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    • 4. 发明申请
    • APPARATUS FOR PRODUCING MULTICRYSTALLINE SILICON INGOTS BY INDUCTION METHOD
    • 通过诱导方法生产多晶硅的装置
    • US20120174630A1
    • 2012-07-12
    • US13386197
    • 2010-07-19
    • Sergii BeringovVolodymyr OnischenkoAnatoly ShkulkovYuriy CherpakSergii PozigunStepan MarchenkoBogdan Chepurnyy
    • Sergii BeringovVolodymyr OnischenkoAnatoly ShkulkovYuriy CherpakSergii PozigunStepan MarchenkoBogdan Chepurnyy
    • C03B17/04
    • C30B29/06C30B11/001C30B11/003C30B13/14C30B28/06Y10S117/901Y10T117/10Y10T117/1088
    • An apparatus for producing multicrystalline silicon ingots by the induction method comprises an enclosure, which includes means for start-up heating of silicon and a cooled crucible enveloped by an inductor. The crucible has a movable bottom and four walls consisting of sections spaced apart by vertically extending slots, means for moving the movable bottom, and a controlled cooling compartment arranged under the cooled crucible. The inside face of the crucible defines a melting chamber of a rectangular or square cross-section. The walls of the cooled crucible extend outwards at least from the inductor toward the lowest portion of the cooled crucible to thereby expand the melting chamber, and the angle β of expanding the melting chamber is defined by the equation β=arctg[2·(k−1.35·10 3·b)/d], where d is the dimension of the smaller side of the rectangle or of the side of the square of the cross-section of the melting chamber at the inducer level, b is the dimension of the adjoining side of the cross-section of the melting chamber at the inducer level, k is an empirical coefficient, which is 1.5 to 2. The apparatus makes it possible to decrease silicon melt spills and to increase the quality of multicrystalline silicon thus produced.
    • 用于通过感应方法生产多晶硅锭的装置包括:外壳,其包括用于启动加热硅的装置和由电感器包围的冷却的坩埚。 坩埚具有可移动的底部和四个壁,其由垂直延伸的槽间隔开的部分,用于移动可移动底部的装置和布置在冷却的坩埚下方的受控制的冷却室组成。 坩埚的内表面限定了矩形或正方形横截面的熔化室。 冷却的坩埚的壁至少从电感器向冷却坩埚的最低部分向外延伸,从而使熔化室膨胀,并且角度& 扩展熔化室的方法由方程&bgr = _ arctg [2·(k-1.35·10 3·b)/ d]定义,其中d是长方形或正方形的一侧的尺寸 在熔化室处于诱导级的剖面的横截面为b,熔化室横截面的相邻侧的尺寸为导流级,k为经验系数,为1.5〜2。 可以减少硅熔体溢出并提高由此产生的多晶硅的质量。
    • 5. 发明授权
    • Apparatus for producing multicrystalline silicon ingots by induction method
    • 用感应法生产多晶硅锭的装置
    • US09039835B2
    • 2015-05-26
    • US13386197
    • 2010-07-19
    • Sergii BeringovVolodymyr OnischenkoAnatoly ShkulkovYuriy CherpakSergii PozigunStepan MarchenkoBogdan Chepurnyy
    • Sergii BeringovVolodymyr OnischenkoAnatoly ShkulkovYuriy CherpakSergii PozigunStepan MarchenkoBogdan Chepurnyy
    • C30B13/14C30B15/10C30B35/00C30B29/06C30B11/00C30B28/06
    • C30B29/06C30B11/001C30B11/003C30B13/14C30B28/06Y10S117/901Y10T117/10Y10T117/1088
    • An apparatus for producing multicrystalline silicon ingots by the induction method comprises an enclosure, which includes means for start-up heating of silicon and a cooled crucible enveloped by an inductor. The crucible has a movable bottom and four walls consisting of sections spaced apart by vertically extending slots, means for moving the movable bottom, and a controlled cooling compartment arranged under the cooled crucible. The inside face of the crucible defines a melting chamber of a rectangular or square cross-section. The walls of the cooled crucible extend outwards at least from the inductor toward the lowest portion of the cooled crucible to thereby expand the melting chamber, and the angle β of expanding the melting chamber is defined by the equation β=arctg[2·(k−1.35·10 3·b)/d], where d is the dimension of the smaller side of the rectangle or of the side of the square of the cross-section of the melting chamber at the inducer level, b is the dimension of the adjoining side of the cross-section of the melting chamber at the inducer level, k is an empirical coefficient, which is 1.5 to 2. The apparatus makes it possible to decrease silicon melt spills and to increase the quality of multicrystalline silicon thus produced.
    • 用于通过感应方法生产多晶硅锭的装置包括:外壳,其包括用于启动加热硅的装置和由电感器包围的冷却的坩埚。 坩埚具有可移动的底部和四个壁,其由垂直延伸的槽间隔开的部分,用于移动可移动底部的装置和布置在冷却的坩埚下方的受控制的冷却室组成。 坩埚的内表面限定了矩形或正方形横截面的熔化室。 冷却的坩埚的壁至少从电感器向冷却坩埚的最低部分向外延伸,从而使熔化室膨胀,并且角度& 扩展熔化室的方法由方程&bgr = _ arctg [2·(k-1.35·10 3·b)/ d]定义,其中d是长方形或正方形的一侧的尺寸 在熔化室处于诱导级的剖面的横截面为b,熔化室横截面的相邻侧的尺寸为导流级,k为经验系数,为1.5〜2。 可以减少硅熔体溢出并提高由此产生的多晶硅的质量。