating high density vias in flexible substrate 失效
标题翻译：在柔性基底中烧蚀高密度通孔的方法
公开(公告)号：US5702662A
公开(公告)日：1997-12-30
申请号：US536863
申请日：1995-09-29
申请人： Adlai H. Smith , Robert O. Hunter, Jr. , Bruce McArthur , Steven Blair , Jim Wilkinson
发明人： Adlai H. Smith , Robert O. Hunter, Jr. , Bruce McArthur , Steven Blair , Jim Wilkinson
IPC分类号： B23K26/06 , H05K1/00 , H05K3/00 , B23K26/00
CPC分类号： H05K3/0026 , B23K26/066 , H05K1/0393 , H05K2203/056 , H05K2203/1545
摘要： A apparatus and process for ablating a matrix of high density vias in a flexible substrate. The apparatus is cantilevered on a horizontal shelf from a partition where it can be rigidly supported. A vacuum container reciprocates towards and away from the partition and supports the horizontal shelf by permitting supporting casters to bear on and be supported by the reciprocating container. When the container is away from the partition, servicing of the apparatus as well as the insertion an removal of substrate can occur. When the container is adjoined to the partition, a vacuum can be drawn on the apparatus and processing commenced. A continuous flexible substrate is provided extending in a circuitous path between a supply roll and a take up roll, all interior of the container. The flexible substrate is maintained under constant tension and incrementally advanced. The substrate is incrementally advanced and stopped, passing across a table. When the roll is advanced, the table releases the substrate and is cleaned of the debris resulting form previous ablations. When the roll is stopped, the table clamps and precisely levels the substrate for sequential ablation of the substrate.
摘要翻译：一种用于在柔性基底中烧蚀高密度通孔基质的装置和方法。该装置悬挂在水平货架上，可从其间被刚性支撑的隔板上。真空容器朝向和远离分隔件往复运动，并且通过允许支撑脚轮承载并由往复式容器支撑来支撑水平搁架。当容器远离分隔件时，可能会发生装置的维修以及插入物的移除。当容器与隔板相邻时，可以在设备上抽真空并开始处理。提供连续的柔性基底，其在供给辊和卷取辊之间的迂回路径中延伸，容纳所有内部。柔性基板保持恒定的张力并递增。底物逐渐升高并停止，穿过桌子。当辊前进时，工作台释放基材，并清除先前烧蚀后产生的碎屑。当辊停止时，工作台夹紧并精确地平整衬底以顺序地消除衬底。

5. 发明授权

US5633735A Use of fresnel zone plates for material processing 失效
标题翻译：使用菲涅耳区板进行材料加工
公开(公告)号：US5633735A
公开(公告)日：1997-05-27
申请号：US177356
申请日：1994-01-03
申请人： Robert O. Hunter, Jr. , Adlai H. Smith , Clark C. Guest , Bruce B. McArthur
发明人： Robert O. Hunter, Jr. , Adlai H. Smith , Clark C. Guest , Bruce B. McArthur
IPC分类号： B23K26/06 , B23K26/067 , B23K26/40 , G02B5/32 , G02B27/44 , G03H1/08 , B23K26/00
CPC分类号： B23K26/067 , B23K26/042 , B23K26/066 , B23K26/082 , B23K26/384 , B23K26/40 , B23K26/402 , G02B5/188 , G03H1/0005 , H05K3/0026 , B23K2203/05 , B23K2203/42 , B23K2203/52 , G03H2001/0094 , G03H2222/33 , G03H2222/36 , H05K2203/056 , H05K2203/107
摘要： Optical machining of a workpiece with coherent light scanning a plate with a plurality of subaperture subapertures is disclosed. Each of the subapertures creates a working image which when scanned with a coherent wave front of the design frequency forms in three dimensional space the working image. The working image when registered to a workpiece effect processing of the workpiece, usually ablating an aperture such as a blind via of small dimension. Improved techniques of dimensioning and fabricating the subaperture, creating amplitude modulation with the phase plate, and finally controlling amplitude with optical features close to the limit of producible optical elements is disclosed. The apparatus for the process, the process and the plate for utilization in the process are set forth.
摘要翻译：公开了具有相干光扫描具有多个子孔径子孔径的板的工件的光学加工。每个子孔径产生工作图像，当用设计频率的相干波前扫描工作图像时，在三维空间中形成工作图像。工件图像在注册到工件时对工件进行加工处理，通常会切割小孔如盲孔等小尺寸。公开了改进的尺寸和制造子孔径的技术，利用相位板产生幅度调制，并且最终以接近可制造光学元件的极限的光学特征来控制幅度。阐述了该过程的装置，过程和该过程中的利用板。

6. 发明授权

US5571429A Apparatus and process for high speed laminate processing with computer generated holograms 失效
标题翻译：用计算机生成的全息图进行高速层压处理的装置和方法
公开(公告)号：US5571429A
公开(公告)日：1996-11-05
申请号：US201600
申请日：1994-02-25
申请人： Adlai H. Smith , Bruce B. McArthur , Robert O. Hunter, Jr.
发明人： Adlai H. Smith , Bruce B. McArthur , Robert O. Hunter, Jr.
IPC分类号： B23K26/06 , H05K3/00
CPC分类号： B23K26/066 , H05K3/0017
摘要： In an apparatus and process for the direct ablation of substrates, an optical train is disclosed which enables large substrates to be processed from relatively small optical masks containing subaperture groups. Optical masks, preferably in the form of transparent plates containing computer generated holograms, are provided with at least discrete subaperture groups for sequential scanning and hence sequential processing of the substrate. A scanning beam in combination with a variable aperture overlying the mask sequentially scans the subaperture groups of the plates to produce direct laser ablation from a subaperture group intended to be scanned and prevents partial scanning of adjacent subaperture groups. Specialized plates with overlying generally negative lenses and subapertures elongated with respect to the radial direction of optical divergence are utilized to project images out from under the respective computer generated holograms to locations at the side of the plates without distortion. The plates enable both ablation of local openings within the substrates as well as the preparation of surfaces surrounding such openings for both cleansing of the working surface of the substrate as well as preparation of the surface of the substrate for receipt of further processing such as plating. Excising of both completed circuits and areas on substrates is disclosed. A preferred embodiment includes a compression telescope combined with a preferred scanning mirror train to minimize mirror size with ablation from underneath a horizontally or vertically disposed substrate so that generated debris falling or cleaned from the substrate falls away from the processed product.
摘要翻译：在用于直接烧蚀衬底的设备和方法中，公开了一种使得能够从包含亚孔径组的相对小的光学掩模处理大衬底的光学系统。优选以包含计算机产生的全息图的透明板的形式的光学掩模设置有至少离散的子孔径组，用于顺序扫描并因此顺序地处理衬底。与覆盖掩模的可变光圈组合的扫描光束顺序地扫描板的子孔径组，以从要被扫描的子孔径组产生直接激光烧蚀，并防止相邻子孔径组的部分扫描。使用具有相对于光学发散的径向方向伸长的具有覆盖的大致负透镜和子孔径的专用板将图像从相应的计算机生成的全息图下方投影到板的侧面的位置而没有变形。这些板使得能够消除衬底内的局部开口以及围绕这种开口的表面的制备，用于清洁衬底的工作表面以及准备用于接收诸如电镀的进一步处理的衬底的表面。公开了完成的电路和基板上的区域的消除。优选实施例包括与优选的扫描反射镜系列组合的压缩望远镜，以使得从水平或垂直布置的基底下方的消融最小化反射镜尺寸，使得从基板落下或清洁的产生的碎屑从处理的产品中脱落。

7. 发明授权

US5482801A High power phase masks for imaging systems 失效
标题翻译：用于成像系统的大功率相位掩模
公开(公告)号：US5482801A
公开(公告)日：1996-01-09
申请号：US230183
申请日：1994-04-20
申请人： Adlai H. Smith , Robert O. Hunter, Jr.
发明人： Adlai H. Smith , Robert O. Hunter, Jr.
IPC分类号： B23K26/00 , B23K26/06 , G03C5/00 , G03F1/00 , G03F1/34 , G03F7/20 , G03F9/00
CPC分类号： G03F1/34 , G03F7/70283
摘要： The phase mask comprises binary square wave gratings which deflect light away from the collecting aperture of the projection system and binary phase gratings which deflect the incident light into a fan of rays to fill the collecting aperture. In the transmissive regions, the mask consists of randomly-placed squares etched to a depth corresponding to a half wave retardation and filling approximately fifty percent of the area within the transmissive region. The "blocking" regions consist of a binary grating etched to the same depth as that of the transmissive region but having sufficiently high spatial frequency to deflect the incident light to points outside of the collecting aperture.
摘要翻译：相位掩模包括使光远离投影系统的收集孔的二进制方波光栅和将入射光偏转成光线的风扇以填充收集孔的二进制相位光栅。在透射区域中，掩模由随机放置的正方形组成，其被蚀刻到对应于半波延迟的深度并且填充透射区域内的大约百分之五十的面积。 “阻挡”区域由蚀刻到与透射区域相同深度的二进制光栅组成，但是具有足够高的空间频率以将入射光偏转到收集孔外部的点。

8. 发明授权

US5481407A Apparatus and process for using Fresnel zone plate array for processing materials 失效
标题翻译：用于加工材料的菲涅耳带板阵列的设备和工艺
公开(公告)号：US5481407A
公开(公告)日：1996-01-02
申请号：US121060
申请日：1993-09-14
申请人： Adlai H. Smith , Robert O. Hunter, Jr. , Bruce B. McArthur
发明人： Adlai H. Smith , Robert O. Hunter, Jr. , Bruce B. McArthur
IPC分类号： B23K26/06 , G02B3/08 , B23K26/00
CPC分类号： B23K26/066
摘要： An apparatus for using and a process of using a Fresnel zone plate array is utilized for processing materials. An optically stable frame receives coherent light and passes the coherent light through beam processing optics such as a collimator, a beam expanding telescope and an aperture. Thereafter, the beam is routed to scanning mirrors immediately overlying a Fresnel zone plate array. The Fresnel zone plate array has a plurality of discrete subapertures with each subaperture containing image information at a discrete working distance from the plate; each image produced by a subaperture of the Fresnel zone plate array typically differs from adjacent images from adjacent subapertures typically in size, shape or gain. The beam is scanned and registered to a discrete selected subaperture on the plate to cause an image from the subaperture to form on a work piece located at the working distance of a scanned subaperture. Once the image is selected, the work piece is moved relative to the Fresnel zone plate array to register the image of the discrete subaperture at the required location for processing on the work piece. At each location for processing utilizing a particular selected image, the work piece is positioned, and the laser pulsed with the selected image causing processing of the work piece. Utilizing the disclosed apparatus and process, a work piece can be configured by multiple image exposures from arbitrarily selected subapertures on the Fresnel zone plate array to produce a precisely spaced and precisely configured array of holes or other shapes of extreme small dimension.
摘要翻译：用于处理材料的使用装置和使用菲涅耳带片阵列的方法。光学稳定的框架接收相干光，并通过诸如准直仪，光束扩展望远镜和光圈的光束处理光学器件传递相干光。此后，光束被路由到立即覆盖在菲涅耳区板阵列上的扫描反射镜。菲涅耳带状板阵列具有多个离散的子孔径，其中每个子孔径包含离板的离散工作距离的图像信息; 由菲涅耳区板阵列的子孔径产生的每个图像通常不同于相邻子孔径的相邻图像，通常在尺寸，形状或增益方面。将光束扫描并登记在板上的离散选定的子孔径上，以使得来自子孔径的图像形成在位于扫描的子孔径的工作距离处的工件上。一旦选择了图像，工件就相对于菲涅耳区板阵列移动，将离散子孔径的图像注册到所需位置，以便在工件上进行处理。在利用特定所选图像进行处理的每个位置处，定位工件，并且用所选择的图像脉冲激光引起工件的处理。利用所公开的装置和工艺，工件可以通过从菲涅耳区板阵列上的任意选择的子孔径进行多次图像曝光来构造，以产生精确间隔且精确配置的孔或其他极小尺寸形状的阵列。

9. 发明授权

US5328785A High power phase masks for imaging systems 失效
标题翻译：用于成像系统的大功率相位掩模
公开(公告)号：US5328785A
公开(公告)日：1994-07-12
申请号：US833939
申请日：1992-02-10
申请人： Adlai H. Smith , Robert O. Hunter, Jr.
发明人： Adlai H. Smith , Robert O. Hunter, Jr.
IPC分类号： B23K26/00 , B23K26/06 , G03C5/00 , G03F1/00 , G03F1/34 , G03F7/20 , G03F9/00
CPC分类号： G03F1/34 , G03F7/70283
摘要： The phase mask comprises binary square wave gratings which deflect light away from the collecting aperture of the projection system and binary phase gratings which deflect the incident light into a fan of rays to fill the collecting aperture. In the transmissive regions, the mask consists of randomly-placed squares etched to a depth corresponding to a half wave retardation and filling approximately fifty percent of the area within the transmissive region. The "blocking" regions consist of a binary grating etched to the same depth as that of the transmissive region but having sufficiently high spatial frequency to deflect the incident light to points outside of the collecting aperture.
摘要翻译：相位掩模包括使光远离投影系统的收集孔的二进制方波光栅和将入射光偏转成光线的风扇以填充收集孔的二进制相位光栅。在透射区域中，掩模由随机放置的正方形组成，其被蚀刻到对应于半波延迟的深度并且填充透射区域内的大约百分之五十的面积。 “阻挡”区域由蚀刻到与透射区域相同深度的二进制光栅组成，但是具有足够高的空间频率以将入射光偏转到收集孔外部的点。

10. 发明授权

US07846624B2 Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves 有权
标题翻译：确定焦点和远心性的系统和方法，改进计量诱发效应和应用于确定精密凸轮曲线
公开(公告)号：US07846624B2
公开(公告)日：2010-12-07
申请号：US11676959
申请日：2007-02-20
申请人： Adlai H. Smith , Robert O. Hunter, Jr.
发明人： Adlai H. Smith , Robert O. Hunter, Jr.
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F9/7023 , G03B27/68 , G03F7/70083 , G03F7/70191 , G03F7/705 , G03F7/70633 , G03F7/70641
摘要： An apparatus and method for the simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners is described. A reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using an aperture plate is exposed onto a resist coated wafer several times. The resulting exposure patterns are measured with a conventional overlay tool. The overlay data is processed with a slope-shift algorithm for the simultaneous determination of both focus and source telecentricity as a function of field position. Additionally, methods for ameliorating metrology induced effects and methods for producing precision Bossung curves are also described. This Abstract is provided for the sole purpose of complying with the Abstract requirement rules, it shall not be used to interpret or to limit the scope or the meaning of the claims.
摘要翻译：描述了用于光刻步进机和扫描仪同时确定焦距和光源瞄准误差的装置和方法。包含专门设计用于使用孔板执行光源或出射光瞳划分的盒装盒测试结构的定制阵列的掩模版被暴露在抗蚀剂涂覆的晶片上多次。所得到的曝光图案用传统的覆盖工具测量。覆盖数据用斜率移位算法处理，用于同时确定作为场位置的函数的焦点和源远心。此外，还描述了用于改善计量学诱导效应的方法和用于产生精确Bossung曲线的方法。本摘要仅用于遵守抽象要求规则，不得用于解释或限制权利要求的范围或含义。

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